NL188434C - Elektrodestructuur. - Google Patents

Elektrodestructuur.

Info

Publication number
NL188434C
NL188434C NLAANVRAGE8001226,A NL8001226A NL188434C NL 188434 C NL188434 C NL 188434C NL 8001226 A NL8001226 A NL 8001226A NL 188434 C NL188434 C NL 188434C
Authority
NL
Netherlands
Prior art keywords
electrodestructure
Prior art date
Application number
NLAANVRAGE8001226,A
Other languages
English (en)
Other versions
NL188434B (nl
NL8001226A (nl
Original Assignee
Nippon Telegraph & Telephone
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5560079A external-priority patent/JPS5949711B2/ja
Priority claimed from JP5560179A external-priority patent/JPS5949712B2/ja
Priority claimed from JP11321679A external-priority patent/JPS5637683A/ja
Application filed by Nippon Telegraph & Telephone filed Critical Nippon Telegraph & Telephone
Publication of NL8001226A publication Critical patent/NL8001226A/nl
Publication of NL188434B publication Critical patent/NL188434B/nl
Application granted granted Critical
Publication of NL188434C publication Critical patent/NL188434C/nl

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/083Anode or cathode regions of thyristors or gated bipolar-mode devices
    • H01L29/0834Anode regions of thyristors or gated bipolar-mode devices, e.g. supplementary regions surrounding anode regions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/45Ohmic electrodes
    • H01L29/456Ohmic electrodes on silicon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/47Schottky barrier electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/868PIN diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/02Contacts, special
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/122Polycrystalline
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/14Schottky barrier contacts

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Thyristors (AREA)
NLAANVRAGE8001226,A 1979-05-07 1980-02-29 Elektrodestructuur. NL188434C (nl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP5560079A JPS5949711B2 (ja) 1979-05-07 1979-05-07 電極付半導体装置
JP5560079 1979-05-07
JP5560179A JPS5949712B2 (ja) 1979-05-07 1979-05-07 半導体整流ダイオ−ド
JP5560179 1979-05-07
JP11321679 1979-09-04
JP11321679A JPS5637683A (en) 1979-09-04 1979-09-04 Semiconductor rectifying device

Publications (3)

Publication Number Publication Date
NL8001226A NL8001226A (nl) 1980-11-11
NL188434B NL188434B (nl) 1992-01-16
NL188434C true NL188434C (nl) 1992-06-16

Family

ID=27295641

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE8001226,A NL188434C (nl) 1979-05-07 1980-02-29 Elektrodestructuur.

Country Status (6)

Country Link
US (1) US4587547A (nl)
CA (1) CA1150417A (nl)
DE (1) DE3008034A1 (nl)
FR (1) FR2456389B1 (nl)
GB (1) GB2050694B (nl)
NL (1) NL188434C (nl)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5860577A (ja) * 1981-10-07 1983-04-11 Hitachi Ltd 半導体装置
JPS5929469A (ja) * 1982-08-11 1984-02-16 Hitachi Ltd 半導体装置
EP0130669A1 (en) * 1983-04-30 1985-01-09 Kabushiki Kaisha Toshiba Gate turn off thyristor with mesh cathode structure
DE3628857A1 (de) * 1985-08-27 1987-03-12 Mitsubishi Electric Corp Halbleitereinrichtung
DE3633161A1 (de) * 1986-09-30 1988-04-07 Licentia Gmbh Halbleiterbauelement mit einer anodenseitigen p-zone und einer anliegenden schwach dotierten n-basiszone
JPH0795592B2 (ja) * 1987-04-14 1995-10-11 株式会社豊田中央研究所 静電誘導型半導体装置
JP2706120B2 (ja) * 1988-02-12 1998-01-28 アゼア ブラウン ボヴェリ アクチェンゲゼルシャフト Gtoパワーサイリスタ
DE3939324A1 (de) * 1989-11-28 1991-05-29 Eupec Gmbh & Co Kg Leistungs-halbleiterbauelement mit emitterkurzschluessen
US5119148A (en) * 1989-11-29 1992-06-02 Motorola, Inc. Fast damper diode and method
JP2663679B2 (ja) * 1990-04-20 1997-10-15 富士電機株式会社 伝導度変調型mosfet
JP3321185B2 (ja) * 1990-09-28 2002-09-03 株式会社東芝 高耐圧半導体装置
DE4201183A1 (de) * 1992-01-17 1993-07-22 Eupec Gmbh & Co Kg Leistungsdiode
US5360990A (en) * 1993-03-29 1994-11-01 Sunpower Corporation P/N junction device having porous emitter
US5369291A (en) * 1993-03-29 1994-11-29 Sunpower Corporation Voltage controlled thyristor
DE4342482C2 (de) * 1993-12-13 1995-11-30 Siemens Ag Schnelle Leistungshalbleiterbauelemente
US5705830A (en) * 1996-09-05 1998-01-06 Northrop Grumman Corporation Static induction transistors
JP2001516156A (ja) 1997-09-10 2001-09-25 インフィネオン テクノロジース アクチエンゲゼルシャフト 半導体構成素子
JP4017258B2 (ja) * 1998-07-29 2007-12-05 三菱電機株式会社 半導体装置
EP1198011A4 (en) * 1999-07-15 2008-02-27 Rohm Co Ltd SEMICONDUCTOR ARRANGEMENT WITH A MOS FIELD EFFECT TRANSISTOR
DE102004005084B4 (de) * 2004-02-02 2013-03-14 Infineon Technologies Ag Halbleiterbauelement
US20050275065A1 (en) * 2004-06-14 2005-12-15 Tyco Electronics Corporation Diode with improved energy impulse rating
DE102004044141A1 (de) 2004-09-13 2006-03-30 Robert Bosch Gmbh Halbleiteranordnung zur Spannungsbegrenzung
JP2006295062A (ja) * 2005-04-14 2006-10-26 Rohm Co Ltd 半導体装置
JP2010283132A (ja) 2009-06-04 2010-12-16 Mitsubishi Electric Corp 半導体装置
JP5321669B2 (ja) 2010-11-25 2013-10-23 株式会社デンソー 半導体装置
US8809902B2 (en) * 2011-10-17 2014-08-19 Infineon Technologies Austria Ag Power semiconductor diode, IGBT, and method for manufacturing thereof
US9123828B2 (en) 2013-11-14 2015-09-01 Infineon Technologies Ag Semiconductor device and method for forming a semiconductor device
JP6443267B2 (ja) 2015-08-28 2018-12-26 株式会社デンソー 半導体装置
DE112016006517B4 (de) * 2016-02-29 2022-09-29 Mitsubishi Electric Corporation Halbleitervorrichtungen
JP6846119B2 (ja) * 2016-05-02 2021-03-24 株式会社 日立パワーデバイス ダイオード、およびそれを用いた電力変換装置
US11127737B2 (en) * 2019-02-12 2021-09-21 Macom Technology Solutions Holdings, Inc. Monolithic multi-I region diode limiters

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL122949C (nl) * 1958-06-25 1900-01-01
NL278058A (nl) * 1961-05-26
US3395320A (en) * 1965-08-25 1968-07-30 Bell Telephone Labor Inc Isolation technique for integrated circuit structure
CH452710A (de) * 1966-12-29 1968-03-15 Bbc Brown Boveri & Cie Verfahren zur Herstellung eines steuerbaren Halbleiterventils mit pnpn Struktur mit einer mit Kurzschlüssen versehenen Emitterzone
CH474154A (de) * 1967-02-10 1969-06-15 Licentia Gmbh Halbleiterbauelement
US3497776A (en) * 1968-03-06 1970-02-24 Westinghouse Electric Corp Uniform avalanche-breakdown rectifiers
US3617829A (en) * 1969-12-01 1971-11-02 Motorola Inc Radiation-insensitive voltage standard means
US3641403A (en) * 1970-05-25 1972-02-08 Mitsubishi Electric Corp Thyristor with degenerate semiconductive region
JPS5213918B2 (nl) * 1972-02-02 1977-04-18
JPS5548705B2 (nl) * 1973-06-28 1980-12-08
US3918082A (en) * 1973-11-07 1975-11-04 Jearld L Hutson Semiconductor switching device
DE2506102C3 (de) * 1975-02-13 1982-03-25 Siemens AG, 1000 Berlin und 8000 München Halbleitergleichrichter
NL7612883A (nl) * 1976-11-19 1978-05-23 Philips Nv Halfgeleiderinrichting, en werkwijze ter ver- vaardiging daarvan.
US4156246A (en) * 1977-05-25 1979-05-22 Bell Telephone Laboratories, Incorporated Combined ohmic and Schottky output transistors for logic circuit

Also Published As

Publication number Publication date
DE3008034A1 (de) 1980-11-13
NL188434B (nl) 1992-01-16
GB2050694A (en) 1981-01-07
FR2456389B1 (fr) 1985-09-27
GB2050694B (en) 1983-09-28
NL8001226A (nl) 1980-11-11
US4587547A (en) 1986-05-06
CA1150417A (en) 1983-07-19
FR2456389A1 (fr) 1980-12-05
DE3008034C2 (nl) 1989-04-20

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Legal Events

Date Code Title Description
A1A A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
CNR Transfer of rights (patent application after its laying open for public inspection)

Free format text: NIPPON TELEGRAPH AND TELEPHONE CORPORATION

BC A request for examination has been filed
V4 Discontinued because of reaching the maximum lifetime of a patent

Free format text: 20000229