KR970019157U - Etching agent recycling device for wet etching equipment - Google Patents
Etching agent recycling device for wet etching equipmentInfo
- Publication number
- KR970019157U KR970019157U KR2019950029980U KR19950029980U KR970019157U KR 970019157 U KR970019157 U KR 970019157U KR 2019950029980 U KR2019950029980 U KR 2019950029980U KR 19950029980 U KR19950029980 U KR 19950029980U KR 970019157 U KR970019157 U KR 970019157U
- Authority
- KR
- South Korea
- Prior art keywords
- recycling device
- etching
- agent recycling
- equipment
- wet etching
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/6708—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950029980U KR0122318Y1 (en) | 1995-10-24 | 1995-10-24 | Etechant recycle device of wet etching apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019950029980U KR0122318Y1 (en) | 1995-10-24 | 1995-10-24 | Etechant recycle device of wet etching apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
KR970019157U true KR970019157U (en) | 1997-05-26 |
KR0122318Y1 KR0122318Y1 (en) | 1998-07-15 |
Family
ID=19426773
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019950029980U KR0122318Y1 (en) | 1995-10-24 | 1995-10-24 | Etechant recycle device of wet etching apparatus |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR0122318Y1 (en) |
-
1995
- 1995-10-24 KR KR2019950029980U patent/KR0122318Y1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0122318Y1 (en) | 1998-07-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
REGI | Registration of establishment | ||
FPAY | Annual fee payment |
Payment date: 20040326 Year of fee payment: 7 |
|
LAPS | Lapse due to unpaid annual fee |