NL128965C - - Google Patents
Info
- Publication number
- NL128965C NL128965C NL128965DA NL128965C NL 128965 C NL128965 C NL 128965C NL 128965D A NL128965D A NL 128965DA NL 128965 C NL128965 C NL 128965C
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US307025A US3300309A (en) | 1963-09-06 | 1963-09-06 | Moisture-resistant planographic plates and methods of producing same |
Publications (1)
Publication Number | Publication Date |
---|---|
NL128965C true NL128965C (zh) |
Family
ID=23187917
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL128965D NL128965C (zh) | 1963-09-06 | ||
NL6410224A NL6410224A (zh) | 1963-09-06 | 1964-09-02 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6410224A NL6410224A (zh) | 1963-09-06 | 1964-09-02 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3300309A (zh) |
BE (1) | BE652748A (zh) |
DE (1) | DE1447916B2 (zh) |
GB (1) | GB1055079A (zh) |
NL (2) | NL6410224A (zh) |
SE (1) | SE313997B (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL156092B (nl) * | 1968-03-25 | 1978-03-15 | Polychrome Corp | Werkwijze voor de vervaardiging van een lithografische drukplaat. |
US3867147A (en) * | 1969-05-20 | 1975-02-18 | Hoechst Co American | Light-sensitive diazo compounds and reproduction material employing the same |
US3891516A (en) * | 1970-08-03 | 1975-06-24 | Polychrome Corp | Process of electrolyically anodizing a mechanically grained aluminum base and article made thereby |
US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
JPS5539825B2 (zh) * | 1972-05-12 | 1980-10-14 | ||
US3997349A (en) * | 1974-06-17 | 1976-12-14 | Minnesota Mining And Manufacturing Company | Light-sensitive development-free driographic printing plate |
US4230492A (en) * | 1978-01-17 | 1980-10-28 | The Richardson Company | Aryl sulfonic acid based stabilizers for presensitized planographic plates |
US4299907A (en) * | 1978-08-10 | 1981-11-10 | Polychrome Corporation | Storage stable photosensitive diazo lithographic printing plates |
US4414315A (en) * | 1979-08-06 | 1983-11-08 | Howard A. Fromson | Process for making lithographic printing plate |
US4401743A (en) * | 1980-04-30 | 1983-08-30 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
US4326020A (en) * | 1980-09-10 | 1982-04-20 | Polychrome Corporation | Method of making positive acting diazo lithographic printing plate |
US4499170A (en) * | 1983-06-17 | 1985-02-12 | Richardson Graphics Company | Lithographic plates and photoresists having stabilized photosensitive diazo resin with theophylline derivative |
US5066568A (en) * | 1985-08-05 | 1991-11-19 | Hoehst Celanese Corporation | Method of developing negative working photographic elements |
US4980271A (en) * | 1985-08-05 | 1990-12-25 | Hoechst Celanese Corporation | Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate |
US5122442A (en) * | 1989-07-28 | 1992-06-16 | Hoechst Celanese Corporation | Method for forming an image from a high speed screen printing composition on a screen mesh |
US5232813A (en) * | 1990-01-31 | 1993-08-03 | Fuji Photo Film Co., Ltd. | Ps plate for use in making lithographic printing plate requiring no dampening water utilizing irradiation cured primer layer containing polyurethane resin and diazonium salt polycondensate photopolymerizable light-sensitive layer and silicone rubber layer |
CN1037552C (zh) * | 1991-03-21 | 1998-02-25 | 北京大学 | 一种负性感光印刷版及其制法 |
US5942368A (en) * | 1996-04-23 | 1999-08-24 | Konica Corporation | Pigment dispersion composition |
JP3567402B2 (ja) * | 1996-06-12 | 2004-09-22 | コニカミノルタホールディングス株式会社 | 平版印刷版用支持体の製造方法、その製造方法で得られる平版印刷版用支持体及びその支持体を用いた感光性平版印刷版 |
US20130172476A1 (en) | 2010-07-02 | 2013-07-04 | Dic Corporation | Fluorine-based surfactant, and coating composition and resist composition each using the same |
US9359547B2 (en) * | 2013-01-31 | 2016-06-07 | Halliburton Energy Services, Inc. | Wellbore servicing compositions and methods of making and using same |
US20230090038A1 (en) | 2019-12-25 | 2023-03-23 | Dic Corporation | Polymer and coating composition containing said polymer |
US20230323002A1 (en) | 2020-09-03 | 2023-10-12 | Dic Corporation | Polymer, coating composition, resist composition, and article |
EP4265661A1 (en) | 2020-12-17 | 2023-10-25 | DIC Corporation | Compound, leveling agent, coating composition, resist composition, and article |
TW202311331A (zh) | 2021-05-18 | 2023-03-16 | 日商Dic股份有限公司 | 含矽酮鏈的聚合物、塗敷組成物、抗蝕劑組成物及物品 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE857739C (de) * | 1950-08-13 | 1952-12-01 | Kalle & Co Ag | Verfahren zum Fixieren von Druckformen, die mit Hilfe von Diazoverbindungen hergestellt sind |
NL254170A (zh) * | 1958-12-29 | |||
BE598570A (zh) * | 1959-12-30 | |||
BE624581A (zh) * | 1961-11-11 | |||
US3169864A (en) * | 1962-05-15 | 1965-02-16 | Minnesota Mining & Mfg | Photosensitive materials comprising diazonium salts of bisphenol esters |
-
0
- NL NL128965D patent/NL128965C/xx active
-
1963
- 1963-09-06 US US307025A patent/US3300309A/en not_active Expired - Lifetime
-
1964
- 1964-08-31 SE SE10425/64A patent/SE313997B/xx unknown
- 1964-09-02 DE DE1964P0034990 patent/DE1447916B2/de active Granted
- 1964-09-02 NL NL6410224A patent/NL6410224A/xx unknown
- 1964-09-07 GB GB36643/64A patent/GB1055079A/en not_active Expired
- 1964-09-07 BE BE652748D patent/BE652748A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
SE313997B (zh) | 1969-08-25 |
GB1055079A (en) | 1967-01-11 |
NL6410224A (zh) | 1965-03-08 |
DE1447916B2 (de) | 1976-11-04 |
US3300309A (en) | 1967-01-24 |
BE652748A (zh) | 1964-12-31 |
DE1447916A1 (de) | 1968-11-14 |