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(en)
|
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|
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(de)
|
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2011-02-17 |
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|
US9482966B2
(en)
|
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|
US7110081B2
(en)
|
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|
US10503084B2
(en)
|
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2019-12-10 |
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|
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(zh)
|
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|
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(ja)
|
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|
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|
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|
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|
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|
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|
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|
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(en)
|
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2007-07-10 |
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|
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(zh)
*
|
2002-12-10 |
2010-06-02 |
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|
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(ja)
*
|
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2010-08-25 |
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|
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(zh)
|
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|
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(ko)
|
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2015-07-01 |
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|
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(en)
|
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2008-04-28 |
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Environmental system including vacuum scavange for an immersion lithography apparatus
|
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(zh)
|
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2006-05-10 |
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|
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(ko)
|
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|
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(ko)
|
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2013-11-01 |
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|
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(en)
|
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2008-04-01 |
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|
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(zh)
*
|
2003-05-23 |
2016-01-21 |
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|
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(zh)
|
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2015-12-01 |
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|
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(zh)
|
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2014-06-21 |
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|
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(en)
|
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2007-05-08 |
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|
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(fr)
|
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2011-05-25 |
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|
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(zh)
|
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2017-12-01 |
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|
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(en)
|
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|
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(en)
|
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|
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(fr)
|
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|
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(fr)
|
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|
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(fr)
|
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|
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(fr)
|
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|
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(fr)
|
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|
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(ko)
|
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2013-08-13 |
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|
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(en)
|
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|
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(fr)
|
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|
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(en)
|
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2007-02-13 |
Asml Netherlands B.V. |
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|
CN101644899B
(zh)
*
|
2003-07-28 |
2012-02-22 |
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|
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(ko)
|
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|
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(fr)
|
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2005-02-02 |
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|
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(en)
|
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|
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(ko)
|
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|
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(fr)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(fr)
|
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2014-07-09 |
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|
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(en)
|
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2006-10-11 |
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|
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(zh)
|
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|
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(ko)
|
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|
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(ja)
*
|
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2010-03-31 |
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|
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(fr)
|
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|
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(de)
|
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|
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(en)
|
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|
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(fr)
|
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|
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(fr)
|
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2005-04-20 |
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|
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(zh)
|
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2017-03-01 |
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|
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(en)
|
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|
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(en)
|
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|
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(ja)
|
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2005-06-16 |
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|
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(ja)
|
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|
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(zh)
|
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|
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(en)
|
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|
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(fr)
|
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2018-07-18 |
Nikon Corporation |
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|
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(fr)
|
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2010-12-08 |
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|
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(en)
|
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2009-09-15 |
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|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
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|
TW201809727A
(zh)
|
2004-02-06 |
2018-03-16 |
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|
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(en)
|
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|
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(ko)
|
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가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
JPWO2005096354A1
(ja)
*
|
2004-03-30 |
2008-02-21 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法、並びに面形状検出装置
|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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2011-03-01 |
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|
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(en)
|
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2008-05-27 |
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|
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(en)
|
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|
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(en)
|
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2009-02-03 |
Asml Netherlands B.V. |
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|
CN1954408B
(zh)
*
|
2004-06-04 |
2012-07-04 |
尼康股份有限公司 |
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|
WO2005122242A1
(fr)
*
|
2004-06-07 |
2005-12-22 |
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|
WO2005122219A1
(fr)
*
|
2004-06-09 |
2005-12-22 |
Nikon Corporation |
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|
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(fr)
|
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2005-12-22 |
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|
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(en)
|
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2013-08-13 |
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|
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(fr)
|
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2013-10-02 |
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|
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(en)
|
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2014-05-06 |
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|
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(en)
|
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2013-02-12 |
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|
US20070139628A1
(en)
*
|
2004-06-10 |
2007-06-21 |
Nikon Corporation |
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|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
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|
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(ko)
|
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2013-11-18 |
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노광 장치 및 디바이스 제조 방법
|
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(en)
|
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2008-12-09 |
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|
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(fr)
|
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2006-01-19 |
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|
US7161663B2
(en)
|
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2007-01-09 |
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|
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(fr)
|
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2006-02-09 |
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|
JP3870207B2
(ja)
*
|
2004-08-05 |
2007-01-17 |
キヤノン株式会社 |
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|
US7304715B2
(en)
|
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2007-12-04 |
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|
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(en)
|
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2012-11-06 |
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|
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(en)
|
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2010-04-20 |
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|
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(en)
|
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2018-04-27 |
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|
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(en)
|
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2006-11-07 |
Asml Netherlands B.V. |
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|
US7522261B2
(en)
*
|
2004-09-24 |
2009-04-21 |
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|
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(en)
|
2004-09-28 |
2008-04-08 |
Asml Netherlands B.V. |
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|
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(en)
|
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2011-02-22 |
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|
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(en)
|
2004-10-07 |
2007-04-24 |
Asml Netherlands B.V. |
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|
WO2006041091A1
(fr)
*
|
2004-10-12 |
2006-04-20 |
Nikon Corporation |
Procédé d’entretien d’un appareil d’exposition, appareil d’exposition, procédé de fabrication du dispositif et élément de récupération de liquide pour l’entretien d’un appareil d’exposition par immersion
|
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(en)
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
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|
US7119876B2
(en)
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
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|
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(zh)
|
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2013-11-21 |
尼康股份有限公司 |
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|
US7583357B2
(en)
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
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|
US7423720B2
(en)
|
2004-11-12 |
2008-09-09 |
Asml Netherlands B.V. |
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|
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(en)
|
2004-11-12 |
2008-08-19 |
Asml Netherlands B.V. |
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|
US7251013B2
(en)
|
2004-11-12 |
2007-07-31 |
Asml Netherlands B.V. |
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|
US7411657B2
(en)
|
2004-11-17 |
2008-08-12 |
Asml Netherlands B.V. |
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|
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(zh)
|
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2019-03-21 |
日商尼康股份有限公司 |
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|
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(en)
|
2004-11-23 |
2006-12-05 |
Asml Netherlands B.V. |
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|
US7161654B2
(en)
|
2004-12-02 |
2007-01-09 |
Asml Netherlands B.V. |
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|
US7446850B2
(en)
|
2004-12-03 |
2008-11-04 |
Asml Netherlands B.V. |
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|
JP2006190996A
(ja)
*
|
2004-12-06 |
2006-07-20 |
Nikon Corp |
基板処理方法、露光方法、露光装置及びデバイス製造方法
|
US20080137056A1
(en)
*
|
2004-12-06 |
2008-06-12 |
Tomoharu Fujiwara |
Method for Processing Substrate, Exposure Method, Exposure Apparatus, and Method for Producing Device
|
US7397533B2
(en)
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
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|
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(en)
|
2004-12-07 |
2007-07-24 |
Asml Netherlands B.V. |
Sensor shield
|
US7196770B2
(en)
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
Prewetting of substrate before immersion exposure
|
US7365827B2
(en)
|
2004-12-08 |
2008-04-29 |
Asml Netherlands B.V. |
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|
US7352440B2
(en)
|
2004-12-10 |
2008-04-01 |
Asml Netherlands B.V. |
Substrate placement in immersion lithography
|
US7403261B2
(en)
|
2004-12-15 |
2008-07-22 |
Asml Netherlands B.V. |
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|
KR101585310B1
(ko)
*
|
2004-12-15 |
2016-01-14 |
가부시키가이샤 니콘 |
기판 유지 장치, 노광 장치 및 디바이스 제조방법
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
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|
US7880860B2
(en)
|
2004-12-20 |
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Lithographic apparatus and device manufacturing method
|
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(en)
|
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|
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(en)
|
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|
US20060147821A1
(en)
|
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2006-07-06 |
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|
DE602006012746D1
(de)
|
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|
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(en)
|
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2006-08-30 |
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|
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(ko)
|
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2018-11-23 |
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노광 장치 및 디바이스 제조 방법
|
US8692973B2
(en)
|
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2014-04-08 |
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|
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(ko)
|
2005-02-10 |
2012-01-17 |
에이에스엠엘 네델란즈 비.브이. |
침지 액체, 노광 장치, 및 노광 프로세스
|
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(en)
|
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|
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(en)
|
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2011-09-13 |
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|
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(en)
|
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|
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(en)
|
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2008-09-23 |
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|
JP4262252B2
(ja)
*
|
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2009-05-13 |
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|
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(en)
|
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2008-01-29 |
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|
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(en)
|
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2010-03-23 |
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|
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(zh)
|
2005-03-18 |
2014-01-21 |
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|
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(en)
|
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2008-02-12 |
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Lithographic apparatus, immersion projection apparatus and device manufacturing method
|
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(en)
|
2005-04-05 |
2008-08-12 |
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|
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(en)
|
2005-04-08 |
2007-11-06 |
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|
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(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
US20060232753A1
(en)
|
2005-04-19 |
2006-10-19 |
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Liquid immersion lithography system with tilted liquid flow
|
EP1876637A4
(fr)
|
2005-04-28 |
2010-01-27 |
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Procédé d exposition, appareil d exposition, et procédé de fabrication du dispositif
|
US8248577B2
(en)
|
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|
US7317507B2
(en)
|
2005-05-03 |
2008-01-08 |
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|
US7433016B2
(en)
|
2005-05-03 |
2008-10-07 |
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|
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(ko)
|
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2015-08-12 |
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|
JP4708876B2
(ja)
*
|
2005-06-21 |
2011-06-22 |
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|
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(en)
|
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|
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(en)
|
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|
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(en)
|
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2010-11-16 |
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|
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(en)
|
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2009-01-06 |
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|
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(en)
|
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2008-12-23 |
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|
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(en)
|
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2012-05-15 |
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|
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(en)
|
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2009-05-19 |
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|
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(en)
|
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2011-11-08 |
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|
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(en)
|
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2008-08-12 |
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|
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(en)
|
2005-11-16 |
2010-02-02 |
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|
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(en)
|
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2010-09-28 |
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|
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(en)
|
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2011-01-04 |
Asml Netherlands B.V. |
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|
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(en)
|
2005-11-23 |
2009-12-15 |
Asml Netherlands B.V. |
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|
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(en)
|
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2010-08-10 |
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System and method to increase surface tension and contact angle in immersion lithography
|
KR101539517B1
(ko)
*
|
2005-12-08 |
2015-07-24 |
가부시키가이샤 니콘 |
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|
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(en)
|
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|
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(en)
|
2005-12-28 |
2010-11-23 |
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|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
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|
JP2007201252A
(ja)
*
|
2006-01-27 |
2007-08-09 |
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露光装置及びデバイス製造方法
|
US7893047B2
(en)
*
|
2006-03-03 |
2011-02-22 |
Arch Chemicals, Inc. |
Biocide composition comprising pyrithione and pyrrole derivatives
|
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(en)
|
2006-03-13 |
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|
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(en)
|
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2011-09-27 |
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|
JP2007266504A
(ja)
*
|
2006-03-29 |
2007-10-11 |
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|
US9477158B2
(en)
|
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2016-10-25 |
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|
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(en)
|
2006-05-22 |
2011-06-28 |
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|
US20070273856A1
(en)
*
|
2006-05-25 |
2007-11-29 |
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|
WO2007139017A1
(fr)
*
|
2006-05-29 |
2007-12-06 |
Nikon Corporation |
Élément de récupération de liquide, appareil de support de substrat, appareil d'exposition et procédé de fabrication du dispositif
|
US7532309B2
(en)
|
2006-06-06 |
2009-05-12 |
Nikon Corporation |
Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid
|
US20080043211A1
(en)
*
|
2006-08-21 |
2008-02-21 |
Nikon Corporation |
Apparatus and methods for recovering fluid in immersion lithography
|
US20080100812A1
(en)
*
|
2006-10-26 |
2008-05-01 |
Nikon Corporation |
Immersion lithography system and method having a wafer chuck made of a porous material
|
US8208116B2
(en)
*
|
2006-11-03 |
2012-06-26 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography system using a sealed wafer bath
|
US8253922B2
(en)
|
2006-11-03 |
2012-08-28 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography system using a sealed wafer bath
|
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(en)
|
2006-11-22 |
2011-10-25 |
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Lithographic apparatus with a fluid combining unit and related device manufacturing method
|
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(en)
|
2006-12-07 |
2017-04-25 |
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Lithographic apparatus, a dryer and a method of removing liquid from a surface
|
US8634053B2
(en)
|
2006-12-07 |
2014-01-21 |
Asml Netherlands B.V. |
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|
US7791709B2
(en)
|
2006-12-08 |
2010-09-07 |
Asml Netherlands B.V. |
Substrate support and lithographic process
|
US20080212050A1
(en)
*
|
2007-02-06 |
2008-09-04 |
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Apparatus and methods for removing immersion liquid from substrates using temperature gradient
|
US20080198346A1
(en)
*
|
2007-02-16 |
2008-08-21 |
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|
US20080198348A1
(en)
*
|
2007-02-20 |
2008-08-21 |
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Apparatus and methods for minimizing force variation from immersion liquid in lithography systems
|
US20080231823A1
(en)
*
|
2007-03-23 |
2008-09-25 |
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Apparatus and methods for reducing the escape of immersion liquid from immersion lithography apparatus
|
US9013672B2
(en)
|
2007-05-04 |
2015-04-21 |
Asml Netherlands B.V. |
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|
US8947629B2
(en)
|
2007-05-04 |
2015-02-03 |
Asml Netherlands B.V. |
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|
US7866330B2
(en)
|
2007-05-04 |
2011-01-11 |
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|
JP2009033111A
(ja)
*
|
2007-05-28 |
2009-02-12 |
Nikon Corp |
露光装置、デバイス製造方法、洗浄装置、及びクリーニング方法並びに露光方法
|
US8514365B2
(en)
*
|
2007-06-01 |
2013-08-20 |
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Lithographic apparatus and device manufacturing method
|
US20080304025A1
(en)
*
|
2007-06-08 |
2008-12-11 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Apparatus and method for immersion lithography
|
US8125611B2
(en)
*
|
2007-06-13 |
2012-02-28 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Apparatus and method for immersion lithography
|
US8705010B2
(en)
|
2007-07-13 |
2014-04-22 |
Mapper Lithography Ip B.V. |
Lithography system, method of clamping and wafer table
|
TWI450047B
(zh)
*
|
2007-07-13 |
2014-08-21 |
Mapper Lithography Ip Bv |
微影系統、夾緊方法及晶圓台
|
US20090040482A1
(en)
*
|
2007-08-10 |
2009-02-12 |
Canon Kabushiki Kaisha |
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|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
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|
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(ja)
|
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2013-08-21 |
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|
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(en)
|
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2012-11-29 |
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|
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(zh)
|
2007-10-16 |
2013-06-12 |
株式会社尼康 |
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|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
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|
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(en)
|
2007-11-06 |
2015-08-25 |
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|
NL1036186A1
(nl)
*
|
2007-12-03 |
2009-06-04 |
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|
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(nl)
*
|
2007-12-03 |
2009-06-04 |
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|
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(ja)
|
2008-02-05 |
2013-12-18 |
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ステージ装置、露光装置、露光方法、及びデバイス製造方法
|
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(ja)
*
|
2008-03-24 |
2009-11-05 |
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|
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(nl)
*
|
2008-04-24 |
2009-10-27 |
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|
KR101695034B1
(ko)
|
2008-05-28 |
2017-01-10 |
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|
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(ja)
|
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2012-12-12 |
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リソグラフィ装置及び装置の動作方法
|
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(ja)
*
|
2008-12-09 |
2010-06-24 |
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|
JP5001343B2
(ja)
*
|
2008-12-11 |
2012-08-15 |
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|
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(en)
|
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2011-03-29 |
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|
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(fr)
|
2010-04-22 |
2015-05-06 |
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|
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(en)
|
2010-07-16 |
2012-01-17 |
Asml Netherlands Bv |
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|
US20120012191A1
(en)
*
|
2010-07-16 |
2012-01-19 |
Nikon Corporation |
Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
|
US9329496B2
(en)
|
2011-07-21 |
2016-05-03 |
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|
EP2856261B1
(fr)
*
|
2012-05-29 |
2020-11-11 |
ASML Netherlands B.V. |
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|
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(en)
|
2012-05-29 |
2013-12-02 |
Asml Netherlands Bv |
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|
WO2015081167A1
(fr)
*
|
2013-11-27 |
2015-06-04 |
Tokyo Electron Limited |
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|
JPWO2018062508A1
(ja)
*
|
2016-09-30 |
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|
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(zh)
*
|
2016-10-09 |
2017-01-18 |
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|
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(en)
|
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|
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(ja)
*
|
2017-10-31 |
2021-12-22 |
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|
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(zh)
*
|
2020-03-06 |
2020-06-23 |
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|
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(zh)
*
|
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2023-02-21 |
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|