KR970062813A - Photoresist coating method - Google Patents
Photoresist coating method Download PDFInfo
- Publication number
- KR970062813A KR970062813A KR1019960003145A KR19960003145A KR970062813A KR 970062813 A KR970062813 A KR 970062813A KR 1019960003145 A KR1019960003145 A KR 1019960003145A KR 19960003145 A KR19960003145 A KR 19960003145A KR 970062813 A KR970062813 A KR 970062813A
- Authority
- KR
- South Korea
- Prior art keywords
- organic solvent
- photoresist
- wafer
- coating
- coating method
- Prior art date
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- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
본 발명은 고집적 반도체 제조 공정에서 포토레지스트를 코팅하기 전에 유기용제를 이용한 전처리 공정을 실시하는 포토레지스트 코팅 방법에 관한 것이다.The present invention relates to a photoresist coating method for performing a pretreatment process using an organic solvent before coating a photoresist in a highly integrated semiconductor manufacturing process.
본 발명은 종래의 포토레지스터 코팅 공정을 진행하기 전에 유기용제를 미리 코팅 처리함으로써 소량의 포토 레지스트로도 웨이퍼의 코팅이 가능하도록 하는데 그 목적이 있다.It is an object of the present invention to coat a wafer with a small amount of photoresist by coating an organic solvent in advance before proceeding with a conventional photoresist coating process.
본 발명에 의하면 웨이퍼상에 포토레지스트의 코팅 공정을 진행하기 전에 유기용제로 미리 전처리함으로써 소량의 포토레지스트로도 웨이퍼의 코팅이 가능해 원가 절감의 효과가 있다.According to the present invention, the wafer can be coated with a small amount of photoresist by pre-treating the wafer with an organic solvent before the coating process of the photoresist is performed, thereby reducing the cost.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is a trivial issue, I did not include the contents of the text.
제2도 내지 제3도는 본 발명에 따른 포토레지스트 코팅 공정을 나타내는 공정도.FIGS. 2 to 3 are process drawings showing a photoresist coating process according to the present invention. FIG.
Claims (4)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960003145A KR970062813A (en) | 1996-02-09 | 1996-02-09 | Photoresist coating method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960003145A KR970062813A (en) | 1996-02-09 | 1996-02-09 | Photoresist coating method |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970062813A true KR970062813A (en) | 1997-09-12 |
Family
ID=66221971
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960003145A KR970062813A (en) | 1996-02-09 | 1996-02-09 | Photoresist coating method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR970062813A (en) |
-
1996
- 1996-02-09 KR KR1019960003145A patent/KR970062813A/en not_active Application Discontinuation
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E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |