KR970053276A - Electron scanning microscope for semiconductor device manufacturing - Google Patents

Electron scanning microscope for semiconductor device manufacturing Download PDF

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Publication number
KR970053276A
KR970053276A KR1019950072234A KR19950072234A KR970053276A KR 970053276 A KR970053276 A KR 970053276A KR 1019950072234 A KR1019950072234 A KR 1019950072234A KR 19950072234 A KR19950072234 A KR 19950072234A KR 970053276 A KR970053276 A KR 970053276A
Authority
KR
South Korea
Prior art keywords
chamber
semiconductor device
scanning microscope
electron scanning
manufacturing
Prior art date
Application number
KR1019950072234A
Other languages
Korean (ko)
Inventor
이영범
Original Assignee
김주용
현대전자산업 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김주용, 현대전자산업 주식회사 filed Critical 김주용
Priority to KR1019950072234A priority Critical patent/KR970053276A/en
Publication of KR970053276A publication Critical patent/KR970053276A/en

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Abstract

1. 청구범위에 기재된 발명이 속한 기술분야1. TECHNICAL FIELD OF THE INVENTION

반도체 소자 제조용 장치.Device for manufacturing semiconductor device.

2. 발명이 해결하려고 하는 기술적 과제2. The technical problem to be solved by the invention

종래의 SEM은 챔버 내의 진공 펌핑이 완전히 수행되지 않아 잔류 미세한 파티클의 산란으로 전자밤의 경로가 간섭을 받아 정확한 이미지를 얻을 수 없다는 문제점을 해결하고자 함.The conventional SEM is to solve the problem that the vacuum pumping in the chamber is not performed completely, the electron night path is interfered with the scattering of the remaining fine particles to obtain an accurate image.

3. 발명의 해결방법의 요지3. Summary of Solution to Invention

SEM의 얼라인먼트 코일이 설치된 제3챔버와 콘덴서 렌즈가 설치된 제2챔버와의 사이에, 그리고 디텍터 렌즈가 설치된 제4쳄버와의 사이에 공간을 차단하기 위한 차단 수단을 설치함으로써 종래와 동일한 챔버내의 동일한 진공 펌프로도 효율적으로 배기를 실시하는 반도체 소자 제조용 전자 주사 현미경을 제공하고자 함.In the same chamber as in the prior art, a blocking means for blocking the space is provided between the third chamber in which the SEM alignment coil is installed and the second chamber in which the condenser lens is installed, and the fourth chamber in which the detector lens is installed. The present invention aims to provide an electron scanning microscope for manufacturing a semiconductor device which exhausts efficiently even with a vacuum pump.

4. 발명의 중요한 용도4. Important uses of the invention

반도체 소자 제조용 전자 주사 현미경을 제조하는데 이용됨.Used to prepare electron scanning microscope for semiconductor device manufacturing.

Description

반도체 소자 제조용 전자 주사 현미경Electron scanning microscope for semiconductor device manufacturing

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음As this is a public information case, the full text was not included.

제1도는 본 발명의 반도체 소자 제조용 전자 주사 현미경의 설치도.1 is an installation diagram of an electron scanning microscope for producing a semiconductor device of the present invention.

Claims (3)

반도체 소자 제조용 전자 주사 현미경에 있어서, 전자총이 설치된 제1챔버와 콘덴서 렌즈가 설치된 제2챔버와 얼라인먼트가 설치딘 제3챔버 및 디텍터 렌즈가 설치된 제4챔버와, 상기 제1 및 제2 및 제3챔버내의 압력을 조절하고 잔류하는 파티클을 흡입하여 배기하기 위한 제1 및 제2 및 제3펌핑 수단과, 상기 제1 및 제2 및 제3 및 제4챔버 사이를 차단하기 위한 다수의 차단 수단을 포함하여 이루어진 반도체 소자 제조용 전자 주사 현미경.An electron scanning microscope for manufacturing a semiconductor device, comprising: a first chamber in which an electron gun is installed, a second chamber in which a condenser lens is installed, a third chamber in which an alignment is installed, and a fourth chamber in which a detector lens is installed, and the first, second, and third First and second and third pumping means for adjusting the pressure in the chamber and for sucking and exhausting the remaining particles; and a plurality of blocking means for blocking between the first, second and third and fourth chambers. An electron scanning microscope for producing a semiconductor device comprising. 제1항에 있어서, 상기 차단 수단은 에어락 밸브인 것을 특징으로 하는 반도체 소자 제조용 전자 주사 현미경.The electron scanning microscope for semiconductor device manufacturing according to claim 1, wherein the blocking means is an air lock valve. 제1항 또는 제2항에 있어서, 상기 차단 수단은 상기 제2챔버와 제3챔버 사이에 그리고 상기 제3챔버와 상기 제4챔버 사이에 각각 설치된 것을 특징으로 하는 반도체 소자 제조용 전자 주사 현미경.The electron scanning microscope of claim 1, wherein the blocking means is provided between the second chamber and the third chamber, and between the third chamber and the fourth chamber, respectively. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950072234A 1995-12-29 1995-12-29 Electron scanning microscope for semiconductor device manufacturing KR970053276A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1019950072234A KR970053276A (en) 1995-12-29 1995-12-29 Electron scanning microscope for semiconductor device manufacturing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950072234A KR970053276A (en) 1995-12-29 1995-12-29 Electron scanning microscope for semiconductor device manufacturing

Publications (1)

Publication Number Publication Date
KR970053276A true KR970053276A (en) 1997-07-31

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Application Number Title Priority Date Filing Date
KR1019950072234A KR970053276A (en) 1995-12-29 1995-12-29 Electron scanning microscope for semiconductor device manufacturing

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KR (1) KR970053276A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101395258B1 (en) * 2013-11-22 2014-05-15 한국기계연구원 Scanning electron microscope with detatchable vaccum chamber unit and scanning method using the same
KR101395261B1 (en) * 2013-12-03 2014-05-15 한국기계연구원 A movable vacuum chamber and scanning electron microscope with a movable vacuum chamber and scanning method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101395258B1 (en) * 2013-11-22 2014-05-15 한국기계연구원 Scanning electron microscope with detatchable vaccum chamber unit and scanning method using the same
KR101395261B1 (en) * 2013-12-03 2014-05-15 한국기계연구원 A movable vacuum chamber and scanning electron microscope with a movable vacuum chamber and scanning method

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