KR20160017101A - 스퍼터링 타깃재 - Google Patents
스퍼터링 타깃재 Download PDFInfo
- Publication number
- KR20160017101A KR20160017101A KR1020167001775A KR20167001775A KR20160017101A KR 20160017101 A KR20160017101 A KR 20160017101A KR 1020167001775 A KR1020167001775 A KR 1020167001775A KR 20167001775 A KR20167001775 A KR 20167001775A KR 20160017101 A KR20160017101 A KR 20160017101A
- Authority
- KR
- South Korea
- Prior art keywords
- copper
- oxide
- phase
- alloy
- sputtering target
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/087—Oxides of copper or solid solutions thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Powder Metallurgy (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014096515 | 2014-05-08 | ||
JPJP-P-2014-096515 | 2014-05-08 | ||
PCT/JP2015/060441 WO2015170534A1 (ja) | 2014-05-08 | 2015-04-02 | スパッタリングターゲット材 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20160017101A true KR20160017101A (ko) | 2016-02-15 |
Family
ID=54392387
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167001775A KR20160017101A (ko) | 2014-05-08 | 2015-04-02 | 스퍼터링 타깃재 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5808513B1 (zh) |
KR (1) | KR20160017101A (zh) |
CN (1) | CN105358734B (zh) |
TW (1) | TWI525208B (zh) |
WO (1) | WO2015170534A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180125946A (ko) * | 2016-03-22 | 2018-11-26 | 미쓰비시 마테리알 가부시키가이샤 | 스퍼터링 타깃 |
KR20190120167A (ko) * | 2017-03-01 | 2019-10-23 | 미쓰비시 마테리알 가부시키가이샤 | 스퍼터링 타깃 및 스퍼터링 타깃의 제조 방법 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017164168A1 (ja) * | 2016-03-22 | 2017-09-28 | 三菱マテリアル株式会社 | スパッタリングターゲット |
JP6932908B2 (ja) * | 2016-09-26 | 2021-09-08 | 住友金属鉱山株式会社 | 積層体基板、導電性基板、積層体基板の製造方法、導電性基板の製造方法 |
WO2018159753A1 (ja) * | 2017-03-01 | 2018-09-07 | 三菱マテリアル株式会社 | スパッタリングターゲット及びスパッタリングターゲットの製造方法 |
JP6533805B2 (ja) * | 2017-03-31 | 2019-06-19 | Jx金属株式会社 | スパッタリングターゲット、スパッタリングターゲットの製造方法、非晶質膜、非晶質膜の製造方法、結晶質膜及び結晶質膜の製造方法 |
JP6627993B2 (ja) * | 2018-03-01 | 2020-01-08 | 三菱マテリアル株式会社 | Cu−Ni合金スパッタリングターゲット |
WO2019167564A1 (ja) * | 2018-03-01 | 2019-09-06 | 三菱マテリアル株式会社 | Cu-Ni合金スパッタリングターゲット |
JP6853440B2 (ja) * | 2019-03-11 | 2021-03-31 | 三菱マテリアル株式会社 | 金属銅及び酸化銅含有粉、金属銅及び酸化銅含有粉の製造方法、及び、スパッタリングターゲット材、スパッタリングターゲット材の製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3779856B2 (ja) * | 2000-04-10 | 2006-05-31 | 株式会社日鉱マテリアルズ | 光ディスク保護膜形成用スパッタリングターゲット |
JP2010030824A (ja) * | 2008-07-28 | 2010-02-12 | Idemitsu Kosan Co Ltd | 金属相含有酸化インジウム焼結体及びその製造方法 |
JP2010077530A (ja) * | 2008-08-26 | 2010-04-08 | Hitachi Metals Ltd | スパッタリングターゲットの製造方法及びスパタリングターゲット |
JP2011084754A (ja) * | 2009-10-13 | 2011-04-28 | Hitachi Metals Ltd | スパッタリングターゲットの製造方法 |
JP5641402B2 (ja) * | 2010-02-01 | 2014-12-17 | 学校法人 龍谷大学 | 酸化物膜及びその製造方法、並びにターゲット及び酸化物焼結体の製造方法 |
-
2015
- 2015-04-02 KR KR1020167001775A patent/KR20160017101A/ko not_active Application Discontinuation
- 2015-04-02 CN CN201580001209.2A patent/CN105358734B/zh active Active
- 2015-04-02 JP JP2015533359A patent/JP5808513B1/ja active Active
- 2015-04-02 WO PCT/JP2015/060441 patent/WO2015170534A1/ja active Application Filing
- 2015-04-30 TW TW104113853A patent/TWI525208B/zh active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20180125946A (ko) * | 2016-03-22 | 2018-11-26 | 미쓰비시 마테리알 가부시키가이샤 | 스퍼터링 타깃 |
KR20190120167A (ko) * | 2017-03-01 | 2019-10-23 | 미쓰비시 마테리알 가부시키가이샤 | 스퍼터링 타깃 및 스퍼터링 타깃의 제조 방법 |
Also Published As
Publication number | Publication date |
---|---|
JP5808513B1 (ja) | 2015-11-10 |
WO2015170534A1 (ja) | 2015-11-12 |
TWI525208B (zh) | 2016-03-11 |
JPWO2015170534A1 (ja) | 2017-04-20 |
CN105358734B (zh) | 2017-03-29 |
CN105358734A (zh) | 2016-02-24 |
TW201542849A (zh) | 2015-11-16 |
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