NL7713855A - Werkwijze voor het door middel van ionen-im- plantatie veranderen van de elektrische eigen- schappen van mos-inrichtingen. - Google Patents
Werkwijze voor het door middel van ionen-im- plantatie veranderen van de elektrische eigen- schappen van mos-inrichtingen.Info
- Publication number
- NL7713855A NL7713855A NL7713855A NL7713855A NL7713855A NL 7713855 A NL7713855 A NL 7713855A NL 7713855 A NL7713855 A NL 7713855A NL 7713855 A NL7713855 A NL 7713855A NL 7713855 A NL7713855 A NL 7713855A
- Authority
- NL
- Netherlands
- Prior art keywords
- procedure
- changing
- ion implantation
- electrical properties
- mos devices
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
- H10B20/27—ROM only
- H10B20/30—ROM only having the source region and the drain region on the same level, e.g. lateral transistors
- H10B20/38—Doping programmed, e.g. mask ROM
- H10B20/383—Channel doping programmed
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/8236—Combination of enhancement and depletion transistors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/958—Passivation layer
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Memories (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/750,368 US4080718A (en) | 1976-12-14 | 1976-12-14 | Method of modifying electrical characteristics of MOS devices using ion implantation |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7713855A true NL7713855A (nl) | 1978-06-16 |
Family
ID=25017581
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7713855A NL7713855A (nl) | 1976-12-14 | 1977-12-14 | Werkwijze voor het door middel van ionen-im- plantatie veranderen van de elektrische eigen- schappen van mos-inrichtingen. |
Country Status (8)
Country | Link |
---|---|
US (1) | US4080718A (de) |
JP (1) | JPS5375781A (de) |
CA (1) | CA1111147A (de) |
DE (1) | DE2750209C2 (de) |
FR (1) | FR2374739A1 (de) |
GB (2) | GB1594958A (de) |
IT (1) | IT1089901B (de) |
NL (1) | NL7713855A (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4294001A (en) * | 1979-01-08 | 1981-10-13 | Texas Instruments Incorporated | Method of making implant programmable metal gate MOS read only memory |
DE2832388C2 (de) * | 1978-07-24 | 1986-08-14 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zum Herstellen von MNOS- und MOS-Transistoren in Silizium-Gate-Technologie auf einem Halbleitersubstrat |
US4208780A (en) * | 1978-08-03 | 1980-06-24 | Rca Corporation | Last-stage programming of semiconductor integrated circuits including selective removal of passivation layer |
US4212684A (en) * | 1978-11-20 | 1980-07-15 | Ncr Corporation | CISFET Processing including simultaneous doping of silicon components and FET channels |
US4210465A (en) * | 1978-11-20 | 1980-07-01 | Ncr Corporation | CISFET Processing including simultaneous implantation of spaced polycrystalline silicon regions and non-memory FET channel |
JPS5570072A (en) * | 1978-11-21 | 1980-05-27 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Semiconductor read only memory |
US4305760A (en) * | 1978-12-22 | 1981-12-15 | Ncr Corporation | Polysilicon-to-substrate contact processing |
US4342100A (en) * | 1979-01-08 | 1982-07-27 | Texas Instruments Incorporated | Implant programmable metal gate MOS read only memory |
JPS5599722A (en) * | 1979-01-26 | 1980-07-30 | Hitachi Ltd | Preparation of semiconductor device |
JPS5643756A (en) * | 1979-09-18 | 1981-04-22 | Seiko Epson Corp | Manufacture of semiconductor device |
US4336647A (en) * | 1979-12-21 | 1982-06-29 | Texas Instruments Incorporated | Method of making implant programmable N-channel read only memory |
US4441941A (en) * | 1980-03-06 | 1984-04-10 | Tokyo Shibaura Denki Kabushiki Kaisha | Method for manufacturing a semiconductor device employing element isolation using insulating materials |
US4315781A (en) * | 1980-04-23 | 1982-02-16 | Hughes Aircraft Company | Method of controlling MOSFET threshold voltage with self-aligned channel stop |
JPS56150860A (en) * | 1980-04-24 | 1981-11-21 | Fujitsu Ltd | Manufacture of semiconductor memory device |
US4519849A (en) * | 1980-10-14 | 1985-05-28 | Intel Corporation | Method of making EPROM cell with reduced programming voltage |
US4359817A (en) * | 1981-05-28 | 1982-11-23 | General Motors Corporation | Method for making late programmable read-only memory devices |
US4358889A (en) * | 1981-05-28 | 1982-11-16 | General Motors Corporation | Process for making a late programming enhanced contact ROM |
US4365405A (en) * | 1981-05-28 | 1982-12-28 | General Motors Corporation | Method of late programming read only memory devices |
US4364165A (en) * | 1981-05-28 | 1982-12-21 | General Motors Corporation | Late programming using a silicon nitride interlayer |
JPS583265A (ja) * | 1981-06-30 | 1983-01-10 | Toshiba Corp | 半導体装置の製造方法 |
GB2102623B (en) * | 1981-06-30 | 1985-04-11 | Tokyo Shibaura Electric Co | Method of manufacturing a semiconductors memory device |
JPS5821369A (ja) * | 1981-07-30 | 1983-02-08 | Toshiba Corp | 固定記憶装置 |
JPS59132651A (ja) * | 1983-01-20 | 1984-07-30 | Sanyo Electric Co Ltd | 半導体読出し専用メモリのデ−タ固定方法 |
US4547959A (en) * | 1983-02-22 | 1985-10-22 | General Motors Corporation | Uses for buried contacts in integrated circuits |
US4514893A (en) * | 1983-04-29 | 1985-05-07 | At&T Bell Laboratories | Fabrication of FETs |
DE3318213A1 (de) * | 1983-05-19 | 1984-11-22 | Deutsche Itt Industries Gmbh, 7800 Freiburg | Verfahren zum herstellen eines integrierten isolierschicht-feldeffekttransistors mit zur gateelektrode selbstausgerichteten kontakten |
JPS5910261A (ja) * | 1983-06-24 | 1984-01-19 | Toshiba Corp | 半導体論理回路装置 |
US5210042A (en) * | 1983-09-26 | 1993-05-11 | Fujitsu Limited | Method of producing semiconductor device |
JPS60130844A (ja) * | 1983-12-20 | 1985-07-12 | Toshiba Corp | 半導体装置の製造方法 |
IT1213230B (it) * | 1984-10-23 | 1989-12-14 | Ates Componenti Elettron | Processo planox a becco ridotto per la formazione di componenti elettronici integrati. |
JPS61222175A (ja) * | 1985-03-01 | 1986-10-02 | Fujitsu Ltd | 半導体記憶装置の製造方法 |
JPS61183548U (de) * | 1986-05-01 | 1986-11-15 | ||
US4679302A (en) * | 1986-05-12 | 1987-07-14 | Northern Telecom Limited | Double polysilicon integrated circuit process |
US5275959A (en) * | 1986-06-25 | 1994-01-04 | Hitachi, Ltd. | Process for producing ROM |
US5149669A (en) * | 1987-03-06 | 1992-09-22 | Seiko Instruments Inc. | Method of forming an isolation region in a semiconductor device |
JP2797538B2 (ja) * | 1989-10-27 | 1998-09-17 | ソニー株式会社 | 読み出し専用メモリ装置の製造方法 |
US5648288A (en) * | 1992-03-20 | 1997-07-15 | Siliconix Incorporated | Threshold adjustment in field effect semiconductor devices |
US5212106A (en) * | 1992-05-07 | 1993-05-18 | Advanced Micro Devices, Inc. | Optimizing doping control in short channel MOS |
US5215937A (en) * | 1992-05-07 | 1993-06-01 | Advanced Micro Devices, Inc. | Optimizing doping control in short channel MOS |
JP3181695B2 (ja) * | 1992-07-08 | 2001-07-03 | ローム株式会社 | Soi基板を用いた半導体装置の製造方法 |
JP2701763B2 (ja) * | 1994-11-04 | 1998-01-21 | 日本電気株式会社 | 半導体装置およびその製造方法 |
WO2001016999A2 (en) * | 1999-08-27 | 2001-03-08 | Macronix America, Inc. | New approach for multilevel mrom |
US6455903B1 (en) * | 2000-01-26 | 2002-09-24 | Advanced Micro Devices, Inc. | Dual threshold voltage MOSFET by local confinement of channel depletion layer using inert ion implantation |
JP2001313389A (ja) * | 2000-05-01 | 2001-11-09 | Seiko Epson Corp | 半導体装置およびその製造方法 |
CN102800593B (zh) * | 2011-05-25 | 2016-03-16 | 中芯国际集成电路制造(上海)有限公司 | 晶体管形成方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2112024B1 (de) * | 1970-07-02 | 1973-11-16 | Commissariat Energie Atomique | |
US3775191A (en) * | 1971-06-28 | 1973-11-27 | Bell Canada Northern Electric | Modification of channel regions in insulated gate field effect transistors |
GB1345818A (en) * | 1971-07-27 | 1974-02-06 | Mullard Ltd | Semiconductor devices |
GB1392599A (en) * | 1971-07-28 | 1975-04-30 | Mullard Ltd | Semiconductor memory elements |
US3837071A (en) * | 1973-01-16 | 1974-09-24 | Rca Corp | Method of simultaneously making a sigfet and a mosfet |
US3873372A (en) * | 1973-07-09 | 1975-03-25 | Ibm | Method for producing improved transistor devices |
US3914855A (en) * | 1974-05-09 | 1975-10-28 | Bell Telephone Labor Inc | Methods for making MOS read-only memories |
JPS5947464B2 (ja) * | 1974-09-11 | 1984-11-19 | 株式会社日立製作所 | 半導体装置 |
JPS51111020A (en) * | 1975-03-26 | 1976-10-01 | Hitachi Ltd | Semiconductor fixing memory equipment |
-
1976
- 1976-12-14 US US05/750,368 patent/US4080718A/en not_active Expired - Lifetime
-
1977
- 1977-10-11 CA CA288,419A patent/CA1111147A/en not_active Expired
- 1977-11-07 GB GB33711/79A patent/GB1594958A/en not_active Expired
- 1977-11-07 GB GB46245/77A patent/GB1594957A/en not_active Expired
- 1977-11-10 DE DE2750209A patent/DE2750209C2/de not_active Expired
- 1977-12-07 FR FR7736804A patent/FR2374739A1/fr active Granted
- 1977-12-13 JP JP14894277A patent/JPS5375781A/ja active Granted
- 1977-12-13 IT IT09653/77A patent/IT1089901B/it active
- 1977-12-14 NL NL7713855A patent/NL7713855A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
FR2374739B1 (de) | 1983-01-07 |
US4080718A (en) | 1978-03-28 |
IT1089901B (it) | 1985-06-18 |
JPS5375781A (en) | 1978-07-05 |
FR2374739A1 (fr) | 1978-07-13 |
GB1594957A (en) | 1981-08-05 |
CA1111147A (en) | 1981-10-20 |
DE2750209A1 (de) | 1978-06-15 |
GB1594958A (en) | 1981-08-05 |
DE2750209C2 (de) | 1986-03-27 |
JPS6219077B2 (de) | 1987-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
BV | The patent application has lapsed |