NO973945L - Molekylkompleksforbindelser som fotoinitiatorer - Google Patents
Molekylkompleksforbindelser som fotoinitiatorerInfo
- Publication number
- NO973945L NO973945L NO973945A NO973945A NO973945L NO 973945 L NO973945 L NO 973945L NO 973945 A NO973945 A NO 973945A NO 973945 A NO973945 A NO 973945A NO 973945 L NO973945 L NO 973945L
- Authority
- NO
- Norway
- Prior art keywords
- complex compounds
- molecular complex
- photoinitiators
- compound
- photopolymerisation
- Prior art date
Links
- 150000001875 compounds Chemical class 0.000 title abstract 4
- 239000000203 mixture Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
- C08K3/20—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Molecular Biology (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Laminated Bodies (AREA)
- Printing Methods (AREA)
- Paper (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH211596 | 1996-08-28 |
Publications (3)
Publication Number | Publication Date |
---|---|
NO973945D0 NO973945D0 (no) | 1997-08-27 |
NO973945L true NO973945L (no) | 1998-03-02 |
NO309145B1 NO309145B1 (no) | 2000-12-18 |
Family
ID=4226232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO973945A NO309145B1 (no) | 1996-08-28 | 1997-08-27 | Molekylkompleksforbindelser, fotopolymeriserbare sammensetninger, anvendelse herav samt belagte substrater |
Country Status (15)
Country | Link |
---|---|
US (1) | US5942290A (no) |
EP (1) | EP0826692B1 (no) |
JP (1) | JP4200392B2 (no) |
KR (1) | KR100530088B1 (no) |
CN (1) | CN1101822C (no) |
AT (1) | ATE233777T1 (no) |
AU (1) | AU720186B2 (no) |
BR (1) | BR9704552A (no) |
CA (1) | CA2213886C (no) |
DE (1) | DE59709426D1 (no) |
NO (1) | NO309145B1 (no) |
RU (1) | RU2181726C2 (no) |
SG (1) | SG53043A1 (no) |
TW (1) | TW401439B (no) |
ZA (1) | ZA977692B (no) |
Families Citing this family (103)
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DE19650562A1 (de) * | 1996-12-05 | 1998-06-10 | Basf Ag | Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate |
AU720650B2 (en) * | 1997-02-19 | 2000-06-08 | Ciba Specialty Chemicals Holding Inc. | (Co)polymers by Photopolymerization |
DE19810745C2 (de) | 1998-03-12 | 2000-05-04 | Bayer Ag | Flüssige Katalysatorformulierung aus Tetraphenylphosphoniumphenolat und Phenol und deren Verwendung |
KR100685153B1 (ko) * | 1998-12-03 | 2007-02-22 | 시바 스페셜티 케미칼스 홀딩 인크. | 광개시제 혼합물, 이를 포함하는 광중합성 조성물 및 이의 용도 |
SE9904080D0 (sv) * | 1998-12-03 | 1999-11-11 | Ciba Sc Holding Ag | Fotoinitiatorberedning |
US6048375A (en) * | 1998-12-16 | 2000-04-11 | Norton Company | Coated abrasive |
EP1230276B1 (en) * | 1999-10-20 | 2005-12-14 | Ciba SC Holding AG | Photoinitiator formulations |
DE60006210T2 (de) | 1999-12-08 | 2004-07-15 | Ciba Specialty Chemicals Holding Inc. | Neues Photoinitiatorsystem aus Phosphinoxidverbindungen und wenig gefärbte härtbare Zusammensetzungen |
GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
JP4597323B2 (ja) * | 2000-07-07 | 2010-12-15 | リンテック株式会社 | 紫外線硬化型粘着剤組成物および紫外線硬化性粘着シート |
US6737216B2 (en) * | 2000-12-08 | 2004-05-18 | E.I. Du Pont De Nemours And Company | Laser engravable flexographic printing element and a method for forming a printing plate from the element |
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DE10315671A1 (de) * | 2003-04-04 | 2004-10-14 | Basf Ag | Verfahren zur Herstellung von Acylphosphinoxid-Feststoffen |
WO2004099302A1 (en) | 2003-05-06 | 2004-11-18 | Ciba Specialty Chemicals Holding Inc. | Photo-cured and stabilized coatings |
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KR100917175B1 (ko) | 2006-07-05 | 2009-09-15 | 주식회사 엘지화학 | 신규한 아실포스핀 화합물 및 그의 제조방법 |
CN101600749B (zh) * | 2006-12-11 | 2012-09-26 | 陶氏环球技术有限责任公司 | 源自种子油的醛组合物和醇组合物 |
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Publication number | Priority date | Publication date | Assignee | Title |
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DE2722264C2 (de) * | 1977-05-17 | 1984-06-28 | Merck Patent Gmbh, 6100 Darmstadt | Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren |
EP0003002B1 (de) * | 1977-12-22 | 1984-06-13 | Ciba-Geigy Ag | Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone |
DE2965566D1 (en) * | 1978-07-14 | 1983-07-07 | Basf Ag | Acylphosphinoxide compounds, their preparation and their use |
DE2909994A1 (de) * | 1979-03-14 | 1980-10-02 | Basf Ag | Acylphosphinoxidverbindungen, ihre herstellung und verwendung |
IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
DE3443221A1 (de) * | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
US5218009A (en) * | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
EP0446175A3 (en) * | 1990-03-09 | 1991-11-21 | Ciba-Geigy Ag | Mixture of photoinitiators |
RU2091385C1 (ru) * | 1991-09-23 | 1997-09-27 | Циба-Гейги АГ | Бисацилфосфиноксиды, состав и способ нанесения покрытий |
TW303379B (no) * | 1994-03-02 | 1997-04-21 | Ciba Sc Holding Ag | |
TW381106B (en) * | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
WO1996007662A1 (en) * | 1994-09-08 | 1996-03-14 | Ciba Specialty Chemicals Holding Inc. | Novel acylphosphine oxides |
DE19618720A1 (de) * | 1995-05-12 | 1996-11-14 | Ciba Geigy Ag | Bisacyl-bisphosphine, -oxide und -sulfide |
SE520727C2 (sv) * | 1996-03-04 | 2003-08-19 | Ciba Sc Holding Ag | Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar |
-
1997
- 1997-08-14 SG SG1997002936A patent/SG53043A1/en unknown
- 1997-08-19 DE DE59709426T patent/DE59709426D1/de not_active Expired - Lifetime
- 1997-08-19 EP EP97810582A patent/EP0826692B1/de not_active Expired - Lifetime
- 1997-08-19 AT AT97810582T patent/ATE233777T1/de not_active IP Right Cessation
- 1997-08-21 US US08/915,776 patent/US5942290A/en not_active Expired - Lifetime
- 1997-08-22 AU AU35226/97A patent/AU720186B2/en not_active Ceased
- 1997-08-25 RU RU97114452/04A patent/RU2181726C2/ru not_active IP Right Cessation
- 1997-08-26 JP JP24467497A patent/JP4200392B2/ja not_active Expired - Lifetime
- 1997-08-26 CA CA002213886A patent/CA2213886C/en not_active Expired - Fee Related
- 1997-08-26 TW TW086112227A patent/TW401439B/zh active
- 1997-08-27 CN CN97117698A patent/CN1101822C/zh not_active Expired - Lifetime
- 1997-08-27 ZA ZA9707692A patent/ZA977692B/xx unknown
- 1997-08-27 NO NO973945A patent/NO309145B1/no not_active IP Right Cessation
- 1997-08-27 KR KR1019970041366A patent/KR100530088B1/ko not_active IP Right Cessation
- 1997-08-28 BR BR9704552A patent/BR9704552A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5942290A (en) | 1999-08-24 |
CA2213886A1 (en) | 1998-02-28 |
RU2181726C2 (ru) | 2002-04-27 |
JP4200392B2 (ja) | 2008-12-24 |
MX9706542A (es) | 1998-07-31 |
KR100530088B1 (ko) | 2006-04-06 |
AU720186B2 (en) | 2000-05-25 |
EP0826692A2 (de) | 1998-03-04 |
CN1175583A (zh) | 1998-03-11 |
AU3522697A (en) | 1998-03-05 |
CA2213886C (en) | 2005-12-06 |
KR19980019052A (ko) | 1998-06-05 |
EP0826692B1 (de) | 2003-03-05 |
EP0826692A3 (de) | 1999-03-03 |
BR9704552A (pt) | 1998-09-01 |
ZA977692B (en) | 1998-03-02 |
TW401439B (en) | 2000-08-11 |
CN1101822C (zh) | 2003-02-19 |
JPH1095788A (ja) | 1998-04-14 |
SG53043A1 (en) | 1998-09-28 |
DE59709426D1 (de) | 2003-04-10 |
NO309145B1 (no) | 2000-12-18 |
ATE233777T1 (de) | 2003-03-15 |
NO973945D0 (no) | 1997-08-27 |
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