NL1016163A1 - Photosensitive resin composition. - Google Patents
Photosensitive resin composition.Info
- Publication number
- NL1016163A1 NL1016163A1 NL1016163A NL1016163A NL1016163A1 NL 1016163 A1 NL1016163 A1 NL 1016163A1 NL 1016163 A NL1016163 A NL 1016163A NL 1016163 A NL1016163 A NL 1016163A NL 1016163 A1 NL1016163 A1 NL 1016163A1
- Authority
- NL
- Netherlands
- Prior art keywords
- resin composition
- photosensitive resin
- photosensitive
- composition
- resin
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Nonlinear Science (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26393399A JP4352524B2 (en) | 1999-09-17 | 1999-09-17 | Photosensitive resin composition |
| JP26393399 | 1999-09-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL1016163A1 true NL1016163A1 (en) | 2001-03-20 |
| NL1016163C2 NL1016163C2 (en) | 2001-05-30 |
Family
ID=17396290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL1016163A NL1016163C2 (en) | 1999-09-17 | 2000-09-13 | Photosensitive resin composition. |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4352524B2 (en) |
| KR (1) | KR20010050442A (en) |
| NL (1) | NL1016163C2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003107697A (en) * | 2001-09-28 | 2003-04-09 | Fuji Photo Film Co Ltd | Photosensitive transfer material, photomask material, photomask and method for manufacturing the photomask |
| KR100655049B1 (en) * | 2005-12-30 | 2006-12-06 | 제일모직주식회사 | High color regenerative photoresist resin composition with good developing properties and color filter using the same |
| JP6578775B2 (en) * | 2015-07-16 | 2019-09-25 | 東洋インキＳｃホールディングス株式会社 | Coloring composition for color filter, and color filter |
| JP6678003B2 (en) * | 2015-10-26 | 2020-04-08 | 東洋インキＳｃホールディングス株式会社 | Coloring composition for solid-state imaging device and color filter |
| JP6847580B2 (en) * | 2016-02-09 | 2021-03-24 | 東京応化工業株式会社 | A photosensitive resin composition for a black column spacer, a black column spacer, a display device, and a method for forming the black column spacer. |
| KR102009675B1 (en) * | 2018-10-31 | 2019-08-12 | 주식회사 삼양사 | Photosensitive resin composition |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NZ208751A (en) * | 1983-07-11 | 1987-04-30 | Iolab Corp | 2-hydroxy-5-acrylyloxyalkylphenyl-2h-benzotriazole derivatives and polymers and copolymers thereof and use as uv absorbing additives in polymer compositions |
| US5384235A (en) * | 1992-07-01 | 1995-01-24 | Eastman Kodak Company | Photographic elements incorporating polymeric ultraviolet absorbers |
| JP3331035B2 (en) * | 1993-02-05 | 2002-10-07 | 富士写真フイルム株式会社 | Photosensitive resin composition and image forming method |
| US5496685A (en) * | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
| JPH08151415A (en) * | 1994-09-29 | 1996-06-11 | Otsuka Chem Co Ltd | Weather-resistant composition |
| US5747585A (en) * | 1995-02-17 | 1998-05-05 | Eastman Kodak Company | Process for synthesizing latex polymers from solid monomer particles |
| JP3081508B2 (en) * | 1995-06-16 | 2000-08-28 | 株式会社日本触媒 | UV absorbing copolymer |
| EP0801328A1 (en) * | 1996-04-09 | 1997-10-15 | Morton International, Inc. | Photoimageable composition having an acrylic-functional UV stabilizer |
| WO1998036000A1 (en) * | 1997-02-17 | 1998-08-20 | Daicel Chemical Industries, Ltd. | Modified copolymer, process for preparing the same, and curable resin composition |
| JPH10231326A (en) * | 1997-02-17 | 1998-09-02 | Daicel Chem Ind Ltd | Modified copolymer and radiation-curable resin composition |
| JPH10251591A (en) * | 1997-03-14 | 1998-09-22 | Nippon Shokubai Co Ltd | Aqueous resin dispersion for thermosensitive recording material, production of the dispersion and thermosensitive recording material by using the dispersion |
| JPH11100529A (en) * | 1997-09-25 | 1999-04-13 | Jsr Corp | Radiation-sensitive composition used for color filter |
| WO1999067337A1 (en) * | 1998-06-24 | 1999-12-29 | Seiko Epson Corporation | Ink composition providing image excellent in light stability |
| JP2000214580A (en) * | 1999-01-26 | 2000-08-04 | Mitsubishi Chemicals Corp | Photopolymerizable composition for color filter and color filter |
| JP2000338658A (en) * | 1999-05-31 | 2000-12-08 | Hitachi Chem Co Ltd | Photosensitive colored resin composition, colored image forming photosensitive fluid using same, photosensitive element, production of colored image and production of color filter |
-
1999
- 1999-09-17 JP JP26393399A patent/JP4352524B2/en not_active Expired - Fee Related
-
2000
- 2000-09-13 NL NL1016163A patent/NL1016163C2/en not_active IP Right Cessation
- 2000-09-14 KR KR1020000053994A patent/KR20010050442A/en not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| JP4352524B2 (en) | 2009-10-28 |
| NL1016163C2 (en) | 2001-05-30 |
| JP2001092134A (en) | 2001-04-06 |
| KR20010050442A (en) | 2001-06-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AD1A | A request for search or an international type search has been filed | ||
| RD2N | Patents in respect of which a decision has been taken or a report has been made (novelty report) |
Effective date: 20010328 |
|
| PD2B | A search report has been drawn up | ||
| VD1 | Lapsed due to non-payment of the annual fee |
Effective date: 20050401 |