MY182858A - Fe-co-based alloy sputtering target material - Google Patents

Fe-co-based alloy sputtering target material

Info

Publication number
MY182858A
MY182858A MYPI2016700480A MYPI2016700480A MY182858A MY 182858 A MY182858 A MY 182858A MY PI2016700480 A MYPI2016700480 A MY PI2016700480A MY PI2016700480 A MYPI2016700480 A MY PI2016700480A MY 182858 A MY182858 A MY 182858A
Authority
MY
Malaysia
Prior art keywords
target material
sputtering target
based alloy
intermetallic compound
soft magnetic
Prior art date
Application number
MYPI2016700480A
Inventor
Hasegawa Hiroyuki
Sawada Toshiyuki
Matsubara Noriaki
Original Assignee
Sanyo Special Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Special Steel Co Ltd filed Critical Sanyo Special Steel Co Ltd
Publication of MY182858A publication Critical patent/MY182858A/en

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
    • G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
    • G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C19/00—Alloys based on nickel or cobalt
    • C22C19/07—Alloys based on nickel or cobalt based on cobalt
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0433—Nickel- or cobalt-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/047—Making non-ferrous alloys by powder metallurgy comprising intermetallic compounds
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C33/00—Making ferrous alloys
    • C22C33/02—Making ferrous alloys by powder metallurgy
    • C22C33/0257—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements
    • C22C33/0278—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5%
    • C22C33/0285—Making ferrous alloys by powder metallurgy characterised by the range of the alloying elements with at least one alloying element having a minimum content above 5% with Cr, Co, or Ni having a minimum content higher than 5%
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C38/00—Ferrous alloys, e.g. steel alloys
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C2200/00—Crystalline structure
    • C22C2200/02—Amorphous

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)

Abstract

There are provided: a Fe-Co-based alloy sputtering target material for molding a soft magnetic film, which enables stable magnetron sputtering and allows generation of particles to be suppressed; a method for producing the Fe-Co-based alloy sputtering target material; a soft magnetic thin film layer; and a perpendicular magnetic recording medium formed by using the soft magnetic thin film layer. The target material is a sputtering target material including a Fe-Co-based alloy, the sputtering target material including: at least one M element .selected from Nb, Ta, Mo, and W; and the balance of one or two of Fe and Co with unavoidable impurities, and satisfying the following formula ( 1): (Fex-C0100-xhoo-yMy ( 1) [wherein atomic ratios are 0 :s X :s 100 and 4 :s Y :s 28], wherein a microstructure of the sputtering target material includes a phase mainly including Fe and Co and an intermetallic compound phase including one or two of Fe and Co and an M element; the phase mainly including Fe and Co is surrounded, divided, and isolated by allowing the intermetallic compound phase comprising one or two of Fe and Co and the M element to grow in a net geometry; and the number of the phases mainly including Fe and Co, isolated by the intermetallic compound phase, is 300 or more per 10000 ?m2 in the sputtering target material. (FIG. 1)
MYPI2016700480A 2013-08-15 2014-08-12 Fe-co-based alloy sputtering target material MY182858A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013168787A JP6161991B2 (en) 2013-08-15 2013-08-15 Fe-Co alloy sputtering target material
PCT/JP2014/071305 WO2015022963A1 (en) 2013-08-15 2014-08-12 Fe-Co-BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER, AND VERTICAL MAGNETIC RECORDING MEDIUM PRODUCED USING SAID SOFT MAGNETIC THIN FILM LAYER

Publications (1)

Publication Number Publication Date
MY182858A true MY182858A (en) 2021-02-05

Family

ID=52468348

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI2016700480A MY182858A (en) 2013-08-15 2014-08-12 Fe-co-based alloy sputtering target material

Country Status (6)

Country Link
JP (1) JP6161991B2 (en)
CN (1) CN105473759B (en)
MY (1) MY182858A (en)
SG (1) SG11201600474SA (en)
TW (1) TWI621718B (en)
WO (1) WO2015022963A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016149170A (en) * 2015-02-12 2016-08-18 日立金属株式会社 Fe-Co-Nb BASED ALLOY SPUTTERING TARGET MATERIAL AND SOFT MAGNETIC FILM
WO2016157922A1 (en) * 2015-03-27 2016-10-06 日立金属株式会社 Soft magnetic film and sputtering target for forming soft magnetic film
CN108004515A (en) * 2018-01-22 2018-05-08 宁波江丰电子材料股份有限公司 Preparation method, iron cobalt tantalum alloy-sputtering targets material and the application of iron cobalt tantalum alloy-sputtering targets material
WO2019187226A1 (en) * 2018-03-28 2019-10-03 Ｊｘ金属株式会社 Perpendicular magnetic recording medium
JP7382142B2 (en) * 2019-02-26 2023-11-16 山陽特殊製鋼株式会社 Alloy suitable for sputtering target material
CN111957982B (en) * 2020-08-31 2023-02-03 宁波江丰电子材料股份有限公司 Preparation method of iron-cobalt-tantalum alloy powder, iron-cobalt-tantalum alloy powder and application

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005190538A (en) * 2003-12-25 2005-07-14 Hitachi Global Storage Technologies Netherlands Bv Magnetic recording medium, and its manufacturing method and apparatus
JP2008121071A (en) * 2006-11-13 2008-05-29 Sanyo Special Steel Co Ltd SOFT MAGNETIC FeCo BASED TARGET MATERIAL
JP5111835B2 (en) * 2006-11-17 2013-01-09 山陽特殊製鋼株式会社 (CoFe) ZrNb / Ta / Hf-based target material and method for producing the same
JP5397755B2 (en) * 2008-06-17 2014-01-22 日立金属株式会社 Fe-Co alloy sputtering target material for soft magnetic film formation
JP5605787B2 (en) * 2008-07-14 2014-10-15 山陽特殊製鋼株式会社 Sputtering target material for forming an alloy for a soft magnetic film layer in a perpendicular magnetic recording medium and its manufacturing method

Also Published As

Publication number Publication date
JP6161991B2 (en) 2017-07-12
SG11201600474SA (en) 2016-02-26
JP2015036453A (en) 2015-02-23
CN105473759B (en) 2018-04-03
WO2015022963A1 (en) 2015-02-19
CN105473759A (en) 2016-04-06
TWI621718B (en) 2018-04-21
TW201512421A (en) 2015-04-01

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