NL2003202A1 - Radiation source, lithographic apparatus and device manufacturing method. - Google Patents
Radiation source, lithographic apparatus and device manufacturing method. Download PDFInfo
- Publication number
- NL2003202A1 NL2003202A1 NL2003202A NL2003202A NL2003202A1 NL 2003202 A1 NL2003202 A1 NL 2003202A1 NL 2003202 A NL2003202 A NL 2003202A NL 2003202 A NL2003202 A NL 2003202A NL 2003202 A1 NL2003202 A1 NL 2003202A1
- Authority
- NL
- Netherlands
- Prior art keywords
- radiation source
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
- H01L21/0275—Photolithographic processes using lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Public Health (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8475908P | 2008-07-30 | 2008-07-30 | |
US9244308P | 2008-08-28 | 2008-08-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL2003202A1 true NL2003202A1 (nl) | 2010-02-02 |
Family
ID=41134690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2003202A NL2003202A1 (nl) | 2008-07-30 | 2009-07-15 | Radiation source, lithographic apparatus and device manufacturing method. |
Country Status (6)
Country | Link |
---|---|
US (1) | US20110122389A1 (nl) |
JP (1) | JP5449352B2 (nl) |
KR (1) | KR101619272B1 (nl) |
CN (1) | CN102105836A (nl) |
NL (1) | NL2003202A1 (nl) |
WO (1) | WO2010012588A1 (nl) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2003192A1 (nl) * | 2008-07-30 | 2010-02-02 | Asml Netherlands Bv | Alignment of collector device in lithographic apparatus. |
NL2009372A (en) * | 2011-09-28 | 2013-04-02 | Asml Netherlands Bv | Methods to control euv exposure dose and euv lithographic methods and apparatus using such methods. |
WO2017125254A1 (en) * | 2016-01-18 | 2017-07-27 | Asml Netherlands B.V. | A beam measurement system, a lithographic system, and a method |
DE102017212534A1 (de) * | 2017-07-21 | 2019-01-24 | Carl Zeiss Smt Gmbh | Optisches System, Lithographieanlage, Verfahren zum Herstellen eines optischen Systems sowie Verfahren zum Austauschen eines Moduls |
DE102020200158A1 (de) * | 2020-01-09 | 2021-07-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Projektionslithografie |
DE102020212229B3 (de) * | 2020-09-29 | 2022-01-20 | Carl Zeiss Smt Gmbh | Blenden-Vorrichtung zur Begrenzung eines Strahlengangs zwischen einer Lichtquelle und einer Beleuchtungsoptik einer Projektionsbelichtungsanlage für die Projektionslithographie |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000100685A (ja) * | 1998-09-17 | 2000-04-07 | Nikon Corp | 露光装置及び該装置を用いた露光方法 |
JP2006501660A (ja) * | 2002-09-30 | 2006-01-12 | カール・ツァイス・エスエムティー・アーゲー | 照明の同定用のセンサを備える波長≦193nm用の照明システム |
US7113261B2 (en) | 2004-06-08 | 2006-09-26 | Asml Netherlands B.V. | Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby |
US7098466B2 (en) * | 2004-06-30 | 2006-08-29 | Intel Corporation | Adjustable illumination source |
WO2007054291A1 (en) | 2005-11-10 | 2007-05-18 | Carl Zeiss Smt Ag | Euv illumination system with a system for measuring fluctuations of the light source |
-
2009
- 2009-07-15 JP JP2011520416A patent/JP5449352B2/ja not_active Expired - Fee Related
- 2009-07-15 NL NL2003202A patent/NL2003202A1/nl not_active Application Discontinuation
- 2009-07-15 US US13/055,827 patent/US20110122389A1/en not_active Abandoned
- 2009-07-15 KR KR1020117004189A patent/KR101619272B1/ko not_active IP Right Cessation
- 2009-07-15 CN CN2009801288121A patent/CN102105836A/zh active Pending
- 2009-07-15 WO PCT/EP2009/059045 patent/WO2010012588A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP2012509572A (ja) | 2012-04-19 |
KR101619272B1 (ko) | 2016-05-10 |
WO2010012588A1 (en) | 2010-02-04 |
US20110122389A1 (en) | 2011-05-26 |
CN102105836A (zh) | 2011-06-22 |
KR20110049821A (ko) | 2011-05-12 |
JP5449352B2 (ja) | 2014-03-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1A | A request for search or an international type search has been filed | ||
WDAP | Patent application withdrawn |
Effective date: 20101013 |