KR970052819U - Semiconductor manufacturing equipment - Google Patents

Semiconductor manufacturing equipment

Info

Publication number
KR970052819U
KR970052819U KR2019960002153U KR19960002153U KR970052819U KR 970052819 U KR970052819 U KR 970052819U KR 2019960002153 U KR2019960002153 U KR 2019960002153U KR 19960002153 U KR19960002153 U KR 19960002153U KR 970052819 U KR970052819 U KR 970052819U
Authority
KR
South Korea
Prior art keywords
semiconductor manufacturing
manufacturing equipment
equipment
semiconductor
manufacturing
Prior art date
Application number
KR2019960002153U
Other languages
Korean (ko)
Other versions
KR0135454Y1 (en
Inventor
장종복
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019960002153U priority Critical patent/KR0135454Y1/en
Publication of KR970052819U publication Critical patent/KR970052819U/en
Application granted granted Critical
Publication of KR0135454Y1 publication Critical patent/KR0135454Y1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019960002153U 1996-02-13 1996-02-13 Fabricating apparatus of semiconductor device KR0135454Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019960002153U KR0135454Y1 (en) 1996-02-13 1996-02-13 Fabricating apparatus of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019960002153U KR0135454Y1 (en) 1996-02-13 1996-02-13 Fabricating apparatus of semiconductor device

Publications (2)

Publication Number Publication Date
KR970052819U true KR970052819U (en) 1997-09-08
KR0135454Y1 KR0135454Y1 (en) 1999-03-20

Family

ID=19450417

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019960002153U KR0135454Y1 (en) 1996-02-13 1996-02-13 Fabricating apparatus of semiconductor device

Country Status (1)

Country Link
KR (1) KR0135454Y1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100445631B1 (en) * 2001-07-12 2004-08-25 삼성전자주식회사 Slot valve opening and shutting apparatus of semiconductor device fabrication equipment

Also Published As

Publication number Publication date
KR0135454Y1 (en) 1999-03-20

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Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20061030

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee