SG11201401813PA - Recycling method for polishing agent - Google Patents
Recycling method for polishing agentInfo
- Publication number
- SG11201401813PA SG11201401813PA SG11201401813PA SG11201401813PA SG11201401813PA SG 11201401813P A SG11201401813P A SG 11201401813PA SG 11201401813P A SG11201401813P A SG 11201401813PA SG 11201401813P A SG11201401813P A SG 11201401813PA SG 11201401813P A SG11201401813P A SG 11201401813PA
- Authority
- SG
- Singapore
- Prior art keywords
- polishing agent
- recycling method
- recycling
- polishing
- agent
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011245153 | 2011-11-09 | ||
PCT/JP2012/078942 WO2013069720A1 (en) | 2011-11-09 | 2012-11-08 | Recycling method for polishing agent |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201401813PA true SG11201401813PA (en) | 2014-09-26 |
Family
ID=48290090
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201401813PA SG11201401813PA (en) | 2011-11-09 | 2012-11-08 | Recycling method for polishing agent |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2013069720A1 (en) |
SG (1) | SG11201401813PA (en) |
WO (1) | WO2013069720A1 (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3326755A1 (en) * | 2016-11-23 | 2018-05-30 | Menzerna Polishing Compounds GmbH & Co. KG | Method for surface treatment, use of an additive and surface treatment article |
CN113913156B (en) * | 2017-10-31 | 2022-06-24 | Hoya株式会社 | Polishing liquid, method for producing glass substrate, and method for producing magnetic disk |
US20220111489A1 (en) * | 2019-01-10 | 2022-04-14 | Konica Minolta, Inc. | Polishing agent regenerating method and polishing agent recycle processing system |
JP2022172678A (en) * | 2021-05-06 | 2022-11-17 | コニカミノルタ株式会社 | Method for preparing recycled/regenerated polishing agent slurry and polishing agent slurry |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3446988B2 (en) * | 1997-04-10 | 2003-09-16 | 三井金属鉱業株式会社 | Method for recovering abrasive raw materials from waste cerium abrasive |
JP4729428B2 (en) * | 2006-04-07 | 2011-07-20 | Agcセイミケミカル株式会社 | Regeneration method of cerium-based abrasive |
JP2008124213A (en) * | 2006-11-10 | 2008-05-29 | Nippon Valqua Ind Ltd | Method of recycling used cmp slurry |
JP4969313B2 (en) * | 2007-05-11 | 2012-07-04 | Agcセイミケミカル株式会社 | Recovery method of rare earth elements |
WO2010084635A1 (en) * | 2009-01-23 | 2010-07-29 | 財団法人大阪産業振興機構 | Mixture treatment method and treatment device |
-
2012
- 2012-11-08 WO PCT/JP2012/078942 patent/WO2013069720A1/en active Application Filing
- 2012-11-08 SG SG11201401813PA patent/SG11201401813PA/en unknown
- 2012-11-08 JP JP2013543019A patent/JPWO2013069720A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
WO2013069720A1 (en) | 2013-05-16 |
JPWO2013069720A1 (en) | 2015-04-02 |
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