MY182967A - Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium - Google Patents
Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording mediumInfo
- Publication number
- MY182967A MY182967A MYPI2013700669A MYPI2013700669A MY182967A MY 182967 A MY182967 A MY 182967A MY PI2013700669 A MYPI2013700669 A MY PI2013700669A MY PI2013700669 A MYPI2013700669 A MY PI2013700669A MY 182967 A MY182967 A MY 182967A
- Authority
- MY
- Malaysia
- Prior art keywords
- magnetic recording
- group
- recording medium
- elements selected
- target material
- Prior art date
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title abstract 3
- 238000005477 sputtering target Methods 0.000 title abstract 3
- 239000013077 target material Substances 0.000 title abstract 3
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 238000002425 crystallisation Methods 0.000 abstract 1
- 230000008025 crystallization Effects 0.000 abstract 1
- 230000004907 flux Effects 0.000 abstract 1
- 229910052735 hafnium Inorganic materials 0.000 abstract 1
- 239000012535 impurity Substances 0.000 abstract 1
- 229910052748 manganese Inorganic materials 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052759 nickel Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/11—Making amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C33/00—Making ferrous alloys
- C22C33/003—Making ferrous alloys making amorphous alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/02—Amorphous alloys with iron as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C45/00—Amorphous alloys
- C22C45/04—Amorphous alloys with nickel or cobalt as the major constituent
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
- H01F41/183—Sputtering targets therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/16—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
- Powder Metallurgy (AREA)
Abstract
SOFT MAGNETIC ALLOY FOR MAGNETIC RECORDING)SPUTTERING TARGET MATERIAL, AND MAGNETIC RECORDING MEDIUM There is provided a soft magnetic alloy for a thermally assisted magnetic recording medium, excellent in saturation magnetic flux density, amorphous property, crystallization temperature and corrosion resistance; and a sputtering target material and a magnetic recording medium therewith. The alloy comprises in at%: Fe: 0 to 70%; (A) 5 to 20% of one or two or more elements selected from the group consisting of Ti, Zr, and Hf; (B) 0 to 30% of one or two or more elements selected from the group consisting of Cr, Mo and W; (C) 0 to 30% of one or two or more elements selected from the group consisting of V, Nb, and Ta; (D) 0 to 30% of one or two elements selected from the group consisting of Ni and Mn; (E) 0 to 5% of one or two elements selected from the group consisting of Al and Cu; and (F) 0 to 10% of one or two or more elements selected from the group consisting of Si, Ge, P, B, and C; and the balance Co and unavoidable impurities.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010240184 | 2010-10-26 | ||
| JP2011092631A JP5714397B2 (en) | 2010-10-26 | 2011-04-19 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| PCT/JP2011/074448 WO2012057087A1 (en) | 2010-10-26 | 2011-10-24 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MY182967A true MY182967A (en) | 2021-02-05 |
Family
ID=45993795
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MYPI2013700669A MY182967A (en) | 2010-10-26 | 2011-10-24 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5714397B2 (en) |
| CN (1) | CN103221568B (en) |
| MY (1) | MY182967A (en) |
| SG (1) | SG189986A1 (en) |
| TW (1) | TWI512120B (en) |
| WO (1) | WO2012057087A1 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5917045B2 (en) * | 2011-08-17 | 2016-05-11 | 山陽特殊製鋼株式会社 | Alloy and sputtering target material for soft magnetic thin film layer in perpendicular magnetic recording medium |
| JP6405261B2 (en) * | 2014-05-01 | 2018-10-17 | 山陽特殊製鋼株式会社 | Soft magnetic alloy for magnetic recording, sputtering target material, and magnetic recording medium |
| CN104388842B (en) * | 2014-12-02 | 2016-08-24 | 北京科技大学 | A kind of Fe-Cr-B system corrosion block non-crystaline amorphous metal and preparation method thereof |
| JP6506659B2 (en) * | 2015-08-24 | 2019-04-24 | 山陽特殊製鋼株式会社 | Amorphous alloy for magnetic recording, sputtering target material and magnetic recording medium |
| CN105755356A (en) * | 2016-03-15 | 2016-07-13 | 梁梅芹 | Preparation method of iron-based nanocrystalline soft magnetic alloy |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62263945A (en) * | 1986-05-09 | 1987-11-16 | Victor Co Of Japan Ltd | Soft-magnetic alloy |
| JPH05267031A (en) * | 1992-02-14 | 1993-10-15 | Takeshi Masumoto | Magnetic core material |
| JP2856725B2 (en) * | 1997-05-26 | 1999-02-10 | 松下電器産業株式会社 | Method of forming soft magnetic alloy film |
| JP3182399B2 (en) * | 1997-09-17 | 2001-07-03 | 株式会社東芝 | Soft magnetic alloy film and manufacturing method thereof, magnetic head, and magnetic disk |
| US20080083616A1 (en) * | 2006-10-10 | 2008-04-10 | Hitachi Metals, Ltd. | Co-Fe-Zr BASED ALLOY SPUTTERING TARGET MATERIAL AND PROCESS FOR PRODUCTION THEREOF |
| JP5605787B2 (en) * | 2008-07-14 | 2014-10-15 | 山陽特殊製鋼株式会社 | Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method |
| JP2010111943A (en) * | 2008-10-10 | 2010-05-20 | Hitachi Metals Ltd | Method for producing sputtering target material |
| JP2010159491A (en) * | 2008-12-12 | 2010-07-22 | Hitachi Metals Ltd | Co-Fe-BASED ALLOY SPUTTERING TARGET MATERIAL |
| JP5617112B2 (en) * | 2010-01-14 | 2014-11-05 | 独立行政法人物質・材料研究機構 | Perpendicular magnetic recording medium and manufacturing method thereof |
| JP2011181140A (en) * | 2010-03-01 | 2011-09-15 | Hitachi Metals Ltd | Fe-Co BASED ALLOY SOFT MAGNETIC FILM FOR MAGNETIC RECORDING MEDIUM |
-
2011
- 2011-04-19 JP JP2011092631A patent/JP5714397B2/en not_active Expired - Fee Related
- 2011-10-24 SG SG2013031174A patent/SG189986A1/en unknown
- 2011-10-24 WO PCT/JP2011/074448 patent/WO2012057087A1/en active Application Filing
- 2011-10-24 CN CN201180051301.1A patent/CN103221568B/en not_active Expired - Fee Related
- 2011-10-24 MY MYPI2013700669A patent/MY182967A/en unknown
- 2011-10-26 TW TW100138891A patent/TWI512120B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| SG189986A1 (en) | 2013-06-28 |
| CN103221568B (en) | 2016-03-23 |
| TWI512120B (en) | 2015-12-11 |
| JP2012108997A (en) | 2012-06-07 |
| TW201231689A (en) | 2012-08-01 |
| JP5714397B2 (en) | 2015-05-07 |
| CN103221568A (en) | 2013-07-24 |
| WO2012057087A1 (en) | 2012-05-03 |
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