NL2010934A - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

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Publication number
NL2010934A
NL2010934A NL2010934A NL2010934A NL2010934A NL 2010934 A NL2010934 A NL 2010934A NL 2010934 A NL2010934 A NL 2010934A NL 2010934 A NL2010934 A NL 2010934A NL 2010934 A NL2010934 A NL 2010934A
Authority
NL
Netherlands
Prior art keywords
substrate
liquid
balance
forces
substrate table
Prior art date
Application number
NL2010934A
Other languages
English (en)
Dutch (nl)
Inventor
William Peter Drent
Michael Johannes Vervoordeldonk
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2010934A publication Critical patent/NL2010934A/en

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
NL2010934A 2012-06-11 2013-06-07 Lithographic apparatus and device manufacturing method. NL2010934A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261658224P 2012-06-11 2012-06-11
US201261658224 2012-06-11

Publications (1)

Publication Number Publication Date
NL2010934A true NL2010934A (en) 2013-12-12

Family

ID=48669880

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2010934A NL2010934A (en) 2012-06-11 2013-06-07 Lithographic apparatus and device manufacturing method.

Country Status (2)

Country Link
NL (1) NL2010934A (fr)
WO (1) WO2013186136A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015120070A1 (fr) 2014-02-05 2015-08-13 Kla-Tencor Corporation Métrologie d'ordre rasant
US10031427B2 (en) * 2015-09-30 2018-07-24 Applied Materials, Inc. Methods and apparatus for vibration damping stage
NL2019331A (en) * 2016-08-04 2018-02-09 Asml Netherlands Bv Positioning system, control system, method to position, lithographic apparatus and device manufacturing method
JP6845305B2 (ja) 2016-09-13 2021-03-17 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めシステムおよびリソグラフィ装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
SG135052A1 (en) 2002-11-12 2007-09-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7675201B2 (en) * 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support

Also Published As

Publication number Publication date
WO2013186136A3 (fr) 2014-02-06
WO2013186136A2 (fr) 2013-12-19

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WDAP Patent application withdrawn

Effective date: 20150106