SG11201708903SA - Production method for copper-clad laminate plate - Google Patents

Production method for copper-clad laminate plate

Info

Publication number
SG11201708903SA
SG11201708903SA SG11201708903SA SG11201708903SA SG11201708903SA SG 11201708903S A SG11201708903S A SG 11201708903SA SG 11201708903S A SG11201708903S A SG 11201708903SA SG 11201708903S A SG11201708903S A SG 11201708903SA SG 11201708903S A SG11201708903S A SG 11201708903SA
Authority
SG
Singapore
Prior art keywords
copper
production method
clad laminate
laminate plate
plate
Prior art date
Application number
SG11201708903SA
Inventor
Ayumu Tateoka
Makoto Hosokawa
Shota Kawaguchi
Original Assignee
Mitsui Mining & Smelting Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining & Smelting Co filed Critical Mitsui Mining & Smelting Co
Publication of SG11201708903SA publication Critical patent/SG11201708903SA/en

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Classifications

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    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
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    • B32B37/00Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
    • B32B37/14Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
    • B32B37/144Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers using layers with different mechanical or chemical conditions or properties, e.g. layers with different thermal shrinkage, layers under tension during bonding
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C22/05Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
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    • C23C22/48Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 not containing phosphates, hexavalent chromium compounds, fluorides or complex fluorides, molybdates, tungstates, vanadates or oxalates
    • C23C22/52Treatment of copper or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C22/00Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
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    • B32B2255/06Coating on the layer surface on metal layer
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    • B32B2255/00Coating on the layer surface
    • B32B2255/24Organic non-macromolecular coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
    • B32B2260/02Composition of the impregnated, bonded or embedded layer
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    • B32B2260/028Paper layer
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    • B32B2260/00Layered product comprising an impregnated, embedded, or bonded layer wherein the layer comprises an impregnation, embedding, or binder material
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    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B32B2262/00Composition or structural features of fibres which form a fibrous or filamentary layer or are present as additives
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    • B32B2307/00Properties of the layers or laminate
    • B32B2307/20Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
    • B32B2307/204Di-electric
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B32B2307/30Properties of the layers or laminate having particular thermal properties
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    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/714Inert, i.e. inert to chemical degradation, corrosion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
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    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/724Permeability to gases, adsorption
    • B32B2307/7242Non-permeable
    • B32B2307/7246Water vapor barrier
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    • B32B2307/70Other properties
    • B32B2307/732Dimensional properties
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    • B32B2309/00Parameters for the laminating or treatment process; Apparatus details
    • B32B2309/08Dimensions, e.g. volume
    • B32B2309/10Dimensions, e.g. volume linear, e.g. length, distance, width
    • B32B2309/105Thickness
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B32B2327/18PTFE, i.e. polytetrafluoroethylene
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B32B2398/00Unspecified macromolecular compounds
    • B32B2398/20Thermoplastics
    • BPERFORMING OPERATIONS; TRANSPORTING
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    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2605/00Vehicles
    • B32B2605/18Aircraft
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Textile Engineering (AREA)
  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)
SG11201708903SA 2016-03-03 2017-01-31 Production method for copper-clad laminate plate SG11201708903SA (en)

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JP7013003B2 (en) * 2017-11-10 2022-01-31 ナミックス株式会社 Objects with a roughened copper surface
WO2019131093A1 (en) * 2017-12-26 2019-07-04 Jx金属株式会社 Copper foil for heat dissipation and heat dissipation member
DE102018200758A1 (en) * 2018-01-18 2019-07-18 Robert Bosch Gmbh Antenna element and antenna array
KR20210003082A (en) * 2018-04-26 2021-01-11 에이지씨 가부시키가이샤 Method for producing a laminate, and a laminate
JP6985745B2 (en) 2018-06-20 2021-12-22 ナミックス株式会社 Roughened copper foil, copper-clad laminate and printed wiring board
CN112969585A (en) * 2018-11-08 2021-06-15 株式会社可乐丽 Thermoplastic liquid crystal polymer film and circuit substrate using the same
JP2020152855A (en) * 2019-03-22 2020-09-24 横浜ゴム株式会社 Thermosetting resin composition and thermosetting resin
CN111029590B (en) * 2019-12-25 2020-10-09 苏州清陶新能源科技有限公司 Battery pole piece substrate, preparation method and application thereof
US20230276579A1 (en) 2020-07-16 2023-08-31 Mitsui Mining & Smelting Co., Ltd. Manufacturing methods for copper-clad laminate and printed wiring board
WO2022014648A1 (en) 2020-07-16 2022-01-20 三井金属鉱業株式会社 Copper-clad laminate plate and printed wiring board

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JPS61176192A (en) * 1985-01-31 1986-08-07 株式会社日立製作所 Adhesion between copper and resin
JPH06104543A (en) 1992-09-22 1994-04-15 Nippon Steel Corp Copper clad laminate for printed wiring board excellent in heat dissipation properties and production thereof
TW374802B (en) * 1996-07-29 1999-11-21 Ebara Densan Ltd Etching composition, method for roughening copper surface and method for producing printed wiring board
JP2005310621A (en) * 2004-04-23 2005-11-04 Matsushita Electric Ind Co Ltd Nonaqueous electrolyte secondary battery
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WO2014126193A1 (en) 2013-02-14 2014-08-21 三井金属鉱業株式会社 Surface-treated copper foil, and copper-clad laminate obtained using surface-treated copper foil
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CN105934307B (en) * 2014-01-27 2018-04-27 三井金属矿业株式会社 Roughening treatment copper foil, copper clad laminate and printed wiring board

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US20180139848A1 (en) 2018-05-17
US10244635B2 (en) 2019-03-26
KR101846141B1 (en) 2018-04-05
KR20170127039A (en) 2017-11-20
CN107614753B (en) 2018-09-28

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