CN103186058A - Mask platform system with six-degree-of-freedom coarse drive platform - Google Patents
Mask platform system with six-degree-of-freedom coarse drive platform Download PDFInfo
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- CN103186058A CN103186058A CN2013100487785A CN201310048778A CN103186058A CN 103186058 A CN103186058 A CN 103186058A CN 2013100487785 A CN2013100487785 A CN 2013100487785A CN 201310048778 A CN201310048778 A CN 201310048778A CN 103186058 A CN103186058 A CN 103186058A
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Abstract
A mask platform system with a six-degree-of-freedom coarse drive platform is mainly used in a photoetching system. The system comprises the coarse drive platform, a fine drive platform and a rack, wherein the coarse drive platform comprises a coarse drive platform body, a drive device and a coarse drive platform gravity balance component, the coarse drive platform body is arranged at the outer part of the fine drive platform to surround the fine drive platform in the middle, and the drive device comprises two groups of X-direction linear motors distributed symmetrically around the direction of an X-axis and four groups of two-degree-of-freedom linear motors driving a Y-direction and a Z-direction to achieve the six-degree-of-freedom motion of the coarse drive platform. The six-degree-of-freedom coarse drive platform and the six-degree-of-freedom fine drive platform are matched, so that the speed, acceleration and control bandwidth of a mask platform are increased and the requirements of high motion precision and location precision are met while the posture of the mask platform is regulated, and furthermore, the production rate, the alignment precision and the resolution ratio of a photoetching machine are improved.
Description
Technical field
The present invention relates to the mask aligner mask platform system, this system is mainly used in the semiconductor lithography machine, belongs to semiconductor and makes the equipment technology field.
Background technology
In the production run of integrated circuit (IC) chip, the exposure transfer printing (photoetching) of the design configuration of chip on the silicon chip surface photoresist is one of most important operation wherein, and the used equipment of this operation is called litho machine (exposure machine).The resolution of litho machine and exposure efficiency affect characteristic line breadth (resolution) and the throughput rate of integrated circuit (IC) chip greatly.And as kinematic accuracy and the work efficiency of the mask platform system of litho machine critical system, determined resolution and the exposure efficiency of litho machine again to a great extent.
The advanced scanning projecting photoetching machine ultimate principle is: from the deep UV (ultraviolet light) of light source see through mask on the mask platform, lens combination with a part of pattern imaging on the mask on certain Chip of silicon chip.For carrying out the exposure of a chip on the silicon chip, mask platform and silicon chip platform need carry out accelerated motion respectively, and reach the speed of the desired 4:1 of scan exposure when moving to the exposure reference position simultaneously.After this, the silicon chip platform moves to the scanning motion direction with uniform speed, mask platform with the speed that is four times in silicon chip platform sweep velocity to doing scanning motion with the opposite direction of silicon chip platform scanning motion, it is split hair synchronous that both motions require to reach, and the whole pattern imagings on the mask are on the certain chip (Chip) of silicon chip the most at last.Behind a chip end of scan, mask platform and silicon chip platform carry out retarded motion respectively, and the silicon chip platform carries out step motion simultaneously, and the chip that the next one will be exposed moves to the projection objective below.After this, mask platform is accelerated, scans, is slowed down to the direction opposite with last scan direction of motion, and the silicon chip platform then according to direction acceleration, scanning, the deceleration of planning, is finished the exposure of a chip in the synchronous scanning process.So constantly repeat, mask platform comes and goes the rectilinear motion that accelerates, scans, slows down, and the silicon chip platform carries out stepping and scanning motion according to the track of planning, finishes the exposure of whole silicon wafer.
According to the motion requirement to mask platform, mask platform mainly provides the function that round ultraprecise high-speed straight-line moves along the direction of scanning.Its stroke should satisfy 4 times of chip length and add the distance of acceleration and deceleration; Its sweep velocity should be 4 times of silicon chip platform sweep velocity, and high acceleration also can be higher than the high acceleration of silicon chip platform accordingly.According to the technical indicator of external typical litho machine commodity, the type that the stroke of mask platform surpasses 100mm(to be had reaches 200mm), sweep velocity reaches 1000mm/s, and high acceleration reaches 20m/s
2, i.e. 2g.Improve sweep velocity and the acceleration (the silicon chip platform also improves synchronously) of mask platform, can effectively improve the throughput rate of litho machine.
Of paramount importancely be that mask platform must be able to realize and being synchronized with the movement of the superhigh precision of silicon chip platform scanning motion that for the 45nm litho machine, its synchronization accuracy requires MA(moving average deviation) less than 2.25nm, MSD(moves standard deviation) less than 5.4nm.Wherein, MA mainly influences the alignment precision of exposure, and MSD mainly influences exposure resolution ratio.
In order to satisfy the big stroke of mask platform and high speed, high-precision harsh requirement, traditional mask platform system adopts the drives structure of thick-smart fold layer usually.The mask platform system is made up of coarse motion platform and the moving platform of stack essence thereon.Wherein, the coarse motion platform adopts the two-sided driving system of the high speed and large stroke of left linear electric motors and right linear electric motors composition to drive the air-float guide rail supporting; Smart moving platform is then driven by the voice coil motor of directions X and the voice coil motor of Y-direction, and mask platform is carried out the fine setting of real-time high-precision, satisfies the requirement of its kinematic accuracy.This lamination drives structure is when motion, and the bilateral drives structure of the reciprocating bottom linear electric motors of single-degree-of-freedom adopts the air-float guide rail supporting, complex structure, assembly precision requires high, thereby has limited the kinematic accuracy of mask platform, has hindered the raising of its acceleration.
Summary of the invention
In order to improve the acceleration of mask aligner mask platform, speed and bearing accuracy, and then the raising of throughput rate, alignment precision and the resolution of promotion litho machine, reduce the assembly precision requirement, the purpose of this invention is to provide a kind of mask stage system with six degree of freedom coarse motion platform.
Technical scheme of the present invention is as follows:
A kind of mask stage system with six degree of freedom coarse motion platform, this system comprises smart moving platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body and drive unit, it is characterized in that: described coarse motion platform stage body is arranged on the outside of smart moving platform, in the middle of the moving platform of essence is enclosed in; Described drive unit comprises big stroke driver module and little stroke driver module two parts, big stroke driver module is made up of two groups of directions X linear electric motors that are arranged symmetrically in coarse motion platform stage body both sides about X-direction, little stroke driver module is made up of four groups of two-freedom linear electric motors that drive Y-direction and Z direction simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body both sides about X-direction in twos, and are positioned at big stroke driver module below;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, described two coarse motion platform gravitational equilibrium arrangement of components are above coarse motion platform stage body, be arranged symmetrically in coarse motion platform stage body both sides along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board and two coarse motion platform gravitational equilibrium permanent magnets, the permanent magnet array of coarse motion platform gravitational equilibrium magnetic conductive board and directions X linear electric motors links together, coarse motion platform gravitational equilibrium permanent magnet is arranged in coarse motion platform stage body upper surface, about the Y direction symmetric arrangement, and leave the gap with coarse motion platform gravitational equilibrium magnetic conductive board along the side of X-direction.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention is characterized in that: described each directions X linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and share one group of permanent magnet array along two two-freedom linear electric motors of directions X homonymy; Two groups of permanent magnet arrays of directions X linear electric motors and four groups of permanent magnet arrays of two-freedom linear electric motors all are fixed on the surface level on the frame; Two groups of coil arrays of directions X linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on the coarse motion platform stage body respectively.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention is characterized in that: the moving platform of described essence comprises smart moving platform stage body, Lorentz motor and smart moving platform gravity compensation assembly; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in smart moving platform stage body along the two sides of Y direction, wherein, the driving direction of first kind of Lorentz motor is along X-direction, about the X-axis symmetric arrangement, at least two of every sides drive smart moving platform stage body and move along directions X with around Z axle sense of rotation; The driving direction of second kind of Lorentz motor is along Y direction and by smart moving platform barycenter, every side at least one, drive smart moving platform stage body and move along Y-direction; On four angles that are positioned at smart moving platform stage body of the third Lorentz motor, simultaneously about the X-axis symmetric arrangement, two of every sides, its driving direction is along Z-direction, drives smart moving platform stage body along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention, it is characterized in that: the moving platform gravity compensation assembly of described essence comprises the moving platform gravity compensation unit of four essences, each smart moving platform gravity compensation unit is made up of the moving platform gravitational equilibrium magnetic conductive board of an essence and the moving platform gravitational equilibrium permanent magnet of essence, the moving platform gravity compensation unit of described four essences is distributed in respectively on four angles of smart moving platform stage body, and wherein four moving platform gravitational equilibrium magnetic conductive boards of essence are separately fixed on the coarse motion platform stage body; Four moving platform gravitational equilibrium permanent magnets of essence are separately fixed on the smart moving platform stage body, and corresponding with the position of the moving platform gravitational equilibrium magnetic conductive board of essence, leave the gap simultaneously and between the moving platform gravitational equilibrium magnetic conductive board of essence.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention is characterized in that: described coarse motion platform stage body is thin-wall case, is made by thyrite.The moving platform stage body of described essence is thin-wall case, is made by thyrite.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention is characterized in that: the one-dimensional array that the coil array of the coil array of described two groups of directions X linear electric motors and four groups of two-freedom linear electric motors all is made up of no iron core square coil; The permanent magnet array of described two groups of directions X linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
A kind of mask stage system with six degree of freedom coarse motion platform of the present invention has the following advantages and the high-lighting effect: 1. compare with the traditional masks platform that adopts the air-float guide rail supporting, mask platform of the present invention adopts magnetic suspension bearing, simplified system architecture, vibration and the noise of having avoided air supporting to introduce, and can satisfy the required condition of high vacuum degree environment of extreme ultraviolet photolithographic, and the attractive force balance of magnetic levitation system mask platform and appendicular most gravity thereof.2. compare with the bilateral driving junction structure of traditional single-degree-of-freedom coarse motion platform, the structure of six degree of freedom coarse motion platform of the present invention, increased the flexibility of mover in the system, the matching requirements of system had both been reduced, also improve response speed, acceleration and the motion positions precision of mask platform, thereby improved throughput rate, alignment precision and the resolution of litho machine.
Scheme attached explanation
Fig. 1 is a kind of structural representation with mask stage system of six degree of freedom coarse motion platform of the present invention.
Fig. 2 is the structural representation of coarse motion platform gravitational equilibrium assembly of the present invention and smart moving platform gravitational equilibrium assembly.
Fig. 3 is the structural representation after a kind of mask stage system directions X linear electric motors with six degree of freedom coarse motion platform of the present invention remove first permanent magnet array.
Fig. 4 is the structural representation after a kind of coil with mask stage system two-freedom linear electric motors of six degree of freedom coarse motion platform of the present invention removes a side the 3rd permanent magnet array.
Fig. 5 is a kind of schematic three dimensional views with the iron-less core coil that adopts in the mask stage system of six degree of freedom coarse motion platform of the present invention.
Fig. 6 is the synoptic diagram of directions X line motor permanent magnet array magnetizing direction in a kind of mask stage system with six degree of freedom coarse motion platform of the present invention.
Fig. 7 is the synoptic diagram of two-freedom line motor permanent magnet array magnetizing direction in a kind of mask stage system with six degree of freedom coarse motion platform of the present invention.
Among the figure: 1-smart moving platform stage body; 2-coarse motion platform stage body; 3-the first directions X linear electric motors; 4-the second directions X linear electric motors; 5-the first two-freedom linear electric motors; 6-the second two-freedom linear electric motors; 7-the three two-freedom linear electric motors; 8-the four two-freedom linear electric motors; 11-coarse motion platform gravitational equilibrium magnetic conductive board; 12-coarse motion platform gravitational equilibrium permanent magnet; 13-first coil array; 14-second largest coil array; 15-the first small coil array; 16-the second small coil array; 17-the three small coil array; 18-the four small coil array; 21-the first permanent magnet array; 22-the second permanent magnet array; 23-the three permanent magnet array; 31-smart moving platform gravitational equilibrium magnetic conductive board; 32-smart moving platform gravitational equilibrium permanent magnet.
Embodiment
Below in conjunction with accompanying drawing concrete structure of the present invention, mechanism and the course of work are further described.
A kind of mask stage system with six degree of freedom coarse motion platform provided by the invention, as depicted in figs. 1 and 2, this system comprises coarse motion platform, smart moving platform and frame, the coarse motion platform contains a coarse motion platform stage body 2, drive unit and two coarse motion platform gravitational equilibrium assemblies; Coarse motion platform stage body 2 is enclosed within the outside of smart moving platform, is thin-wall case, is made by the thyrite sintering; Described drive unit comprises big stroke driver module and little stroke driver module two parts.Big stroke driver module is made up of the two groups of first directions X linear electric motors 3 and second directions X linear electric motors 4 that are arranged symmetrically in coarse motion platform stage body 2 both sides about directions X, is responsible for driving mask platform coarse motion platform and does big stroke linear reciprocating motion at directions X; Little stroke driver module then is the first two-freedom linear electric motors 5 that drive Y-direction and Z direction simultaneously by four groups, the second two-freedom linear electric motors 6, the 3rd two-freedom linear electric motors 7 and the 4th two-freedom linear electric motors 8 are formed, these four groups of two-freedom linear electric motors are to be arranged symmetrically in coarse motion platform stage body 2 both sides in twos about directions X, and be positioned at below the big stroke driver module, described four groups of two-freedom linear electric motors are responsible for regulating mask platform coarse motion platform in the little travel displacement of Y-axis and Z-direction, and around X-axis, the rotation among a small circle of the anglec of rotation of the three degree of freedom that Y-axis and Z axle rotate; Employing can make the directions X linear electric motors that the thrust of directions X only is provided based on the control algolithm that d-q decomposes, and the thrust of Y and Z direction is close to zero; Y and Z direction linear electric motors only produce the thrust of Y-direction and Z direction, and the thrust of directions X is close to zero.
Described two coarse motion platform gravitational equilibrium assemblies are arranged symmetrically in coarse motion platform stage body both sides about X-direction, and each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board 11 and two coarse motion platform gravitational equilibrium permanent magnets 12.Each coarse motion platform gravitational equilibrium magnetic conductive board 11 links together with the stationary part of the directions X linear electric motors of the same side, two coarse motion platform gravitational equilibrium permanent magnets 12 are installed in coarse motion platform stage body 2 respectively along on two angles of side of X-direction, and keep certain clearance with coarse motion platform gravitational equilibrium magnetic conductive board 11;
Each directions X linear electric motors is formed by first permanent magnet array 21, second permanent magnet array 22 and one group big coil array; Each two-freedom linear electric motors is made up of the 3rd permanent magnet array 23 and one group of small coil array, and shares one group of the 3rd permanent magnet array 23 along two two-freedom linear electric motors of directions X homonymy; The 3rd permanent magnet array 23 of described all directions X linear electric motors first permanent magnet arrays 21 and second permanent magnet array 22 and all two-freedom linear electric motors all is fixed on the surface level on the litho machine frame; Described all big coil arrays and small coil array are separately fixed on the coarse motion platform stage body 2;
The one-dimensional array that the big coil array of the directions X linear electric motors of coarse motion of the present invention and the small coil array of two-freedom linear electric motors all are made up of the no iron core square coil (as shown in Figure 5) that adopts the concentric coiling of copper cash, the support of coil adopt nonferromagnetic parts (as aluminium alloy) to make;
First permanent magnet array 21 of the directions X linear electric motors of coarse motion of the present invention and second permanent magnet array 22 are bonding one group of one dimension halbach type permanent magnet arrays that adopt the rectangular parallelepiped rare-earth permanent magnet to arrange and form on the square thin yoke of a block length, the volume of the magnetizing direction permanent magnet parallel with array direction less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 6 in first permanent magnet array 21 and second permanent magnet array 22, " N " among the figure, the N utmost point and the S utmost point of " S " expression permanent magnet, the magnetizing direction of permanent magnet is perpendicular to paper at this moment.The 3rd permanent magnet array 23 of described two-freedom linear electric motors also is bonding one group of plane halbach type permanent magnet array that adopts the rectangular parallelepiped rare-earth permanent magnet to arrange and form on the square thin yoke of a block length, and the volume of the magnetizing direction permanent magnet parallel with array direction is also less than the magnetizing direction permanent magnet vertical with array direction (as shown in Figure 7) in the 3rd permanent magnet array 23.
Smart moving platform is six-freedom micro displacement worktable, comprises smart moving platform stage body 1, Lorentz motor and smart moving platform gravity compensation assembly; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in smart moving platform stage body 1 along the two sides of Y direction, wherein, the driving direction of first kind of Lorentz motor is along X-direction, about the X-axis symmetric arrangement, at least two of every sides drive smart moving platform stage body 1 and move along directions X with around Z axle sense of rotation; The driving direction of second kind of Lorentz motor is along Y direction and by smart moving platform barycenter, every side at least one, drive smart moving platform stage body 1 and move along Y-direction; On four angles that are positioned at smart moving platform stage body of the third Lorentz motor, simultaneously about the X-axis symmetric arrangement, two of every sides, its driving direction is along Z-direction, drives smart moving platform stage body along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation;
Smart moving platform gravity compensation assembly comprises four groups of smart moving platform gravity compensation unit, each smart moving platform gravity compensation unit is made up of the moving platform gravitational equilibrium magnetic conductive board 31 of an essence and the moving platform gravitational equilibrium permanent magnet 32 of essence, described four groups of smart moving platform gravity compensation cell distribution are on four angles of the moving platform stage body 1 of essence, wherein all moving platform gravitational equilibrium magnetic conductive boards 31 of essence are fixed on the coarse motion platform stage body 2, the moving platform gravitational equilibrium permanent magnet 32 of all essences is fixed on the position of each corresponding on the smart moving platform stage body 1 smart moving platform gravitational equilibrium magnetic conductive board 31, and has certain clearance with the moving platform gravitational equilibrium magnetic conductive board of essence, smart moving platform stage body 1 is thin-wall case, is made by thyrite;
A kind of mask stage of the present invention system is the unloading phase that its working stage being divided into, normal work stage and stop phase, three phases altogether.The unloading phase principle of work as follows: before system's electrifying startup, the attractive force of gravity balance device is less than the gravity of mask stage coarse motion platform and smart moving platform, and mask stage stops at a little more than on the fixedly station on the litho machine frame of second permanent magnet array, 22 upper surfaces.Behind system's electrifying startup, four thrusts that the two-freedom linear electric motors provide the Z direction to make progress, promote coarse motion platform mover and partly move upward to the working position, in the mask stage course of work, regulate coarse motion platform mover part then on the one hand along the position of Z-direction, and around the rotation of X-direction with around the attitude of these two degree of freedom of rotation of Y-direction, cooperating gravity balance device balance coarse motion platform mover part on the other hand also is mask stage and appendicular gravity thereof, makes coarse motion platform mover part and smart moving platform be in suspended state all the time.Meanwhile, four two-freedom linear electric motors provide the thrust of Y-direction, adjust coarse motion platform mover part and smart moving platform along the translation of Y-axis with around the attitude of two degree of freedom of rotation of Z axle, make coarse motion platform mover part and smart moving Delta to the desired position of work and attitude, and in entire work process, regulate aforementioned five degree of freedom in real time, satisfy system to the positioning requirements of these five degree of freedom.Then, two directions X linear electric motors adopt bilateral type of drive, driving coarse motion platform mover part also is that coarse motion platform mover part and smart moving platform carry out acceleration, deceleration and at the uniform velocity to-and-fro movement along directions X, reaches the operating rate of system requirements, the work the unloading phase of finishing.
After this, system enters normal work stage, drive unit is finely tuned speed and the attitude of coarse motion platform mover part and smart moving platform in directions X linear electric motors perform region, satisfies system to its speed and the requirement of position, simultaneously the energy dissipation of bucking-out system.When coarse motion platform mover part and smart moving platform move to+latter end of directions X stroke, directions X linear electric motors deceleration work is to stopping, oppositely accelerate again then, make coarse motion platform mover part and smart moving platform move to the latter end of the trip to-directions X, directions X linear electric motors deceleration work is to stopping circulation and so forth.
At stop phase, when coarse motion platform mover part and the static station of smart moving platform low-speed motion top, all drive units cooperate to slow down and are parked on the static station then.
Mask stage of the present invention system adopts magnetic suspension bearing, does not need air-flotation system, has simplified system architecture, vibration and the noise of having avoided air supporting to introduce, and can satisfy the required condition of high vacuum degree environment of extreme ultraviolet photolithographic.
On the other hand, compare with traditional thick smart fold layer structure, mask stage of the present invention system provides a kind of coarse motion platform structure with six-freedom motion function, both guarantee the thrust of scanning motion and improved kinematic accuracy, the high precision matching requirements of coarse motion platform have been reduced again, under the condition that does not change kinematic accuracy, simplified the accuracy requirement of parts design and manufacturing greatly, improved throughput rate, alignment precision and the resolution of litho machine.
Claims (7)
1. mask stage system with six degree of freedom coarse motion platform, this system comprises smart moving platform, coarse motion platform and frame, described coarse motion platform contains a coarse motion platform stage body (2) and drive unit, it is characterized in that: described coarse motion platform stage body (2) is arranged on the outside of smart moving platform, in the middle of the moving platform of essence is enclosed in; Described drive unit comprises big stroke driver module and little stroke driver module two parts, big stroke driver module is made up of two groups of directions X linear electric motors that are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction, little stroke driver module is made up of four groups of two-freedom linear electric motors that drive Y-direction and Z direction simultaneously, four groups of two-freedom linear electric motors are arranged symmetrically in coarse motion platform stage body (2) both sides about X-direction in twos, and are positioned at big stroke driver module below;
Described coarse motion platform also comprises two coarse motion platform gravitational equilibrium assemblies, described two coarse motion platform gravitational equilibrium arrangement of components are in coarse motion platform stage body (2) top, be arranged symmetrically in coarse motion platform stage body (2) both sides along X-direction, each coarse motion platform gravitational equilibrium assembly comprises a coarse motion platform gravitational equilibrium magnetic conductive board (11) and two coarse motion platform gravitational equilibrium permanent magnets (12), coarse motion platform gravitational equilibrium magnetic conductive board (11) links together with the permanent magnet array of directions X linear electric motors, coarse motion platform gravitational equilibrium permanent magnet (12) is arranged in coarse motion platform stage body (2) upper surface, about the Y direction symmetric arrangement, and leave the gap with coarse motion platform gravitational equilibrium magnetic conductive board (11) along the side of X-direction.
2. according to the described a kind of mask stage system with six degree of freedom coarse motion platform of claim 1, it is characterized in that: described each directions X linear electric motors are made up of two groups of permanent magnet arrays and one group of coil array; Described each two-freedom linear electric motors are made up of one group of permanent magnet array and one group of coil array, and share one group of permanent magnet array along two two-freedom linear electric motors of directions X homonymy; Two groups of permanent magnet arrays of directions X linear electric motors and four groups of permanent magnet arrays of two-freedom linear electric motors all are fixed on the surface level on the frame; Two groups of coil arrays of directions X linear electric motors and four groups of coil arrays of two-freedom linear electric motors are fixed on the coarse motion platform stage body (2) respectively.
3. according to claim 1 or 2 described a kind of mask stage systems with six degree of freedom coarse motion platform, it is characterized in that: the moving platform of described essence comprises smart moving platform stage body (1), Lorentz motor and smart moving platform gravity compensation assembly; Described Lorentz motor comprises three kinds of Lorentz motors, every kind of Lorentz motor is symmetrically distributed in smart moving platform stage body (1) along the two sides of Y direction, wherein, the driving direction of first kind of Lorentz motor is along X-direction, about the X-axis symmetric arrangement, at least two of every sides drive smart moving platform stage body (1) and move along directions X with around Z axle sense of rotation; The driving direction of second kind of Lorentz motor is along Y direction and by smart moving platform barycenter, every side at least one, drive smart moving platform stage body (1) and move along Y-direction; On four angles that are positioned at smart moving platform stage body of the third Lorentz motor, simultaneously about the X-axis symmetric arrangement, two of every sides, its driving direction is along Z-direction, drives smart moving platform stage body along the Z direction, move around X-axis sense of rotation and Y-axis sense of rotation.
4. according to the described a kind of mask stage system with six degree of freedom coarse motion platform of claim 3, it is characterized in that: the moving platform gravity compensation assembly of described essence comprises the moving platform gravity compensation unit of four essences, each smart moving platform gravity compensation unit is made up of the moving platform gravitational equilibrium magnetic conductive board (31) of an essence and the moving platform gravitational equilibrium permanent magnet (32) of essence, the moving platform gravity compensation unit of described four essences is distributed in respectively on four angles of smart moving platform stage body (1), and wherein four moving platform gravitational equilibrium magnetic conductive boards (31) of essence are separately fixed on the coarse motion platform stage body (2); Four moving platform gravitational equilibrium permanent magnets (32) of essence are separately fixed on the smart moving platform stage body (1), and corresponding with the position of the moving platform gravitational equilibrium magnetic conductive board (31) of essence, leave the gap simultaneously and between the moving platform gravitational equilibrium magnetic conductive board of essence.
5. according to the described a kind of mask stage system with six degree of freedom coarse motion platform of claim 1, it is characterized in that: described coarse motion platform stage body (2) is thin-wall case, is made by thyrite.
6. according to the described a kind of mask stage system with six degree of freedom coarse motion platform of claim 3, it is characterized in that: the moving platform stage body (1) of described essence is thin-wall case, is made by thyrite.
7. according to the described a kind of mask stage system with six degree of freedom coarse motion platform of claim 2, it is characterized in that: the one-dimensional array that the coil array of the coil array of described two groups of directions X linear electric motors and four groups of two-freedom linear electric motors all is made up of no iron core square coil; The permanent magnet array of described two groups of directions X linear electric motors adopts one dimension halbach type permanent magnet array, and the permanent magnet array of two-freedom linear electric motors adopts plane halbach type permanent magnet array.
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| CN103929097A (en) * | 2014-04-30 | 2014-07-16 | 清华大学 | Six-degree-of-freedom magnetic suspension movement platform |
| CN104795920A (en) * | 2014-01-20 | 2015-07-22 | 上海微电子装备有限公司 | Six-degree-of-freedom micro-motion device |
| WO2016000497A1 (en) * | 2014-06-30 | 2016-01-07 | 清华大学 | Electromagnetic ejection startup type mask table system |
| CN105319989A (en) * | 2015-11-19 | 2016-02-10 | 清华大学 | A minimum motor output trajectory planning method for an ejection area of a permanent magnet ejection reticle stage |
| CN105024519B (en) * | 2014-04-25 | 2018-06-01 | 上海微电子装备（集团）股份有限公司 | A kind of ironless linear motors |
| NL2031640A (en) * | 2021-09-22 | 2023-03-27 | Harbin Inst Technology | Magnetic suspension type mask stage of lithography machine |
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