SE519666C2 - Förfarande för att belägga ett substrat, t ex. ett skärverktyg, medelst bågförångning - Google Patents

Förfarande för att belägga ett substrat, t ex. ett skärverktyg, medelst bågförångning

Info

Publication number
SE519666C2
SE519666C2 SE0004277A SE0004277A SE519666C2 SE 519666 C2 SE519666 C2 SE 519666C2 SE 0004277 A SE0004277 A SE 0004277A SE 0004277 A SE0004277 A SE 0004277A SE 519666 C2 SE519666 C2 SE 519666C2
Authority
SE
Sweden
Prior art keywords
chamber
coating
substrate
sub
gas
Prior art date
Application number
SE0004277A
Other languages
English (en)
Swedish (sv)
Other versions
SE0004277L (sv
SE0004277D0 (sv
Inventor
Yasuhisa Hashimoto
Kazuo Yamagata
Akihiko Ikegaya
Original Assignee
Sumitomo Electric Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries filed Critical Sumitomo Electric Industries
Publication of SE0004277L publication Critical patent/SE0004277L/xx
Publication of SE0004277D0 publication Critical patent/SE0004277D0/xx
Publication of SE519666C2 publication Critical patent/SE519666C2/sv

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SE0004277A 1999-03-23 2000-11-22 Förfarande för att belägga ett substrat, t ex. ett skärverktyg, medelst bågförångning SE519666C2 (sv)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7792899 1999-03-23
PCT/JP2000/001618 WO2000056947A1 (fr) 1999-03-23 2000-03-16 Procede d'evaporation a arc sous vide, systeme d'evaporation a arc sous vide et outil de coupe rotatif

Publications (3)

Publication Number Publication Date
SE0004277L SE0004277L (sv) 2000-11-22
SE0004277D0 SE0004277D0 (sv) 2000-11-22
SE519666C2 true SE519666C2 (sv) 2003-03-25

Family

ID=13647758

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0004277A SE519666C2 (sv) 1999-03-23 2000-11-22 Förfarande för att belägga ett substrat, t ex. ett skärverktyg, medelst bågförångning

Country Status (4)

Country Link
US (1) US6592726B1 (fr)
DE (1) DE10080930B4 (fr)
SE (1) SE519666C2 (fr)
WO (1) WO2000056947A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007017528A1 (fr) * 2005-08-02 2007-02-15 Fundacion Tekniker Evaporateur a arc cathodique et procede d'allumage de l'arc
US8916001B2 (en) * 2006-04-05 2014-12-23 Gvd Corporation Coated molds and related methods and components
JP5276392B2 (ja) * 2007-09-21 2013-08-28 住友電気工業株式会社 切削工具、及び切削工具の製造方法
WO2011117945A1 (fr) 2010-03-26 2011-09-29 キヤノンアネルバ株式会社 Dispositif de pulvérisation et procédé de fabrication d'un dispositif électronique
DE102010023418A1 (de) * 2010-06-11 2011-12-15 Uhde Gmbh Ein- oder mehrseitige Substratbeschichtung
JP5611803B2 (ja) 2010-12-21 2014-10-22 キヤノンアネルバ株式会社 反応性スパッタリング装置
WO2016136520A1 (fr) * 2015-02-23 2016-09-01 住友電気工業株式会社 Outil rotatif
CN113664472B (zh) * 2021-08-25 2022-11-01 宁波江丰电子材料股份有限公司 一种镍蒸发料的制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
JP3318595B2 (ja) * 1991-12-24 2002-08-26 独立行政法人産業技術総合研究所 レーザイオンプレーティング装置
US5317235A (en) * 1993-03-22 1994-05-31 Ism Technolog Magnetically-filtered cathodic arc plasma apparatus
CH689558A5 (de) * 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
US5722803A (en) * 1995-07-14 1998-03-03 Kennametal Inc. Cutting tool and method of making the cutting tool
JP3315302B2 (ja) * 1995-12-18 2002-08-19 株式会社神戸製鋼所 真空アーク蒸着方法
JP3758248B2 (ja) * 1996-08-26 2006-03-22 日新電機株式会社 化合物薄膜の形成方法
JPH10251845A (ja) * 1997-03-17 1998-09-22 Nissin Electric Co Ltd アーク式イオンプレーティング装置
JPH1161391A (ja) * 1997-08-21 1999-03-05 Nissin Electric Co Ltd 薄膜形成方法および薄膜形成装置
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus

Also Published As

Publication number Publication date
DE10080930B4 (de) 2005-03-10
SE0004277L (sv) 2000-11-22
US6592726B1 (en) 2003-07-15
SE0004277D0 (sv) 2000-11-22
WO2000056947A1 (fr) 2000-09-28
DE10080930T1 (de) 2001-06-13

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