SE9704193D0 - Device and method for flat holding of a substrate in microlithography - Google Patents
Device and method for flat holding of a substrate in microlithographyInfo
- Publication number
- SE9704193D0 SE9704193D0 SE9704193A SE9704193A SE9704193D0 SE 9704193 D0 SE9704193 D0 SE 9704193D0 SE 9704193 A SE9704193 A SE 9704193A SE 9704193 A SE9704193 A SE 9704193A SE 9704193 D0 SE9704193 D0 SE 9704193D0
- Authority
- SE
- Sweden
- Prior art keywords
- substrate
- microlithography
- flat holding
- prevent
- different
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9704193A SE9704193D0 (sv) | 1997-11-14 | 1997-11-14 | Device and method for flat holding of a substrate in microlithography |
US09/529,988 US6529266B1 (en) | 1997-11-14 | 1998-11-13 | Device and method for flat holding of a substrate in microlithography |
JP2000521417A JP2001523843A (ja) | 1997-11-14 | 1998-11-13 | マイクロリソグラフィにおける基板を平坦に保持する装置および方法 |
AU12671/99A AU1267199A (en) | 1997-11-14 | 1998-11-13 | Device and method for flat holding of a substrate in microlithography |
PCT/SE1998/002051 WO1999026113A1 (en) | 1997-11-14 | 1998-11-13 | Device and method for flat holding of a substrate in microlithography |
DE19882796T DE19882796T1 (de) | 1997-11-14 | 1998-11-13 | Vorrichtung und Verfahren zum Ebenhalten eines Substrats in der Mikrolithographie |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9704193A SE9704193D0 (sv) | 1997-11-14 | 1997-11-14 | Device and method for flat holding of a substrate in microlithography |
Publications (1)
Publication Number | Publication Date |
---|---|
SE9704193D0 true SE9704193D0 (sv) | 1997-11-14 |
Family
ID=20408999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9704193A SE9704193D0 (sv) | 1997-11-14 | 1997-11-14 | Device and method for flat holding of a substrate in microlithography |
Country Status (6)
Country | Link |
---|---|
US (1) | US6529266B1 (sv) |
JP (1) | JP2001523843A (sv) |
AU (1) | AU1267199A (sv) |
DE (1) | DE19882796T1 (sv) |
SE (1) | SE9704193D0 (sv) |
WO (1) | WO1999026113A1 (sv) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60309590T2 (de) * | 2002-05-07 | 2007-09-13 | Vkr Holding A/S | Plattenelement mit rahmen mit einer platteneinheit |
TWI277836B (en) * | 2002-10-17 | 2007-04-01 | Adv Lcd Tech Dev Ct Co Ltd | Method and apparatus for forming pattern on thin-substrate or the like |
KR100578262B1 (ko) * | 2003-11-13 | 2006-05-11 | 주식회사 디엠에스 | 진공을 이용한 대면적 마스크 고정장치 및 그를 이용한노광장치와 노광방법 |
US7019816B2 (en) * | 2003-12-17 | 2006-03-28 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7119884B2 (en) * | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7440081B2 (en) * | 2004-11-05 | 2008-10-21 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and substrate table |
US7411657B2 (en) | 2004-11-17 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP5523206B2 (ja) * | 2010-05-31 | 2014-06-18 | 株式会社トプコン | 露光装置 |
KR101258868B1 (ko) * | 2011-06-02 | 2013-04-29 | 아페리오(주) | 부품 내장형 인쇄회로기판의 노광 방법 및 이를 적용한 노광장치 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4425038A (en) * | 1981-10-19 | 1984-01-10 | The Perkin-Elmer Corporation | Technique to modify wafer geometry |
US4737824A (en) * | 1984-10-16 | 1988-04-12 | Canon Kabushiki Kaisha | Surface shape controlling device |
JPS6194325A (ja) | 1984-10-16 | 1986-05-13 | Canon Inc | 薄板の表面形状矯正装置 |
JPS6194324A (ja) | 1984-10-16 | 1986-05-13 | Canon Inc | 薄板の表面形状矯正装置 |
JP2672535B2 (ja) | 1987-12-14 | 1997-11-05 | 株式会社東芝 | 露光装置 |
US5761023A (en) * | 1996-04-25 | 1998-06-02 | Applied Materials, Inc. | Substrate support with pressure zones having reduced contact area and temperature feedback |
US6183523B1 (en) * | 1997-03-03 | 2001-02-06 | Tokyo Electron Limited | Apparatus for thermal control of variously sized articles in vacuum |
-
1997
- 1997-11-14 SE SE9704193A patent/SE9704193D0/sv unknown
-
1998
- 1998-11-13 US US09/529,988 patent/US6529266B1/en not_active Expired - Fee Related
- 1998-11-13 AU AU12671/99A patent/AU1267199A/en not_active Abandoned
- 1998-11-13 WO PCT/SE1998/002051 patent/WO1999026113A1/en active Application Filing
- 1998-11-13 DE DE19882796T patent/DE19882796T1/de not_active Withdrawn
- 1998-11-13 JP JP2000521417A patent/JP2001523843A/ja not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US6529266B1 (en) | 2003-03-04 |
DE19882796T1 (de) | 2001-03-22 |
JP2001523843A (ja) | 2001-11-27 |
AU1267199A (en) | 1999-06-07 |
WO1999026113A1 (en) | 1999-05-27 |
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