SG10201802550QA - Method of processing workpiece - Google Patents

Method of processing workpiece

Info

Publication number
SG10201802550QA
SG10201802550QA SG10201802550QA SG10201802550QA SG10201802550QA SG 10201802550Q A SG10201802550Q A SG 10201802550QA SG 10201802550Q A SG10201802550Q A SG 10201802550QA SG 10201802550Q A SG10201802550Q A SG 10201802550QA SG 10201802550Q A SG10201802550Q A SG 10201802550QA
Authority
SG
Singapore
Prior art keywords
workpiece
cutting
processing
dicing lines
layered bodies
Prior art date
Application number
SG10201802550QA
Other languages
English (en)
Inventor
Takenouchi Kenji
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG10201802550QA publication Critical patent/SG10201802550QA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0675Grinders for cutting-off methods therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00Component parts such as frames, beds, carriages, headstocks
    • B24B41/06Work supports, e.g. adjustable steadies
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24DTOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D5/00Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
    • B24D5/12Cut-off wheels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0094Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being of the vacuum type
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/023Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a cutting blade mounted on a carriage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67092Apparatus for mechanical treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Dicing (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
SG10201802550QA 2017-04-04 2018-03-27 Method of processing workpiece SG10201802550QA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2017074469A JP2018181909A (ja) 2017-04-04 2017-04-04 加工方法

Publications (1)

Publication Number Publication Date
SG10201802550QA true SG10201802550QA (en) 2018-11-29

Family

ID=63525596

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201802550QA SG10201802550QA (en) 2017-04-04 2018-03-27 Method of processing workpiece

Country Status (7)

Country Link
US (1) US10522405B2 (zh)
JP (1) JP2018181909A (zh)
KR (1) KR20180112683A (zh)
CN (1) CN108687638A (zh)
DE (1) DE102018205020A1 (zh)
SG (1) SG10201802550QA (zh)
TW (1) TWI752183B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111906954B (zh) * 2020-08-10 2021-12-07 重庆聚源塑料股份有限公司 一种改性水泥发泡保温板成型加工方法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6349926A (ja) 1986-08-20 1988-03-02 Nec Corp 複数ソ−ト処理の並行実行方式
JPS63196381A (ja) * 1987-02-10 1988-08-15 Mitsubishi Metal Corp 砥石
JPS6427904A (en) * 1987-07-24 1989-01-30 Hitachi Ltd Method and apparatus for dicing
JPH06349926A (ja) 1993-06-12 1994-12-22 Hitachi Ltd 半導体装置
JPH0955573A (ja) 1995-08-10 1997-02-25 Disco Abrasive Syst Ltd 樹脂基板の切削方法
US6310017B1 (en) 1999-02-01 2001-10-30 Ct Associates, Inc. Cleaner composition, method for making and using same
JP3440888B2 (ja) * 1999-06-21 2003-08-25 株式会社村田製作所 ダイシングブレード及び電子部品の製造方法
US6280298B1 (en) 1999-11-24 2001-08-28 Intel Corporation Test probe cleaning
US6596562B1 (en) 2002-01-03 2003-07-22 Intel Corporation Semiconductor wafer singulation method
US6791197B1 (en) * 2002-08-26 2004-09-14 Integrated Device Technology, Inc. Reducing layer separation and cracking in semiconductor devices
US7855130B2 (en) * 2003-04-21 2010-12-21 International Business Machines Corporation Corrosion inhibitor additives to prevent semiconductor device bond-pad corrosion during wafer dicing operations
US7087452B2 (en) 2003-04-22 2006-08-08 Intel Corporation Edge arrangements for integrated circuit chips
JP4231349B2 (ja) 2003-07-02 2009-02-25 株式会社ディスコ レーザー加工方法およびレーザー加工装置
JP4751634B2 (ja) 2005-03-31 2011-08-17 富士通セミコンダクター株式会社 半導体装置の製造方法
JP2006344827A (ja) * 2005-06-09 2006-12-21 Renesas Technology Corp 半導体装置の製造方法
US20060288993A1 (en) * 2005-06-27 2006-12-28 Anthony Baratta Tools and methods for making and using tools, blades and methods of making and using blades
US20080191318A1 (en) 2007-02-09 2008-08-14 Advanced Micro Devices, Inc. Semiconductor device and method of sawing semiconductor device
US8629532B2 (en) 2007-05-08 2014-01-14 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor wafer with assisting dicing structure and dicing method thereof
TWI385116B (zh) * 2008-11-21 2013-02-11 Chan Li Machinery Co Ltd A paper roll winding mechanism with a grooved scraper and a gumming method
JP5419596B2 (ja) 2009-09-02 2014-02-19 兼房株式会社 回転工具のための流体供給機構
JP5480923B2 (ja) 2011-05-13 2014-04-23 シャープ株式会社 半導体モジュールの製造方法及び半導体モジュール
JP2013161998A (ja) 2012-02-07 2013-08-19 Disco Abrasive Syst Ltd 切削方法
US8952413B2 (en) 2012-03-08 2015-02-10 Micron Technology, Inc. Etched trenches in bond materials for die singulation, and associated systems and methods
JP5996260B2 (ja) * 2012-05-09 2016-09-21 株式会社ディスコ 被加工物の分割方法
US8859397B2 (en) 2012-07-13 2014-10-14 Applied Materials, Inc. Method of coating water soluble mask for laser scribing and plasma etch
US9085049B2 (en) 2012-11-30 2015-07-21 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for manufacturing semiconductor device
JP6101140B2 (ja) * 2013-04-18 2017-03-22 株式会社ディスコ 切削装置
JP6274926B2 (ja) * 2014-03-17 2018-02-07 株式会社ディスコ 切削方法
US9130057B1 (en) 2014-06-30 2015-09-08 Applied Materials, Inc. Hybrid dicing process using a blade and laser
JP6359384B2 (ja) * 2014-08-26 2018-07-18 株式会社ディスコ 切削ブレード
JP6426407B2 (ja) * 2014-09-03 2018-11-21 株式会社ディスコ ウエーハの加工方法
WO2016052444A1 (ja) 2014-09-29 2016-04-07 リンテック株式会社 半導体ウエハ加工用シート用基材、半導体ウエハ加工用シート、および半導体装置の製造方法
US10535554B2 (en) 2016-12-14 2020-01-14 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor die having edge with multiple gradients and method for forming the same

Also Published As

Publication number Publication date
TWI752183B (zh) 2022-01-11
DE102018205020A1 (de) 2018-10-04
US10522405B2 (en) 2019-12-31
CN108687638A (zh) 2018-10-23
JP2018181909A (ja) 2018-11-15
TW201839833A (zh) 2018-11-01
US20180286757A1 (en) 2018-10-04
KR20180112683A (ko) 2018-10-12

Similar Documents

Publication Publication Date Title
MY170046A (en) Wafer processing method
EP3510454A4 (en) PROCESSING STATION, HOLDING SYSTEM FOR WORKPIECE AND METHOD FOR PROCESSING A WORKPIECE
MY185737A (en) Laser processing apparatus
MY179206A (en) Wafer processing method
EP3900871A4 (en) WELDING DEVICE AND WELDING METHOD FOR WELDING WORKPIECES WITH IT
SG11202103563XA (en) Laser-processing apparatus, methods of operating the same, and methods of processing workpieces using the same
MY185297A (en) Work sucking board, work cutting apparatus, work-cutting method, and fabricating method for work sucking board
MX2018004079A (es) Metodo para maquinar una pieza de trabajo de metal por torneado.
SG10201802546UA (en) Method of processing workpiece
WO2015169918A3 (de) Bearbeitungsvorrichtung und bearbeitungsverfahren
WO2017149133A8 (de) Vorrichtung mit absaugeinrichtung
MX2015015669A (es) Metodo para producir paquetes de laminas e instalacion para llevar a cabo el metodo.
MY190518A (en) Dressing method of cutting blade
SG10201802543SA (en) Method of processing workpiece
EP4052821A4 (en) PROCESSING DEVICE, PROCESSING METHOD AND CUTTING TOOL
EP3604999A4 (en) DEVICE FOR WORKPIECE PROCESSING AND MANUFACTURING METHOD FOR MACHINED WORKPIECES
SG10201802550QA (en) Method of processing workpiece
SG10201804285WA (en) Method of cutting workpiece
EP3316058A3 (en) Tool-path planning method
EP3666438A4 (en) REDUCING GAS SUPPLY DEVICE AND METHOD FOR MANUFACTURING A FULLY TREATED WORKPIECE
SG10201802542RA (en) Workpiece processing method
SG10201802544PA (en) Method of processing workpiece
SG10201803307SA (en) Method of processing workpiece
MX2018014535A (es) Plantilla de mecanizado y metodo de procesamiento.
EP3685956A4 (en) PROCESS FOR TREATMENT OF A PART WITH LASER AND USE OF THE SAME IN THE MANUFACTURE OF A CUTTING DEVICE