DE3751743T2 - Positiv arbeitende photoempfindliche Kunststoffzusammensetzung - Google Patents
Positiv arbeitende photoempfindliche KunststoffzusammensetzungInfo
- Publication number
- DE3751743T2 DE3751743T2 DE3751743T DE3751743T DE3751743T2 DE 3751743 T2 DE3751743 T2 DE 3751743T2 DE 3751743 T DE3751743 T DE 3751743T DE 3751743 T DE3751743 T DE 3751743T DE 3751743 T2 DE3751743 T2 DE 3751743T2
- Authority
- DE
- Germany
- Prior art keywords
- plastic composition
- positive working
- working photosensitive
- photosensitive plastic
- positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61070552A JPH0654386B2 (ja) | 1986-03-28 | 1986-03-28 | ポジ型感放射線性樹脂組成物 |
JP61146459A JPH0654389B2 (ja) | 1986-06-23 | 1986-06-23 | ポジ型感放射線性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3751743D1 DE3751743D1 (de) | 1996-04-25 |
DE3751743T2 true DE3751743T2 (de) | 1996-11-14 |
Family
ID=26411695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3751743T Expired - Lifetime DE3751743T2 (de) | 1986-03-28 | 1987-03-30 | Positiv arbeitende photoempfindliche Kunststoffzusammensetzung |
Country Status (3)
Country | Link |
---|---|
US (1) | US5019479A (de) |
EP (1) | EP0239423B1 (de) |
DE (1) | DE3751743T2 (de) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2590342B2 (ja) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物 |
US5266440A (en) * | 1986-12-23 | 1993-11-30 | Shipley Company Inc. | Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons |
KR920001450B1 (ko) † | 1986-12-23 | 1992-02-14 | 쉬플리 캄파니 인코포레이티드 | 감광성 내식막의 제조방법, 감광성 내식막 조성물 및 이의 제조방법 |
DE3810632A1 (de) * | 1988-03-29 | 1989-10-12 | Hoechst Ag | Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial |
DE3810631A1 (de) * | 1988-03-29 | 1989-10-12 | Hoechst Ag | Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand |
JPH063544B2 (ja) * | 1988-07-07 | 1994-01-12 | 住友化学工業株式会社 | ポジ型感放射線性レジスト組成物 |
JP2692403B2 (ja) * | 1988-07-07 | 1997-12-17 | 住友化学工業株式会社 | ポジ型感放射線性レジスト組成物 |
US5861229A (en) * | 1988-07-07 | 1999-01-19 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compound |
US5456995A (en) * | 1988-07-07 | 1995-10-10 | Sumitomo Chemical Company, Limited | Radiation-sensitive positive resist composition |
JP2623778B2 (ja) * | 1988-10-18 | 1997-06-25 | 日本合成ゴム株式会社 | 感放射線性樹脂組成物 |
US5753406A (en) * | 1988-10-18 | 1998-05-19 | Japan Synthetic Rubber Co., Ltd. | Radiation-sensitive resin composition |
CA2023791A1 (en) * | 1989-08-24 | 1991-02-25 | Ayako Ida | Radiation-sensitive positive resist composition |
US5288587A (en) * | 1989-09-05 | 1994-02-22 | Sumitomo Chemical Co., Ltd. | Radiation-sensitive positive resist composition comprising an o-quinone diazide, an alkali-soluble resin and a polyphenol compound |
EP0701169B1 (de) * | 1989-09-08 | 1998-12-30 | Olin Microelectronic Chemicals, Inc. | Vollständig substituierte Novalak-Polymere enthaltende Strahlungsempfindliche Zusammensetzungen |
US5322757A (en) * | 1989-09-08 | 1994-06-21 | Ocg Microelectronic Materials, Inc. | Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present |
US5324620A (en) * | 1989-09-08 | 1994-06-28 | Ocg Microeletronic Materials, Inc. | Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde |
CA2029464A1 (en) * | 1989-12-20 | 1991-06-21 | Sangya Jain | Positive photoresist composition |
JP3063148B2 (ja) * | 1989-12-27 | 2000-07-12 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
US5208138A (en) * | 1990-02-05 | 1993-05-04 | Morton International, Inc. | High contrast high thermal stability positive photoresists having novolak resins of lowered hydroxyl content |
TW202504B (de) * | 1990-02-23 | 1993-03-21 | Sumitomo Chemical Co | |
US5151340A (en) * | 1990-07-02 | 1992-09-29 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in radiation-sensitive mixtures |
US5225318A (en) * | 1990-07-02 | 1993-07-06 | Ocg Microelectronic Materials, Inc. | Selected photoactive methylolated cyclohexanol compounds and their use in forming positive resist image patterns |
JP2711590B2 (ja) † | 1990-09-13 | 1998-02-10 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5413896A (en) * | 1991-01-24 | 1995-05-09 | Japan Synthetic Rubber Co., Ltd. | I-ray sensitive positive resist composition |
JPH05204144A (ja) * | 1991-08-21 | 1993-08-13 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
JPH05239166A (ja) * | 1991-08-22 | 1993-09-17 | Hoechst Celanese Corp | 高いガラス転位点と高い光感度を有するフォトレジスト用ノボラック樹脂組成物 |
US5372909A (en) * | 1991-09-24 | 1994-12-13 | Mitsubishi Kasei Corporation | Photosensitive resin composition comprising an alkali-soluble resin made from a phenolic compound and at least 2 different aldehydes |
US5346799A (en) * | 1991-12-23 | 1994-09-13 | Ocg Microelectronic Materials, Inc. | Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde |
JP3095847B2 (ja) * | 1991-12-27 | 2000-10-10 | コニカ株式会社 | カラー写真用処理液及び該処理液を用いたハロゲン化銀カラー写真感光材料の処理方法 |
JPH05249666A (ja) * | 1992-03-05 | 1993-09-28 | Sumitomo Chem Co Ltd | ポジ型レジスト組成物 |
US5206348A (en) * | 1992-07-23 | 1993-04-27 | Morton International, Inc. | Hexahydroxybenzophenone sulfonate esters of diazonaphthoquinone sensitizers and positive photoresists employing same |
US5308744A (en) * | 1993-03-05 | 1994-05-03 | Morton International, Inc. | Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives |
JP3192548B2 (ja) * | 1994-04-22 | 2001-07-30 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物 |
US5652081A (en) * | 1995-09-20 | 1997-07-29 | Fuji Photo Film Co., Ltd. | Positive working photoresist composition |
JPH0990622A (ja) * | 1995-09-22 | 1997-04-04 | Fuji Photo Film Co Ltd | ポジ型フォトレジスト組成物 |
US6023318A (en) * | 1996-04-15 | 2000-02-08 | Canon Kabushiki Kaisha | Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device |
JP3666839B2 (ja) * | 1998-01-23 | 2005-06-29 | 東京応化工業株式会社 | ポジ型ホトレジスト組成物およびその製造方法 |
US6200891B1 (en) * | 1998-08-13 | 2001-03-13 | International Business Machines Corporation | Removal of dielectric oxides |
ATE318705T1 (de) * | 1998-08-24 | 2006-03-15 | Fuji Photo Film Co Ltd | Lichtempfindliche harzzusammensetzung und flachdruckplatte |
JP4068260B2 (ja) * | 1999-04-02 | 2008-03-26 | Azエレクトロニックマテリアルズ株式会社 | 感放射線性樹脂組成物 |
US8822123B2 (en) | 2012-07-13 | 2014-09-02 | Momentive Specialty Chemicals Inc. | Polymeric materials and methods for making the polymeric materials |
CA3044541A1 (en) * | 2016-12-05 | 2018-06-14 | Arkema Inc. | Initiator blends and photocurable compositions containing such initiator blends useful for 3d printing |
CN111176073B (zh) * | 2020-01-06 | 2023-11-07 | 苏州瑞红电子化学品有限公司 | 一种含高耐热性羧基酚醛树脂的厚膜光刻胶组合物 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3666473A (en) * | 1970-10-06 | 1972-05-30 | Ibm | Positive photoresists for projection exposure |
US4173470A (en) * | 1977-11-09 | 1979-11-06 | Bell Telephone Laboratories, Incorporated | Novolak photoresist composition and preparation thereof |
EP0054258B1 (de) * | 1980-12-17 | 1986-03-05 | Konica Corporation | Lichtempfindliche Zusammensetzungen |
EP0070624B1 (de) * | 1981-06-22 | 1986-11-20 | Philip A. Hunt Chemical Corporation | Novolak-Harz und eine dieses enthaltende positive "Photoresist"-Mischung |
US4492740A (en) * | 1982-06-18 | 1985-01-08 | Konishiroku Photo Industry Co., Ltd. | Support for lithographic printing plate |
CA1255952A (en) * | 1983-03-04 | 1989-06-20 | Akihiro Furuta | Positive type photoresist composition |
JPH0658529B2 (ja) * | 1983-08-17 | 1994-08-03 | 三菱化成株式会社 | ポジ型クレゾ−ルノボラツクフオトレジスト組成物 |
JPS6045238A (ja) * | 1983-08-23 | 1985-03-11 | Fujitsu Ltd | ポジ型レジスト材料とその製造方法 |
EP0136110A3 (de) * | 1983-08-30 | 1986-05-28 | Mitsubishi Kasei Corporation | Positive lichtempfindliche Zusammensetzung und Verwendung für Photolacke |
DE3344202A1 (de) * | 1983-12-07 | 1985-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Positiv-fotoresistzusammensetzungen |
JPS61185741A (ja) * | 1985-02-13 | 1986-08-19 | Mitsubishi Chem Ind Ltd | ポジ型フオトレジスト組成物 |
-
1987
- 1987-03-30 DE DE3751743T patent/DE3751743T2/de not_active Expired - Lifetime
- 1987-03-30 EP EP87302750A patent/EP0239423B1/de not_active Expired - Lifetime
-
1989
- 1989-06-30 US US07/373,592 patent/US5019479A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0239423B1 (de) | 1996-03-20 |
EP0239423A3 (en) | 1989-10-18 |
US5019479A (en) | 1991-05-28 |
DE3751743D1 (de) | 1996-04-25 |
EP0239423A2 (de) | 1987-09-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8365 | Fully valid after opposition proceedings | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: JSR CORP., TOKIO/TOKYO, JP |