KR970063635A - 수직형 퍼티스용 보트(Boat) - Google Patents

수직형 퍼티스용 보트(Boat) Download PDF

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Publication number
KR970063635A
KR970063635A KR1019960004199A KR19960004199A KR970063635A KR 970063635 A KR970063635 A KR 970063635A KR 1019960004199 A KR1019960004199 A KR 1019960004199A KR 19960004199 A KR19960004199 A KR 19960004199A KR 970063635 A KR970063635 A KR 970063635A
Authority
KR
South Korea
Prior art keywords
boat
slot
vertical surface
trouble
deterioration
Prior art date
Application number
KR1019960004199A
Other languages
English (en)
Other versions
KR100207461B1 (ko
Inventor
이용운
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019960004199A priority Critical patent/KR100207461B1/ko
Priority to TW085111004A priority patent/TW446677B/zh
Priority to JP31241496A priority patent/JPH09232412A/ja
Priority to US08/804,432 priority patent/US5921773A/en
Publication of KR970063635A publication Critical patent/KR970063635A/ko
Application granted granted Critical
Publication of KR100207461B1 publication Critical patent/KR100207461B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67303—Vertical boat type carrier whereby the substrates are horizontally supported, e.g. comprising rod-shaped elements
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)

Abstract

본 발명은 수직형 퍼니스용 보트에 관하여 게시한다. 종래의 보트는 슬롯의 내측 수직면의 상단만 경사면으로 형성되어 있고, 또 보트의 하단판에만 핀 구멍들이 형성되어 있었기 때문에 슬롯의 열화 및 석영성 트러블 발생시에는 사용하지 못하게 되었다. 그러나 본 발명에 의하면 슬롯의 내측 수직면의 상단과 하단 모두가 경사면으로 형성되어 있고, 또 보트의 하단 판뿐만 아니라 상단 판에도 핀 구멍들이 형성되어 있어서 슬롯의 열화 및 석영성 트러블 발생시에도 사용이 가능하다. 또한 보트의 사용 주기가 2배로 연장되어서 보트의 제조 원가도 절약된다.

Description

수직형 퍼니스용 보트(Boat)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제4도는 본 발명의 수직형 퍼니스용 보트의 단면도.

Claims (1)

  1. 내측 수직면 상단 및 하단이 경사면을 이루는 슬롯; 및 핀을 사용하여 외부 장치에 고정하기 위한 적어도 하나의 핀 구멍을 갖는 상단 판과 하단 판을 갖는 것을 특징으로 하는 수직형 퍼니스용 보트.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019960004199A 1996-02-22 1996-02-22 수직형 퍼니스용 보트 KR100207461B1 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1019960004199A KR100207461B1 (ko) 1996-02-22 1996-02-22 수직형 퍼니스용 보트
TW085111004A TW446677B (en) 1996-02-22 1996-09-09 Wafer boat for vertical furnace
JP31241496A JPH09232412A (ja) 1996-02-22 1996-11-22 ウェーハ積載のための垂直型ファーネス用のボート
US08/804,432 US5921773A (en) 1996-02-22 1997-02-21 Wafer boat for a vertical furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019960004199A KR100207461B1 (ko) 1996-02-22 1996-02-22 수직형 퍼니스용 보트

Publications (2)

Publication Number Publication Date
KR970063635A true KR970063635A (ko) 1997-09-12
KR100207461B1 KR100207461B1 (ko) 1999-07-15

Family

ID=19451573

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019960004199A KR100207461B1 (ko) 1996-02-22 1996-02-22 수직형 퍼니스용 보트

Country Status (4)

Country Link
US (1) US5921773A (ko)
JP (1) JPH09232412A (ko)
KR (1) KR100207461B1 (ko)
TW (1) TW446677B (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7059848B2 (en) 2004-10-18 2006-06-13 Samsung Electronics Co., Ltd. Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment
CN112466794A (zh) * 2020-11-24 2021-03-09 长江存储科技有限责任公司 薄膜沉积装置及晶舟组件

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6196211B1 (en) 1999-04-15 2001-03-06 Integrated Materials, Inc. Support members for wafer processing fixtures
US6225594B1 (en) 1999-04-15 2001-05-01 Integrated Materials, Inc. Method and apparatus for securing components of wafer processing fixtures
WO2001018856A1 (fr) * 1999-09-03 2001-03-15 Mitsubishi Materials Silicon Corporation Support de tranche
US6455395B1 (en) 2000-06-30 2002-09-24 Integrated Materials, Inc. Method of fabricating silicon structures including fixtures for supporting wafers
US6450346B1 (en) 2000-06-30 2002-09-17 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing
KR100712495B1 (ko) * 2001-09-01 2007-04-27 삼성전자주식회사 웨이퍼 적재용 보트의 고정장치 및 그에 의한 고정방법
JP2003347176A (ja) * 2002-03-20 2003-12-05 Shin Etsu Handotai Co Ltd 貼り合わせウェーハの製造方法
US6939132B2 (en) * 2002-09-30 2005-09-06 Samsung Austin Semiconductor, L.P. Semiconductor workpiece apparatus
KR101111436B1 (ko) * 2004-09-13 2012-02-15 신에쯔 한도타이 가부시키가이샤 Ｓｏｉ 웨이퍼의 제조 방법 및 ｓｏｉ 웨이퍼
KR100705267B1 (ko) 2005-10-24 2007-04-09 동부일렉트로닉스 주식회사 보트 및 이를 구비한 수직형 퍼니스
US8449238B2 (en) * 2006-10-11 2013-05-28 Sunpower Corporation In-line furnace conveyors with integrated wafer retainers
JP4812675B2 (ja) * 2007-03-30 2011-11-09 コバレントマテリアル株式会社 縦型ウエハボート
US9153466B2 (en) * 2012-04-26 2015-10-06 Asm Ip Holding B.V. Wafer boat
US10008401B2 (en) * 2013-04-09 2018-06-26 Asm Ip Holding B.V. Wafer boat having dual pitch
CN112786500A (zh) * 2019-11-11 2021-05-11 夏泰鑫半导体(青岛)有限公司 晶圆架及具有晶圆架的垂直晶舟
KR20210100798A (ko) 2020-02-06 2021-08-18 삼성디스플레이 주식회사 기판용 카세트

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7059848B2 (en) 2004-10-18 2006-06-13 Samsung Electronics Co., Ltd. Method of and auxiliary cleaner for use in cleaning a diffusion furnace of semiconductor manufacturing equipment
CN112466794A (zh) * 2020-11-24 2021-03-09 长江存储科技有限责任公司 薄膜沉积装置及晶舟组件

Also Published As

Publication number Publication date
TW446677B (en) 2001-07-21
US5921773A (en) 1999-07-13
JPH09232412A (ja) 1997-09-05
KR100207461B1 (ko) 1999-07-15

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