NL2021649B1 - Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist - Google Patents

Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist Download PDF

Info

Publication number
NL2021649B1
NL2021649B1 NL2021649A NL2021649A NL2021649B1 NL 2021649 B1 NL2021649 B1 NL 2021649B1 NL 2021649 A NL2021649 A NL 2021649A NL 2021649 A NL2021649 A NL 2021649A NL 2021649 B1 NL2021649 B1 NL 2021649B1
Authority
NL
Netherlands
Prior art keywords
lens mask
substrate
light source
holder
lens
Prior art date
Application number
NL2021649A
Other languages
English (en)
Dutch (nl)
Inventor
Vogler Uwe
Original Assignee
Suss Microtec Lithography Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Suss Microtec Lithography Gmbh filed Critical Suss Microtec Lithography Gmbh
Priority to NL2021649A priority Critical patent/NL2021649B1/en
Priority to PCT/EP2019/074711 priority patent/WO2020058194A1/de
Priority to TW108133275A priority patent/TW202032274A/zh
Application granted granted Critical
Publication of NL2021649B1 publication Critical patent/NL2021649B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70158—Diffractive optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2021649A 2018-09-17 2018-09-17 Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist NL2021649B1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
NL2021649A NL2021649B1 (en) 2018-09-17 2018-09-17 Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist
PCT/EP2019/074711 WO2020058194A1 (de) 2018-09-17 2019-09-16 Belichtungsvorrichtung für ein fotolithographieverfahren, baugruppe mit einer belichtungsvorrichtung sowie verfahren zur belichtung eines mit einem fotolack beschichteten substrats
TW108133275A TW202032274A (zh) 2018-09-17 2019-09-16 用於光微影方法的曝光裝置、具有曝光裝置的總成、以及用於將塗有光阻的基板曝光的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL2021649A NL2021649B1 (en) 2018-09-17 2018-09-17 Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist

Publications (1)

Publication Number Publication Date
NL2021649B1 true NL2021649B1 (en) 2020-05-07

Family

ID=64744895

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2021649A NL2021649B1 (en) 2018-09-17 2018-09-17 Exposure device for a photolithography method, assembly having an exposure device and method for exposing a substrate coated with a photoresist

Country Status (3)

Country Link
NL (1) NL2021649B1 (de)
TW (1) TW202032274A (de)
WO (1) WO2020058194A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114682910A (zh) * 2022-05-13 2022-07-01 东莞市中麒光电技术有限公司 采用透镜阵列的晶粒焊接装置及焊接方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900637A (en) * 1997-05-30 1999-05-04 Massachusetts Institute Of Technology Maskless lithography using a multiplexed array of fresnel zone plates
US20070019070A1 (en) * 2003-08-27 2007-01-25 Koninklijke Philips Electronics N.V. Method of forming optical images, an array of converging elements and an array of light valves for use in this method, apparatus for carrying out this method and a process for manufacturing a device using this method
EP2253997A2 (de) 2009-05-18 2010-11-24 Süss MicroTec Lithography GmbH Beleuchtungssystem für einen mikrolithografischen Kontakt und Nähenbelichtungsvorrichtung
US20120140194A1 (en) * 2010-12-01 2012-06-07 Samsung Electronics Co., Ltd. Maskless Exposure Apparatus
US20150097914A1 (en) * 2012-04-20 2015-04-09 Koninklijke Philips N.V. Lighting apparatus for providing light for processing an object

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5900637A (en) * 1997-05-30 1999-05-04 Massachusetts Institute Of Technology Maskless lithography using a multiplexed array of fresnel zone plates
US20070019070A1 (en) * 2003-08-27 2007-01-25 Koninklijke Philips Electronics N.V. Method of forming optical images, an array of converging elements and an array of light valves for use in this method, apparatus for carrying out this method and a process for manufacturing a device using this method
EP2253997A2 (de) 2009-05-18 2010-11-24 Süss MicroTec Lithography GmbH Beleuchtungssystem für einen mikrolithografischen Kontakt und Nähenbelichtungsvorrichtung
US20120140194A1 (en) * 2010-12-01 2012-06-07 Samsung Electronics Co., Ltd. Maskless Exposure Apparatus
US20150097914A1 (en) * 2012-04-20 2015-04-09 Koninklijke Philips N.V. Lighting apparatus for providing light for processing an object

Also Published As

Publication number Publication date
WO2020058194A1 (de) 2020-03-26
TW202032274A (zh) 2020-09-01

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MM Lapsed because of non-payment of the annual fee

Effective date: 20211001