NL2031640A - Magnetic suspension type mask stage of lithography machine - Google Patents

Magnetic suspension type mask stage of lithography machine Download PDF

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Publication number
NL2031640A
NL2031640A NL2031640A NL2031640A NL2031640A NL 2031640 A NL2031640 A NL 2031640A NL 2031640 A NL2031640 A NL 2031640A NL 2031640 A NL2031640 A NL 2031640A NL 2031640 A NL2031640 A NL 2031640A
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Netherlands
Prior art keywords
motion
micro
magnetic suspension
electromagnets
linear motor
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NL2031640A
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Dutch (nl)
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NL2031640B1 (en
Inventor
Zhao Pengyue
Wang Jiyao
Li Changqi
Zheng Jian
Wei Weiwei
Tan Jiubin
Wu Jianwei
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Harbin Inst Technology
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Publication of NL2031640A publication Critical patent/NL2031640A/en
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Publication of NL2031640B1 publication Critical patent/NL2031640B1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70816—Bearings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Disclosed is a magnetic suspension type mask stage of a lithography machine. The mask stage includes a base, a micro-motion stage and a mask, where the base is provided with a driving mechanism and magnetic suspension guide rails parallel to each other, and a guide rail groove is provided in each magnetic suspension guide rail, the micro-motion stage is provided with a mounting position, four upper electromagnets positioned at four comers of the rectangle, and four lower electromagnets being in one-to-one correspondence with the upper electromagnets in terms of position, and the driving mechanism drives the micro-motion stage to make multi-degree-of—freedom precise motion, and the mask is mounted at the mounting position. The mask stage further includes a control circuit for controlling a magnetic force of each upper electromagnet and each lower electromagnet, so as to realize multi-degree-of—freedom position and posture adjustment of the micro-motion stage.

Description

MAGNETIC SUSPENSION TYPE MASK STAGE OF LITHOGRAPHY
MACHINE
TECHNICAL FIELD
[DI] The present invention relates to the technical field of lithography machines, in particular to a magnetic suspension type mask stage of a lithography machine.
BACKGROUND ART
[02] As a crucial subsystem of a lithography machine, a mask stage subsystem of the lithography machine has the functions of fast marching, precise positioning, precise field-by-field leveling and focusing, and synchronous scanning. Positioning precision and synchronization precision with a wafer stage determine the alignment precision of the lithography machine, and finally determine a lithography critical dimension which the lithography machine can realize.
[03] The mask stage system mainly includes a macro-motion stage and a micro- motion stage, where the macro-motion stage completes large-travel linear motion, and the micro-motion stage completes high-precision micro motion and positioning. In order to ensure the lithography quality and production efficiency of the lithography machine, the mask stage system is required to have the function of large-travel, high-speed and high-acceleration motion. A traditional supporting and motion driving manner composed of a sliding guide rail, a precise ball screw and a precise motion motor has the problems of mechanical wear, dust and detritus, oil pollution, etc., and precision becomes lower due to long-time, high-speed and high-acceleration motion, so as to effect the motion and positioning precise of a mask stage.
[04] The patent with the number of CN 101900952 and entitled as “lithography machine mask stage using magnetic suspension technology” provides a lithography machine mask stage using a magnetic suspension technology, which mainly includes a precise guide rail, a base, suspended bodies, etc. The suspended bodies on two sides of the mask stage use C-shaped connecting members, the mask stage is suspended above the guide rail by means of four pairs of electromagnets in a vertical direction 4 and two pairs of electromagnets in a horizontal direction 2, linear motor movers are directly fixed on the suspended bodies, and a linear motor is used to directly drive the suspended bodies to make precise linear positioning motion.
[05] Although the solution of CN 101900952 can realize large-travel linear motion of the mask stage, the solution limits the other five degrees of freedom except the degree of freedom in a linear motion direction of the mask stage, such that the micro-motion stage of the solution cannot realize a multi-degree-of-freedom position and posture adjustment.
SUMMARY
[06] The technical problem to be solved by the present invention is how to realize multi-degree-of-freedom position and posture adjustment of a micro-motion stage.
[07] In order to solve the above technical problem, the present invention provides a magnetic suspension type mask stage of a lithography machine. The mask stage includes a base, a micro-motion stage, a mask and a control circuit. An upper surface of the base is provided with a driving mechanism and magnetic suspension guide rails, each magnetic suspension guide rail is in a long strip shape, the two magnetic suspension guide rails are parallel to each other, and a guide rail groove is provided at a side, facing the other magnetic suspension guide rail, of each magnetic suspension guide rail. The micro-motion stage is provided with a mounting position, an upper surface of the micro- motion stage is provided with four upper electromagnets, the upper electromagnets are distributed in a rectangle, a lower surface of the micro-motion stage 1s provided with four lower electromagnets, the lower electromagnets are positioned right below the upper electromagnets, the lower electromagnets are in one-to-one correspondence with the upper electromagnets in terms of position, the micro-motion stage is suspended between the two magnetic suspension guide rails, the upper electromagnets and the lower electromagnets are positioned in the guide rail grooves, and the driving mechanism drives the micro-motion stage to move such that the micro-motion stage may make multi-degree-of-freedom precise motion. The mask is mounted at the mounting position. The control circuit is used for controlling a magnetic force of each upper electromagnet and a magnetic force of each lower electromagnet, so as to change a differential magnetic suspension force between the upper electromagnets and the lower electromagnets.
[08] Further, the driving mechanism includes a motion control device, the motion control device includes a first linear motor, a second linear motor and a third linear motor, the third linear motor is positioned between the first linear motor and the second linear motor, the first linear motor and the second linear motor drive the micro-motion stage to move along a y-axis, and the third linear motor drives the micro-motion stage to move along an x-axis.
[09] Further, the first linear motor, the second linear motor and the third linear motor each have travel of plus or minus 1 mm to 3 mm.
[10] Further, the driving mechanism further includes a macro-motion linear motor and a macro-motion stage, a stator of the macro-motion linear motor is fixed on the base, a mover of the macro-motion linear motor is fixed with the macro-motion stage, the motion control device is fixed on the macro-motion stage, and the macro-motion linear motor drives the macro-motion stage to move along a y-axis.
[11] Further, the macro-motion linear motor has a travel of plus or minus 5 mm to 10mm.
[12] Further, the mounting position is provided with vacuum suckers for sucking the mask, the micro-motion stage is internally provided with ventilation pipelines, and the ventilation pipelines are in communication with the vacuum suckers.
[13] Further, the vacuum suckers comprise convex blocks and ventilation holes, the convex blocks are positioned on the upper surface of the micro-motion stage, grooves are concavely provided on the convex blocks, the ventilation holes are positioned on bottom surfaces of the grooves, the ventilation holes are in communication with the ventilation pipelines, and air pressure in each ventilation pipeline is minus 0.04 MPa to 0.08 MPa.
[14] Further, each ventilation hole has a diameter of 1 mm to 3 mm, each convex block is in a long strip shape, and each convex block has a length of 50 mm to 54 mm, a width of 4 mm to 6 mm and a height of 12 mm to 17 mm.
[15] Further, four vacuum suckers are arranged, the four vacuum suckers are distributed in a rectangle, and the vacuum suckers are positioned at the corners of the mask.
[16] Further, each ventilation pipeline includes four first air channels, two second air channels and one third air channel, each first air channel is in communication with one vacuum sucker, two first air channels are in communication with each other by means of one second air channel, the other two first air channels are in communication with each other by means of the other second air channel, the two second air channels are in communication with each other by means of the third air channel, the micro- motion stage is provided with an air extraction port, and one first air channel is in communication with the air extraction port.
[17] It is assumed that the four upper electromagnets are arranged in a clockwise direction and are a first upper electromagnet, a second upper electromagnet, a third upper electromagnet and a fourth upper electromagnet, respectively, where the first upper electromagnet and the fourth upper electromagnet are arranged in the same y-axis direction. The four lower electromagnets are a first lower electromagnet, a second lower electromagnet, a third lower electromagnet and a fourth lower electromagnet, where the first lower electromagnet 1s positioned right below the first upper electromagnet, the second lower electromagnet is positioned right below the second upper electromagnet, the third lower electromagnet 1s positioned right below the third upper electromagnet, and the fourth lower electromagnet is positioned right below the fourth upper electromagnet.
[18] The control circuit adjusts a Z-direction degree of freedom of the micro- motion stage through the following method, which includes: making magnetic forces of all the upper electromagnets the same; making magnetic forces of all the lower electromagnets the same; changing the magnetic forces of all the upper electromagnets and the magnetic forces of all the lower electromagnets, so as to change a Z-direction position of the micro-motion stage; and readjusting the magnetic forces of all the upper electromagnets and the magnetic forces of all the lower electromagnets when the micro- motion stage reaches a designated Z-direction degree of freedom position, so as to position and suspend the micro-motion stage at the position, thereby realizing Z- direction degree of freedom position adjustment of the micro-motion stage.
[19] The control circuit adjusts a Rx-direction degree of freedom of the micro- motion stage through the following method which include: making the magnetic forces of the first upper electromagnet, the second upper electromagnet, the first lower electromagnet and the second lower electromagnet the same; making the magnetic forces of the third upper electromagnet, the fourth upper electromagnet, the third lower electromagnet and the fourth lower electromagnet the same; changing the magnetic forces of the first upper electromagnet and the third upper electromagnet to enable the micro-motion stage to slightly rotate around an x-axis, so as to change a Rx-direction degree of freedom position of the micro-motion stage; and readjusting the magnetic forces of all the upper electromagnets and the magnetic forces of all the lower electromagnets after the micro-motion stage reaches a designated Rx-direction degree of freedom position, so as to position and suspend the micro-motion stage at the position, thereby realizing Rx-direction degree of freedom position and posture of the micro- motion stage.
[20] The control circuit adjusts a Ry-direction degree of freedom of the micro- motion stage through the following method which include: making the magnetic forces of the first upper electromagnet, the fourth upper electromagnet, the first lower electromagnet and the fourth lower electromagnet the same; making the magnetic forces of the second upper electromagnet, the third upper electromagnet, the second lower electromagnet and the third lower electromagnet the same; changing the magnetic forces of the first upper electromagnet and the second upper electromagnet to enable the micro- motion stage to slightly rotate around a y-axis, so as to change a Ry-direction degree of freedom position of the micro-motion stage; and readjusting the magnetic forces of all the upper electromagnets and the magnetic forces of all the lower electromagnets after the micro-motion stage reaches a designated Ry-direction degree of freedom position, so as to position and suspend the micro-motion stage at the position, thereby realizing
Ry-direction degree of freedom position and posture of the micro-motion stage. [BIJ] Compared with the prior art, the magnetic suspension type mask stage of the lithography machine in an embodiment of the present invention has beneficial effects: by arranging the four upper electromagnets and the four lower electromagnets on the micro-motion stage and changing the magnetic forces of the upper electromagnets and the magnetic forces of the lower electromagnets, the Z-direction degree of freedom position and posture, the Rx-direction degree of freedom position and posture and the
Ry-direction degree of freedom position and posture of the micro-motion stage may be adjusted, thereby realizing multi-degree-of-freedom position and posture adjustment of the micro-motion stage.
BRIEF DESCRIPTION OF THE DRAWINGS
[22] FIG. 1 is a structural schematic diagram of one embodiment of the present invention;
[23] FIG. 2 is a combined diagram of a micro-motion stage and a base;
[24] FIG. 3 is a top view of FIG. 2;
[25] FIG. 415 a structural schematic diagram of a micro-motion stage;
[26] FIG. 5 is a bottom view of FIG. 4;
[27] FIG. 6 is a sectional view of a vacuum sucker; and
[28] FIG. 7 is a structural schematic diagram of a ventilation pipeline.
[29] In the accompanying drawings: 1. base, 11. driving mechanism, 111. first linear motor, 112. second linear motor, 113. third linear motor, 114. macro-motion linear motor, 115. macro-motion stage, 12. magnetic suspension guide rail, 121. guide rail groove, 2. micro-motion stage, 21. mounting position, 22. vacuum sucker, 221. convex block, 222. ventilation hole, 223, groove, 23, upper electromagnet, 231. first upper electromagnet, 232. second upper electromagnet, 233. third upper electromagnet, 234.
fourth upper electromagnet, 24. lower electromagnet, 241. first lower electromagnet, 242. second lower electromagnet, 243. third lower electromagnet, 244. fourth lower electromagnet, 25. ventilation pipeline, 251, first air channel, 252, second air channel, 253, third air channel, 26, air extraction port and 3. mask.
DETAILED DESCRIPTION OF THE EMBODIMENTS
[30] The specific implementations of the present invention will be further described in detail with reference to the accompanying drawings and the embodiments. The following embodiments are used for describing the present invention, but are not used for limiting the scope of the present invention.
[31] In the description of the present invention, it should be understood that orientations or positional relations indicated by the terms “upper”, “lower”, “left”, “right”, “front”, “back”, “top”, “bottom”, etc. are based on the orientations or positional relations shown in the accompanying drawings and are only for facilitating the description of the present invention and simplifying the description, rather than indicating or implying that a device or element referred to must have a particular orientation or be constructed and operated in a particular orientation, and therefore will not be interpreted as limiting the present invention.
[32] As shown in FIG. 1, a magnetic suspension type mask stage of the lithography machine in a preferred embodiment of the present invention includes a base 1, a micro- motion stage 2, a mask 3 and a control circuit. The micro-motion stage 2 may make large-distance macro motion and small-distance micro motion on the base 1 at the same time. The mask 3 moves as the micro-motion stage 2 moves.
[33] As shown in FIGs. 1-5, an upper surface of the base 1 is provided with a driving mechanism 11 and a pair of magnetic suspension guide rails 12, each magnetic suspension guide rail 12 is in a long strip shape, the two magnetic suspension guide rails 12 are parallel to each other, a guide rail groove 121 is provided at a side, facing the other magnetic suspension guide rail 12, of each magnetic suspension guide rail 12, and each magnetic suspension guide rail 12 is a stainless steel guide rail having a C-shaped cross-section. A square hole for transmitting laser is provided on the micro-motion stage 2, amounting position 21 is further arranged on the micro-motion stage 2, the mounting position 21 is arranged on the square hole, and the mounting position 21 is used for mounting the mask 3. The micro-motion stage 2 is substantially in a rectangular shape.
Anupper surface of the micro-motion stage 2 is provided with four upper electromagnets 23, the upper electromagnets 23 are distributed in a rectangle, the four upper electromagnets 23 are positioned at four corners of the rectangle, and the upper electromagnets 23 are positioned at the corners of the micro-motion stage 2. A lower surface of the micro-motion stage 2 is provided with four lower electromagnets 24, the lower electromagnets 24 are positioned right below the upper electromagnets 23, the lower electromagnets are in one-to-one correspondence with the upper electromagnets 23 in terms of position, and the lower electromagnets 24 are also positioned at the comers of the micro-motion stage 2.
[34] As shown in FIGs. 2-5, the micro-motion stage 2 is suspended between the two magnetic suspension guide rails 12, and the upper electromagnets 23 and the lower electromagnets 24 are all positioned in the guide rail grooves 121. The magnetic suspension guide rails 12 provide magnetic suspension support in a z-axis direction for the micro-motion stage 2 and a motion guide in a y-axis direction for the micro-motion stage 2. The upper electromagnet 23 and the lower electromagnet 24, which are positioned at the same corner of the micro-motion stage 2 use a differential magnetic suspension manner to support and suspend the micro-motion stage 2. The suspension principle is as follows: it is assumed that an upward magnetic suspension suction force generated by each upper electromagnet 23 is F1, and a downward magnetic suspension suction force generated by each lower electromagnet 24 is F2, [F1[>[F2/, F1 and F2 are in opposite directions, and the following force balance relation is satisfied: 4x(F1+F2)+G=0,
[35] where G is the total gravity of the micro-motion stage 2.
[36] Since the micro-motion stage 2 is suspended on the magnetic suspension guide rails 12, the micro-motion stage 2 has an extremely low friction coefficient when doing high-speed and high-acceleration motion on the magnetic suspension guide rails 12, does not creep, and further has good rigidity and a relatively large bearing capacity.
[37] As shown in FIGs. 1-5, the driving mechanism 11 is connected to the micro- motion stage 2, and the driving mechanism 11 may drive the micro-motion stage 2 to make large-distance macro motion and small-distance micro motion in a y-axis direction, or make small-distance micro motion in an x-axis direction, and z-direction suspension of the micro-motion stage 2 may not be affected. Since the micro-motion stage 2 is magnetically suspend on the magnetic suspension guide rails 12, and the upper electromagnets 23 and the lower electromagnets 24 only play a role of magnetic suspension support in a z-axis direction, degrees of freedom in vertical directions Z, Rx and Ry of the micro-motion stage 2 are not limited. The mask 3 is mounted at the mounting position 21. The control circuit is used for controlling a coil current of each upper electromagnet 23 and a coil current of each lower electromagnet 24, so as to control a magnetic force of each upper electromagnet 23 and a magnetic force of each lower electromagnet 24. The control circuit finely adjusts a differential magnetic suspension force of the upper electromagnets 23 and the lower electromagnets 24, so as to realize position and posture adjustment of degrees of freedom in vertical directions Z,
Rx and Ry of the micro-motion stage 2. The control circuit may be arranged on the micro-motion stage 2 or on the base 1.
[38] As shown in FIGs. 4 and 5, a working process of the present invention is as follows: it is assumed that the four upper electromagnets 23 are arranged in a clockwise direction and are a first upper electromagnet 231, a second upper electromagnet 232, a third upper electromagnet 233 and a fourth upper electromagnet 234 respectively, where the first upper electromagnet 231 and the fourth upper electromagnet 234 are arranged in the same y-axis direction. The four lower electromagnets 24 are a first lower electromagnet 241, a second lower electromagnet 242, a third lower electromagnet 243 and a fourth lower electromagnet 244, where the first lower electromagnet 241 is positioned right below the first upper electromagnet 231, the second lower electromagnet 242 is positioned right below the second upper electromagnet 232, the third lower electromagnet 243 is positioned right below the third upper electromagnet 233, and the fourth lower electromagnet 244 is positioned right below the fourth upper electromagnet 234.
[39] The control circuit adjusts a Z-direction degree of freedom of the micro- motion stage 2 through the following method, which includes: making magnetic forces of all the upper electromagnets 23 the same; making magnetic forces of all the lower electromagnets 24 the same; changing the magnetic forces of all the upper electromagnets 23 and the magnetic forces of all the lower electromagnets 24, so as to change a Z-direction position of the micro-motion stage 2; and readjusting the magnetic forces of all the upper electromagnets 23 and the magnetic forces of all the lower electromagnets 24 when the micro-motion stage 2 reaches a designated Z-direction degree of freedom position, so as to position and suspend the micro-motion stage 2 at the position, thereby realizing Z-direction degree of freedom position adjustment of the micro-motion stage 2.
[40] The control circuit adjusts a Rx-direction degree of freedom of the micro- motion stage 2 through the following method which include: making the magnetic forces of the first upper electromagnet 231, the second upper electromagnet 232, the first lower electromagnet 241 and the second lower electromagnet 242 the same; making the magnetic forces of the third upper electromagnet 233, the fourth upper electromagnet 234, the third lower electromagnet 243 and the fourth lower electromagnet 244 the same; changing the magnetic forces of the first upper electromagnet 231 and the third upper electromagnet 233 to enable the micro-motion stage 2 to slightly rotate around an x-axis, so as to change a Rx-direction degree of freedom position of the micro-motion stage 2; and readjusting the magnetic forces of all the upper electromagnets 23 and the magnetic forces of all the lower electromagnets 24 after the micro-motion stage 2 reaches a designated Rx-direction degree of freedom position, so as to position and suspend the micro-motion stage 2 at the position, thereby realizing Rx-direction degree of freedom position and posture of the micro-motion stage 2.
[41] The control circuit adjusts a Ry-direction degree of freedom of the micro-
motion stage 2 through the following method which include: making the magnetic forces of the first upper electromagnet 23 1, the fourth upper electromagnet 234, the first lower electromagnet 241 and the fourth lower electromagnet 244 the same; making the magnetic forces of the second upper electromagnet 232, the third upper electromagnet 233, the second lower electromagnet 242 and the third lower electromagnet 243 the same; changing the magnetic forces of the first upper electromagnet 231 and the second upper electromagnet 232 to enable the micro-motion stage 2 to slightly rotate around a y-axis, so as to change a Ry-direction degree of freedom position of the micro-motion stage 2; and readjusting the magnetic forces of all the upper electromagnets 23 and the magnetic forces of all the lower electromagnets 24 after the micro-motion stage 2 reaches a designated Ry-direction degree of freedom position, so as to position and suspend the micro-motion stage 2 at the position, thereby realizing Ry-direction degree of freedom position and posture of the micro-motion stage 2.
[42] In summary, according to the magnetic suspension type mask stage of the lithography machine provided in the embodiment of the present invention, by arranging the four upper electromagnets 23 and the four lower electromagnets 24 on the micro- motion stage 2 and by changing the magnetic forces of the upper electromagnets 23 and the magnetic forces of the lower electromagnets 24, Z-direction degree of freedom position and posture, the Rx-direction degree of freedom position and posture and the
Ry-direction degree of freedom position and posture of the micro-motion stage 2 may be adjusted, thereby realizing multi-degree-of-freedom position and posture adjustment of the micro-motion stage 2.
[43] As shown in FIGs. 1-3, the driving mechanism 11 includes a motion control device, the motion control device includes a first linear motor 111, a second linear motor 112 and a third linear motor 113, a mover of the first linear motor 111, a mover of the second linear motor 112 and a mover of the third linear motor 113 are fixed to the micro- motion stage 2, the third linear motor 113 is positioned between the first linear motor 111 and the second linear motor 112, the first linear motor 111 and the second linear motor 112 drive the micro-motion stage 2 to move along a y-axis, and the third linear motor 113 drives the micro-motion stage 2 to move along an x-axis. When the micro- motion stage 2 needs to rotate around a z-axis, by changing a travel of the first linear motor 111 and a travel of the second linear motor 112 and enabling the travel of the first linear motor 111 and a motion direction of the second linear motor 112 are different, motion positions and distances on a left side and a right side of the micro-motion stage 2 are different, and further, the micro-motion stage 2 rotates around the z-axis. The first linear motor 111, the second linear motor 112 and the third linear motor 113 each have a travel of plus or minus 1 mm to 3 mm. In the embodiment, the second linear motor 112 and the third linear motor 113 each have a travel of plus or minus 2 mm, which may enable the micro-motion stage 2 to slightly rotate and may not cause the mover to collide with a stator of the first linear motor 111, and may not cause the mover to collide with a stator of the second linear motor 112. The first linear motor 111, the second linear motor 112 and the third linear motor 113 may provide micro motion in horizontal directions X and Y for the micro-motion stage 2, and magnetic force adjustment of the upper electromagnets 23 and the lower electromagnets 24 are provided in cooperation to provide nanoscale precise motion control of three degrees of freedom in horizontal directions X, Y, and Rz for the micro-motion stage 2, so as to realize multi-degree-of- freedom position and posture precise adjustment of the micro-motion stage 2. The first linear motor 111, the second linear motor 112 and the third linear motor 113 each may bea voice coil motor.
[44] As shown in FIGs. 1-3, the driving mechanism 11 further includes a macro- motion linear motor 114 and a macro-motion stage 115, where a stator of the macro- motion linear motor 114 is fixed on the base 1, a mover of the macro-motion linear motor 114 is fixed with the macro-motion stage 115, the stator of the first linear motor 111, the stator of the second linear motor 112 and a stator of the third linear motor 113 are fixed on the macro-motion stage 115, the macro-motion linear motor 114 may drive the macro- motion stage 115 to make large-travel, high-speed and high-acceleration motion along a y-axis, and the micro-motion stage 2 make large-size macro motion in a y-axis direction along with the macro-motion stage 115 by means of the motion control device. The macro-motion linear motor 114 has a travel of plus or minus 5 mm to 10 mm. In the embodiment, the macro-motion linear motor 114 has a travel of plus or minus 6 mm, which may enable the micro-motion stage 2 to make large-travel motion, where the macro-motion linear motor 114 is an ironless linear motor. In the present invention, a two-stage motion drive manner of the macro-motion linear motor 114 and the motion control device is used, the micro-motion stage 2 may make large-travel, high-speed and high-acceleration precise motion, and multi-degree-of-freedom fine adjustment of the micro-motion stage 2 may be realized. The magnetic suspension type mask stage of the lithography machine of the present invention is suitable for being used in ten thousand- level or hundred thousand-level clean rooms, and may be applied to the field of multi- degree-of-freedom position and posture adjustment of the micro-motion stage 2.
[45] As shown in FIGs. 1-6, the mounting position 21 is provided with vacuum suckers 22 for sucking the mask 3, the micro-motion stage 2 is internally provided with ventilation pipelines 25, the ventilation pipelines 25 are in communication with the vacuum suckers 22, and the ventilation pipelines 25 may be externally connected to an air pump. After the mask 3 is placed on the vacuum suckers 22, the air in the ventilation pipelines 25 and the vacuum suckers 22 may be pumped to form negative pressure by means of the air pump, the mask 3 is sucked on the vacuum suckers 22 by means of vacuum air negative pressure, air pressure in each ventilation pipeline is minus 0.04 MPa to 0.08 MPa, and the air pressure is surface air pressure. The vacuum suckers 22 include convex blocks 221 and ventilation holes 222, the convex blocks 221 are positioned on the upper surface of the micro-motion stage 2, grooves 223 are concavely provided on the convex blocks 221, the ventilation holes 222 are positioned on bottom surfaces of the grooves 223, and the ventilation holes 222 are in communication with the ventilation pipelines 25. After the mask 3 is placed on the convex blocks 221, air is pumped by means of an air pump, and by means of an air negative air pressure environment of the ventilation holes 222 in the grooves 223 and the ventilation pipes 25, the grooves 223 may firmly suck and fix the mask 3. The convex blocks 221 may lift up the mask 3 to avoid scratch between the mask 3 and the micro-motion stage 2, and the grooves 223 may increase contact area between the vacuum negative air pressure environment and the mask 3, so as to ensure the convex blocks 221 to firmly suck and fix the mask 3.
Each ventilation hole has a diameter of 1 mm to 3 mm, each convex block is in a long strip shape, and each convex block has a length of 50 mm to 54 mm, a width of 4 mm to 6 mm and a height of 12 mm to 17 mm. In the embodiment, each ventilation hole 222 has a diameter of 1 mm, each convex block 221 is in a long strip shape, each convex block 221 has a length of 52 mm, a width of 5 mm and a height of 15 mm, the convex block 221 having this size does not occupy too much space of the micro-motion stage 2, and may effectively support the mask 3, such that the situation that the mask 3 deforms due to pressure increase caused by over small contact area between the vacuum suckers 22 and the mask 3 is avoided.
[46] As shown in FIGs. 1-3, four vacuum suckers 22 are arranged, the four vacuum suckers 22 are distributed in a rectangle, top ends of the four vacuum suckers 22 have the same horizontal height, and the vacuum suckers 22 are positioned at the corners of the mask 3. The corners of the mask 3 are fixed by means of the vacuum suckers 22 such that the mask 3 may be firmly fixed on the vacuum suckers 22. The vacuum suckers 22 carry and protect the mask 3 in a vacuum pressure pre-tightening manner, so as to fix the mask in a mounting position firmly, such that the mask 3 can be fixed and positioned on the vacuum suckers 22, and it is ensured that the mask 3 may make high-speed and high-acceleration motion along with the micro-motion stage 2. The mask 3 is made of microcrystalline glass, which is a fragile material. Since the mask 3 has a thin thickness, the mask 3 is extremely fragile and may not bear an excessive external contact force in a fixing and clamping process. According to the present invention, by means of the vacuum suckers 2 arranged at the four corners of the mask 3 and a vacuum pressure pre- tightening manner, the mask 3 is positioned and clamped. The vacuum suckers 22 ensures the mask 3 to stably make high-speed and high-acceleration motion along with the micro-motion stage 2, and moreover, the mask 3 is arranged in a vacuum pressure pre-tightening manner without mechanical connection, such that the problem that the mask 3 is damaged due to excessive pre-tightening stress applied to an edge of the mask
3 by means of a screw or pressing plate clamping mounting manner commonly used in traditional mechanical clamping is avoided, and it is ensured that position deviation, shake and fracture deformation of the mask 3 due to high-speed and high acceleration motion of the micro-motion stage 2 do not occur.
[47] As shown in FIGs. 6 and 7, each ventilation pipeline 25 includes four first air channels 251, two second air channels 252 and one third air channel 253. Each first air channel 251 is in communication with one vacuum sucker 22, each first air channel 251 extends along a y-axis, two first air channels 251 are in communication with each other by means of one second air channel 252, and the other two first air channels 251 are in communication with each other by means of the other second air channel 252. Each second air channel 252 extends along a x-axis, and the two second air channels 252 are in communication with each other by means of the third air channel 253. Each third air channel 253 extends along a y-axis. The micro-motion stage 2 is provided with an air extraction port 26, and one first air channel 251 is in communication with the air extraction port 26. By means of this design, it is ensured that air negative pressure of all the ventilation pipelines 25 is kept the same, air negative pressure of the vacuum suckers 22 1s also the same as that of the ventilation pipeline 25, and only one air pump is needed to be connected to the air extraction port 26 to enable four vacuum suckers 22 to simultaneously suck the mask 3.
[48] What is mentioned above is only the preferred implementations of the present invention, it should be pointed out that a person of ordinary skill in art may also make several improvements and modifications without departing from the technical principle of the present invention, and these improvements and modifications should also fall within the scope of protection of the present invention.

Claims (10)

Conclusies l. Maskerplatform van het magnetische ophangingstype van een lithografiemachine, die het volgende omvat: een basis, waarbij een bovenoppervlak van de basis voorzien is van een aandrijfmechanisme en een paar magnetische ophanggeleidingsrails, waarbij elke magnetische ophanggeleidingsrail een lange strookvorm heeft, de twee magnetische ophanggeleidingsrails evenwijdig aan elkaar zijn, en een geleidingsrailgroef voorzien is aan een kant tegenover de andere magnetische ophanggeleidingsrails van elke magnetische ophanggeleidingsrail; een microbewegingsplatform, waarbij het microbewegingsplatform voorzien is van een montagepositie, een bovenoppervlak van het microbewegingsplatform voorzien is van vier bovenste elektromagneten, waarbij de bovenste elektromagneten verdeeld zijn in een rechthoek, een onderoppervlak van het microbewegingsplatform voorzien is van vier onderste elektromagneten, de onderste elektromagneten direct onder de bovenste elektromagneten gepositioneerd zijn, de onderste elektromagneten in één-op-één overeenkomst zijn met de bovenste elektromagneten qua positie, het microbewegingsplatform tussen de twee magnetische ophanggeleidingsrails hangt, de bovenste elektromagneten en de onderste elektromagneten allemaal in de geleidingsrailgroeven gepositioneerd zijn en het aandrijfmechanisme het microbewegingsplatform aandrijft om te bewegen; een masker, waarbij het masker op de montagepositie gemonteerd is; en een regelcircuit, waarbij het regelcircuit gebruikt is voor het regelen van een magnetische kracht van elke bovenste elektromagneet en een magnetische kracht van elke onderste elektromagneet, om zo een differentiële magnetische ophangkracht tussen de bovenste elektromagneten en de onderste elektromagneten te veranderen.Conclusions l. Magnetic suspension type mask platform of a lithography machine, which includes: a base, in which an upper surface of the base is provided with a driving mechanism, and a pair of magnetic suspension guide rails, each magnetic suspension guide rail having a long strip shape, the two magnetic suspension guide rails parallel to each other and a guide rail groove is provided on a side opposite to the other magnetic suspension guide rails of each magnetic suspension guide rail; a micro-motion platform, the micro-motion platform being provided with a mounting position, an upper surface of the micro-motion platform being provided with four upper electromagnets, the upper electromagnets being divided into a rectangle, a lower surface of the micro-moving platform being provided with four lower electromagnets, the lower electromagnets directly are positioned below the top electromagnets, the bottom electromagnets are in one-to-one correspondence with the top electromagnets in position, the micromotion platform is suspended between the two suspension magnetic guide rails, the top electromagnets and bottom electromagnets are all positioned in the guide rail grooves, and the drive mechanism drives the micro motion platform to move; a mask, the mask being mounted at the mounting position; and a control circuit, the control circuit being used to control a magnetic force of each upper electromagnet and a magnetic force of each lower electromagnet, so as to change a differential magnetic suspension force between the upper electromagnets and the lower electromagnets. 2. Maskerplatform van het magnetische ophangingstype van een lithogratiemachine volgens conclusie 1, waarbij het aandrijfmechanisme een bewegingsbesturingsinrichting omvat, de bewegingsbesturingsinrichting een eerste lineaire motor, een tweede lineaire motor en een derde lineaire motor omvat, waarbij de derde lineaire motor gepositioneerd is tussen de eerste lineaire motor en de tweede lineaire motor, de eerste lineaire motor en de tweede lineaire motor de microbewegingsplatform aandrijven om langs een y-as te bewegen, en de derde lineaire motor het microbewegingsplatform aandrijft om langs een x-as te bewegen.The magnetic suspension type mask stage of a lithography machine according to claim 1, wherein the drive mechanism comprises a motion controller, the motion controller comprises a first linear motor, a second linear motor and a third linear motor, the third linear motor being positioned between the first linear motor motor and the second linear motor, the first linear motor and the second linear motor drive the micromotion stage to move along a y-axis, and the third linear motor drives the micromotion stage to move along an x-axis. 3. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 2, waarbij de eerste lineaire motor, de tweede lineaire motor en de derde lineaire motor elk een slag hebben van plus of min 1 mm -3 mm.The magnetic suspension type mask stage of a lithography machine according to claim 2, wherein the first linear motor, the second linear motor and the third linear motor each have a stroke of plus or minus 1 mm - 3 mm. 4. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 2, waarbij het aandrijfmechanisme verder een lineaire macrobewegingsmotor en een macrobewegingsplatform omvat, een stator van de lineaire macrobewegingsmotor bevestigd is op de basis, een verhuizer van de lineaire macrobewegingsmotor bevestigd is met het macrobewegingsplatform, het bewegingsbesturingsapparaat bevestigd is op het macrobewegingsplatform en de lineaire macrobewegingsmotor het macrobewegingsplatform aandrijft om langs een y- as te bewegen.The magnetic suspension type mask stage of a lithography machine according to claim 2, wherein the drive mechanism further comprises a linear macro-motion motor and a macro-motion platform, a stator of the linear macro-motion motor is mounted on the base, a mover of the linear macro-motion motor is mounted with the macro-motion platform, the motion control device is mounted on the macro motion platform and the linear macro motion motor drives the macro motion platform to move along a y-axis. 5. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 4, waarbij de lineaire macrobewegingsmotor een slag heeft van plus of min 5 mm -10 mm.The magnetic suspension type mask stage of a lithography machine according to claim 4, wherein the linear macro-motion motor has a stroke of plus or minus 5mm-10mm. 6. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 1, waarbij de montagepositie voorzien is van vacuümzuigers voor het aanzuigen van het masker, de microbewegingsfase intern voorzien is van ventilatiepijpleidingen, de ventilatiepijpleidingen in verbinding staan met de vacuümzuigers en de luchtdruk in elke ventilatiepijpleiding min 0,04 MPa - 0,08 MPa is.The magnetic suspension type mask platform of a lithography machine according to claim 1, wherein the mounting position is provided with vacuum pistons for sucking the mask, the micro-motion stage is internally provided with ventilation pipelines, the ventilation pipelines are in communication with the vacuum pistons, and the air pressure in each ventilation pipeline min is 0.04 MPa - 0.08 MPa. 7. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 6, waarbij de vacuümzuigers convexe blokken en ventilatiegaten omvatten, de convexe blokken gepositioneerd zijn op het bovenoppervlak van het microbewegingsplatform, groeven concaaf voorzien zijn op de convexe blokken, de ventilatiegaten gepositioneerd zijn op de bodemoppervlakken van de groeven en de ventilatiegaten in verbinding staan met de ventilatiepijpleidingen.The magnetic suspension type mask platform of a lithography machine according to claim 6, wherein the vacuum pistons include convex blocks and vent holes, the convex blocks are positioned on the top surface of the micromotion stage, grooves are concavely provided on the convex blocks, the vent holes are positioned on the bottom surfaces of the grooves and the ventilation holes communicate with the ventilation pipelines. 8. Maskerplatform van het magnetische ophangingstype van een lithogratiemachine volgens conclusie 7, waarbij elk ventilatiegat een diameter heeft van 1 mm - 3 mm, elk convex blok een lange strookvorm heeft en elk convex blok een lengte heeft van 50 mm - 54 mm, een breedte van 4 mm - 6 mm en een hoogte van 12 mm - 17 mm.The magnetic suspension type mask platform of a lithography machine according to claim 7, wherein each vent hole has a diameter of 1mm - 3mm, each convex block has a long stripe shape, and each convex block has a length of 50mm - 54mm, a width from 4 mm - 6 mm and a height of 12 mm - 17 mm. 9. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 6, waarbij vier vacuümzuigers gerangschikt zijn, de vier vacuümzuigers verdeeld zijn in een rechthoek en de vacuümzuigers gepositioneerd zijn op de hoeken van het masker.The magnetic suspension type mask stage of a lithography machine according to claim 6, wherein four vacuum pistons are arranged, the four vacuum pistons are divided into a rectangle, and the vacuum pistons are positioned at the corners of the mask. 10. Maskerplatform van het magnetische ophangingstype van een lithografiemachine volgens conclusie 9, waarbij elke ventilatiepijpleiding vier eerste luchtkanalen, twee tweede luchtkanalen en één derde luchtkanaal omvat, waarbij elk eerste luchtkanaal in verbinding staat met één vacuümzuiger, twee eerste luchtkanalen met elkaar in verbinding staan door middel van een tweede luchtkanaal, de andere twee eerste luchtkanalen met elkaar in verbinding staan door middel van het andere tweede luchtkanaal, de twee tweede luchtkanalen met elkaar in verbinding staan door middel van het derde luchtkanaal, de microbewegingstrap voorzien is van een luchtafvoerpoort en een eerste luchtkanaal in verbinding staat met de luchtafvoerpoort.The magnetic suspension type mask platform of a lithography machine according to claim 9, wherein each ventilation pipeline includes four first air ducts, two second air ducts and one third air duct, each first air duct communicating with one vacuum piston, two first air ducts communicating with each other by by means of a second air channel, the other two first air channels communicate with each other by means of the other second air channel, the two second air channels communicate with each other by means of the third air channel, the micromovement stage is provided with an air exhaust port and a first air duct is connected to the air exhaust port.
NL2031640A 2021-09-22 2022-04-20 Magnetic suspension type mask stage of lithography machine NL2031640B1 (en)

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