DE10080930T1 - Vakuumbogen-Verdampfungsverfahren, Vakuumbogen-Verdampfungssystem und Drehschneidewerkzeug - Google Patents

Vakuumbogen-Verdampfungsverfahren, Vakuumbogen-Verdampfungssystem und Drehschneidewerkzeug

Info

Publication number
DE10080930T1
DE10080930T1 DE10080930T DE10080930T DE10080930T1 DE 10080930 T1 DE10080930 T1 DE 10080930T1 DE 10080930 T DE10080930 T DE 10080930T DE 10080930 T DE10080930 T DE 10080930T DE 10080930 T1 DE10080930 T1 DE 10080930T1
Authority
DE
Germany
Prior art keywords
vacuum arc
arc evaporation
cutting tool
rotary cutting
evaporation process
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE10080930T
Other languages
English (en)
Other versions
DE10080930B4 (de
Inventor
Yasuhisa Hashimoto
Kazuo Yamagata
Akihiko Ikegaya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE10080930T1 publication Critical patent/DE10080930T1/de
Application granted granted Critical
Publication of DE10080930B4 publication Critical patent/DE10080930B4/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE10080930T 1999-03-23 2000-03-16 Vakuumbogen-Verdampfungsverfahren, Vakuumbogen-Verdampfungssystem und Drehschneidewerkzeug Expired - Fee Related DE10080930B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP7792899 1999-03-23
PCT/JP2000/001618 WO2000056947A1 (fr) 1999-03-23 2000-03-16 Procede d'evaporation a arc sous vide, systeme d'evaporation a arc sous vide et outil de coupe rotatif

Publications (2)

Publication Number Publication Date
DE10080930T1 true DE10080930T1 (de) 2001-06-13
DE10080930B4 DE10080930B4 (de) 2005-03-10

Family

ID=13647758

Family Applications (1)

Application Number Title Priority Date Filing Date
DE10080930T Expired - Fee Related DE10080930B4 (de) 1999-03-23 2000-03-16 Vakuumbogen-Verdampfungsverfahren, Vakuumbogen-Verdampfungssystem und Drehschneidewerkzeug

Country Status (4)

Country Link
US (1) US6592726B1 (de)
DE (1) DE10080930B4 (de)
SE (1) SE519666C2 (de)
WO (1) WO2000056947A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113664472A (zh) * 2021-08-25 2021-11-19 宁波江丰电子材料股份有限公司 一种镍蒸发料的制备方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007017528A1 (es) * 2005-08-02 2007-02-15 Fundacion Tekniker Dispositivo evaporador de arco catodico, y metodo para el encendido del arco
US8916001B2 (en) * 2006-04-05 2014-12-23 Gvd Corporation Coated molds and related methods and components
JP5276392B2 (ja) * 2007-09-21 2013-08-28 住友電気工業株式会社 切削工具、及び切削工具の製造方法
WO2011117945A1 (ja) 2010-03-26 2011-09-29 キヤノンアネルバ株式会社 スパッタリング装置及び電子デバイスの製造方法
DE102010023418A1 (de) * 2010-06-11 2011-12-15 Uhde Gmbh Ein- oder mehrseitige Substratbeschichtung
JP5611803B2 (ja) 2010-12-21 2014-10-22 キヤノンアネルバ株式会社 反応性スパッタリング装置
WO2016136520A1 (ja) * 2015-02-23 2016-09-01 住友電気工業株式会社 回転工具

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
JP3318595B2 (ja) * 1991-12-24 2002-08-26 独立行政法人産業技術総合研究所 レーザイオンプレーティング装置
US5317235A (en) * 1993-03-22 1994-05-31 Ism Technolog Magnetically-filtered cathodic arc plasma apparatus
CH689558A5 (de) * 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
US5722803A (en) * 1995-07-14 1998-03-03 Kennametal Inc. Cutting tool and method of making the cutting tool
JP3315302B2 (ja) * 1995-12-18 2002-08-19 株式会社神戸製鋼所 真空アーク蒸着方法
JP3758248B2 (ja) * 1996-08-26 2006-03-22 日新電機株式会社 化合物薄膜の形成方法
JPH10251845A (ja) * 1997-03-17 1998-09-22 Nissin Electric Co Ltd アーク式イオンプレーティング装置
JPH1161391A (ja) * 1997-08-21 1999-03-05 Nissin Electric Co Ltd 薄膜形成方法および薄膜形成装置
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113664472A (zh) * 2021-08-25 2021-11-19 宁波江丰电子材料股份有限公司 一种镍蒸发料的制备方法

Also Published As

Publication number Publication date
DE10080930B4 (de) 2005-03-10
SE0004277L (sv) 2000-11-22
SE519666C2 (sv) 2003-03-25
US6592726B1 (en) 2003-07-15
SE0004277D0 (sv) 2000-11-22
WO2000056947A1 (fr) 2000-09-28

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8607 Notification of search results after publication
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee