KR950031473U - Semiconductor wafer drying equipment - Google Patents

Semiconductor wafer drying equipment

Info

Publication number
KR950031473U
KR950031473U KR2019940008897U KR19940008897U KR950031473U KR 950031473 U KR950031473 U KR 950031473U KR 2019940008897 U KR2019940008897 U KR 2019940008897U KR 19940008897 U KR19940008897 U KR 19940008897U KR 950031473 U KR950031473 U KR 950031473U
Authority
KR
South Korea
Prior art keywords
semiconductor wafer
drying equipment
wafer drying
equipment
semiconductor
Prior art date
Application number
KR2019940008897U
Other languages
Korean (ko)
Other versions
KR200169676Y1 (en
Inventor
이봉기
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940008897U priority Critical patent/KR200169676Y1/en
Publication of KR950031473U publication Critical patent/KR950031473U/en
Application granted granted Critical
Publication of KR200169676Y1 publication Critical patent/KR200169676Y1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
KR2019940008897U 1994-04-26 1994-04-26 Dryer for semiconductor wafer KR200169676Y1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940008897U KR200169676Y1 (en) 1994-04-26 1994-04-26 Dryer for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940008897U KR200169676Y1 (en) 1994-04-26 1994-04-26 Dryer for semiconductor wafer

Publications (2)

Publication Number Publication Date
KR950031473U true KR950031473U (en) 1995-11-22
KR200169676Y1 KR200169676Y1 (en) 2000-02-01

Family

ID=19381806

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940008897U KR200169676Y1 (en) 1994-04-26 1994-04-26 Dryer for semiconductor wafer

Country Status (1)

Country Link
KR (1) KR200169676Y1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040032200A (en) * 2002-10-01 2004-04-17 주식회사 에이텍 Apparatus for washing and drying wafer and method of washing and drying wafer using that

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990048784A (en) * 1997-12-10 1999-07-05 김영환 Manufacturing method of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040032200A (en) * 2002-10-01 2004-04-17 주식회사 에이텍 Apparatus for washing and drying wafer and method of washing and drying wafer using that

Also Published As

Publication number Publication date
KR200169676Y1 (en) 2000-02-01

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Legal Events

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E701 Decision to grant or registration of patent right
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Payment date: 20081027

Year of fee payment: 10

EXPY Expiration of term