KR20230130694A - 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제 - Google Patents

조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제 Download PDF

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KR20230130694A
KR20230130694A KR1020237027036A KR20237027036A KR20230130694A KR 20230130694 A KR20230130694 A KR 20230130694A KR 1020237027036 A KR1020237027036 A KR 1020237027036A KR 20237027036 A KR20237027036 A KR 20237027036A KR 20230130694 A KR20230130694 A KR 20230130694A
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South Korea
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group
formula
substituent
compounds
japanese patent
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KR1020237027036A
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Korean (ko)
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스구루 사메지마
토키히코 마츠무라
유미 카토
아키히로 하라
료지 오리타
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후지필름 가부시키가이샤
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Publication of KR20230130694A publication Critical patent/KR20230130694A/ko

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F265/00Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
    • C08F265/04Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
    • C08F265/06Polymerisation of acrylate or methacrylate esters on to polymers thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/0008Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0041Optical brightening agents, organic pigments
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/55Boron-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B67/00Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
    • C09B67/006Preparation of organic pigments
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
KR1020237027036A 2021-03-12 2022-03-03 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제 KR20230130694A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021039768 2021-03-12
JPJP-P-2021-039768 2021-03-12
PCT/JP2022/009246 WO2022191044A1 (ja) 2021-03-12 2022-03-03 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサ、カメラモジュール、化合物および赤外線吸収剤

Publications (1)

Publication Number Publication Date
KR20230130694A true KR20230130694A (ko) 2023-09-12

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KR1020237027036A KR20230130694A (ko) 2021-03-12 2022-03-03 조성물, 막, 광학 필터, 고체 촬상 소자, 화상 표시장치, 적외선 센서, 카메라 모듈, 화합물 및 적외선 흡수제

Country Status (4)

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JP (1) JPWO2022191044A1 (ja)
KR (1) KR20230130694A (ja)
TW (1) TW202248363A (ja)
WO (1) WO2022191044A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014240371A (ja) 2013-06-12 2014-12-25 シャープ株式会社 化合物、太陽電池モジュール及び太陽光発電装置
WO2016158819A1 (ja) 2015-03-31 2016-10-06 富士フイルム株式会社 赤外線カットフィルタ、および固体撮像素子

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5601768B2 (ja) * 2008-10-09 2014-10-08 富士フイルム株式会社 近赤外線吸収組成物、近赤外線吸収塗布物およびそれらの製造方法
JP2015200878A (ja) * 2014-03-31 2015-11-12 富士フイルム株式会社 赤外線センサ、近赤外線吸収組成物、硬化膜、近赤外線吸収フィルタ、イメージセンサ、カメラモジュールおよび化合物
KR101852804B1 (ko) * 2014-05-01 2018-04-27 후지필름 가부시키가이샤 적외선 센서, 근적외선 흡수 조성물, 감광성 수지 조성물, 화합물, 근적외선 흡수 필터 및 촬상 장치
WO2017056831A1 (ja) * 2015-09-29 2017-04-06 富士フイルム株式会社 感光性組成物、硬化膜、赤外線カットフィルタ、赤外線透過フィルタ、硬化膜の製造方法、固体撮像素子、画像表示装置、固体撮像素子の製造方法および赤外線センサの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014240371A (ja) 2013-06-12 2014-12-25 シャープ株式会社 化合物、太陽電池モジュール及び太陽光発電装置
WO2016158819A1 (ja) 2015-03-31 2016-10-06 富士フイルム株式会社 赤外線カットフィルタ、および固体撮像素子

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TW202248363A (zh) 2022-12-16
WO2022191044A1 (ja) 2022-09-15
JPWO2022191044A1 (ja) 2022-09-15

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