KR970001248A - 비-다공성의 고순도 용융 실리카 유리의 제조방법 - Google Patents
비-다공성의 고순도 용융 실리카 유리의 제조방법 Download PDFInfo
- Publication number
- KR970001248A KR970001248A KR1019960020410A KR19960020410A KR970001248A KR 970001248 A KR970001248 A KR 970001248A KR 1019960020410 A KR1019960020410 A KR 1019960020410A KR 19960020410 A KR19960020410 A KR 19960020410A KR 970001248 A KR970001248 A KR 970001248A
- Authority
- KR
- South Korea
- Prior art keywords
- reducing atmosphere
- hydrogen
- fused silica
- high purity
- silica glass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/90—Drying, dehydration, minimizing oh groups
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Abstract
본 발명은 248㎚ 엑시머 레이저-유발 광학적 손상에 큰 저항성을 갖는 고순도 용융 실리카 유리를 제조에 관한 것으로, 더욱 상세하게는, 본 발명은 용융 실리카의 광학 부재 또는 블랭크에 관한 것이다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (8)
- a) 산화 또는 불꽃 가수분해를 이용한 열적 분해를 통해 SiO2로 전환될 수 있는 실리콘을 함유하는 기상 화합물을 포함하는 가스 스트림을 제조하는 단계; b) 상기 가스 스트림을 연소 버어너의 불꽃에 통과시켜 무정형 입자의 용융된 SiO2를 형성시키는 단계; c) 무정형 입자를 지지체 위에 증착시키는 단계; d) 무정형 입자를 환원 분위기에 노출시키는 단계; 및 e) 상기 무정형 입자 증착물을 비-다공성의 바디로 고화시키기 위해 환원 분위기의 온도를 상승시키는 단계를 포함하는 것을 특징으로 하는 비-다공성의 고순도 용융 실리카 유리의 제조방법.
- 제1항에 있어서, 상기 (e) 단계에서 환원 분위기의 온도가 1000 내지 1400℃의 범위로 상승됨을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제1항에 있어서, 상기 환원 분위기가 적어도 하나의 수소, 일산화탄소, 디보란, 하이드라진을 포함하는 것을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제3항에 있어서, 상기 환원 분위기가 수소, 또는 수소 및 헬륨을 포함하는 것을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제4항에 있어서, 상기 환원 분위기가 전체 혼합물 중 1 내지 10% 양의 수소를 포함하는 것을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제1항에 있어서, 상기 실리콘-함유 화합물은 할로겐화합물이 없는 폴리메틸실록산을 포함하는 것을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제6항에 있어서, 상기 폴리메틸실록산이 헥사메틸디실록산, 폴리 메틸사이클로실록산 및 이들의 혼합물로부터 선택됨을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.
- 제7항에 있어서, 상기 폴리메틸사이클로실록산이 옥타메틸사이클로테트라실록산, 데카메틸사이클로펜타실록산, 헥사메틸사이클로트리실록산 및 이들의 혼합물로 이루어진 군으로부터 선택됨을 특징으로 하는 비-다공성 고순도 용융 실리카 유리의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US48446595A | 1995-06-07 | 1995-06-07 | |
US08/484,465 | 1995-06-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970001248A true KR970001248A (ko) | 1997-01-21 |
Family
ID=23924258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960020410A KR970001248A (ko) | 1995-06-07 | 1996-06-07 | 비-다공성의 고순도 용융 실리카 유리의 제조방법 |
Country Status (5)
Country | Link |
---|---|
US (1) | US5735921A (ko) |
EP (1) | EP0747327B2 (ko) |
JP (1) | JP4173564B2 (ko) |
KR (1) | KR970001248A (ko) |
DE (1) | DE69601749T3 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20170058662A (ko) * | 2015-11-19 | 2017-05-29 | (주)엘지하우시스 | 인조대리석의 절단 휨 방지방법 |
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AU744011B2 (en) * | 1996-10-25 | 2002-02-14 | Corning Incorporated | Apparatus and method for reducing break sources in drawn fibers |
EP0870737B1 (en) * | 1997-04-08 | 2002-07-24 | Shin-Etsu Quartz Products Co., Ltd. | Optical synthetic quartz glass, production method thereof, and optical member for excimer laser using the synthetic quartz glass |
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US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
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JP2001247318A (ja) * | 2000-03-03 | 2001-09-11 | Shin Etsu Chem Co Ltd | 合成石英ガラス光学部材及びその製造方法 |
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US6813908B2 (en) * | 2000-12-22 | 2004-11-09 | Corning Incorporated | Treating an optical fiber preform with carbon monoxide |
WO2002051762A1 (en) * | 2000-12-22 | 2002-07-04 | Corning Incorporated | Treating soot preforms with a reducing agent |
US7797966B2 (en) | 2000-12-29 | 2010-09-21 | Single Crystal Technologies, Inc. | Hot substrate deposition of fused silica |
WO2002098811A1 (en) * | 2001-06-04 | 2002-12-12 | The Regents Of The University Of California | Combined finishing and uv laser conditioning process for producing damage resistant optics |
KR100653861B1 (ko) * | 2002-11-29 | 2006-12-05 | 신에쯔 세끼에이 가부시키가이샤 | 합성 석영 유리의 제조 방법 및 합성 석영 유리체 |
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1996
- 1996-05-30 DE DE69601749T patent/DE69601749T3/de not_active Expired - Lifetime
- 1996-05-30 EP EP96108702A patent/EP0747327B2/en not_active Expired - Lifetime
- 1996-06-07 JP JP14612896A patent/JP4173564B2/ja not_active Expired - Lifetime
- 1996-06-07 KR KR1019960020410A patent/KR970001248A/ko not_active Application Discontinuation
- 1996-12-10 US US08/762,513 patent/US5735921A/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20170058662A (ko) * | 2015-11-19 | 2017-05-29 | (주)엘지하우시스 | 인조대리석의 절단 휨 방지방법 |
Also Published As
Publication number | Publication date |
---|---|
JPH092835A (ja) | 1997-01-07 |
EP0747327A1 (en) | 1996-12-11 |
US5735921A (en) | 1998-04-07 |
DE69601749T2 (de) | 1999-10-21 |
DE69601749T3 (de) | 2004-04-29 |
JP4173564B2 (ja) | 2008-10-29 |
EP0747327B2 (en) | 2003-08-27 |
DE69601749D1 (de) | 1999-04-22 |
EP0747327B1 (en) | 1999-03-17 |
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