KR960026111A - Primers, prime methods and devices thereof - Google Patents

Primers, prime methods and devices thereof Download PDF

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Publication number
KR960026111A
KR960026111A KR1019940040774A KR19940040774A KR960026111A KR 960026111 A KR960026111 A KR 960026111A KR 1019940040774 A KR1019940040774 A KR 1019940040774A KR 19940040774 A KR19940040774 A KR 19940040774A KR 960026111 A KR960026111 A KR 960026111A
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KR
South Korea
Prior art keywords
primer
equipment
prime
solution
primers
Prior art date
Application number
KR1019940040774A
Other languages
Korean (ko)
Other versions
KR0140649B1 (en
Inventor
마상훈
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019940040774A priority Critical patent/KR0140649B1/en
Publication of KR960026111A publication Critical patent/KR960026111A/en
Application granted granted Critical
Publication of KR0140649B1 publication Critical patent/KR0140649B1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

1. 청구범위에 기재된 고안이 속한 기술분야 프라이머와, 프라이머(Primer)가 HMDS(Hexamethyldisilizane)인 프라임방법및 그 장비에 관한 것임.1. TECHNICAL FIELD The invention described in the claims pertains to a primer, a primer (Primer) of HMDS (Hexamethyldisilizane) prime method and equipment.

2. 고안이 해결하려고 하는 기술적 과제2. The technical problem the invention is trying to solve

종래 공정의 장시간화를 개선하면서 유독성이 강한 프라이머의 사용량을 줄일 수 있는 프라이머, 프라임 방법 및 장비에유용함.Useful for primers, prime methods and equipment that can reduce the amount of highly toxic primers while improving the length of conventional processes.

3. 고안의 해결 방법의 요지3. Summary of solution of design

크실렌 용액에 10%의 HMDS용액을 혼합한 프라이머와, 기존의 감광막 도포장비의 도포수단에 프라이머 분사노즐을 포함한장비를 프라임 장비로 하며, 프라임를 분사노즐(1)을 통하여 분사시켜 도포함과 동시에 디핑(Dipping)시키는 단계(a)와,디핑된 웨이퍼를 스핀 드라이로 건조하는 단계(b)로 되는 프라임 방법임.Primer is a equipment that contains a primer mixed with 10% HMDS solution in xylene solution and a primer spray nozzle to the application means of the conventional photoresist coating equipment. And a step (a) of dipping and a step (b) of drying the dipped wafer by spin dry.

4. 고안의 중요한 용도4. Important uses of the devise

본 발명에 의한 프라임 공정은 종래 공정에 비하여 공정 시간을 단축시키게 되었으며, HMDS용액을 극소량(약 10%)을 사용하게 되었으며, 프라이머를 분사도포하기 위한 장비에 있어서도 장비의 구성면이나, 운용면에서 유용성을 가짐.Prime process according to the present invention has shortened the process time compared to the conventional process, using a very small amount (about 10%) of HMDS solution, and also useful in terms of construction and operation of the equipment in the equipment for spray coating primer Having

Description

프라이머, 프라임 방법 및 그 장치Primers, prime methods and devices thereof

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제1a도는 본 발명 프라임를 도포하기 위한 도포장비의 구성도. 제1b도는 본 발명 웨이퍼 스핀 드라이 장비의 구성도.Figure 1a is a block diagram of the coating equipment for applying the present invention prime. Figure 1b is a block diagram of the wafer spin dry equipment of the present invention.

Claims (3)

프라임 공정에 사용되는 프라이머에 있어서, 전체 프라이머 용액중 HMDS용액을 10%로 하고, 나머지는 크실렌 용액으로 한 프라이머인것을 특징으로 하는 프라이머.A primer for use in the prime step, characterized in that the primer is a 10% HMDS solution in the total primer solution, the remainder is a xylene solution. 프라임 장비에 있어서, 기존의 감광막 도포장치의 도포수단에 프라이머 분사노즐을 포함한것을 특징으로하는 프라임 장비.A prime equipment, characterized by including a primer spray nozzle in the coating means of the conventional photosensitive film coating apparatus. 프라임 방법에 있어서, 프라이머를 분사노즐을 통하여 분사시켜 도포함과 동시에 디핑시키는 단계와, 디핑된 웨이터 스핀 드라이로 건조하는 단계를 포함하는 것을 특징으로 하는 프라임 방법.A prime method, comprising: spraying a primer through a spray nozzle to dip simultaneously with coating, and drying with a dipped waiter spin dry. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940040774A 1994-12-30 1994-12-30 Primer, method of prime and its apparatus KR0140649B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019940040774A KR0140649B1 (en) 1994-12-30 1994-12-30 Primer, method of prime and its apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940040774A KR0140649B1 (en) 1994-12-30 1994-12-30 Primer, method of prime and its apparatus

Publications (2)

Publication Number Publication Date
KR960026111A true KR960026111A (en) 1996-07-22
KR0140649B1 KR0140649B1 (en) 1998-07-15

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940040774A KR0140649B1 (en) 1994-12-30 1994-12-30 Primer, method of prime and its apparatus

Country Status (1)

Country Link
KR (1) KR0140649B1 (en)

Also Published As

Publication number Publication date
KR0140649B1 (en) 1998-07-15

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