NO20080729L - Silisium sprutevirvelsjikt - Google Patents

Silisium sprutevirvelsjikt

Info

Publication number
NO20080729L
NO20080729L NO20080729A NO20080729A NO20080729L NO 20080729 L NO20080729 L NO 20080729L NO 20080729 A NO20080729 A NO 20080729A NO 20080729 A NO20080729 A NO 20080729A NO 20080729 L NO20080729 L NO 20080729L
Authority
NO
Norway
Prior art keywords
silicon
fluid layer
injection fluid
silicon injection
reactors
Prior art date
Application number
NO20080729A
Other languages
English (en)
Inventor
Paul Edward Ege
Jeffrey A Hansen
Levi C Allen
Original Assignee
Rec Silicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rec Silicon Inc filed Critical Rec Silicon Inc
Publication of NO20080729L publication Critical patent/NO20080729L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1845—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
    • B01J8/1854—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement inside the reactor to form a loop
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1845—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised
    • B01J8/1863—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles with particles moving upwards while fluidised followed by a downward movement outside the reactor and subsequently re-entering it
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/245—Spouted-bed technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/26—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique with two or more fluidised beds, e.g. reactor and regeneration installations
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B01J2208/00407—Controlling the temperature using electric heating or cooling elements outside the reactor bed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00017—Controlling the temperature
    • B01J2208/00389—Controlling the temperature using electric heating or cooling elements
    • B01J2208/00415—Controlling the temperature using electric heating or cooling elements electric resistance heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00002—Chemical plants
    • B01J2219/00027—Process aspects
    • B01J2219/00038—Processes in parallel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00119—Heat exchange inside a feeding nozzle or nozzle reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/18—Details relating to the spatial orientation of the reactor
    • B01J2219/185—Details relating to the spatial orientation of the reactor vertical
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/19—Details relating to the geometry of the reactor
    • B01J2219/192—Details relating to the geometry of the reactor polygonal
    • B01J2219/1923—Details relating to the geometry of the reactor polygonal square or square-derived

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)

Abstract

Polysilisium dannes ved pyrolytisk dekomponering av en silisiumførende gass og avsetning av silisium på fluidiserte silisiumpartikler. Reaktorer (10) med sjikt fluidisert med flere neddykkede stråler og reaktorer som har sekundære åpninger (20) beskrives.
NO20080729A 2005-07-19 2008-02-08 Silisium sprutevirvelsjikt NO20080729L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70096405P 2005-07-19 2005-07-19
PCT/US2006/028112 WO2007012027A2 (en) 2005-07-19 2006-07-19 Silicon spout-fluidized bed

Publications (1)

Publication Number Publication Date
NO20080729L true NO20080729L (no) 2008-04-17

Family

ID=37529310

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20080729A NO20080729L (no) 2005-07-19 2008-02-08 Silisium sprutevirvelsjikt

Country Status (10)

Country Link
US (1) US20080220166A1 (no)
EP (1) EP1924349B1 (no)
JP (1) JP5086256B2 (no)
KR (1) KR101363911B1 (no)
CN (1) CN101316651B (no)
AT (1) ATE456395T1 (no)
DE (1) DE602006012064D1 (no)
NO (1) NO20080729L (no)
TW (1) TWI465600B (no)
WO (1) WO2007012027A2 (no)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5435188B2 (ja) * 2006-11-14 2014-03-05 三菱マテリアル株式会社 多結晶シリコンの製造方法および多結晶シリコン製造設備
CN102083522B (zh) 2008-06-30 2014-03-26 Memc电子材料有限公司 流化床反应器***及减少硅沉积在反应器壁上的方法
FR2937053B1 (fr) * 2008-10-09 2010-12-17 Commissariat Energie Atomique Dispositif pour la synthese de nanoparticules par depot chimique en phase vapeur en lit fluidise
US8168123B2 (en) * 2009-02-26 2012-05-01 Siliken Chemicals, S.L. Fluidized bed reactor for production of high purity silicon
WO2010123869A1 (en) 2009-04-20 2010-10-28 Ae Polysilicon Corporation Methods and system for cooling a reaction effluent gas
JP2012523963A (ja) 2009-04-20 2012-10-11 エーイー ポリシリコン コーポレーション ケイ化物がコーティングされた金属表面を有する反応器
US8075692B2 (en) 2009-11-18 2011-12-13 Rec Silicon Inc Fluid bed reactor
EP2519343A1 (en) 2009-12-29 2012-11-07 MEMC Electronic Materials, Inc. Methods for reducing the deposition of silicon on reactor walls using peripheral silicon tetrachloride
JP2013522472A (ja) * 2010-03-19 2013-06-13 ジーティーエイティー・コーポレーション 多結晶シリコン堆積のためのシステム及び方法
KR101329030B1 (ko) 2010-10-01 2013-11-13 주식회사 실리콘밸류 유동층 반응기
CN102205222A (zh) * 2011-03-25 2011-10-05 浙江合盛硅业有限公司 制取多晶硅的流化床反应装置
KR101329032B1 (ko) * 2011-04-20 2013-11-14 주식회사 실리콘밸류 다결정 실리콘 제조장치 및 이를 이용한 다결정 실리콘의 제조방법
KR101329035B1 (ko) 2011-04-20 2013-11-13 주식회사 실리콘밸류 유동층 반응기
TW201304864A (zh) * 2011-06-10 2013-02-01 Rec Silicon Inc 高純度矽塗佈顆粒之製造
FR2977259B1 (fr) 2011-06-28 2013-08-02 Commissariat Energie Atomique Dispositif a profil specifique de reacteur de type lit a jet pour depot par cvd
US8875728B2 (en) 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
KR102098605B1 (ko) 2012-08-29 2020-04-08 헴로크 세미컨덕터 오퍼레이션즈 엘엘씨 테이퍼 유동층 반응기 및 그의 사용 공정
US9212421B2 (en) 2013-07-10 2015-12-15 Rec Silicon Inc Method and apparatus to reduce contamination of particles in a fluidized bed reactor
US9587993B2 (en) 2012-11-06 2017-03-07 Rec Silicon Inc Probe assembly for a fluid bed reactor
US20140312030A1 (en) * 2013-04-23 2014-10-23 Paul D. Steneck Microwave heat treatment apparatus and method
DE102013208274A1 (de) * 2013-05-06 2014-11-20 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium
US9238211B1 (en) 2014-08-15 2016-01-19 Rec Silicon Inc Segmented silicon carbide liner
US9662628B2 (en) 2014-08-15 2017-05-30 Rec Silicon Inc Non-contaminating bonding material for segmented silicon carbide liner in a fluidized bed reactor
US9446367B2 (en) 2014-08-15 2016-09-20 Rec Silicon Inc Joint design for segmented silicon carbide liner in a fluidized bed reactor
US10518237B2 (en) 2015-04-01 2019-12-31 Hanwha Chemical Corporation Gas distribution unit for fluidized bed reactor system, fluidized bed reactor system having the gas distribution unit, and method for preparing granular polycrystalline silicon using the fluidized bed reactor system
CN105568254B (zh) * 2016-02-24 2018-10-30 清华大学 一种用于流化床化学气相沉积反应器的气体入口设备
KR102096577B1 (ko) * 2016-12-29 2020-04-02 한화솔루션 주식회사 폴리실리콘 제조 장치
MY195308A (en) * 2017-08-23 2023-01-12 Wacker Chemie Ag Fluidized Bed Reactor for Production of Granular Polycrystalline Silicon
RU183578U1 (ru) * 2017-12-06 2018-09-26 федеральное государственное бюджетное образовательное учреждение высшего образования "Иркутский национальный исследовательский технический университет" (ФГБОУ ВО "ИРНИТУ") Электрическая печь для обжига сыпучих материалов

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3977896A (en) * 1972-03-09 1976-08-31 General Atomic Company Process for depositing pyrolytic carbon coatings
US4207360A (en) * 1975-10-31 1980-06-10 Texas Instruments Incorporated Silicon seed production process
DE2626446C3 (de) * 1976-06-12 1978-12-14 Hobeg Hochtemperaturreaktor-Brennelement Gmbh, 6450 Hanau Verfahren zur Beschichtung von Teilchen für die Herstellung von Brenn- und/oder Absorberelementen für Kernreaktoren und Vorrichtung dazu
US4080927A (en) * 1976-10-06 1978-03-28 General Atomic Company Fluidized bed-gas coater apparatus
US4116160A (en) * 1976-10-26 1978-09-26 General Atomic Company Fluidized bed, gas coating apparatus
US4221182A (en) * 1976-10-06 1980-09-09 General Atomic Company Fluidized bed gas coating apparatus
JPS6051601B2 (ja) * 1978-06-19 1985-11-14 バブコツク日立株式会社 流動層炉起動バ−ナ装置
DE2846160A1 (de) * 1978-10-24 1980-05-08 Kernforschungsanlage Juelich Wirbelschichtreaktor mit offenem reaktionsgaszutritt und verfahren zur laminar-durchflussteigerung
JPS57135708A (en) * 1981-02-12 1982-08-21 Shin Etsu Chem Co Ltd Manufacturing of high purity silicon granule
JPS57145021A (en) * 1981-02-27 1982-09-07 Shin Etsu Chem Co Ltd Preparation of silicon granule
US4424199A (en) * 1981-12-11 1984-01-03 Union Carbide Corporation Fluid jet seed particle generator for silane pyrolysis reactor
US4416913A (en) * 1982-09-28 1983-11-22 Motorola, Inc. Ascending differential silicon harvesting means and method
US4546012A (en) * 1984-04-26 1985-10-08 Carbomedics, Inc. Level control for a fluidized bed
JPS6316040A (ja) * 1986-03-28 1988-01-23 Kawasaki Heavy Ind Ltd 粉粒体の熱処理方法
JPS6465010A (en) * 1987-09-04 1989-03-10 Osaka Titanium Device for producing high-purity granular metallic silicon
US5326547A (en) * 1988-10-11 1994-07-05 Albemarle Corporation Process for preparing polysilicon with diminished hydrogen content by using a two-step heating process
US5284676A (en) * 1990-08-17 1994-02-08 Carbon Implants, Inc. Pyrolytic deposition in a fluidized bed
US5175942A (en) * 1991-07-19 1993-01-05 Gte Products Corporation Method for fluidized bed discharge
GB2271518B (en) * 1992-10-16 1996-09-25 Korea Res Inst Chem Tech Heating of fluidized bed reactor by microwave
US5328713A (en) * 1993-03-16 1994-07-12 Carbon Implants, Inc. Precise regulation of fluidized bed weight in pyrolytically coating substrates
US5798137A (en) * 1995-06-07 1998-08-25 Advanced Silicon Materials, Inc. Method for silicon deposition
JPH119985A (ja) * 1997-06-19 1999-01-19 Ube Ind Ltd 流動層粉体被覆装置及び被覆肥料の製造方法
DE19735378A1 (de) * 1997-08-14 1999-02-18 Wacker Chemie Gmbh Verfahren zur Herstellung von hochreinem Siliciumgranulat
US6410087B1 (en) * 1999-11-01 2002-06-25 Medical Carbon Research Institute, Llc Deposition of pyrocarbon
AU2000267902A1 (en) * 2000-02-18 2001-08-27 Gt Equipment Technologies Inc. Method and apparatus for chemical vapor deposition of polysilicon
US6733826B2 (en) * 2000-12-18 2004-05-11 Osram Sylvania Inc. Method and apparatus for coating electroluminescent phosphors
DE10124848A1 (de) * 2001-05-22 2002-11-28 Solarworld Ag Verfahren zur Herstellung von hochreinem, granularem Silizium in einer Wirbelschicht
AU2002329626A1 (en) * 2002-07-22 2004-02-23 Stephen M. Lord Methods for heating a fluidized bed silicon manufacture apparatus
EP2455945B1 (en) * 2004-04-21 2013-09-04 Nuclear Fuel Industries, Ltd. Apparatus for manufacturing coated fuel particles for high-temperature gas-cooled reactor
DE102005042753A1 (de) * 2005-09-08 2007-03-15 Wacker Chemie Ag Verfahren und Vorrichtung zur Herstellung von granulatförmigem polykristallinem Silicium in einem Wirbelschichtreaktor

Also Published As

Publication number Publication date
CN101316651B (zh) 2011-03-02
JP2009502704A (ja) 2009-01-29
KR20080039911A (ko) 2008-05-07
TWI465600B (zh) 2014-12-21
ATE456395T1 (de) 2010-02-15
CN101316651A (zh) 2008-12-03
EP1924349B1 (en) 2010-01-27
JP5086256B2 (ja) 2012-11-28
TW200710263A (en) 2007-03-16
EP1924349A2 (en) 2008-05-28
US20080220166A1 (en) 2008-09-11
KR101363911B1 (ko) 2014-02-21
WO2007012027A3 (en) 2008-06-05
WO2007012027A2 (en) 2007-01-25
DE602006012064D1 (de) 2010-03-18

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