KR970025775U - Semiconductor device manufacturing equipment - Google Patents

Semiconductor device manufacturing equipment

Info

Publication number
KR970025775U
KR970025775U KR2019950034439U KR19950034439U KR970025775U KR 970025775 U KR970025775 U KR 970025775U KR 2019950034439 U KR2019950034439 U KR 2019950034439U KR 19950034439 U KR19950034439 U KR 19950034439U KR 970025775 U KR970025775 U KR 970025775U
Authority
KR
South Korea
Prior art keywords
semiconductor device
device manufacturing
manufacturing equipment
equipment
semiconductor
Prior art date
Application number
KR2019950034439U
Other languages
Korean (ko)
Other versions
KR200143430Y1 (en
Inventor
남정림
이창환
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019950034439U priority Critical patent/KR200143430Y1/en
Publication of KR970025775U publication Critical patent/KR970025775U/en
Application granted granted Critical
Publication of KR200143430Y1 publication Critical patent/KR200143430Y1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR2019950034439U 1995-11-20 1995-11-20 Manufacturing apparatus of semiconductor devices KR200143430Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950034439U KR200143430Y1 (en) 1995-11-20 1995-11-20 Manufacturing apparatus of semiconductor devices

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950034439U KR200143430Y1 (en) 1995-11-20 1995-11-20 Manufacturing apparatus of semiconductor devices

Publications (2)

Publication Number Publication Date
KR970025775U true KR970025775U (en) 1997-06-20
KR200143430Y1 KR200143430Y1 (en) 1999-06-15

Family

ID=19429550

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950034439U KR200143430Y1 (en) 1995-11-20 1995-11-20 Manufacturing apparatus of semiconductor devices

Country Status (1)

Country Link
KR (1) KR200143430Y1 (en)

Also Published As

Publication number Publication date
KR200143430Y1 (en) 1999-06-15

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Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20061221

Year of fee payment: 9

LAPS Lapse due to unpaid annual fee