SG10201502035RA - Washing device and washing method - Google Patents

Washing device and washing method

Info

Publication number
SG10201502035RA
SG10201502035RA SG10201502035RA SG10201502035RA SG10201502035RA SG 10201502035R A SG10201502035R A SG 10201502035RA SG 10201502035R A SG10201502035R A SG 10201502035RA SG 10201502035R A SG10201502035R A SG 10201502035RA SG 10201502035R A SG10201502035R A SG 10201502035RA
Authority
SG
Singapore
Prior art keywords
washing
washing device
washing method
Prior art date
Application number
SG10201502035RA
Inventor
Tomoatsu Ishibashi
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG10201502035RA publication Critical patent/SG10201502035RA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B08B1/143—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/02068—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers
    • H01L21/02074—Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a planarization of conductive layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
SG10201502035RA 2014-04-01 2015-03-17 Washing device and washing method SG10201502035RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014075712 2014-04-01
JP2015042868A JP6600470B2 (en) 2014-04-01 2015-03-04 Cleaning device and cleaning method

Publications (1)

Publication Number Publication Date
SG10201502035RA true SG10201502035RA (en) 2015-11-27

Family

ID=54552613

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201502035RA SG10201502035RA (en) 2014-04-01 2015-03-17 Washing device and washing method
SG10201901404XA SG10201901404XA (en) 2014-04-01 2015-03-17 Washing device and washing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG10201901404XA SG10201901404XA (en) 2014-04-01 2015-03-17 Washing device and washing method

Country Status (6)

Country Link
US (3) US10170344B2 (en)
JP (4) JP6600470B2 (en)
KR (3) KR102314682B1 (en)
CN (1) CN109647769B (en)
SG (2) SG10201502035RA (en)
TW (2) TWI666068B (en)

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Also Published As

Publication number Publication date
KR102513280B1 (en) 2023-03-24
JP2022003705A (en) 2022-01-11
KR102450849B1 (en) 2022-10-06
US20190080933A1 (en) 2019-03-14
TWI709440B (en) 2020-11-11
JP6831360B2 (en) 2021-02-17
TWI666068B (en) 2019-07-21
US20210272820A1 (en) 2021-09-02
TW201540381A (en) 2015-11-01
CN109647769B (en) 2022-02-11
TW201945090A (en) 2019-12-01
JP6964745B2 (en) 2021-11-10
US11164758B2 (en) 2021-11-02
KR20150114428A (en) 2015-10-12
JP2015201627A (en) 2015-11-12
JP7241844B2 (en) 2023-03-17
KR20220137855A (en) 2022-10-12
JP2021016007A (en) 2021-02-12
CN109647769A (en) 2019-04-19
US10170344B2 (en) 2019-01-01
US11837477B2 (en) 2023-12-05
JP6600470B2 (en) 2019-10-30
US20150348806A1 (en) 2015-12-03
KR20210127668A (en) 2021-10-22
SG10201901404XA (en) 2019-03-28
JP2019041116A (en) 2019-03-14
KR102314682B1 (en) 2021-10-20

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