NL9100051A - Werkwijze voor het vervaardigen van een dunne film-transistor. - Google Patents

Werkwijze voor het vervaardigen van een dunne film-transistor. Download PDF

Info

Publication number
NL9100051A
NL9100051A NL9100051A NL9100051A NL9100051A NL 9100051 A NL9100051 A NL 9100051A NL 9100051 A NL9100051 A NL 9100051A NL 9100051 A NL9100051 A NL 9100051A NL 9100051 A NL9100051 A NL 9100051A
Authority
NL
Netherlands
Prior art keywords
metal layer
layer
thickness
thin film
film transistor
Prior art date
Application number
NL9100051A
Other languages
English (en)
Dutch (nl)
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of NL9100051A publication Critical patent/NL9100051A/nl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742Thin film unipolar transistors
    • H01L29/6675Amorphous silicon or polysilicon transistors
    • H01L29/66765Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
    • H01L21/28506Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
    • H01L21/28512Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45Ohmic electrodes
    • H01L29/456Ohmic electrodes on silicon
    • H01L29/458Ohmic electrodes on silicon for thin film silicon, e.g. source or drain electrode
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Electrodes Of Semiconductors (AREA)
NL9100051A 1990-07-27 1991-01-11 Werkwijze voor het vervaardigen van een dunne film-transistor. NL9100051A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR900011417 1990-07-27
KR1019900011417A KR930001901B1 (ko) 1990-07-27 1990-07-27 박막 트랜지스터의 제조방법

Publications (1)

Publication Number Publication Date
NL9100051A true NL9100051A (nl) 1992-02-17

Family

ID=19301689

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9100051A NL9100051A (nl) 1990-07-27 1991-01-11 Werkwijze voor het vervaardigen van een dunne film-transistor.

Country Status (4)

Country Link
JP (1) JP2505662B2 (ja)
KR (1) KR930001901B1 (ja)
FR (1) FR2665300B1 (ja)
NL (1) NL9100051A (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05335336A (ja) * 1992-06-02 1993-12-17 Nec Corp 薄膜トランジスタの製造方法
TW406317B (en) * 1997-06-27 2000-09-21 Siemens Ag Method to produce a barrier-layer in a semiconductor-body and semiconductor component with such a barrier-layer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2044994B (en) * 1979-03-22 1983-06-15 Philips Electronic Associated Thin film transistors
JPS59124162A (ja) * 1982-12-29 1984-07-18 Sharp Corp 薄膜トランジスタ
JPS60183770A (ja) * 1984-03-01 1985-09-19 Asahi Glass Co Ltd 薄膜トランジスタ
JPS60211982A (ja) * 1984-04-06 1985-10-24 Hitachi Ltd 薄膜トランジスタ
JPS6281057A (ja) * 1985-10-04 1987-04-14 Hosiden Electronics Co Ltd 透明導電膜

Also Published As

Publication number Publication date
JPH04233738A (ja) 1992-08-21
FR2665300B1 (fr) 1997-09-05
KR930001901B1 (ko) 1993-03-19
FR2665300A1 (fr) 1992-01-31
KR920003534A (ko) 1992-02-29
JP2505662B2 (ja) 1996-06-12

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
BN A decision not to publish the application has become irrevocable