KR970007497A - Exposure energy measurement method - Google Patents
Exposure energy measurement method Download PDFInfo
- Publication number
- KR970007497A KR970007497A KR1019950020158A KR19950020158A KR970007497A KR 970007497 A KR970007497 A KR 970007497A KR 1019950020158 A KR1019950020158 A KR 1019950020158A KR 19950020158 A KR19950020158 A KR 19950020158A KR 970007497 A KR970007497 A KR 970007497A
- Authority
- KR
- South Korea
- Prior art keywords
- photolithography process
- measurement
- pattern
- exposure energy
- forming
- Prior art date
Links
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
본 발명은 동일한 포토리소그래피 공정이 반복적으로 계속 시행되는 반도체 소자 제조 공정에 있어서; 상기 포토리소그래피 공정에 사용되는 레티클에 각기 크기가 다른 다수의 측정용 패턴들을 형성하고 상기 측정용 패턴들마다 상기 측정용 패턴 간을 구분해주는 표시부 패턴을 형성하여 포토리소그래피 공정을 진행한 후, 광학 현미경으로 기판에 전사된 측정용 패턴을 확인하여 적정한 노광에너지로 포토리소그래피 공정이 진행되었는지를 판단하는 것을 특징으로 하는 노광 에너지 측정 방법에 관한 것으로, 전자 현미경을 사용하여 매 공정하다 CD를 확인하지 않아도됨으로, 전자 현미경 사용에 따른 설비 및 시간을 절약할 수 있는 효과가 있다.The present invention relates to a semiconductor device manufacturing process in which the same photolithography process is repeatedly performed; After forming a plurality of measurement patterns having different sizes on the reticle used in the photolithography process and forming a display pattern for distinguishing between the measurement patterns for each measurement pattern, a photolithography process is performed. The present invention relates to a method of measuring exposure energy, characterized by determining whether a photolithography process has been performed at an appropriate exposure energy by checking a measurement pattern transferred to a substrate. Therefore, there is an effect that can save equipment and time by using an electron microscope.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제2도는 본 발명의 일실시예에 따라 레티클 상에 형성되는 지시자를 나타내는 평면도.2 is a plan view showing an indicator formed on the reticle in accordance with one embodiment of the present invention.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950020158A KR970007497A (en) | 1995-07-10 | 1995-07-10 | Exposure energy measurement method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019950020158A KR970007497A (en) | 1995-07-10 | 1995-07-10 | Exposure energy measurement method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR970007497A true KR970007497A (en) | 1997-02-21 |
Family
ID=66526319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019950020158A KR970007497A (en) | 1995-07-10 | 1995-07-10 | Exposure energy measurement method |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR970007497A (en) |
-
1995
- 1995-07-10 KR KR1019950020158A patent/KR970007497A/en not_active Application Discontinuation
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WITN | Withdrawal due to no request for examination |