SG115575A1 - Lithographic projection apparatus comprising a secondary electron removal unit - Google Patents
Lithographic projection apparatus comprising a secondary electron removal unitInfo
- Publication number
- SG115575A1 SG115575A1 SG200306242A SG200306242A SG115575A1 SG 115575 A1 SG115575 A1 SG 115575A1 SG 200306242 A SG200306242 A SG 200306242A SG 200306242 A SG200306242 A SG 200306242A SG 115575 A1 SG115575 A1 SG 115575A1
- Authority
- SG
- Singapore
- Prior art keywords
- projection apparatus
- removal unit
- secondary electron
- lithographic projection
- electron removal
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02079329 | 2002-10-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG115575A1 true SG115575A1 (en) | 2005-10-28 |
Family
ID=32668752
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200306242A SG115575A1 (en) | 2002-10-18 | 2003-10-16 | Lithographic projection apparatus comprising a secondary electron removal unit |
Country Status (7)
Country | Link |
---|---|
US (1) | US6791665B2 (zh) |
JP (1) | JP4058404B2 (zh) |
KR (1) | KR100544357B1 (zh) |
CN (1) | CN1327296C (zh) |
DE (1) | DE60323584D1 (zh) |
SG (1) | SG115575A1 (zh) |
TW (1) | TWI294995B (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
US7135692B2 (en) * | 2003-12-04 | 2006-11-14 | Asml Netherlands B.V. | Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation |
US7800079B2 (en) * | 2003-12-22 | 2010-09-21 | Asml Netherlands B.V. | Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method |
US7279690B2 (en) * | 2005-03-31 | 2007-10-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7405417B2 (en) * | 2005-12-20 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus having a monitoring device for detecting contamination |
US7629594B2 (en) * | 2006-10-10 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus, and device manufacturing method |
US7825390B2 (en) * | 2007-02-14 | 2010-11-02 | Asml Netherlands B.V. | Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus |
JP2010257998A (ja) * | 2007-11-26 | 2010-11-11 | Nikon Corp | 反射投影光学系、露光装置、及びデバイスの製造方法 |
NL1036769A1 (nl) * | 2008-04-23 | 2009-10-26 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device. |
DE102013218748A1 (de) * | 2013-09-18 | 2014-10-02 | Carl Zeiss Smt Gmbh | Optisches Bauelement |
CN113767335A (zh) * | 2019-04-09 | 2021-12-07 | 库力&索法利特克有限公司 | 平版印刷***及操作该***的方法 |
KR20220109471A (ko) * | 2020-03-03 | 2022-08-04 | 사이머 엘엘씨 | 광원용 제어 시스템 |
JP6844798B1 (ja) * | 2020-05-26 | 2021-03-17 | レーザーテック株式会社 | 光学装置、及び光学装置の汚染防止方法 |
WO2023094084A1 (en) * | 2021-11-25 | 2023-06-01 | Asml Netherlands B.V. | An optical device, illumination system, projection system, euv radiation source, lithographic apparatus, deposition of contamination preventing method, and optical component refurbishing method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1008352C2 (nl) | 1998-02-19 | 1999-08-20 | Stichting Tech Wetenschapp | Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden. |
JP2000100685A (ja) * | 1998-09-17 | 2000-04-07 | Nikon Corp | 露光装置及び該装置を用いた露光方法 |
CA2349912A1 (en) * | 2000-07-07 | 2002-01-07 | Heidelberger Druckmaschinen Aktiengesellschaft | Setting an image on a printing plate using ultrashort laser pulses |
US6781673B2 (en) * | 2000-08-25 | 2004-08-24 | Asml Netherlands B.V. | Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
EP1182510B1 (en) * | 2000-08-25 | 2006-04-12 | ASML Netherlands B.V. | Lithographic projection apparatus |
GB0031194D0 (en) | 2000-12-21 | 2001-01-31 | Eastman Kodak Co | Processing photographic material |
EP1223468B1 (en) * | 2001-01-10 | 2008-07-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
DE10138284A1 (de) * | 2001-08-10 | 2003-02-27 | Zeiss Carl | Beleuchtungssystem mit genesteten Kollektoren |
-
2003
- 2003-10-16 SG SG200306242A patent/SG115575A1/en unknown
- 2003-10-17 DE DE60323584T patent/DE60323584D1/de not_active Expired - Fee Related
- 2003-10-17 CN CNB2003101196105A patent/CN1327296C/zh not_active Expired - Fee Related
- 2003-10-17 US US10/686,813 patent/US6791665B2/en not_active Expired - Lifetime
- 2003-10-17 TW TW092128890A patent/TWI294995B/zh not_active IP Right Cessation
- 2003-10-17 KR KR1020030072586A patent/KR100544357B1/ko not_active IP Right Cessation
- 2003-10-20 JP JP2003393098A patent/JP4058404B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6791665B2 (en) | 2004-09-14 |
DE60323584D1 (de) | 2008-10-30 |
KR20040034524A (ko) | 2004-04-28 |
JP2004289120A (ja) | 2004-10-14 |
CN1497358A (zh) | 2004-05-19 |
CN1327296C (zh) | 2007-07-18 |
JP4058404B2 (ja) | 2008-03-12 |
US20040130694A1 (en) | 2004-07-08 |
KR100544357B1 (ko) | 2006-01-23 |
TW200424784A (en) | 2004-11-16 |
TWI294995B (en) | 2008-03-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
AU2003208331A1 (en) | Projection objective for a projection exposure apparatus | |
TWI315673B (en) | A mask | |
AU2003297347A8 (en) | Photoresist removal | |
GB2385533B (en) | Mask apparatus | |
AU2003288007A8 (en) | Illumination arrangement for a projection system | |
EP1550912A4 (en) | METHOD FOR REMOVING PHOTORESIST | |
IL160173A0 (en) | Image printing apparatus including a microcontroller | |
SG106683A1 (en) | Chuck, lithographic projection apparatus, method of manufacturing a chuck and device manufacturing method | |
EP1624919A4 (en) | MASK SYSTEM | |
AU2001284304A1 (en) | Image projection apparatus | |
AU2003301613A8 (en) | Method and apparatus for a projection system | |
SG115575A1 (en) | Lithographic projection apparatus comprising a secondary electron removal unit | |
SG110121A1 (en) | Method for exposing a substrate and lithographic projection apparatus | |
SG118222A1 (en) | Lithographic apparatus | |
GB2379281B (en) | Projection apparatus | |
TW547675U (en) | A projection cooling apparatus | |
SG115590A1 (en) | Lithographic projection apparatus and device manufacturing method | |
SG111171A1 (en) | Lithographic projection apparatus and device manufacturing method | |
SG121823A1 (en) | Lithographic projection apparatus with multiple suppression meshes | |
TWI349160B (en) | Objective for a projection or backprojection apparatus, and corresponding front-projection or backprojection apparatus | |
EP1468335A4 (en) | CLEANER COMPOSITION FOR A POSITIVE OR NEGATIVE PHOTOGRAPHIST | |
TW490072U (en) | Apparatus for stripping photoresist | |
GB0119510D0 (en) | A lamp for a projection system | |
GB0100168D0 (en) | Lithographic method utilizing a phase-shifting mask | |
AU2003249668A8 (en) | Insulator system for a crt focus mask |