KR850000801A - 광전지장치 및 그 제조방법 - Google Patents
광전지장치 및 그 제조방법 Download PDFInfo
- Publication number
- KR850000801A KR850000801A KR1019840002914A KR840002914A KR850000801A KR 850000801 A KR850000801 A KR 850000801A KR 1019840002914 A KR1019840002914 A KR 1019840002914A KR 840002914 A KR840002914 A KR 840002914A KR 850000801 A KR850000801 A KR 850000801A
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- KR
- South Korea
- Prior art keywords
- electrode
- semiconductor body
- photovoltaic device
- barrier layer
- current flowing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims 2
- 239000004065 semiconductor Substances 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 14
- 230000007547 defect Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 4
- 229910052787 antimony Inorganic materials 0.000 claims 4
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 4
- 229910052793 cadmium Inorganic materials 0.000 claims 4
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 claims 4
- 229910052738 indium Inorganic materials 0.000 claims 4
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims 4
- 150000001247 metal acetylides Chemical class 0.000 claims 4
- 239000000203 mixture Substances 0.000 claims 4
- 150000004767 nitrides Chemical class 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- 229910052718 tin Inorganic materials 0.000 claims 4
- 229910052725 zinc Inorganic materials 0.000 claims 4
- 239000011701 zinc Substances 0.000 claims 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 3
- 229910052804 chromium Inorganic materials 0.000 claims 3
- 239000011651 chromium Substances 0.000 claims 3
- WSXHQDSJUJYQDO-UHFFFAOYSA-M [Mg]F Chemical compound [Mg]F WSXHQDSJUJYQDO-UHFFFAOYSA-M 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 230000002950 deficient Effects 0.000 claims 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 claims 1
- 239000002184 metal Substances 0.000 claims 1
- 239000002210 silicon-based material Substances 0.000 claims 1
- 230000003466 anti-cipated effect Effects 0.000 description 2
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
- H01L31/076—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PIN type, e.g. amorphous silicon PIN solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
- H01L31/208—Particular post-treatment of the devices, e.g. annealing, short-circuit elimination
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Development (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
내용 없음.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 다수의 p-i-n형 전지로 구성되고, 전지의 각층이 반도체 합금으로 형성된 “비장벽”탠덥 광전지 장치의 부분단면도. 제2A도는 본 발명의 장벽층이 합체된 반도체장치의 제1실시예를 도시한 단면도. 제2B도는 굵은 선으로 표시된 장벽층의 제1예상배치와 가상선으로 표시된 장벽층의 제2예상배치를 도시한 개량반도체 장치의 분해 부분품 배열사시도. 제3A도는 내부에 몇개의 결함구역이 형성되어 있는 종래식 반도체 장치의 단면도. 제3B도는 제3A도의 저저항결함 구역을 통하는 전류의 분로를 제거할 수 있도록 장벽층을 반도체 몸 체위에 배치되어 있는 본 발명의 장벽층을 표시하는 반도체 장치의 단면도.
Claims (9)
- 제1전극, 입사광 에너지에 반응하여 전류를 흐르게 하는 제1전극 위의 능동 반도체 몸체, 반도체 몸체 위에 있는 제2전극, 전극 사이를 흐르는 전류에 대하여 저저항분로를 제공할 수 있는 적어도 하나 이상의 결함구역등으로 구성된반도체장치에 있어서, 그 결함구역을 통하여 흐르는 전류를 감소시키기 위하여 반도체몸체와 한전극 사이에 배치된 역속투명장벽층이 포함되어 있는 것을 특징으로 하하 광전지 장치.
- 제1항에 있어서, 장벽층이 인듐, 주석, 카드뮴, 아연, 안티몬, 실리콘, 크롬 및 그 혼합물, 질화물 및 탄화물에 근거한 루플오트 마그네슘으로 구성된 원자단으로부터 선택한 재료로 성형되어 있는 것을 특징으로 하는 광전지 장치.
- 제1항에 있어서, 장벽층이 반도체 몸체와 제2전극 사이에 배치되어 있는 것을 특징으로 하는 광전지 장치.
- 제3항에 있어서, 반도체 몸체가 비결정성 p-i-n층으로 구성되고, 제1전극이 두걷운 고전도성 금속으로 형성되어 있는 것을 특징으로 하는 광전지 장치.
- 제1항에 있어서, 장벽층이 103-108옴-cm의 고유저항을 가진 투명 실리콘 재료로 형성되어 있는 것을 특징으로 하는 광전지 장치.
- 기판전극, 기판전극 위에 있는 활성 반도체 몸체, 반도체 몸체 위에 있는 투명한 도전성 전극, 전극 사이를 흐르는 전류에 대하여 저저항 분로를 제공할 수 있는 적어도 하나 이상의 결함구역등으로 구성되고, 상기 반도체 몸체가 그 위에 입사되는 광선에 반응하여 전류를 발생시키게 되어있는 광전지 장치에 있어서, 연속 투명장벽층이 광전지 장치의 적어도 하나 이상의 결함구역을 통하여 흐르는 전류를 감소시키기 위하여 반도체 몸체와 투명전극 사이에 배치되어 있는 것을 특징으로 하는 광전지 장치.
- 제6항에 있어서, 장벽층의 인듐, 주석, 카드뮴, 아연, 안티몬, 실리콘 및 그 혼합물들의 산화물, 질화물 및 탄화물에 근거한 플루오로 마스네슘으로 구성된 원자단으로부터 선태할 재료로 형성되어 있는 것 특징으로 하는 광전지 장치.
- 제1전극, 입사광선에 반응하여 전류를 흐르게 하는 제1전극 위의 반도체 몸체, 반도체 몸체 위에 있는 제2전극, 전극 사이로 흐르는 전류에 대하여 저저항 분로를 제공할 수 있는 적어도 하나 이상의 결함 구역등으로 구성된 개량반도체 장치를 만드는 방법에 있어서, 인듐, 주석, 카드뮴, 아연, 안티몬, 실리콘, 크롬 및 그 혼합물들의 산화물, 질화물 및 탄화물에 근거한 플루오로 마그네슘으로 구성된 원자단으로부터 재료를 선택하는 단계와 재료로 형성된 연속 투명장벽층을 상기 반도체 장치의 적어도 하나 이상의 결함구역을 통하여 흐르는 전류를 감소시키기 위하여 반도체 몸체와 한전극 사이에 배치하는 단계가 포함되어 있는 것을 특징으로 하는 광전지 장치 제조방법.
- 제1전극, 입사광선에 반응하여 전류를 흐르게 하는 제1전극 위의 활성 반도체 몸체, 반도체 몸체위에 있는 제2전극, 전극 사이를 흐르는 전류에 저저항 분로를 제공할 수 있는 적어도 하나 이상의 잠재결함구역 등으로 구성된 광전지 장치의 동작 모드장애를 방지하는 방법에 있어서, 인듐, 주석, 카드뮴, 아연, 안티몬, 실리콘, 크롬 및 그 혼합물의 산화물, 질화물 및 탄화물에 근거한 플루오로 마그네슘으로 구성된 원자단으로부터 재료로 형성된 연속 투명장벽층을 상기 광전지 장치의 적어도 하나 이상의 잠재결합구역을 통하여 흐르는 전류를 감소시키기 위하여 반도체 몸체와 한전극 사이에 배치하는 단계가 포함되어 있는 R서을 특징으로 하는 광전지 장치 제조 방법.※참고사항:최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US518184 | 1983-05-28 | ||
US06/518,184 US4598306A (en) | 1983-07-28 | 1983-07-28 | Barrier layer for photovoltaic devices |
US564862 | 1983-12-23 | ||
US06/564,862 US4532372A (en) | 1983-12-23 | 1983-12-23 | Barrier layer for photovoltaic devices |
Publications (1)
Publication Number | Publication Date |
---|---|
KR850000801A true KR850000801A (ko) | 1985-03-09 |
Family
ID=27059374
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019840002914A KR850000801A (ko) | 1983-05-28 | 1984-05-26 | 광전지장치 및 그 제조방법 |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0132924A3 (ko) |
JP (1) | JPH065767B2 (ko) |
KR (1) | KR850000801A (ko) |
AU (1) | AU560950B2 (ko) |
BR (1) | BR8402521A (ko) |
ES (1) | ES8601565A1 (ko) |
IN (1) | IN165761B (ko) |
MX (1) | MX154938A (ko) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0190855A3 (en) * | 1985-02-08 | 1986-12-30 | Energy Conversion Devices, Inc. | Improved photovoltaic device tolerant of low resistance defects |
EP0236938A3 (de) * | 1986-03-11 | 1989-11-15 | Siemens Aktiengesellschaft | Verfahren zur Vermeidung von Kurzschlüssen bei der Herstellung von Dünnschichtsolarzellen aus amorphem Silizium |
JP2784841B2 (ja) * | 1990-08-09 | 1998-08-06 | キヤノン株式会社 | 太陽電池用基板 |
US5181968A (en) * | 1991-06-24 | 1993-01-26 | United Solar Systems Corporation | Photovoltaic device having an improved collector grid |
AU650782B2 (en) * | 1991-09-24 | 1994-06-30 | Canon Kabushiki Kaisha | Solar cell |
JP2994812B2 (ja) * | 1991-09-26 | 1999-12-27 | キヤノン株式会社 | 太陽電池 |
AU662360B2 (en) * | 1991-10-22 | 1995-08-31 | Canon Kabushiki Kaisha | Photovoltaic device |
US6072117A (en) * | 1996-02-27 | 2000-06-06 | Canon Kabushiki Kaisha | Photovoltaic device provided with an opaque substrate having a specific irregular surface structure |
JP2984595B2 (ja) | 1996-03-01 | 1999-11-29 | キヤノン株式会社 | 光起電力素子 |
US5981934A (en) * | 1996-09-12 | 1999-11-09 | Canon Kabushiki Kaisha | Photovoltaic element having a transparent conductive layer with specified fractal dimension and fractal property |
US6184456B1 (en) | 1996-12-06 | 2001-02-06 | Canon Kabushiki Kaisha | Photovoltaic device |
JP3327811B2 (ja) | 1997-05-13 | 2002-09-24 | キヤノン株式会社 | 酸化亜鉛薄膜の製造方法、それを用いた光起電力素子及び半導体素子基板の製造方法 |
JPH1146006A (ja) | 1997-07-25 | 1999-02-16 | Canon Inc | 光起電力素子およびその製造方法 |
US6951689B1 (en) | 1998-01-21 | 2005-10-04 | Canon Kabushiki Kaisha | Substrate with transparent conductive layer, and photovoltaic element |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4318938A (en) * | 1979-05-29 | 1982-03-09 | The University Of Delaware | Method for the continuous manufacture of thin film solar cells |
US4251286A (en) * | 1979-09-18 | 1981-02-17 | The University Of Delaware | Thin film photovoltaic cells having blocking layers |
JPS56160080A (en) * | 1980-05-15 | 1981-12-09 | Shunpei Yamazaki | Photoelectric conversion unit |
JPS5814582A (ja) * | 1981-07-17 | 1983-01-27 | Kanegafuchi Chem Ind Co Ltd | 高効率のアモルフアスシリコン系太陽電池 |
JPS5878474A (ja) * | 1981-11-05 | 1983-05-12 | Seiko Epson Corp | 薄膜太陽電池 |
US4571448A (en) * | 1981-11-16 | 1986-02-18 | University Of Delaware | Thin film photovoltaic solar cell and method of making the same |
-
1984
- 1984-05-19 IN IN423/DEL/84A patent/IN165761B/en unknown
- 1984-05-23 MX MX84201428A patent/MX154938A/es unknown
- 1984-05-24 AU AU28586/84A patent/AU560950B2/en not_active Expired - Fee Related
- 1984-05-25 BR BR8402521A patent/BR8402521A/pt unknown
- 1984-05-25 JP JP59106337A patent/JPH065767B2/ja not_active Expired - Lifetime
- 1984-05-25 ES ES532821A patent/ES8601565A1/es not_active Expired
- 1984-05-25 EP EP84303560A patent/EP0132924A3/en not_active Withdrawn
- 1984-05-26 KR KR1019840002914A patent/KR850000801A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JPS6084888A (ja) | 1985-05-14 |
IN165761B (ko) | 1990-01-06 |
AU560950B2 (en) | 1987-04-30 |
BR8402521A (pt) | 1985-04-02 |
ES532821A0 (es) | 1985-10-16 |
ES8601565A1 (es) | 1985-10-16 |
EP0132924A3 (en) | 1986-06-18 |
AU2858684A (en) | 1985-01-31 |
MX154938A (es) | 1988-01-08 |
JPH065767B2 (ja) | 1994-01-19 |
EP0132924A2 (en) | 1985-02-13 |
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