SG11201702242PA - Gas-dissolved water production device and production method - Google Patents

Gas-dissolved water production device and production method

Info

Publication number
SG11201702242PA
SG11201702242PA SG11201702242PA SG11201702242PA SG11201702242PA SG 11201702242P A SG11201702242P A SG 11201702242PA SG 11201702242P A SG11201702242P A SG 11201702242PA SG 11201702242P A SG11201702242P A SG 11201702242PA SG 11201702242P A SG11201702242P A SG 11201702242PA
Authority
SG
Singapore
Prior art keywords
gas
dissolved water
production method
production device
water production
Prior art date
Application number
SG11201702242PA
Inventor
Suguru Ozawa
Minoru Harada
Munehito Takahashi
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority claimed from PCT/JP2015/004586 external-priority patent/WO2016042740A1/en
Publication of SG11201702242PA publication Critical patent/SG11201702242PA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B01F21/30—Workflow diagrams or layout of plants, e.g. flow charts; Details of workflow diagrams or layout of plants, e.g. controlling means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
    • B01F23/237613—Ozone
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B01F21/02—Methods
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/232—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles
    • B01F23/2326—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids using flow-mixing means for introducing the gases, e.g. baffles adding the flowing main component by suction means, e.g. using an ejector
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/312—Injector mixers in conduits or tubes through which the main component flows with Venturi elements; Details thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2111—Flow rate
    • B01F35/21112—Volumetric flow rate
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/211—Measuring of the operational parameters
    • B01F35/2113—Pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/2132—Concentration, pH, pOH, p(ION) or oxygen-demand
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/22—Control or regulation
    • B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2213—Pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/22—Control or regulation
    • B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2217—Volume of at least one component to be mixed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
    • B01F2101/24—Mixing of ingredients for cleaning compositions
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/64—Oxygen
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/78—Details relating to ozone treatment devices
    • C02F2201/782—Ozone generators
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/03—Pressure
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/38—Gas flow rate
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/40—Liquid flow rate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Hydrology & Water Resources (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Physical Water Treatments (AREA)
  • Accessories For Mixers (AREA)
SG11201702242PA 2014-09-18 2015-09-09 Gas-dissolved water production device and production method SG11201702242PA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2014189639 2014-09-18
JP2014240990A JP2016064386A (en) 2014-09-18 2014-11-28 Gas dissolved water production device and method
PCT/JP2015/004586 WO2016042740A1 (en) 2014-09-18 2015-09-09 Device and method for manufacturing gas-dissolved water

Publications (1)

Publication Number Publication Date
SG11201702242PA true SG11201702242PA (en) 2017-04-27

Family

ID=55803741

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201702242PA SG11201702242PA (en) 2014-09-18 2015-09-09 Gas-dissolved water production device and production method

Country Status (7)

Country Link
US (1) US20170282132A1 (en)
EP (1) EP3195926A4 (en)
JP (1) JP2016064386A (en)
KR (1) KR20170058928A (en)
CN (1) CN106714954A (en)
SG (1) SG11201702242PA (en)
TW (1) TW201619045A (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6917775B2 (en) 2017-05-19 2021-08-11 株式会社荏原製作所 Gas solution manufacturing equipment
JP6917790B2 (en) * 2017-06-12 2021-08-11 株式会社荏原製作所 Gas solution manufacturing equipment
CN107308835B (en) * 2017-08-22 2020-11-24 依格安顾问(香港)有限公司 Device and method for manufacturing high-pressure atomized ozone water
JP6970007B2 (en) * 2017-12-25 2021-11-24 株式会社荏原製作所 Gas solution manufacturing equipment
JP7059040B2 (en) * 2018-02-23 2022-04-25 株式会社荏原製作所 Gas solution manufacturing equipment
JP2020175338A (en) * 2019-04-19 2020-10-29 株式会社荏原製作所 Functional water concentration control system and functional water concentration control method
JP7260429B2 (en) * 2019-07-19 2023-04-18 株式会社荏原製作所 Gas solution manufacturing equipment
JP2021069999A (en) * 2019-10-31 2021-05-06 キヤノン株式会社 Method for generating ultrafine bubble, and device and method for generating ultrafine bubble-containing liquid
KR102166073B1 (en) * 2019-11-14 2020-10-15 주식회사 크리스탈이엔지 Ozone Altitude Water Treatment Using Pressure Energy
CN111111538A (en) * 2019-12-05 2020-05-08 林锡润 Control method based on ozone water machine
WO2021250745A1 (en) * 2020-06-08 2021-12-16 三菱電機株式会社 Ozone water production apparatus, water treatment apparatus, and ozone water production method
CN114307700A (en) * 2021-12-17 2022-04-12 苏州晶拓半导体科技有限公司 Large-flow ozone water generation system

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621010B2 (en) * 1988-05-06 1994-03-23 住友精密工業株式会社 A method to generate high-purity, high-concentration ozone with almost no change over time
JP3130751B2 (en) * 1995-01-30 2001-01-31 株式会社荏原製作所 Ozone water production method and apparatus
JP3566453B2 (en) * 1995-04-17 2004-09-15 株式会社荏原製作所 Ozone generator
JPH09906A (en) * 1995-06-21 1997-01-07 Ishikawajima Harima Heavy Ind Co Ltd Ozonized water producing device and its method
US5971368A (en) * 1997-10-29 1999-10-26 Fsi International, Inc. System to increase the quantity of dissolved gas in a liquid and to maintain the increased quantity of dissolved gas in the liquid until utilized
JP3478142B2 (en) * 1998-10-02 2003-12-15 栗田工業株式会社 Method for producing pressurized water and apparatus for producing pressurized water
CN2369991Y (en) * 1999-04-29 2000-03-22 李文义 Generator for ozone water
JP4095758B2 (en) * 2000-06-29 2008-06-04 株式会社荏原製作所 Ozone generator
US6805791B2 (en) * 2000-09-01 2004-10-19 Applied Science And Technology, Inc. Ozonated water flow and concentration control apparatus
JP2003210956A (en) * 2002-01-17 2003-07-29 Idemitsu Petrochem Co Ltd Apparatus for producing high concentration ozone water
JP4025978B2 (en) * 2002-03-08 2007-12-26 株式会社ササクラ Ozone water supply device
JP2003334433A (en) * 2002-05-16 2003-11-25 Kurita Water Ind Ltd Continuous dissolving device, continuous dissolving method and apparatus for supplying gas-dissolved water
JP2008012512A (en) * 2006-06-08 2008-01-24 Sanyo Electric Co Ltd Water-ozone mixing device, water purifying device, ozone water generation device, gas-liquid mixer, and check valve
JP2009096692A (en) * 2007-10-18 2009-05-07 Kansai Electric Power Co Inc:The Method and apparatus for generating ozone by intermittent inert gas injection
JP5210596B2 (en) * 2007-11-02 2013-06-12 メタウォーター株式会社 Ozone generator
CN101254311A (en) * 2008-01-31 2008-09-03 徐名勇 Device for improving ozone water pressure and flow quantity
JP2010207724A (en) * 2009-03-10 2010-09-24 Yamatake Corp Gas dissolving system, gas dissolving method, and gas dissolving program
JP2010234298A (en) * 2009-03-31 2010-10-21 Kurita Water Ind Ltd Device for supplying water containing dissolved gas and method for producing water containing dissolved gas
JP5079896B2 (en) * 2011-03-18 2012-11-21 シャープ株式会社 Ozone liquid generator and production method thereof
JP5916350B2 (en) * 2011-11-16 2016-05-11 株式会社Icst High concentration oxygen water generating device, high concentration oxygen water irrigation device, and high concentration oxygen water generating method
JP2014093357A (en) * 2012-11-01 2014-05-19 Kurita Water Ind Ltd Method for manufacturing ozone gas dissolved water and method for cleaning electronic material
JP5947271B2 (en) * 2013-02-04 2016-07-06 松村 明子 Decontamination system

Also Published As

Publication number Publication date
JP2016064386A (en) 2016-04-28
CN106714954A (en) 2017-05-24
US20170282132A1 (en) 2017-10-05
TW201619045A (en) 2016-06-01
KR20170058928A (en) 2017-05-29
EP3195926A4 (en) 2018-04-18
EP3195926A1 (en) 2017-07-26

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