KR20160142187A - Nanocrystal, method of preparing the same and electronic device including the same - Google Patents
Nanocrystal, method of preparing the same and electronic device including the same Download PDFInfo
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- KR20160142187A KR20160142187A KR1020150078225A KR20150078225A KR20160142187A KR 20160142187 A KR20160142187 A KR 20160142187A KR 1020150078225 A KR1020150078225 A KR 1020150078225A KR 20150078225 A KR20150078225 A KR 20150078225A KR 20160142187 A KR20160142187 A KR 20160142187A
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- South Korea
- Prior art keywords
- indium
- nanocrystals
- mixture
- containing precursor
- amine
- Prior art date
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- 239000002159 nanocrystal Substances 0.000 title claims abstract description 117
- 238000000034 method Methods 0.000 title claims description 23
- 238000002161 passivation Methods 0.000 claims abstract description 36
- 239000007771 core particle Substances 0.000 claims abstract description 33
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 claims abstract description 29
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract description 17
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000002243 precursor Substances 0.000 claims description 43
- 229910052738 indium Inorganic materials 0.000 claims description 40
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 39
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 32
- 150000001412 amines Chemical class 0.000 claims description 28
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 19
- 239000000194 fatty acid Substances 0.000 claims description 19
- 229930195729 fatty acid Natural products 0.000 claims description 19
- 150000004665 fatty acids Chemical class 0.000 claims description 19
- VBXWCGWXDOBUQZ-UHFFFAOYSA-K diacetyloxyindiganyl acetate Chemical compound [In+3].CC([O-])=O.CC([O-])=O.CC([O-])=O VBXWCGWXDOBUQZ-UHFFFAOYSA-K 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 238000006243 chemical reaction Methods 0.000 claims description 16
- 150000003839 salts Chemical class 0.000 claims description 12
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052698 phosphorus Inorganic materials 0.000 claims description 10
- 239000011574 phosphorus Substances 0.000 claims description 10
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- RMSOEGBYNWXXBG-UHFFFAOYSA-N 1-chloronaphthalen-2-ol Chemical compound C1=CC=CC2=C(Cl)C(O)=CC=C21 RMSOEGBYNWXXBG-UHFFFAOYSA-N 0.000 claims description 6
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 claims description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 6
- 229910000337 indium(III) sulfate Inorganic materials 0.000 claims description 6
- PSCMQHVBLHHWTO-UHFFFAOYSA-K indium(iii) chloride Chemical compound Cl[In](Cl)Cl PSCMQHVBLHHWTO-UHFFFAOYSA-K 0.000 claims description 6
- XGCKLPDYTQRDTR-UHFFFAOYSA-H indium(iii) sulfate Chemical compound [In+3].[In+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O XGCKLPDYTQRDTR-UHFFFAOYSA-H 0.000 claims description 6
- 229940049964 oleate Drugs 0.000 claims description 6
- JKNHZOAONLKYQL-UHFFFAOYSA-K tribromoindigane Chemical compound Br[In](Br)Br JKNHZOAONLKYQL-UHFFFAOYSA-K 0.000 claims description 6
- 150000008065 acid anhydrides Chemical class 0.000 claims description 5
- 239000011701 zinc Substances 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 3
- 150000008064 anhydrides Chemical class 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052717 sulfur Inorganic materials 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 230000003760 hair shine Effects 0.000 abstract description 4
- 230000000052 comparative effect Effects 0.000 description 21
- 239000000463 material Substances 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 10
- CCCMONHAUSKTEQ-UHFFFAOYSA-N octadec-1-ene Chemical compound CCCCCCCCCCCCCCCCC=C CCCMONHAUSKTEQ-UHFFFAOYSA-N 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- 238000002347 injection Methods 0.000 description 8
- 239000007924 injection Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 7
- -1 P (N (CH 3 ) 2 ) 3 Chemical compound 0.000 description 6
- 238000002835 absorbance Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- QGLWBTPVKHMVHM-KTKRTIGZSA-N (z)-octadec-9-en-1-amine Chemical compound CCCCCCCC\C=C/CCCCCCCCN QGLWBTPVKHMVHM-KTKRTIGZSA-N 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 4
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 4
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 4
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 4
- 238000004020 luminiscence type Methods 0.000 description 4
- 239000012299 nitrogen atmosphere Substances 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 4
- TWJNQYPJQDRXPH-UHFFFAOYSA-N 2-cyanobenzohydrazide Chemical compound NNC(=O)C1=CC=CC=C1C#N TWJNQYPJQDRXPH-UHFFFAOYSA-N 0.000 description 3
- 235000021360 Myristic acid Nutrition 0.000 description 3
- TUNFSRHWOTWDNC-UHFFFAOYSA-N Myristic acid Natural products CCCCCCCCCCCCCC(O)=O TUNFSRHWOTWDNC-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- 239000005968 1-Decanol Substances 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- LZSJBLXYNYSKPJ-UHFFFAOYSA-N 9-octyl-9h-fluorene Chemical compound C1=CC=C2C(CCCCCCCC)C3=CC=CC=C3C2=C1 LZSJBLXYNYSKPJ-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229910016036 BaF 2 Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910021617 Indium monochloride Inorganic materials 0.000 description 2
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- 235000021314 Palmitic acid Nutrition 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- VEBCLRKUSAGCDF-UHFFFAOYSA-N ac1mi23b Chemical compound C1C2C3C(COC(=O)C=C)CCC3C1C(COC(=O)C=C)C2 VEBCLRKUSAGCDF-UHFFFAOYSA-N 0.000 description 2
- 125000003282 alkyl amino group Chemical group 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000005103 alkyl silyl group Chemical group 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000001769 aryl amino group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 125000005104 aryl silyl group Chemical group 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000005119 centrifugation Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 2
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 2
- XVDBWWRIXBMVJV-UHFFFAOYSA-N n-[bis(dimethylamino)phosphanyl]-n-methylmethanamine Chemical compound CN(C)P(N(C)C)N(C)C XVDBWWRIXBMVJV-UHFFFAOYSA-N 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 235000003441 saturated fatty acids Nutrition 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004054 semiconductor nanocrystal Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 2
- QNLQKURWPIJSJS-UHFFFAOYSA-N trimethylsilylphosphane Chemical compound C[Si](C)(C)P QNLQKURWPIJSJS-UHFFFAOYSA-N 0.000 description 2
- DDQMTQUVWRTBIV-UHFFFAOYSA-N tris(triethylsilyl)phosphane Chemical compound CC[Si](CC)(CC)P([Si](CC)(CC)CC)[Si](CC)(CC)CC DDQMTQUVWRTBIV-UHFFFAOYSA-N 0.000 description 2
- JYPDBXWRMXCOSW-UHFFFAOYSA-N tris(trimethylsilyl)phosphane Chemical compound C[Si](C)(C)P([Si](C)(C)C)[Si](C)(C)C.C[Si](C)(C)P([Si](C)(C)C)[Si](C)(C)C JYPDBXWRMXCOSW-UHFFFAOYSA-N 0.000 description 2
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical compound C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- CTAPFRYPJLPFDF-UHFFFAOYSA-N isoxazole Chemical compound C=1C=NOC=1 CTAPFRYPJLPFDF-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 125000000040 m-tolyl group Chemical group [H]C1=C([H])C(*)=C([H])C(=C1[H])C([H])([H])[H] 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 231100000956 nontoxicity Toxicity 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 150000005041 phenanthrolines Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- VLLMWSRANPNYQX-UHFFFAOYSA-N thiadiazole Chemical compound C1=CSN=N1.C1=CSN=N1 VLLMWSRANPNYQX-UHFFFAOYSA-N 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0665—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02587—Structure
- H01L21/0259—Microstructure
- H01L21/02601—Nanoparticles
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/1026—Compound semiconductors
- H01L2924/1032—III-V
- H01L2924/10335—Indium phosphide [InP]
Abstract
A core particle composed of a first nanocrystal of indium phosphide (InP); At least one shell of a second nanocrystal selected from ZnS, GaP and combinations thereof surrounding the core particles; And a passivation layer made of indium oxide (In 2 O 3 ) which shines at the outermost part of the shell.
Description
A nanocrystal, a method of manufacturing the same, and an electronic device including the same.
Nanocrystals are materials with a crystal structure of a few nanometers in size and are made up of hundreds to thousands of atoms. These small-sized materials have a large surface area per unit volume, so that most of the atoms are present on the surface and exhibit a quantum confinement effect. Thus, a unique electrical, magnetic, and optical , Chemical and mechanical properties. In other words, it is possible to control various properties by controlling the physical size of the nanocrystals.
Nanocrystals based on II-IV group compound semiconductors composed of elements of Group II and Group IV on the periodic table are the materials that can emit light of high luminous efficiency, Has come.
Studies on representative II-IV semiconductor nanocrystals have been carried out with a great deal of attention due to their advantages such as high luminescence efficiency and stability. However, since they contain Cd 2 + and Se 2 - , they cause serious problems in terms of environmental hazard and toxicity In recent years, ternary systems of Ⅲ-Ⅴ and ternary semiconductor nanocrystals of Ⅰ-Ⅲ-Ⅵ, which can replace Ⅱ-Ⅳ nanocrystals, have been developed. A lot of research has been done.
Among the III-V group nanocrystals, InP nanocrystals are the most extensively studied materials because of their non-toxicity advantages compared with II-IV group semiconductors and their luminescent region similar to CdSe nanocrystals and good luminous efficiency. InP nanocrystals are representative III-V group nanocrystals with a broad emission range from visible to near infrared.
However, since the stability of InP-based nanocrystals is low, studies for passivation of the surface of InP nanocrystals have been actively conducted.
One embodiment provides a nanocrystal that efficiently passivates the surface of nanocrystals to provide excellent stability to oxygen and moisture, and excellent thermal stability and light stability.
Another embodiment provides a method of making the nanocrystals.
Another embodiment provides an electronic device comprising the nanocrystals.
According to one embodiment, a core particle comprising a first nanocrystal of indium phosphide (InP); At least one shell of a second nanocrystal selected from ZnS, GaP and combinations thereof surrounding the core particles; And a passivation layer made of indium oxide (In 2 O 3 ) which shines at the outermost part of the shell.
The size of the core particles is in the range of 1 nm to 5 nm.
The total thickness of the shell may range from 2 nm to 5 nm.
The thickness of the passivation layer may be in the range of 2 nm to 5 nm.
In 2 O 3 forming the passivation times Orientation layer may have a lattice spacing of 10Å to 10.5Å.
The size of the nanocrystals may range from 2 to 5 times the size of the core.
According to another embodiment, the indium-containing precursor and the fatty acid are mixed to prepare the first mixture and then the temperature is raised; Wherein the first mixture comprises at least one shell of a second nanocrystal selected from ZnS, GaP, and combinations thereof, surrounding the core particles and core particles comprising first nanocrystals of indium phosphide (InP) Adding a nanocrystal to produce a second mixture; And adding the amine or alcohol to the second mixture to produce indium oxide in the indium-containing precursor by water produced by the reaction of the acid or anhydride produced in the fatty acid with the amine or alcohol. .
The indium-containing precursor may be an indium-containing salt. Specific examples of the indium-containing salt may be selected from indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate, and combinations thereof.
The fatty acid may be a carboxylic acid having 10 or more carbon atoms.
The amine may be an amine having 10 or more carbon atoms.
The alcohol may be an alcohol having 10 or more carbon atoms.
After the first mixture is prepared, the temperature may be increased to 300 ° C at a rate of 20 ° C to 30 ° C per minute.
According to another embodiment, an indium-containing precursor; A combination of a zinc-containing precursor and a sulfur-containing precursor, a combination of a gallium-containing precursor and a phosphorus-containing precursor, and a shell precursor and a fatty acid selected from the combination, to raise the temperature; Adding a phosphorus-containing precursor to the first mixture to produce a second mixture; And adding the amine or alcohol to the second mixture to produce indium oxide from the indium-containing precursor by water generated by the reaction of the acid anhydride produced in the fatty acid with the amine or alcohol. ≪ / RTI >
The indium-containing precursor may be an indium-containing salt. Specific examples of the indium-containing salt may be selected from indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate, and combinations thereof.
The fatty acid may be a carboxylic acid having 10 or more carbon atoms.
The amine may be an amine having 10 or more carbon atoms.
The alcohol may be an alcohol having 10 or more carbon atoms.
After the first mixture is prepared, the temperature may be increased to 300 ° C at a rate of 20 ° C to 30 ° C per minute.
The phosphorus-containing precursor may be a compound represented by P (R) 3 . Wherein R may be an alkylsilyl group, an arylsilyl group, an alkylamino group or an arylamino group, wherein alkyl means straight or branched chain C1 to C10 alkyl, and aryl means C6 to C12 aryl. More specific examples of the phosphorus-containing precursor include trimethylsilylphosphine, tris (dimethylamino) phosphine, P (N (CH 3 ) 2 ) 3 , tris (trimethylsilyl) phosphine tris (trimethylsilyl) phosphine, tris (triethylsilyl) phosphine, and the like.
According to another embodiment, there is provided an electronic device including the nanocrystals.
The nanocrystals have excellent stability against oxygen and moisture, and are excellent in thermal stability and light stability.
1 is a schematic cross-sectional view of a nanocrystal including a core / shell / passivation layer according to one embodiment.
2 is a schematic cross-sectional view of an organic / inorganic electroluminescent device according to one embodiment.
3 and 4 are transmission electron microscope (TEM) photographs of the nanocrystals of Example 1 and Comparative Example 1, respectively.
FIGS. 5 and 6 are graphs showing the energy-dispersive X-ray spectroscopy (EDX) analysis results of the nanocrystals of Example 1 and Comparative Example 1, respectively.
FIG. 7 and FIG. 8 are graphs showing the results of measuring the PL characteristics with time of the nanocrystals according to Example 6 and Comparative Example 2 at a high temperature.
9 is a graph showing the measurement results of UV absorbance of the nanocrystals according to Example 1 and Comparative Example 1 after UV irradiation.
10 is a graph showing the results of measurement of PL light characteristics after UV irradiation of nanocrystals according to Example 1 and Comparative Example 1. FIG.
FIG. 11 is a graph showing the measurement results of UV absorbance and PL light characteristics after UV irradiation of the nanocrystals according to Example 6. FIG.
Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art can easily carry out the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
In the drawings, the thickness is enlarged to clearly represent the layers and regions.
Whenever a portion of a layer, film, region, plate, or the like is referred to as being "on" another portion, it includes not only the case where it is "directly on" another portion, but also the case where there is another portion in between. Conversely, when a part is "directly over" another part, it means that there is no other part in the middle.
The term " combination "means a mixture or a multilayer structure in which two or more layers are stacked.
According to one embodiment, a core particle comprising a first nanocrystal of indium phosphide (InP); At least one shell of a second nanocrystal selected from ZnS, GaP and combinations thereof surrounding the core particles; And a passivation layer made of indium oxide (In 2 O 3 ) which shines at the outermost part of the shell.
Hereinafter, a nanocrystal having a core / shell / passivation layer structure according to an embodiment will be described with reference to FIG.
1 is a schematic cross-sectional view of a nanocrystal having a core / shell passivation layer structure according to one embodiment.
1, a
When the
The size of the core particles (3) is in the range of 1 nm to 5 nm. When the size of the
The total thickness of the
The thickness of the
In 2 O 3 constituting the
The size of the
The
According to another embodiment, the indium-containing precursor and the fatty acid are mixed to prepare the first mixture and then the temperature is raised; Wherein the first mixture comprises at least one shell of a second nanocrystal selected from ZnS, GaP, and combinations thereof, surrounding the core particles and core particles comprising first nanocrystals of indium phosphide (InP) Adding a nanocrystal to produce a second mixture; And adding the amine or alcohol to the second mixture to produce indium oxide in the indium-containing precursor by water produced by the reaction of the acid or anhydride produced in the fatty acid with the amine or alcohol. .
The indium-containing precursor may be an indium-containing salt. Specific examples of the indium-containing salt include, but are not limited to, indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate and combinations thereof.
The fatty acid may be a carboxylic acid having 10 or more carbon atoms and specifically includes saturated fatty acids such as myristic acid, palmitic acid and stearic acid, and combinations thereof. Can be selected.
The amine may be an amine having a carbon number of 10 or more, and specifically may be selected from oleylamine, 1-dodecylamine, 1-octadecylamine, and combinations thereof.
The alcohol may be an alcohol having 10 or more carbon atoms, and specifically may be selected from 1-decanol, 1-dodecanol, and combinations thereof.
After the first mixture is prepared, the temperature may be increased to 300 ° C at a rate of 20 ° C to 30 ° C per minute.
The amine or alcohol may be used in a molar ratio of 1: 1 with the fatty acid.
In the nanocrystals, the In 3 + ions generated from the indium-containing precursor are present on the surface of the
According to another embodiment, an indium-containing precursor; A combination of a zinc-containing precursor and a sulfur-containing precursor, a combination of a gallium-containing precursor and a phosphorus-containing precursor, and a shell precursor and a fatty acid selected from the combination, To produce an acid anhydride; Adding a phosphorus-containing precursor to the first mixture to produce a second mixture; And adding the amine or alcohol to the second mixture to produce indium oxide in the indium-containing precursor by the water generated by the reaction of the acid anhydride with the amine or the alcohol .
The indium-containing precursor may be an indium-containing salt. Specific examples of the indium-containing salt may be selected from indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate, and combinations thereof.
The fatty acid may be a carboxylic acid having 10 or more carbon atoms and specifically includes saturated fatty acids such as myristic acid, palmitic acid and stearic acid, and combinations thereof. Can be selected.
The amine may be an amine having a carbon number of 10 or more, and specifically may be selected from oleylamine, 1-dodecylamine, 1-octadecylamine, and combinations thereof.
The alcohol may be an alcohol having 10 or more carbon atoms, and specifically may be selected from 1-decanol, 1-dodecanol, and combinations thereof.
After the first mixture is prepared, the temperature may be increased to 300 ° C at a rate of 20 ° C to 30 ° C per minute.
The phosphorus-containing precursor may be a compound represented by P (R) 3 . Wherein R may be selected from an alkylsilyl group, an arylsilyl group, an alkylamino group, and an arylamino group, wherein alkyl means straight or branched chain C1 to C10 alkyl, and aryl means C6 to C12 aryl. More specific examples of the phosphorus-containing precursor include trimethylsilylphosphine, tris (dimethylamino) phosphine, P (N (CH 3 ) 2 ) 3 , tris (trimethylsilyl) phosphine tris (trimethylsilyl) phosphine, tris (triethylsilyl) phosphine, and the like.
The amine or alcohol may be used in a molar ratio of 1: 1 with the fatty acid.
In one embodiment, there is provided a method of making a nanocrystal, comprising the steps of: forming core particles of a first nanocrystal of indium phosphide (InP) and a second nanocrystal of a second nanocrystal selected from ZnS, GaP, A nanocrystal including a shell of one layer is used as a raw material, or a core particle composed of indium phosphide (InP) first nanocrystals and a second nano-crystal selected from ZnS, GaP and combinations thereof surrounding the core particle A process for producing indium oxide from an indium-containing precursor by water produced by the reaction of an acid anhydride with an amine or an alcohol by adding an amine or an alcohol after preparing a nanocrystal including at least one layer of a crystal, Since the process proceeds separately from the synthesis process of the nanocrystals, the process of forming the indium oxide passivation layer is facilitated And the process for forming the indium oxide passivation layer can be repeatedly performed, so that the thickness of the passivation layer can be easily controlled.
In the nanocrystals, the In 3 + ions generated from the indium-containing precursor are present on the surface of the
The nanocrystals can be applied variously to electronic devices such as a display, an image sensor, a biosensor, a solar cell, and illumination, and are particularly useful for a light emitting layer of a blue light emitting device.
Hereinafter, an organic electroluminescent device including the nanocrystals will be described with reference to FIG.
2 is a schematic cross-sectional view of an organic / inorganic electroluminescent device according to one embodiment.
The structure of the organic / inorganic electroluminescent device according to one embodiment includes a substrate 10, a
Optionally, a
As the substrate 10 used for the electroluminescent device, a commonly used substrate can be used. Specifically, a glass substrate or a transparent plastic substrate having excellent transparency, surface smoothness, ease of handling, and water resistance can be used. More specific examples include glass substrates, polyester substrates such as polyethylene terephthalate, and polycarbonate substrates.
The material of the
As the material of the
As the material of the
The material of the
As the material used for forming the
Hereinafter, embodiments of the present invention will be described in detail with reference to embodiments. The following examples are for illustrative purposes only and are not intended to limit the scope of the invention.
Hereinafter, specific embodiments of the present invention will be described. It should be understood, however, that the embodiments described below are only for the purpose of illustrating or explaining the invention in detail, and thus the scope of the invention should not be limited thereto.
[ Example ]
Example One: InP core/ ZnS Shell / In 2 O 3 passivation Preparation of nanocrystals containing layers
A condenser, nitrogen and vacuum lines and the temperature detected 50 mL three-necked round bottom flask sensor is installed,
0.5 mL of an InP core / ZnS shell nanocrystal diluted in toluene was injected into the reaction vessel. Except that the dilution concentration of the nanocrystals was calculated by the optical intensity value for? Max at the first absorption band edge obtained from the UV absorption measurement.
Approximately 2 minutes after the nanocrystals are dispersed stably, 0.04 mL of oleylamine is injected. The reaction mixture was maintained at a temperature of 250 to 270 ° C. for 30 minutes and then cooled to room temperature (24 ° C.) to terminate the reaction. The reaction solution was repeatedly centrifuged and purified using a mixture of chloroform / ethanol / acetone (1/1/10 volume ratio). After the addition of oleic acid as a stabilizer, the mixture was kept for about 6 hours and finally purified by centrifugation, redispersed in toluene organic solvent, transferred into a brown bottle, sealed and refrigerated .
Example 2: InP core/ ZnS Shell / In 2 O 3 passivation Preparation of nanocrystals containing layers
A nanocrystal was prepared in the same manner as in Example 1 except that InCl 3 (21.1 mg, 0.1 mmol) was used instead of indium acetate (In (acetate) 3 ) (30 mg, 0.1 mmol)
Example 3: InP core/ GaP Shell / ZnS Shell / In 2 O 3 passivation Preparation of nanocrystals containing layers
In Example 1, nanocrystals were prepared in the same manner as in Example 1 except that InP core / GaP shell / ZnS shell nanocrystals were used instead of InP core / ZnS shell nanocrystals.
Example 4: InP core/ ZnS Shell / In 2 O 3 passivation Preparation of nanocrystals containing layers
A condenser, nitrogen and vacuum lines and 50 mL three-necked temperature sensor is installed round bottom
(TMS) 3 P (12.5 mg, 0.05 mmol), which was stored in a glove box, was placed in a vial containing 1.6 mL of 1-octadecene solution and diluted in a glove box. This solution was rapidly injected into the reaction vessel at 300 캜. The temperature is maintained at 270 캜 for about 2 to 5 minutes, and 0.04 mL of oleylamine is then injected. The temperature was maintained at about 250 to 270 DEG C for 30 minutes, the temperature was lowered to room temperature, and the reaction was terminated. The reaction solution was repeatedly centrifuged and purified using a mixture of chloroform / ethanol / acetone (1/1/10 volume ratio). After the addition of oleic acid as a stabilizer, the mixture was maintained for about 6 hours, and finally purified by centrifugation, re-dispersed in toluene organic solvent, transferred to a brown bottle, sealed and refrigerated .
Example 5: InP core/ ZnS Shell / In 2 O 3 passivation Preparation of nanocrystals containing layers
A nanocrystal was prepared in the same manner as in Example 4 except that InCl 3 (21.1 mg, 0.1 mmol) was used instead of indium acetate (In (acetate) 3 ) (30 mg, 0.1 mmol)
Comparative Example One: InP core/ ZnS Shell containing Manufacture of nanocrystals
A condenser, nitrogen and vacuum lines and 50 mL three-necked temperature sensor is installed round bottom
(TMS) 3 P (12.5 mg, 0.05 mmol), which was stored in a glove box, was placed in a vial containing 1.6 mL of 1-octadecene solution and diluted in a glove box. This solution was rapidly injected into the reaction vessel at 300 캜 and maintained at 270 캜. After 10-30 minutes, the temperature was lowered to 230 < 0 > C and 1-dodecanthiol (100 mg, 0.5 mmol) was slowly added. The reaction was maintained at a time interval of 5 hours or more, and then the temperature was lowered to room temperature and terminated.
passivation Identification of the floor
The passivation layer was confirmed through transmission electron microscope (TEM) photographs and energy-dispersive X-ray spectroscopy (EDX) analysis of the nanocrystals of Example 1 and Comparative Example 1.
3 and 4 are transmission electron microscope (TEM) photographs of the nanocrystals of Example 1 and Comparative Example 1, respectively. 3 and 4, it can be seen that the nanocrystals of Example 1 were larger in size than the nanocrystals of Comparative Example 1, and the passivation layer was formed to a thickness of about 2 nm.
FIGS. 5 and 6 are graphs showing EDX analysis results of the nanocrystals of Example 1 and Comparative Example 1, respectively. 5 and 6, it can be seen that the In and O components of the nanocrystals of Example 1 were much higher than those of Comparative Example 1.
Thermal stability evaluation
500 쨉 l of the nanocrystals of Examples 1 to 5 and the nanocrystals of Comparative Example 1 were added to 20 g of the monomer (A-DCP (tricyclodecane dimethanol diacrylate)) of the acrylate resin, and the chloroform solution was removed by depressurization. The vials were divided into 4 ml portions. The samples except for the double RT (24 ° C) conditions were placed in an oven at 120 ° C., and samples were taken out at predetermined times to measure PL characteristics.
The results of Example 2 and Comparative Example 1 are shown in FIG. 7 and FIG. FIGS. 7 and 8 are graphs showing the results of measurement of PL characteristics with time at a high temperature of the nanocrystals according to Example 2 and Comparative Example 1. FIG. Referring to FIG. 7, the nanocrystal according to Example 2 shows stable luminescence wavelength under a severe condition of 120 ° C, low rate of decrease in luminescence intensity with time, and luminescence characteristics even after 30 hours of exposure. Referring to FIG. 8, the nanocrystals of Comparative Example 1 were shifted toward the blue wavelength when exposed for 2 hours, and after 30 hours, the optical characteristics completely disappeared. As a result, it can be seen that the thermal stability of the nanocrystals according to Example 2 is significantly improved as compared with the nanocrystals according to Comparative Example 1.
Light stability evaluation
500 [micro] l of the nanocrystals of Example 1 and nanocrystals of Comparative Example 1 were added to 20 g of the monomer (A-DCP (tricyclodecane dimethanol diacrylate)) of the acrylate resin, and the chloroform solution was removed by depressurization, (vial). The samples were irradiated with UV light, and UV absorbance and PL light characteristics were measured.
The UV absorbance of the nanocrystals according to Example 1 and Comparative Example 1 is shown in FIG. 9, and the PL light characteristics of the nanocrystals according to Example 1 and Comparative Example 1 are shown in FIG. Referring to FIG. 9, it can be seen that the nanocrystal of Example 1 is superior to the nanocrystal of Comparative Example 1 in UV absorbance. 10, it can be seen that the nanocrystals according to Example 1 emitted light at the red wavelength, whereas the nanocrystals according to Comparative Example 1 migrated toward the blue wavelength. After UV irradiation of the nanocrystals according to Example 3, And PL light characteristics are shown in Fig. Referring to FIG. 11, it can be seen that the UV absorbance and PL light characteristics of the nanocrystals according to Example 3 are excellent.
While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments, And falls within the scope of the invention.
1: nanocrystal 3: core particle
5: Shell 7: Passivation layer
10: substrate 20: hole injection electrode
30: hole transport layer 40: light emitting layer
50: electron transport layer 60: electron injection electrode
70: hole blocking layer
Claims (21)
At least one shell of a second nanocrystal selected from ZnS, GaP and combinations thereof surrounding the core particles; And
A passivation layer made of indium oxide (In 2 O 3 ) shouting at the outermost part of the shell
Containing nanocrystals.
Wherein the core particles have a size in the range of 1 nm to 5 nm.
Wherein the total thickness of the shell is in the range of 2 nm to 5 nm.
Wherein the thickness of the passivation layer is in the range of 2 nm to 5 nm.
In 2 O 3 constituting the passivation layer has a lattice spacing of 10 Å to 10.5 Å.
Wherein the size of the nanocrystals is in the range of 2 to 5 times the size of the core.
Wherein the first mixture comprises at least one shell of a second nanocrystal selected from ZnS, GaP, and combinations thereof, surrounding the core particles and core particles comprising first nanocrystals of indium phosphide (InP) Adding a nanocrystal to produce a second mixture;
Adding the amine or alcohol to the second mixture to produce indium oxide from the indium-containing precursor by water produced by the reaction of the acid or anhydride produced in the fatty acid with the amine or alcohol
≪ / RTI >
Wherein the indium-containing precursor is an indium-containing salt.
Specific examples of the indium-containing salt are selected from the group consisting of indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate and combinations thereof.
Wherein the fatty acid is a carboxylic acid having 10 or more carbon atoms.
Wherein the amine is an amine having 10 or more carbon atoms.
Wherein the alcohol is an alcohol having 10 or more carbon atoms.
Wherein the temperature of the first mixture is raised to 300 DEG C at a rate of 20 DEG C to 30 DEG C per minute.
Adding a phosphorus-containing precursor to the first mixture to produce a second mixture;
Adding the amine or alcohol to the second mixture to produce indium oxide from the indium-containing precursor by water generated by the reaction of the acid anhydride produced in the fatty acid with the amine or alcohol
≪ / RTI >
Wherein the indium-containing precursor is an indium-containing salt.
Specific examples of the indium-containing salt are selected from the group consisting of indium chloride, indium bromide, indium fluoride, indium acetate, indium sulfate, indium nitrate, indium acetate, indium oleate and combinations thereof.
Wherein the fatty acid is a carboxylic acid having 10 or more carbon atoms.
Wherein the amine is an amine having 10 or more carbon atoms.
Wherein the alcohol is an alcohol having 10 or more carbon atoms.
Wherein the temperature of the first mixture is raised to 300 DEG C at a rate of 20 DEG C to 30 DEG C per minute.
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US10851298B2 (en) | 2018-08-30 | 2020-12-01 | Samsung Electronics Co., Ltd. | Electronic device including quantum dots |
US11236270B2 (en) | 2018-11-29 | 2022-02-01 | Samsung Electronics Co., Ltd. | Quantum dots, a composition or composite including the same, and an electronic device including the same |
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US10851297B2 (en) | 2018-07-10 | 2020-12-01 | Samsung Electronics Co., Ltd. | Composition, patterned film, and electronic device including the same |
US11345851B2 (en) | 2018-07-10 | 2022-05-31 | Samsung Electronics Co., Ltd. | Composition, patterned film, and electronic device including the same |
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