SG11201903240PA - Magnetic material sputtering target and method for manufacturing same - Google Patents
Magnetic material sputtering target and method for manufacturing sameInfo
- Publication number
- SG11201903240PA SG11201903240PA SG11201903240PA SG11201903240PA SG11201903240PA SG 11201903240P A SG11201903240P A SG 11201903240PA SG 11201903240P A SG11201903240P A SG 11201903240PA SG 11201903240P A SG11201903240P A SG 11201903240PA SG 11201903240P A SG11201903240P A SG 11201903240PA
- Authority
- SG
- Singapore
- Prior art keywords
- sputtering target
- oxides
- magnetic material
- manufacturing same
- material sputtering
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Powder Metallurgy (AREA)
Abstract
PCTJP/043990 MAGNETIC MATERIAL SPUTTERING TARGET AND METHOD FOR 5 MANUFACTURING SAME Provided is a magnetic sputtering target which includes oxides having a melting point of 500°C or lower, and the magnetic sputtering target is characterized by an average number density of oxides having a grain size of 10 pm or more on a 10 sputter surface of the sputtering target is 5/mm 2 or less. The present invention addresses the problem of providing a sputtering target and a method for manufacturing the same, whereby the generation of particles or abnormal electric discharge caused by oxides in the sputtering target, particularly coarsely grown oxides, can be reduced. 15 Fig. 3 22
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016255597 | 2016-12-28 | ||
PCT/JP2017/043990 WO2018123500A1 (en) | 2016-12-28 | 2017-12-07 | Magnetic material sputtering target and method for manufacturing same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201903240PA true SG11201903240PA (en) | 2019-05-30 |
Family
ID=62710993
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201903240PA SG11201903240PA (en) | 2016-12-28 | 2017-12-07 | Magnetic material sputtering target and method for manufacturing same |
Country Status (6)
Country | Link |
---|---|
JP (1) | JP6734399B2 (en) |
CN (1) | CN109844167B (en) |
MY (1) | MY191374A (en) |
SG (1) | SG11201903240PA (en) |
TW (1) | TWI753073B (en) |
WO (1) | WO2018123500A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2020066114A1 (en) * | 2018-09-25 | 2020-04-02 | Jx金属株式会社 | Sputtering target and powder for producing sputtering target |
JP7462636B2 (en) * | 2019-07-18 | 2024-04-05 | 田中貴金属工業株式会社 | Sputtering targets for magnetic recording media |
TWI834072B (en) * | 2021-10-22 | 2024-03-01 | 光洋應用材料科技股份有限公司 | Ru-al alloy target and method of preparing the same |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7186471B2 (en) * | 2002-02-28 | 2007-03-06 | Seagate Technology Llc | Chemically ordered, cobalt-three platinum alloys for magnetic recording |
JP4962905B2 (en) * | 2007-03-12 | 2012-06-27 | 三菱マテリアル株式会社 | Method for producing Co-based sintered alloy sputtering target for forming magnetic recording film with less generation of particles |
MY150804A (en) * | 2009-03-27 | 2014-02-28 | Jx Nippon Mining & Metals Corp | Nonmagnetic material particle-dispersed ferromagnetic material sputtering target |
US9269389B2 (en) * | 2009-12-11 | 2016-02-23 | Jx Nippon Mining & Metals Corporation | Sputtering target of magnetic material |
MY158512A (en) * | 2010-12-09 | 2016-10-14 | Jx Nippon Mining & Metals Corp | Ferromagnetic material sputtering target |
CN103261470B (en) * | 2010-12-17 | 2015-02-18 | 吉坤日矿日石金属株式会社 | Ferromagnetic material sputtering target |
SG189257A1 (en) * | 2010-12-17 | 2013-05-31 | Jx Nippon Mining & Metals Corp | Sputtering target for magnetic recording film and method for producing same |
WO2013125469A1 (en) * | 2012-02-22 | 2013-08-29 | Jx日鉱日石金属株式会社 | Magnetic material sputtering target and manufacturing method for same |
JP6005767B2 (en) * | 2014-01-17 | 2016-10-12 | Jx金属株式会社 | Sputtering target for magnetic recording media |
SG11201606737UA (en) * | 2014-09-04 | 2016-09-29 | Jx Nippon Mining & Metals Corp | Sputtering target |
US10837101B2 (en) * | 2016-03-31 | 2020-11-17 | Jx Nippon Mining & Metals Corporation | Ferromagnetic material sputtering target |
-
2017
- 2017-12-07 MY MYPI2019002892A patent/MY191374A/en unknown
- 2017-12-07 JP JP2018558973A patent/JP6734399B2/en active Active
- 2017-12-07 CN CN201780063272.8A patent/CN109844167B/en active Active
- 2017-12-07 WO PCT/JP2017/043990 patent/WO2018123500A1/en active Application Filing
- 2017-12-07 SG SG11201903240PA patent/SG11201903240PA/en unknown
- 2017-12-22 TW TW106145320A patent/TWI753073B/en active
Also Published As
Publication number | Publication date |
---|---|
JPWO2018123500A1 (en) | 2019-03-28 |
JP6734399B2 (en) | 2020-08-05 |
WO2018123500A1 (en) | 2018-07-05 |
CN109844167B (en) | 2022-01-04 |
CN109844167A (en) | 2019-06-04 |
MY191374A (en) | 2022-06-21 |
TW201835361A (en) | 2018-10-01 |
TWI753073B (en) | 2022-01-21 |
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