SG129259A1 - Radiation source lithographic apparatus, and device manufacturing method - Google Patents

Radiation source lithographic apparatus, and device manufacturing method

Info

Publication number
SG129259A1
SG129259A1 SG200305633A SG200305633A SG129259A1 SG 129259 A1 SG129259 A1 SG 129259A1 SG 200305633 A SG200305633 A SG 200305633A SG 200305633 A SG200305633 A SG 200305633A SG 129259 A1 SG129259 A1 SG 129259A1
Authority
SG
Singapore
Prior art keywords
radiation source
source comprises
improve
radiation
device manufacturing
Prior art date
Application number
SG200305633A
Other languages
English (en)
Inventor
Lucas Henricus Johanne Stevens
Yurii Vctorovitch Sidelkov
Vsevolod Grigorevi Koloshnikov
Vladimir Mihailovitch Krivtsun
Konstantin Nikolaevit Koshelev
Vadim Yevgenyevich Banine
Vladimir Vital Evtich Ivanov
Erik Rene Kieft
Erik Roelof Loopstra
Robert Rafilevitch Gayazov
Olav Waldemar Vladimir Frijns
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG129259A1 publication Critical patent/SG129259A1/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/0266—Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with separate evaporating and condensing chambers connected by at least one conduit; Loop-type heat pipes; with multiple or common evaporating or condensing chambers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Thermal Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Sustainable Development (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
SG200305633A 2002-10-03 2003-09-17 Radiation source lithographic apparatus, and device manufacturing method SG129259A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02256907 2002-10-03

Publications (1)

Publication Number Publication Date
SG129259A1 true SG129259A1 (en) 2007-02-26

Family

ID=32695567

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200305633A SG129259A1 (en) 2002-10-03 2003-09-17 Radiation source lithographic apparatus, and device manufacturing method
SG200305749A SG127702A1 (en) 2002-10-03 2003-09-30 Radiation source, lithographic apparatus, and device manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG200305749A SG127702A1 (en) 2002-10-03 2003-09-30 Radiation source, lithographic apparatus, and device manufacturing method

Country Status (6)

Country Link
US (2) US6933510B2 (zh)
JP (2) JP4188208B2 (zh)
KR (1) KR100606498B1 (zh)
CN (1) CN100505974C (zh)
SG (2) SG129259A1 (zh)
TW (1) TWI252377B (zh)

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CN100594428C (zh) * 2002-09-19 2010-03-17 Asml荷兰有限公司 辐射源、光刻装置和器件的制造方法
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US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
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DE102004058500A1 (de) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
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US7233010B2 (en) * 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
JP5176037B2 (ja) * 2005-05-30 2013-04-03 国立大学法人大阪大学 極端紫外光源用ターゲット
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DE102005055686B3 (de) * 2005-11-18 2007-05-31 Xtreme Technologies Gmbh Anordnung zur Erzeugung kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas sowie Verfahren zur Herstellung von kühlmitteldurchströmten Elektrodengehäusen
US7479646B2 (en) * 2005-12-09 2009-01-20 Plex Llc Extreme ultraviolet source with wide angle vapor containment and reflux
US7863542B2 (en) 2005-12-22 2011-01-04 Sony Corporation Laser processing apparatus and laser processing method as well as debris extraction mechanism and debris extraction method
ATE489839T1 (de) * 2006-05-16 2010-12-15 Koninkl Philips Electronics Nv Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
US7609815B2 (en) * 2006-06-01 2009-10-27 The Regents Of The University Of California High brightness—multiple beamlets source for patterned X-ray production
US7825390B2 (en) * 2007-02-14 2010-11-02 Asml Netherlands B.V. Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7872244B2 (en) * 2007-08-08 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1035846A1 (nl) * 2007-08-23 2009-02-24 Asml Netherlands Bv Radiation source.
US7700930B2 (en) * 2007-09-14 2010-04-20 Asml Netherlands B.V. Lithographic apparatus with rotation filter device
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
NL2002890A1 (nl) * 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
EP2146368A1 (en) * 2008-07-15 2010-01-20 Barco N.V. Gas discharge lamp system
US8891058B2 (en) * 2008-07-18 2014-11-18 Koninklijke Philips N.V. Extreme UV radiation generating device comprising a contamination captor
CN103257532B (zh) * 2008-09-11 2015-04-22 Asml荷兰有限公司 辐射源和光刻设备
US20110089834A1 (en) * 2009-10-20 2011-04-21 Plex Llc Z-pinch plasma generator and plasma target
CN102696283B (zh) * 2010-01-07 2015-07-08 Asml荷兰有限公司 包括液滴加速器的euv辐射源以及光刻设备
CN102782582A (zh) * 2010-03-12 2012-11-14 Asml荷兰有限公司 辐射源、光刻设备以及器件制造方法
CN104380203B (zh) * 2012-06-12 2017-09-08 Asml荷兰有限公司 光子源、检查设备、光刻***以及器件制造方法
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
KR102281775B1 (ko) * 2012-11-15 2021-07-27 에이에스엠엘 네델란즈 비.브이. 리소그래피를 위한 방법 및 방사선 소스
US8901523B1 (en) * 2013-09-04 2014-12-02 Asml Netherlands B.V. Apparatus for protecting EUV optical elements
DE102014226309A1 (de) * 2014-12-17 2016-06-23 Carl Zeiss Smt Gmbh Komponente; optisches System und Lithographieanlage
US10203604B2 (en) * 2015-11-30 2019-02-12 Applied Materials, Inc. Method and apparatus for post exposure processing of photoresist wafers
NL2021345A (en) 2018-04-12 2018-08-22 Asml Netherlands Bv Lithographic apparatus

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Also Published As

Publication number Publication date
US20050253092A1 (en) 2005-11-17
SG127702A1 (en) 2006-12-29
JP2007019031A (ja) 2007-01-25
US6933510B2 (en) 2005-08-23
KR20040031601A (ko) 2004-04-13
TWI252377B (en) 2006-04-01
CN100505974C (zh) 2009-06-24
JP2004165160A (ja) 2004-06-10
TW200421040A (en) 2004-10-16
US20040141165A1 (en) 2004-07-22
JP4188208B2 (ja) 2008-11-26
CN1498056A (zh) 2004-05-19
KR100606498B1 (ko) 2006-08-02

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