KR20140093496A - Ttransparent substrate having a ultra-fine conductive circuit using Lenticular system and a method of manufacturing a transparent substrate by him. - Google Patents

Abstract

The present invention relates to a method of manufacturing a transparent substrate having an ultra-fine conductive circuit by using a lenticular system and a transparent substrate manufactured by the same. The method of manufacturing a transparent substrate having an ultra-fine conductive circuit by using a lenticular system according to the present invention includes: forming a thin photosensitive layer on a transparent substrate; generating a linear light source having a fine line width by allowing light of a light source to pass through a lenticular system having a fine pitch and forming an exposure part and a non-exposure part on the photosensitive layer by irradiating the linear light source through a photo mask or a pattern film; and forming a space section by chemically removing the non-exposure part formed by the lenticular system.

Description

A method of manufacturing a transparent substrate having a very fine conductive circuit portion by using a lenticular system, and a transparent substrate by the method. {Transparent substrate having an ultra-fine conductive circuit using a lenticular system and a method of manufacturing a transparent substrate by him.}

The present invention relates to a method of manufacturing a transparent substrate having a very fine conductive circuit portion by using a lenticular system, and a transparent substrate by the method.

A transparent substrate having conductivity is most widely used for a touch screen panel and the like. Typically, TSP is a sputtering process in which particles are dispersed and deposited on the surface of an indium oxide electrode (ITO) after ion bombardment, or a silver screen process in which a transparent electrode material is thinly applied to a panel. .

The present invention makes it possible to reduce the size of a circuit in order to maintain the transparency of a substrate while forming a conductive circuit part having a very small size on a transparent substrate. The present invention is also characterized in that the size of the transparent substrate having the very fine conductive circuit portion can be made large.

It goes without saying that a transparent substrate having a very fine conductive circuit portion can be produced. However, in the conventional method, in order to reduce the line width of the conductive circuit part, an expensive flat light exposure device is used, but the area to be manufactured is limited. This could not be done because of the limitation of the optical system used for the balanced light exposure machine. In addition, it was practically impossible to finely process the line width of the circuit portion in a productive manner.

The transparent substrate having the very fine conductive circuit portion to be manufactured in the present invention can be used for various purposes in the industry because it can economically produce a large area. The touch panel of the display device, the electromagnetic wave shielding device, and the solar panel can be used in all areas where electricity is to be maintained while maintaining transparency.

INDUSTRIAL APPLICABILITY The present invention can be applied to various applications as a transparent substrate having a very fine conductive circuit portion. It goes without saying that the pattern of the conductive circuit part is changed according to the field to which it is applied.

In a touch panel for a display, an electromagnetic wave shielding device, a solar panel or the like, the shape of the circuit part is formed by a square shape or a honeycomb shape having a width and a length. In addition, it is a matter of course that a very fine conductive circuit is formed in the form of COF or various shapes and used as a general circuit board.

The present invention relates to a transparent substrate on which a very fine conductive circuit portion is formed using a lenticular system. The present invention relates to a method for manufacturing a transparent substrate, comprising: a photosensitive layer forming step of forming a thin photosensitive layer on a transparent substrate; The light of the light source is passed through a lenticular system having fine pitch to generate a linear light source having a fine line width and the generated linear light source is irradiated to a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer An exposure process by a lenticular system; And a space part forming step of chemically removing the non-exposed part formed by the exposure process by the lenticular system to form a space part.

In the present invention, in order to implement a transparent substrate constituted by a very fine conductive circuit portion, a lenticular system for exposing light to a photosensitive material is introduced. In contrast to exposure equipment using existing optical systems, the present invention applies a novel concept of photoresist exposure technology.

Generally, an exposure device refers to a device that transfers a pattern to a material that reacts to light (photo-resist: PR, photosensitive material). This process consists of several processes. A substrate coated with a photosensitive material is prepared. A pattern film on which a pattern is formed is placed on the substrate. The patterned film is irradiated with ultraviolet rays. The ultraviolet rays expose the photosensitive material through the pattern film in the form of a pattern. After the exposure, the unexposed area is chemically removed to transfer the desired pattern.

In the present invention, substrates of various types in which a photosensitive material is coated are defined as substrates. Conventionally, a parallel light exposure apparatus was used to fabricate a circuit having a fine pitch. Parallel photo exposures are accompanied by a lot of fabrication costs and have a limited area to be applied. In the present invention, an exposing device including a concentrating light source generating device using a lenticure can be made without using an expensive parallel light exposing device to replace expensive equipment.

Generally, the exposure apparatus comprises: A light source, an optical system for processing light of the light source by various lens arrangements, a table, and other transporting devices, a cooling device, and a controller. The exposure machine used in the present invention comprises: And is an exposure device equipped with a luminous source generating device using lenticure. The light source device includes a light source and a lenticular system. The exposure of the exposure device according to the present invention is performed through relative transfer between the optical source device and the pattern film or the photomask.

In the present invention, an optical source used in a conventional exposure apparatus is not used, and a source of light generating apparatus is used. Lenticular is used for the source of light. By using the optical circulator generating apparatus disclosed in the present invention, the photosensitive layer is exposed accurately and precisely according to the pattern of the pattern film or the photomask. The optical source generator is a simple structure to replace a complex optical system manufactured by machining and combining large lenses. For fine and precise exposure, a complex and large optical system must be used. In this case, it is a reality that the effective area for actually exposing the substrate is only a palm-sized area in the region near the center of the optical system.

However, the exposure system for fabricating the transparent substrate constituted by the extremely fine conductive circuit portion of the present invention uses only a simple lenticular system. It is surprising that using the Lenticular system can increase the effective area as much as you want. The thickness of the lenticular system used in the present invention is usually within 1 mm. At the current scientific level, making large lenses of optical systems has physical limitations. However, at the present science level, making lenticure large is simple and has no limit. One of the great features of the exposure apparatus having the optical circulator generating apparatus used in the present invention is that it is resistant to vibration. The exposure apparatus used in the present invention is characterized in that accurate exposure can be performed even in a somewhat vibrating environment.

The greatest problem in the transparent substrate constituted by the extremely fine conductive circuit portion using the lenticular system of the present invention is, firstly, how precisely and finely the conductive circuit portion can be formed on the transparent substrate. Second, how can we fabricate a transparent substrate with extremely fine conductive circuitry with a large surface area? Third, is it possible to fabricate a transparent substrate composed of a very fine conductive circuit part so as to be economically mass-producible?

When a conductive circuit is to be formed on a transparent substrate, a transparent substrate having a line width of 30 microns or more can be fabricated precisely and finely with a very fine conductive circuit even if a conventional exposure apparatus is used. When the line width is 30 microns or more, it is possible to easily manufacture a transparent substrate having a very fine conductive circuit portion with a large area even if an existing exposure apparatus is used. A line width of 30 microns or more can manufacture a transparent substrate having a very fine conductive circuit portion so that even if an existing exposure apparatus is utilized, it can be easily and economically mass-produced.

However, when the line width reaches 10 microns, the conventional method suffers from three problems. In addition, when the line width is from 1 to 3 microns, the conventional method is ineffective in all three aspects. However, according to the method of the present invention, even if the line width is a few microns, it can be produced economically with a large area easily and precisely and precisely.

It is possible to manufacture a transparent substrate having a very fine conductive circuit portion having a line width that is almost impossible to use in the conventional optical system in the method of exposing a photosensitive layer by using a lenticular system used in the present invention .

Currently, there is an exposure device that uses parallel light as a dedicated device to make a circuit with a line width of 10 microns. This is an exposer using a lens optical system, which costs about 3 billion won. Although it has a high price, the product that can be manufactured is only able to produce products with a diameter of less than 15 centimeters. However, it has become the mainstream technology as exposure equipment of the most useful line width in the world at present. In order to lower the price of the product, efforts to increase the productivity have been continued, but technological progress has been difficult due to the limitation of the lens optical system.

However, when a very fine conductive circuit is formed by using the lenticular system adopted in the present invention, a conventional light source made of a lenticure system made of a thin film is utilized instead of a conventional complicated and expensive optical system. This optical circulator can make a circuit of a minute line width large. The present invention enables mass production of microcircuits of any size. It is possible to produce products with a large area through a scanning process with a linear light source having a line width of nanometer unit. The linear light source having a line width of nanometer enables a circuit board having an extremely fine conductive circuit portion which is difficult to realize by an exposure apparatus using an existing optical system.

The present invention uses a lenticular system, and a transparent substrate having a very fine conductive circuit portion is characterized by using a characteristic of a linear light source provided by Lenticular. When the lenticular system used in the present invention is used, the line width of the linear light source can be made up to the nanosize size. As a method for manufacturing a very fine conductive circuit part, the area that can be manufactured is limited. On the other hand, according to the present invention, there is no limitation on the length or width of the product. It is an epoch-making fact that we can process any large area as needed.

The lenticular system used in the present invention applies the light converging function of a lenticular lens. In particular, the vertical light function generated in the region near the central portion of the lenticular lens is effectively used. The form of the lenticular system is: There is a form composed of one lenticular and a form formed by laminating a plurality of lenticulars. For a single lenticule, one convex lenticular is used, or one concave lenticular is used. In the form of laminated lenticure, there is a form in which only the same material is laminated, and a form in which different materials are appropriately combined and arranged to form a laminate. In a form in which only the same material is laminated, there is a form in which the convex lenticules are laminated and a form in which the concave lenticules are laminated. In the form in which different kinds of materials are suitably combined and arranged to form a laminate, there is a form in which at least one or more convex tenticles and at least one or more concave lenticules are arranged in an appropriate order.

The lenticular of the lenticular system used in the present invention preferably includes a vertical lenticular at least in part. Of course, it includes a convex vertical lenticular or a concave vertical lenticular, called vertical lenticular. The combination or arrangement order of these can be applied in various forms since it is necessary to design according to each situation. The Lenticular system can simultaneously use the condensing function of the convex Lenticular and the light splitting function of the concave Lenticular. It has the function of splitting the light called the carved lenticular. When the light is divided, the linewidth of the ray source becomes finer and the number of ray sources increases. This enables more delicate exposure work.

The present invention relates to a method of manufacturing a transparent substrate having a very fine conductive circuit portion by using a lenticular system, and a transparent substrate by the method. In the present invention, a photosensitive layer for forming a thin photosensitive layer is formed on a transparent substrate, and a light source having a fine line width is generated by passing light from a light source through a lenticular system having a minute pitch. And then irradiating the patterned film to form an exposed portion and an unexposed portion in the photosensitive layer.

The light provided by the linear light source generating device is irradiated on the substrate on which the photosensitive layer is formed through the pattern film or the photomask. The irradiated light exposes the photosensitive layer according to the pattern of the pattern film or the photomask.

The lenticular system used in the present invention makes the concentrator light converged by the concave lenticule and the convex lenticule into a concentric circle having a narrower line width. At the same time, the number of lines of light of the light source is increased. As a result, the number of lines of the optical circulator is increased, and at the same time, a more precise exposure can be performed by using the optical circulator having a narrower line width. Using the Lenticurea system, which combines the properties of lenticule and convex lenticule, it is possible to produce a very fine luminous source with line widths ranging from tens to hundreds of nanometers. This fact implies that the use of the optical circulator generating apparatus used in the present invention makes it possible to expose a fine pitch of several microns.

The transparent substrate having the very fine conductive circuit portion made by the manufacturing method of the present invention is a major feature that it can be manufactured at low cost. And a transparent substrate having a very fine conductive circuit portion can be processed into a large area. In addition, it is a significant feature that the size of the line width of the very fine conductive circuit portion can be manufactured with a very small size of several microns.

For example, the entire area of a glass substrate of 3 m in length and 10 m in length is filled with a very fine conductive line in a checkerboard pattern, the line width of the conductive metal is 2 microns and the pitch of the checkerboard is 70 microns It has not been possible to fabricate it in the past. Even if you make one sheet, the cost will go beyond imagination.

However, if the present invention is used, it can be manufactured extremely easily at a low cost in a short time. Therefore, it has a strong effect on large-sized display panels, large electromagnetic shielding devices and similar areas.

In order to develop such a technique, the present invention utilizes the light converging function and the vertical optical function of the convex lenticular. By using the characteristics of lenticure to the maximum, by using the exposure technique used in the present invention, it is possible to easily expose even a circuit on which a thick photosensitive layer is formed or a circuit which should be formed with a very fine pitch. The most remarkable feature of using the optical circulator generating apparatus to be used in the present invention is that it is possible to perform exposure even for a very fine circuit composed of several microns, to expose a large area quickly, And there is a feature that the exposure can be continuously performed by the operation.

From the viewpoint of the working environment, it is essential that the processing by laser is performed in a space free from vibration. However, the provision of the optical circulator generating apparatus to be used in the present invention does not produce a definite defect even if there is slight vibration. The possibility of a microcircuit by a laser is realized in the form of a point light source. On the other hand, the ore-ray generating apparatus used in the present invention is in the form of a ray source, and the advantages are great contrast.

Even in terms of the production area of the product, large area can be produced with high productivity by scanning with the linear light source used in the present invention. When the result of exposure is strictly observed, when exposure is made through a laser made up of a point light source, the exposure cross-section can be seen to have roughly roughened originally. However, it can be seen that the exposed section of the lenticular system used in the present invention is in a clean state.

In order to produce a very fine circuit, a conventional balanced light exposure device was used. However, the structure of the optical system is complicated, and expensive production costs are required for the flat light exposure apparatus. Since a complex combination is required by combining a large convex lens and a concave lens, the optical system made becomes expensive. Even if a large optical system is produced, the effective area of the optical system that can be used for actual work is limited to only the limited area of the central portion of the lens, and the effective area.

However, if the lenticular system used in the present invention is used, the apparatus is simple, and expensive equipment is not used. It is produced using only the optical properties of the Lenticular lens. The light of the linear light source used in the present invention has properties of vertical light having a line shape or quasi parallel light having a line shape. Line-shaped vertical light having a fine line width minimizes diffusion, diffraction, and scattering of light even though it passes through a pattern film, thereby allowing precise exposure of a very fine pattern.

Fig. 1 is a general conceptual diagram of an exposure device equipped with a linear light source generating device.
2 is a perspective view of a typical convex lenticular.
3 is a view showing a state in which light is condensed in a convex tentacle.
4 is an explanatory view for explaining the vertical light of the convex cantilever.
5 is an explanatory diagram of a vertical optical lenticular.
6 is an explanatory view for explaining a vertical light lenticular which forms a lens shield.
Fig. 7 is an explanatory diagram for explaining a vertical light lenticular with a light transmitting slit. Fig.
8 is a perspective view of a general concave lenticular.
Figures 9a, 9b and 9c show an embodiment of a lenticular system.
10 is a configuration diagram of a convex lenticular with a shielding portion.
11 is a configuration diagram of a concave lenticular with a shielding portion.
12 and 13 are still another embodiment of a lenticular system having a light shield.
Fig. 14 is an explanatory diagram for explaining the configuration of the exposure device of the present invention with the upper and lower structures. Fig.
Fig. 15 is an explanatory diagram further illustrating Fig. 14; Fig.
FIG. 16 is an explanatory diagram of a tonic circle generating apparatus used in the present invention. FIG.
17 is another embodiment of the superstructure of the exposure machine.
18 is an explanatory diagram of a light source generating device for controlling intensity of light in a container.
19 is an explanatory view for explaining the positional relationship between the linear light source generating device, the pattern film, and the substrate in the exposure machine.

The present invention relates to a method of manufacturing a transparent substrate having a very fine conductive circuit portion by using a lenticular system, and a transparent substrate by the method.

The very fine conductive circuit used in the present invention means that the line width of the circuit is several microns to tens of microns in size. However, it will be used most competitively in the 2 micron to 10 micron range. In order to manufacture a transparent substrate having such a very fine conductive circuit portion, the most important thing is the exposure technique for exposing a very fine circuit. For this purpose, the present invention uses an exposure technique using a lenticular system. Accordingly, much of the present invention focuses on explaining the exposure technique by the lenticular system.

In order to manufacture a transparent substrate having a very fine conductive circuit portion, a thin photosensitive layer is first formed on a transparent substrate. As the transparent substrate, a wide variety of transparent materials such as transparent glass, PET film for optical use, transparent polyimide film or UV transparent film can be applied. The substrate may be a rigid substrate, a flexible substrate or may be wound in the form of a film. In general, transparent glass is generally used for a display panel or a touch panel.

In some cases, the substrate is made of a single material, but in many cases, a substrate made of another material is laminated on the substrate of the main material. That is, the substrate is made of a transparent glass or a transparent film, and a layer having a different material on the substrate is formed as a laminate, is also defined as a substrate of the present invention. A method of forming a thin photosensitive layer on a transparent substrate is constituted by a general method. There is a method of laminating a dry film to a transparent substrate or coating a liquid photosensitive material with a wet process. In the case of a thin coating of 1 micron or 2 microns, it is common to coat a liquid photosensitive material.

After the photosensitive layer forming step in which the thin photosensitive layer is formed on the transparent substrate, the exposure process is performed by the lenticular system. This process is the most important process of the present invention, and it is a unique process in which any existing conductive circuit has never been manufactured by this method. Only when this step is carried out, the extremely fine conductive circuit of the present invention can be produced economically and easily with a large area. In this process, the exposure process by the lenticure system forms the basis of the present invention. In other words, the optical source generator made by the Lenticular system and its function and configuration will be explained in detail.

The lenticular system includes a vertical optical lenticular. In addition, the lenticular system may be constituted by a convex lenticular or a concave lenticular or may be formed by laminating a plurality of lenticulars. In the present invention, after the photosensitive layer forming step, the exposure process by the lenticular system is carried out. Through the exposure process by the lenticular system, the light of the light source is passed through a lenticular system having a fine pitch to generate a linear light source having a fine line width. The generated linear light source is irradiated to a photomask or a pattern film, Thereby forming an exposed portion and an unexposed portion in the layer.

A post-process of the exposure process by the lenticular system includes a process for forming a space portion. The space portion forming process chemically removes the non-exposed portion formed by the exposure process by the lenticular system to form a space portion. The present invention has two types of embodiments in the process after the space portion forming process.

As a first embodiment, a sputtering process for forming a sputtering metal layer by sputtering a conductive metal on the upper portion of the exposure portion and the upper portion of the space portion is performed as a post-process of the space portion forming process. After the sputtering process, A sputtering metal layer formed on the upper part of the exposure part and a step of removing the exposure part. When this process is completed, a very fine conductive circuit remains only in the space portion. By sputtering the metal, the thickness of the sputtered metal layer can generally range from tens of microstrongs to several microns. Since sputtering is deposited in vacuum, it is deposited almost uniformly over the entire area. A metal layer is simultaneously formed on the upper surface of the exposure part as well as the space part. Of course, in order to achieve good sputtering, it is necessary to clean the transparent substrate formed with the exposed portion and the unexposed portion before the sputtering process. It is necessary to remove the sputtering metal layer in all other portions except the sputtering metal layer formed in the space portion because the sputtering is performed on the entire surface of the upper portion of the substrate.

Normally, the exposed portion of the photosensitive material exposed to light is easily removed by using caustic soda. However, the situation is slightly different in this case where the sputtered metal layer covers the upper part of the exposed portion as in the case of the present invention. In the present invention, the metal layer covered on the upper part of the exposure part and the exposure part itself must be removed together. In this case, however, if caustic soda liquid is used, when the sputtered metal layer is thin, the sputtered metal layer and the exposed portion under the sputtered metal layer are removed while being thinned. However, in the case where the sputtered metal layer is thick, it is preferable to remove the metal layer on the upper part of the exposed portion through a fine polishing operation before proceeding with caustic soda. Even if the sputtering metal layer is formed to be extremely thick by performing the polishing operation, the sputtered metal layer and the exposed portion under the sputtered metal layer can be removed.

Thus, when the exposed portion formed on the transparent substrate and the sputtered metal layer on the exposed portion are removed together through the caustic soda liquid, the sputtered metal layer remains only in the space portion. And the sputtered metal layer in the space portion is tightly adhered to the surface of the transparent substrate. As a result, a very fine conductive circuit is formed by the sputtered metal layer only in the space portion formed in the transparent substrate. Therefore, in the present invention, the accuracy of the circuit is determined according to how precisely and finely the space is processed through the exposure operation. Therefore, it is a key point of the present invention to precisely form the space portion through the exposure operation. The technique of forming the line width of the space portion in several microns over a large area is possible by utilizing the lenticular system proposed in the present invention. Therefore, the transparent substrate constituting the extremely fine conductive circuit part of the present invention can be manufactured in a mass production form by using the lenticular system of the present invention.

When the conductive circuit is formed as described above, the circuit portion may be plated to reinforce the circuit portion. In the case of performing the plating process, firstly, the entire metal layer sputtered with the metal immediately after the sputtering process may be plated, and as a second method, after the sputtering process, through the caustic soda, There is a case where the sputtering metal layer remaining on the space portion is plated after removing the sputtered metal layer on the upper portion. If the transparent electroconductive circuit is formed in the same shape and the same size as the transparent electroconductive substrate in the same manner as in the present invention and the circuit is constructed using sputtering, have. The thickness of the metal layer of the sputtering is formed almost uniformly, and if the shape and size of the micro-fine conductive circuit are the same, the electrical resistance value can be uniformly formed.

In a second embodiment of the present invention, after the space portion forming step is completed, a conductive material filling process is performed in which the space portion is filled with a conductive paste of silver paste or liquid, and the mixture is cured. When the exposed portion is removed after the conductive material filling process, a very fine conductive circuit is left in the space portion. This process is called a very fine conductive circuit forming process. When the process of forming the very fine conductive circuit is completed in this way, a very fine conductive circuit is formed on the transparent substrate.

The most typical example is to fill the space with silver paste obtained by mixing nano-silver powder with a solvent. When the silver paste is applied to the space portion formed between the light exposure portions and then squeezed, the silver paste is filled in the space portion and the silver paste on the upper surface of the light exposure portion is cleaned. The second embodiment of the present invention can also improve the electrical characteristics of the extremely fine conductive circuit by forming a very fine conductive circuit by removing the exposed portion and further performing a plating operation on part or all of the circuit. When a conductive filler is filled and cured to form a circuit, the conductive filler may be oxidized. For example, when a circuit is formed by using a conductive filler as a silver paste, the oxidizing action proceeds on the surface of the circuit portion composed of the silver paste over time. Plating is performed to prevent such oxidation. In this case, oxidation of the circuit portion can be prevented.

The transparent substrate on which the very fine conductive circuit fabricated by the present invention is formed is applicable to various fields. One of the most representative areas is the touch screen panel. One of the most important uses of the touch screen panel is a smart phone. In the case of a touch screen panel, a very fine circuit portion is formed inside the panel, and a bezel is formed on the outside of the circuit portion. The bezel refers to the portion of the display where the touch is not input. The bezel can also be described as a frame from the product border to where the screen (display) begins. The bezel is used to prevent the TSP internal electrical pattern or parts from being exposed to the outside.

As the area of the display increases, the number of touch sensors increases. In order to transmit the touch input signal of the user to the IC, the middle- or large-sized TSP requires a more complicated fine pattern. In this case, it is necessary to maintain a constant pattern interval in order to reduce interference of signals. It is important to maximize display space in TSPs such as smart pads and notebook PCs with limited size. In order to increase the efficiency of the panel displaying the screen, it is necessary to minimize the bezel serving as a frame. However, since the space occupied by the pattern is widened as the number of touch sensors increases, it is difficult to reduce the size of the bezel in the case of a medium and large TSP.

 When a touch screen panel is fabricated by the method of the present invention, the transparent substrate may include a bezel portion and a circuit portion formed inside the bezel portion. In this case, it is preferable to simultaneously form the bezel portion and the circuit portion inside the bezel portion through a single exposure operation in order to save the convenience and cost of fabrication. The bezel portion and the circuit portion formed inside the bezel portion can be integrally formed at the same time through the same exposure process operation.

In this case, after the bezel and the circuit portion formed inside the bezel are formed through a sputtering method or a conductive material filling method, a plating operation is further performed only on the bezel portion to improve the electrical flow of the bezel portion have. When performing the plating operation on the bezel portion, it is necessary to seal the circuit portion inside the bezel portion so as not to proceed with plating. There are various ways of sealing. The most typical method is to perform an exposure operation through a photosensitive material to perform sealing. In the case of the conventional touch screen panel, the thickness of the circuit lines constituting the bezel is made thicker than the thickness of the internal circuit portion, so that the electricity flows well.

In the case of a touch screen panel, it is natural for the very fine conductive circuitry inside the bezel to have the same shape and size. Since the human vision tends to concentrate on a specific shape or surrounding and other shapes, it is desirable that the shape and size of the internal circuit portion of the touch screen panel be the same. The ultra-fine conductive circuitry within the bezel is configured such that the interior of the bezel is fully enclosed without any voids, but is divided into a plurality of electrically connected circuit groups. The plurality of circuit groups are electrically insulated from each other to allow recognition of the position. At this time, in the form of shorting the circuit group for electrical insulation, it is preferable to make a short circuit with a small interval so as to prevent the short circuit of the circuit group from being short-circuited.

In the present invention, the transparent substrate produced by the method of manufacturing a transparent substrate having a very fine conductive circuit portion using the lenticular system is also subject to the protection of the present invention. According to the present invention, there is provided a method of manufacturing a transparent substrate having a very fine conductive circuit portion, comprising: a photosensitive layer forming step of forming a thin photosensitive layer on a transparent substrate; An exposure step of irradiating light of a light source onto a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer; A space part forming step of chemically removing the non-exposed part formed by the exposure step to make a space part; A sputtering step of forming a sputtering metal layer on the upper part of the exposure part and the upper part of the space part by sputtering a conductive metal; And forming a very fine conductive circuit by removing the sputtering metal layer formed on the exposed portion and the exposed portion to leave a very fine conductive circuit only in the space portion. ≪ / RTI >

The present invention also provides a method of manufacturing a transparent substrate having a very fine conductive circuit portion, comprising the steps of: forming a thin photosensitive layer on a transparent substrate; An exposure step of irradiating light of a light source onto a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer; A space part forming step of chemically removing the non-exposed part formed by the exposure step to make a space part; A conductive material filling step of filling the space part with a silver paste or a liquid conductive filler to cure the space; And a step of forming a very fine conductive circuit by removing the exposed portion to leave a very fine conductive circuit in only the space portion.

In the present invention, the photosensitive layer uniformly applied to the transparent substrate can be used by coating a liquid photosensitive material or laminating a photosensitive material having a photosensitive layer with a predetermined thickness. When the liquid photoresist is coated on the substrate, it is mainly used when the thickness of the photosensitive layer is very thin.

Hereinafter, the lenticular system used in the present invention will be described in detail. A luminous source generating apparatus used in the present invention is manufactured by using a lenticular system. Using the luminous source generating device used in the present invention using lenticure, an extremely fine luminous source having a line width of the linear luminous source of nano size can be made. In order to fabricate a linear light source having such a nano-sized line width, a lenticular system used in the present invention is constructed. The luminous source generating apparatus using the lenticure system used in the present invention can be used effectively in other industrial fields, but it can be most effectively used in the field of exposure apparatus.

The luminous source generating apparatus using the lenticurea used in the present invention may include additional equipment, but basically includes a light source and a lenticure system. The light source can be used as a light source by using a surface light source LED using a compound semiconductor or by mounting a plurality of LEDs. Of course, in addition to LEDs, all luminous luminous bodies can be used as light sources. In the present invention, the lenticular system may be constituted by a single convex lenticular. However, in most cases, a single convex lenchyque and a single concave lenticule are laminated, or multiple lenticulars are laminated and used. In the light source used in the present invention, the intensity of light used during exposure is very important. In addition, uniform light distribution plays an important role. It is preferable that the light of the light source is uniformly irradiated with respect to the entire area of the lenticure system, with uniform distribution and uniform intensity.

The optical circulator for use in the present invention can perform the exposure work only when there is relative movement with respect to the pattern film mounted on the exposure machine. The light source and the lenticular system constituting the optical circulator used in the present invention are relatively moved relative to the pattern film of the exposure machine in the same direction and moving at the same speed in the same direction without relative movement. To this end, in the exposure machine used in the present invention, a light source and a lenticular system are often mounted in a single container. In this case, since the light source and the lenticular system are mounted in one container, the relative movement to the pattern film must occur in the same direction at the same speed as the whole.

In the present invention, it is ideal that the light passing through the tonic circle generator used in the present invention is directed downward in the vertical direction. When the light is vertically lowered in this way, the light is not dispersed sideways or diffracted, but goes down in a vertical direction. Such a circular light source generating device is referred to as a vertical light source generating device in the present invention. In order to generate such vertical light, the function of the central region of the lenticular lens is mainly used. A lenticurea having a function of allowing light to go down substantially in the vertical direction with respect to the substrate is defined as a vertical lenticurea in the present invention. The vertical light lenticular as defined in the present invention does not mean that the light is completely vertically down. The vertical light defined in the present invention means that the condensed light falls almost vertically.

In the present invention, there are two types, namely, a vertical optical lenticular lens. There is a vertical lenticular with a convex lenticular and a vertical lenticular with a concave lenticular. Vertical lenticular with convex lenticular is defined as convex vertical lenticular and lenticular with concave lenticular is defined as concave vertical lenticular. In the present invention, the term vertical light lenticular refers to convex or concave vertical lenticular. The concave vertical lenticular and convex vertical lenticular correspond to each other. They correspond to each other like female threads.

Convex or concave vertical lenticular, and the other is formed by forming a release layer and plating and replicating. A general lenticular lens, Lenticular, used in the linear light source generator used in the present invention can also be used. However, in this case, the accuracy of the exposure operation may be lowered. In order to accurately perform the function of the lenticule for generating the linear light source in the linear light source generating device used in the present invention, the exposure device used in the present invention, and the lenticurea system used in the present invention, the use of the vertical lenticure desirable.

In the form of the lenticular system used in the present invention, the simplest and basic form is to consist of only one convex lenticular. The next simple form is a single concave lenticule laminated to the bottom of one convex lenticular. However, in order to achieve more various effects, it is possible to produce a laminate in which at least one convex horned cylinder and at least one concave horned cylinder are laminated. The lenticular layered body is formed by combining convex lenticulars or concave lenticulars in an appropriate order.

Hereinafter, the exposure machine used in the present invention will be described. In explaining the exposure machine used in the present invention, a general concept of the exposure machine of the present invention will be described. In order to explain the concrete construction, the embodiment will be explained by dividing into the upper structure and the lower structure.

The exposure device of the present invention comprises a luminous source generating device using lenticure. The light source device includes a light source and a lenticular system. The exposure work of the exposure machine used in the present invention is performed through relative transfer between the above-mentioned optical circulator generating device and the pattern film. In the description used in the present invention, the pattern film and the photomask perform almost the same functions as those of the photomask, and therefore, even if only the pattern film is mentioned, the photomask is also applied to the photomask unless otherwise specified.

When the exposure operation is performed using the exposure apparatus used in the present invention, the exposure operation can be performed only when there is a relative transfer operation between the linear light source and the pattern film. In order to carry out the exposure work, there are three types of transfer methods for relatively transferring the optical source device and the pattern film. Second, when the pattern light source device is moved and the pattern film is fixed. Second, when the pattern light source device is fixed and the pattern film is moved. Third, when the pattern light source device and the pattern film are moved together, And the speed at which it is made is different. The structure for the movement of the substrate below the pattern film and the table below the substrate may be suitably designed if necessary. The exposure apparatus of the present invention is applied to any one of the above-mentioned three forms. In each case, a structural design suited to the operating structure of the exposure machine is required. Such a structural design is merely an application of a known technology, and will not be described separately.

In order to more specifically explain the structure of the exposure system used in the present invention, the upper structure of the exposure system used in the present invention will be described. In the superstructure, an optical source is constituted. The upper structure may further include a conveying means for conveying the linear light source, a cooling means for cooling the heat of the light source, and a controller. Further, an elastic roller may be additionally provided in the upper structure.

The lower structure of the exposure machine according to the present invention is a structure formed under the upper structure. Basically, a table is constituted in the lower structure of the exposure machine used in the present invention. The table on which the photosensitive material is coated is detachably mounted on the table. The table may be provided with a contact means for closely contacting the substrate. The lower structure may be configured to include a conveying means for conveying the table, a cooling means for cooling the linear light source generating device, a power supply means, a controller, and the like.

A pattern film, a photomask, a substrate on which a photosensitive layer is formed, and the like are detachably positioned between the upper structure and the lower structure. A pattern film or a photomask positioned between the upper structure and the lower structure, a substrate on which the photosensitive layer is formed, and the like can be attached and detached when preparing or finishing an exposure operation. The attachment / detachment from the exposure apparatus structure used in the present invention is defined as an accessory, not as a component of the exposure apparatus in the present invention.

The standard construction procedure for the exposure machine used in the present invention is as follows. However, it is obvious that it can be changed to any situation and characteristics. A pattern film or a photomask and a substrate are positioned between the tonic circle generating device and the table. The substrate is placed under the pattern film or the photomask and is detachably mounted on the table. In the lower part of the table, there can be placed a contact means for bringing the substrate into close contact with the table, a conveying means for conveying the table, a cooling means for cooling the heat of the light source, a power supply means, a controller and the like.

Light of the linear light source produced by the linear light source generator used in the present invention is irradiated onto a pattern film or a photomask of an exposure machine. The light of the linear light source passes through the pattern film or the photomask, and then exposes the photosensitive layer of the substrate. When the exposure operation is performed, the pattern film or the photomask is in close contact with or spaced from the substrate. Also, when the exposure operation is performed, the pattern film or the photomask should never be slippery with the substrate. Further, when the exposure operation is performed, the substrate is generally in a state in which it does not slip due to close contact with the table, but there is also a case where the substrate slips against the table.

When the substrate does not slip with respect to the table at the time of the exposure work, the substrate and the table can be brought into close contact with each other through the tightening means formed by the vacuum pressure formed on the table. In this case, there is a method of moving the light source device to fix the table. Also, it is possible to fix the ray source generating device and move the table.

In the case where the substrate slips with respect to the table when the exposure operation is proceeding, the substrate is wound around the reel while the flexible substrate is being used, and a continuous exposure operation is performed. At this time, the table and the light source generating device are stationary, and the pattern film and the substrate become one body in a state of being closely contacted with or spaced from each other, and are slid and moved with respect to the table.

In this case, it is possible to constitute an elastic roller in the upper structure, and press the pattern film using the elastic roller. That is, by pressing using the elastic roller, the pattern film is pressed onto the substrate; The pattern film and the substrate become one body, and are moved while slipping with respect to the stationary table. At this time, it is desirable that the elastic roller is structured so as to cooperate with the linear light source generating device and one body to perform the same movement. At this time, during the exposure operation, the upper structure including the source of light is stopped.

In the exposure machine used in the present invention, a transfer device for relatively transferring the upper structure and the lower structure to each other, a cooling device for removing heat from the light source, an upper structure driving device, a lower structure driving device, It is a matter of course that the feeding device and the like can be replaced with a device which is generally used. Therefore, specific constructions thereof are not disclosed in the present invention.

1 is a view for explaining the concept of an exposure machine used in the present invention.

The exposure machine used in the present invention is equipped with a luminous source generating device used in the present invention. The exposure apparatus 1 used in the present invention is constituted by a substrate structure 9, a luminous source generating device 2, and a device section including an opening / closing port. The specific structure of the exposure apparatus used in the present invention will be described later in terms of the upper structure and the lower structure.

The luminous source generating device (2) used in the present invention includes a light source (4) and a lenticure system (5) in a basic configuration. It is preferable that the light source 4 is configured to uniformly irradiate light over the entire area of the lenticular system having a constant area. The lenticular system used in the present invention is the most important part of the exposure apparatus provided with the optical circulator for use in the present invention.

There are various types of optical circulator generators used in the present invention. The concentrator generator is composed of a light source and a lenticular system. The lenticular system and the light source do not have relative motion with respect to each other. In the simplest form of a circular light source, a light source and a lenticular system are mounted on the same frame. In this case, the light source may oscillate in the container, or the lenticular system may be subjected to fine vibration. During the exposure operation, the source of light of the source is moved relative to the pattern film mounted on the exposure apparatus.

Mounting the light source and the lenticular system in the same container is a universal constitution of the present invention. It goes without saying that the light source and the lenticular system can be mounted on various structures without being mounted on the container. It is one of the key concepts used in the present invention that the light source and the lenticure system move together in the same direction and at the same speed. The light source and the lenticular system, as a whole, belong to the core technology used in the present invention to prevent relative movement with respect to each other. Of course, when the light source is stopped, the lenticure system is stopped because the light source and the lenticure system all move in the same direction and at the same speed.

Of the technologies using lenticure, there is a stereoscopic image camera technology different from the mechanism of the luminous source generating device used in the present invention. In a stereoscopic camera, a convex lenticular is placed in front of a film for recording an image. In order to capture a stereoscopic image, the shutter is opened to open the lens, the convex lens and the film are stopped, and a plurality of images are recorded while moving the subject. As another method, there is a method of recording a plurality of images while stopping a subject and moving a convex lens and a film. This mechanism is significantly different from the mechanism used in the present invention. It can be said that the subject corresponds to the light source.

That is, in a stereoscopic image camera, a mechanism for stopping the lenticule and moving only the light source, or stopping the light source and moving only the lenticule is used. A mechanism for recording a stereoscopic image using a convex lenticular has been commonly used in a stereoscopic image recording apparatus. Observing the stereoscopic image, it can be seen that a plurality of images are recorded on the film through each of the convex lenticular lenses. This means that a plurality of images having different wide angles with respect to the same subject are recorded in a plurality of lenticule pitches. This is a principle in which stereoscopic images can be seen by recording images of a plurality of subjects at different angles in a pitch of each lens of the convex lens.

On the table of the exposure machine used in the present invention, a substrate to which a photosensitive material is uniformly applied is placed. The substrate is detachable from the table when preparing an exposure operation or completing exposure. The substrate can be closely fixed to an upper portion of the table by a close-contact device. A pattern film or a photomask is placed on the substrate. The pattern film or the photomask is detachable from the table when preparing an exposure operation or completing exposure.

The pattern film or the photomask is mounted on the substrate in close contact or spaced apart. During the exposure operation, the pattern film or photomask should not have any relative movement to the substrate. During the exposure operation of the exposure machine used in the present invention, the pattern film or the photomask must be configured so as to be capable of relative transfer with respect to the optical brightener generating device. That is, when the linear light source is stopped, the pattern film or the photomask is transferred; When the pattern film or the photomask is stopped, the light source generating device is transferred. Of course, it is also possible that both the light source generating device and the pattern film are transported, but in this case, the transporting speed must be different.

In the exposure machine used in the present invention, the lenticular system of the linear light source generating device is constituted below the linear light source generating device. It is preferable that the lenticular system constituted at the lower part of the circular light source generating device is spaced apart from the pattern film or the photomask by a predetermined distance so as not to cause friction with motion. In order to realize an accurate exposure work, the smaller the degree of the spacing is, the more preferable.

The relative transfer is possible by means of various transport means 3. In the exposure machine used in the present invention, various forms can be used, such as using a motor and a rail, using a rack and pinion structure, or using an LM guide, in order to transfer the light source. As shown in Fig. 1, it is also possible to feed by driving the motor using the slider rod.

During the exposure operation of the exposure device of the present invention, it is of course possible to constitute the optical source generating device in a stationary state and to move the substrate structure 9 located under the optical source generating device. The term " substrate structure " The substrate structure may include a table, a table transfer device, a vacuum pressure generator, a cooling means, and the like. The substrate to which the photosensitive material is applied is detachably placed on the table, and the substrate is separate from the substrate structure.

When attaching the substrate to the table, a cohesive device may be provided for tightly attaching the substrate to the table using vacuum pressure. In addition, the table transfer device for moving the table of the exposure machine has various forms. All of these devices are included in the above substrate structure. At the bottom of the pattern film 6 or the photomask, the substrate is mounted in a detachable form from the table of the exposure machine. The photosensitive layer 7 is uniformly applied to the substrate 8. The pattern film or the photomask can be mounted on the substrate in close contact or spaced apart. During the exposure operation, the pattern film or the photomask must not move relative to the substrate.

The photosensitive layer on the substrate is coated with a transparent protective film. This is to protect the photosensitive material. When the exposure process is performed using the exposure apparatus used in the present invention, the exposure process is performed with the transparent protective film attached, or the exposure process is performed with the transparent protective film removed. When the exposure is performed in a state of having a transparent protective film, the photosensitive layer is protected, and exposure can be performed by performing exposure while removing the transparent protective film.

When the exposure is carried out while the transparent protective film is peeled off, the pattern film or the photomask should be prevented from damaging the photosensitive layer. For this, first, the pattern film or the photomask is exposed to a predetermined distance from the photosensitive layer, or secondly, the releasing property is increased on the surface of the pattern film or the photomask, followed by exposure to the photosensitive layer.

When the photosensitive layer is exposed in a state in which the protective film is coated, it is preferable that the photosensitive layer is not damaged. Theoretically, the most accurate exposure is to expose a pattern film or a photomask to the photosensitive layer in a state of peeling off the protective film of the photosensitive layer. The second precise exposure is to expose a pattern film or a photomask to the photosensitive layer in a state in which the protective film of the photosensitive layer is covered. The third precise exposure is to expose the pattern film or the photomask away from the photosensitive layer while the protective film of the photosensitive layer is peeled off. The fourth precise exposure is to expose the pattern film or the photomask away from the photosensitive layer with the protective film of the photosensitive layer covered.

The exposure of the protective film in the covered state is preferable for the purpose of not damaging the photosensitive layer, but it may be adversely affected by diffraction of light, interference and diffusion due to the transparent protective film. The exposure machine used in the present invention can be manufactured in a structure capable of suitably coping with exposure conditions and conditions in the field.

When the pattern film 6 is irradiated with light by the optical circulator generating device 2 used in the present invention, the transparent portion of the pattern film transmits light and the opaque portion shields the light. The light condensed through the tonic circle generator 2 used in the present invention cures the photosensitive layer through the transparent portion of the pattern film 6. When the pattern film is irradiated with the light of the source of light formed through the extinction light source device used in the present invention, the photo-sensitive material is exposed in the pattern film pattern. After the exposure operation, if the portion of the photosensitive material that has not been exposed, that is, the portion that is not cured, is removed by a chemical method, a pattern is formed on the flat plate 8 by the exposure portion.

In the exposure machine used in the present invention, the substrate is detachably positioned on the table of the exposure machine. During the exposure operation, the substrate is preferably brought into close contact with the table. For this purpose, it is preferable to form fine air holes in the upper part of the table, and tightly fix the substrate to the table with the vacuum pressure through the holes. For convenience of explanation in the present invention, a plate to which a photosensitive material is uniformly applied is referred to as a substrate, and a state in which the substrate is unfolded flat is referred to as a flat plate. The pattern film or photomask is detachable, and is located at the bottom of the luminous source generating device and the top of the substrate.

In the state in which the exposure process is being performed using the exposure apparatus used in the present invention, the pattern film prevents mutual relative movement with respect to the substrate. There should be no slip. The substrate to which the photosensitive material is uniformly applied may have various shapes. There is a form in which a photosensitive material is thinly coated on a rigid substrate which is not deformed. When the substrate is wound with the flexible substrate, the exposure can be continuously performed.

In the exposure machine used in the present invention, rollers capable of winding a flexible substrate can be formed on both sides or one side of the exposure table. This allows the flexible substrate to be wound in a reel-like shape, so that the exposure operation can be performed continuously.

It is needless to say that the optical circulator generating apparatus used in the present invention may include not only the light source and the lenticular system but also other components to enable additional functions. The present invention is not limited to the use of the light source 4, which is a core element of the light source, and the lenticular system 5, which is located below the light source, even if other elements are included in the light source for use in the present invention. The light source of the present invention.

The lenticular system used in the present invention has a form composed of one lenticular and a form formed by laminating a plurality of lenticulars. For a single lenticule, one convex lenticular is used, or one concave lenticular is used. In the form of laminated lenticure, there is a form in which only the same material is laminated, and a form in which different materials are appropriately combined and arranged to form a laminate. In a form in which only the same material is laminated, there is a form in which the convex lenticules are laminated and a form in which the concave lenticules are laminated. In the form in which different kinds of materials are suitably combined and arranged to form a laminate, there is a form in which at least one or more convex tenticles and at least one or more concave lenticules are arranged in an appropriate order.

In the lenticular of the lenticular system used in the present invention, it is preferable that at least a part of the lenticular comprises a vertical lenticular. Of course, it includes a convex vertical lenticular or a concave vertical lenticular, called vertical lenticular. The combination or arrangement order of the laminated lenticules can be applied in various forms because the design for each situation is required. Or convex or concave lenticules are laminated, each lenticure can be laminated immediately, and there is also a case where lamination is carried out in an inverted manner.

In the lenticular system used in the present invention, generally, a convex lenticular is generally formed at the uppermost portion. Of course, it is possible to construct a concave lenticule. It is also common that a concave lenticular is laminated on the lower part of the convex tentile. The number of the concave lenticules is at least one or more. If you want to divide the light of the concentrator into a larger number, you can increase the number of concave lenticules.

In the case of making the exposure apparatus having the optical bright-circle generating apparatus used in the present invention, the optical bright-circle generating apparatus is placed on the top of the pattern film or the photomask. In order to perform a continuous exposure operation, during the exposure operation, the optical source generator is preferably positioned to be spaced apart from the pattern film or the photomask by a predetermined distance so as to enable relative transfer without friction.

2 is a perspective view showing a general convex tentacle.

As shown in FIG. 2, the convex portion of the convex portion of the convex portion is connected to the convex portion. A plurality of convex lenticular lenses 11 called convex lenticular lenses are continuously connected to the side surfaces. Each convex lenticular lens has a long columnar shape. And a plurality of convex lenticular lenses called " convex lenticular " Each of the convex lenticular lenses has a flat surface on one surface and a columnar surface on the other surface. The light of the light source is condensed in a line shape through each convex lens of the convex lenticular. Such a convex lens is often used for recording or reconstructing a stereoscopic image.

3 is a view showing a state in which the light of the light source is condensed through the convex lenticular.

Each of the convex lenticular lenses 13 and 14 condenses the light of the light source 12. When the photosensitive layer is closely adhered to the lower part of the convex lenticular, and the light is irradiated, the condensed light is exposed in the form of a line in the photosensitive layer 15. The condensed light forms an exposure section 16. In the photosensitive layer, an exposed portion and a non-exposed portion appear in a linear form.

As shown, when the light of the light source 12 is irradiated to the convex cantilever, the light is condensed toward the focal point of the respective lenticular lenses 13 and 14. Given a change in the curvature of the lens, the focal length of the lens changes. By controlling the focal length of the convex lenticular, the light condensed on the photosensitive member 15 can be adjusted. By using these characteristics, the condensing ability of the lens can be adjusted. In the photosensitive layer, an exposing portion 16 is formed by the condensed light.

4 is a view showing a state of vertical light generated in the central portion of each lens of the convex cantilever.

Through the curved surface of each lens called the convex lens, the light received from the top is refracted and focused toward the focal point. At this time, the light irradiated near the central part of each of the convex polytetrafluoro lenses has minute refraction action. In other words, the refraction is lowered almost vertically toward the lower part in a state of small refraction. The more the light is out of the center of each of the lenticular lenses, the more refracted the light is, and the more focused toward the focal point. Condensation occurs through the above-mentioned cheek action. The angle of refraction is larger as it deviates from the center of each lens.

In the convex lenticular, a portion in which the refraction action of light is extremely fine and the portion which goes down almost vertically toward the bottom is defined as a vertical optical region. The vertical light region corresponds to a region near the central portion of each lens of the convex lenticular lens. A convex lenticule is defined as a vertical lenticule that consists of only the central region of each lens of the convex lenticular lens. Even in a vertical light lenticule, the light goes down almost vertically. However, it is not a state without refraction at all. It is a matter of course that the condensing function is carried out as well because the vertical optical lens cue also has a refraction action. It can be said that the light is almost vertically lowered compared to a typical lenticurea called a vertical light Lenticular. In the present invention, it is understood that there is a refraction action called vertical light lenticular, but the size of the refraction is relatively small.

In the present invention, for convenience of explanation, it can be explained that only the regions near the central portion of each lens of the convex tentacle, called the vertical optical lens, are cut and connected to each other to form a convex lenticular. The vertical optical lenticular lens collects the light emitted from the light source and transmits the light to the lower portion, and functions to transmit the light almost vertically. In the present invention, the central region of the convex lenticular lens does not exactly mean the central portion of the lens. (18) on the left and right sides with respect to the center of the center.

A certain range region 18 near the central portion of the convex lenticular lenses condenses the light from the light source 17 and transmits it downward in a substantially vertical direction. In a certain range region 18 near the central portion of the convex lenticular lenses, refraction action is minimized. Light irradiated to this area is condensed and goes down vertically.

Light that is condensed and irradiated in a substantially vertical direction through a region in the vicinity of the central portion of the lenses of the convex lenticular is defined as vertical light in the present invention. The region of the convex lenticular lens, in which light is condensed in a substantially vertical direction, is defined as a vertical light region 18 in the present invention. A certain range in the vicinity of the central part of the convex lenticular lenses becomes the vertical light area. Vertical light Lenticular is also subject to the protection of the invention.

In the present invention, the vertical light means substantially vertical, and does not mean exactly vertical. This is a typical embodiment of a lenticular system used in a linear light source generating apparatus used in the present invention called vertical light lenticular. In the exposure machine used in the present invention, various types of convex or concave lenticulars can be used, but the efficiency of the vertical light lenticulars is most effective. It is needless to say that various types of lenticulars other than the above-mentioned vertical light lenticular may be used in the exposure apparatus used in the present invention.

However, in order to obtain a ray source having a fine line width, the pitch of the lenticular used must be a fine size. As an example, when the pitch of the vertical light convex tenture was set at 30 microns, the linewidth of the linear light source was 3 microns. Using this lenticure system, a microcircuit with a pitch of 20 microns was realized. In the case of Lenticular, it was found that the efficiency of the luminous source generating device changes depending on the size of the pitch and the focal length of the Lenticular. It can be manufactured by various methods called vertical light lenticular with extremely fine pitch. Hereinafter, various methods of manufacturing a vertical optical lenticular are described.

It is possible to fabricate only one region shape near the central part of the convex lenticular lens through the use of a cutting tool or a laser beam and then copy and connect them. The pitch of the vertical light lenticule is significantly smaller than the pitch of a typical convex lenticular. This is because the convex lenticule is constituted by only the region near the center of the lens of the convex lenticular lens. A circuit substrate having a pitch of several microns in size can be processed only when the pitch of the vertical light lenticular is not more than several tens of microns.

FIG. 5 is an explanatory diagram illustrating the configuration of a vertical optical lenticular used in the present invention. FIG. In the present invention, it is possible to configure various embodiments as a vertical optical lenticular lens. 5 shows only the vertical light region 21 of each convex lenticular lens. This is a representative form of the vertical light lenticular according to the present invention. The light of the light source located at the upper portion is transmitted to the lower portion in a substantially vertical direction in the condensed form through the vertical light lenticular used in the present invention.

FIG. 6 is an explanatory diagram illustrating a vertical light lenticule that forms a lens shield on a convex lenticular to realize vertical light.

This is an embodiment of the vertical optical lenticular used in the present invention. In each of the convex lenticular lenses, a portion except for the vertical light region 25 is filled with an opaque shield 24 to shield light from passing therethrough. This constitutes a vertical light lenticular through a method of filling opaque shields in portions other than the vertical light region in the Lenticular lenses. If the photoreceptor is placed under the vertical light cantilever, the light is irradiated only through the vertical light region 25 of the lenticular lens to form the exposed portion 26.

Fig. 7 is an explanatory diagram for explaining a vertical light lenticular with a light transmitting slit provided in a convex lenticular.

In this embodiment, a light transmitting slit is formed at the lower part of the convex lenticular. The light transmitting slit is formed at the lower part of the central portion of each convex lenticular lens 29. The light transmitting slit is configured such that light passes through only the lower region of the central portion of the convex lenticular lens 29. The light transmitting slit can be manufactured by dicing a long groove along the longitudinal direction of each lenticular lens on an opaque plate.

Or a transparent film is formed in the film even if light passes through only the lower region of the central portion of the convex lenticular lens 29. When light condensed through each lens 29 of the convex lenticular is transmitted downward, only the light allowed through the light transmitting slit goes down. If the photosensitive layer is placed under the light transmitting slit, the condensed light is irradiated to the photosensitive layer 31 to form the exposed portion 33. The light transmitting slit is supported through the slit support (30).

In another embodiment of the vertical optical lenticular used in the present invention, the shield of FIG. 6 and the light transmitting slit of FIG. 7 are simultaneously formed in a lenticular. In the present invention, if the lenticulars are capable of forming vertical light even at a part thereof, they will be referred to as vertical lenticular lenses. In general, a number of lenticure lenses called Lenticure are connected. Each lenticular lens has the same cross section in the longitudinal direction of the lens. If the number of lenses of the lenticular lens is at least one, it is referred to as a lenticular lens in the present invention. Therefore, it is a matter of course that the present invention also encompasses Lenticular lenses in which the number of lenticular lenses is one.

The larger the number of lenticular lenses, the easier it is to expose. That is, the larger the number of lenticular lenses is, the shorter the exposure time becomes. In the embodiment used in the present invention, more efficient use of light can be induced by using a Fresnel lens. This also belongs to the embodiment used in the present invention.

The concept of a toric source generating apparatus using one of the lenticureas used in the present invention is very important. The luminous source generating apparatus used in the present invention always uses lenticure. The optical circulator generating apparatus used in the present invention comprises a light source and a lenticular system. The light source and the lenticular system are mounted in a single container.

In the present invention, the light source includes an LED light source, and various types of light sources are usable. It is preferable that the light source is uniformly irradiated with respect to the entire area of the lenticular system. In order to realize light having a uniform distribution, in the present invention, the light source may be configured to swing back and forth and / or laterally in a plane parallel to the lenticular system. In order to adjust the intensity of the light, the light source may be moved up and down to adjust the distance to the lenticular system. The distance can be controlled by using a scooter or by various other methods. It is needless to say that the lenticular system may be provided with a vibrating means so that fine vibrations can be applied.

The lenticular system used in the present invention includes at least one convex lenticular or at least one concave lenticular. And at least one convex lenticule and at least one concave lenticule are simultaneously included. The lenticular system preferably includes at least one vertical lenticular lens. Of course, in the present invention, it is most preferable that all the lenticulars constituting the lenticular system are constructed of vertical lenticular lenses. In this case, the term vertical lenticular refers to a convex vertical lenticular or a concave vertical lenticular.

The lenticular system may be configured to include at least one convex lenticular with the opaque shield. The lenticular system may include at least one lenticular formed with a light transmitting slit. The lenticular system may include at least one lenticule that forms a light shielding part.

The optical circulator generating apparatus used in the present invention is composed of a light source and a lenticular system; The light source and the lenticular system are relatively stationary relative to each other. In another embodiment, the concentrator generating apparatus includes a light source and a lenticular system; The light source and the lenticular system may be mounted on the same light source container.

In the present invention, when the lenticular system is constituted by only one convex lenticular lens, a number of line shapes such as a convex lenticular lens is formed below the lenticular system. That is, when only one convex lenticular is used, the number of lines of the circle light source is formed corresponding to the number of the convex lenticular lenses.

Hereinafter, terms used to define the size of the luminous source generating device will be described. The magnitude of the source of light source is compared with the size of the Lenticular system. In the lenticular system, the length in the longitudinal direction of the lenticular lens is defined as the length of the lenticular system, which is also defined as the length of the optical source. The width of the lenticure system is defined as the width of the lenticure system. The width of the lenticure system is also defined as the width of the lenticular lens. When the exposure operation is proceeding, a relative movement motion is performed in a direction of width of the lenticular lens, that is, in the width direction of the linear light source generating device, relative to the linear light source generating device.

In order to perform a large-area exposure work with the exposure apparatus used in the present invention, the length of the round light source generator must be long and the distance of travel in the width direction of the round light source generator must be long. Since the transfer operation can be performed in the width direction of the linear light source generator, large area exposure can be performed even if the linear light source generator is small in width. The length of the luminous source generating device used in the present invention, that is, the size of the lenticular lens in the longitudinal direction, can be made long when the lenticular is manufactured. Therefore, in the present invention, a large-area exposure work can be easily performed.

Hereinafter, an embodiment of the size of the optical circulator for use in the present invention will be described. If the dimensions of the substrate to be exposed are; When the width is 1 meter and the length is 200 meters, the width of the concentrator is about 10 centimeters and the length of the concentrator is slightly larger than 1 meter. At this time, the feed distance is required to be at least 200 meters.

It is absolutely necessary that the luminous source generating apparatus used in the present invention is transported relative to the pattern film during the exposure operation. In the exposure machine used in the present invention, the lenticular system is formed at the bottom of the linear light source and is located on the top of the pattern film or the photomask. It is preferable that the pattern film or the photomask is spaced a predetermined distance from the source of light to enable the pattern film or the photomask and the source of light to move without friction.

The light source device for use in the present invention can form a large-area exposed portion through relative transfer with a pattern film or a photomask during an exposure operation. In the present invention, these mutual relative movements can be configured in various ways. As a concrete example, a case is described in which the linear light source generating device is moved and the pattern film is fixed together with the table of the exposure machine. The rail portion and the driving portion are formed in the linear light source generating device, the driving portion is composed of the driving motor having the driving gear, and the rail portion in which the driving gear meshes with the rail portion can be formed.

The luminous source generating device used in the present invention uses the condensing function of Lenticular. When the condensing function of the vertical light convex tricyta is maximized in the exposure machine according to the present invention, even if the thickness of the photosensitive layer is several tens of microns or more, and the pitch of the exposed circuit width is several microns, a clear exposure is possible. Since a clear exposure can be performed, a clear circuit configuration without defects is possible. In particular, in the case of using the vertical light lenticular in the linear light source device used in the present invention, the vertical light generated from the linear light source generator can maximally prevent scattering, diffraction and reflection of light.

The luminous source generating device using lenticure used in the present invention includes a light source and a lenticular system as basic components. There are two main types of the Lenticular system. The first is a form consisting of a single lenticule, and the second is a form of a lenticure laminate laminated with a plurality of lenticureas. The lenticular layered body is arranged by suitably combining convex lenticular or concave lenticular. As a representative example of the lenticular system, there is a laminate of at least one or more concave lenticules on the lower part of the convex lenticular. In the form of a lenticular system, at least one or more laminated layers may be laminated with only a concave lenticular layer, and various laminated layers exist.

In the present invention, when the lenticular system is formed by laminating the convex lenticular and the concave lenticular, it is possible to expose a circuit having a finer pitch in the exposure operation. This is because, when laminated lenticulars are used, a linear light source having a line width of a linear light source having a line width of several tens of nanometers can be formed. By irradiating the pattern film with a linear light source having a line width of several tens of nanometers, it becomes possible to perform an exposure operation with a circuit width of several microns.

In the following, a brief description will be given of the convex lenticular and the concave lenticular. It is made of transparent material called Lenticure. One surface is constituted by a plane, and the other surface is constituted by a convex lens or a concave lens. The concave lens or the convex lens is continuously arranged in a columnar shape. The definition of the concave lenticular used in the present invention is as follows. It is defined that the concave lens columnar shape is continuously arranged in one surface and the other surface is in a plane.

8 is a perspective view of a concave lenticular. Corresponding to the fact that the convex lens columns called the convex lens grooves are continuously connected, the concave lens curtain 34 is connected to the concave lens columns continuously.

The light is condensed through the convex lenticule, and the light is divided into the plural light through the concave lenticule. The lenticular system used in the present invention is a laminated body in which at least one convex lenticular is arranged, or at least one concave lenticule is arranged, or at least one convex lenticule is laminated with at least one concave lenticule Can be configured.

It is needless to say that the lenticular system used in the present invention can be constituted by only a single convex lenticular. In the lenticular system used in the present invention, the convex lenticular and the concave lenticular can be laminated in various order, and different effects can be obtained depending on the order and method of lamination. The laminating order of lenticure has a great influence on the performance of the exposure machine, so it is designed to suit each situation.

Figures 9a, 9b and 9c show an embodiment of a lenticular system.

FIG. 9A shows a concave lenticule laminated on the lower part of the convex lenticular.

The convex lenticular lens functions as a convex lens, and the concave lenticular lens functions as a concave lens. In the concave lenticular, the central portion of the concave portion is referred to as a bone in the present invention.

FIG. 9B shows a case where four concave lenticules 38, 39, 40 and 41 are laminated on the lower part of the convex tentacle.

If you arrange the inverted lenticule upside down, you can get another effect. It is possible to change the performance of the lenticular system by changing the shape of the concave lenticule laminated on the top or laminating the convex lenticule to the bottom.

9C shows an embodiment in which a concave lenticular is arranged in the lower part of the convex lenticular and a convex lenticule 44 is formed in the lower part of the concave lenticule.

Hereinafter, the light condensed by the convex lenticule is divided by the concave lenticule. It carries out a splitting function that divides the light of the source of light called orchoren tikyu. When the convex lenticule is placed on the upper part and the concave lenticule is laminated on the lower part; The light irradiated from the light source is transmitted to the concave Lenticular with the same number of lines of light as the number of the convex lenticular lenses. The above-mentioned line-shaped light is split by the concave Lenticular lens at the bottom.

The number of line-shaped lights equal in number to the number of the lenses of the convex lenticular is divided into a greater number of line-shaped lights by the concave lenticular positioned at the lower portion. The light source is divided into a larger number of light sources by Lenticulite. The concave lenticular is divided into a larger number of linear light sources, and at the same time, the line width of the linear light sources is further narrowed. The linear light source having a narrow line width passes through the pattern film while receiving less diffraction and interference.

This phenomenon means that the exposure layer of the substrate can be more finely exposed. The light condensed and divided by the stacked lenticulars; First, the linewidth of the ray source is tapered, and second, the number of ray sources is increased. In the present invention, since light is condensed and divided by the lenticular system, finer exposure can be performed. The luminous source produced through the lenticular system in the present invention can produce line-shaped light having a line width of several tens to several hundreds of nanometers.

Fig. 10 is a configuration diagram of a vertical light convex tentacle having a light shielding portion.

In the present invention, it is possible to make a ray source of several tens of nanometers to hundreds of nanometers through a laminated lenticular system. In this case, however, the spacing between adjacent ray sources passing through the Lenticular system is too narrow. When the concentrators are so densely packed, they cause undesirable phenomena. If the spacing of the adjacent line-shaped light is too small, it can be adhered to a lump.

This causes interference and diffraction of the light when the ray source passes through the pattern film. Precise exposure work becomes impossible. Accordingly, in order to prevent the neighboring ray source from sticking to each other, a shielding portion 47 for blocking the flow of light is formed between the convex lenticular lenses 46 as shown in FIG.

In the present invention, it is possible to make a light shielding part for preventing the light from entering between the lens and the neighboring lens in the lenticular, irrespective of whether the lens is a convex lenticular lens or a concave lenticular lens. In the present invention, a light shielding portion is defined as a region that prevents light from entering the lenticule. The shielding portion constitutes a flat plane portion between the lens and the lens, and printing is performed thereon with an opaque portion by a printing method; A pattern film having a flat plane portion between the lens and the lens and an opaque portion formed on the plane portion may be manufactured and attached. In the present invention, the lenticurea is defined as a lenticurea 45 having a light shielding portion.

11 is a configuration diagram of a concave lenticular with a shielding portion.

This corresponds to a convex lenticular with a shielding portion. The light shielding portion 50 is positioned between the concave portion 51 and the concave portion in the concave lenticular 49 having the light shielding portion 50. [

12 is another embodiment of a lenticular system having a light shielding portion.

A convex lenticular layer 53 having a light shielding portion and concave lenticules 54, 55 and 56 having a light shielding portion are stacked to constitute a lenticular system having a light shielding portion.

13 shows another lenticular system having a light shielding portion by laminating concave lenticules 58, 60 having a light shielding portion and convex lenticules 57, 59, 61 having light shielding portions. This configuration has the advantage of separating the light source and the light source from the Lenticular system. The lenticular system having the light shielding portion can be formed into various shapes by combining the convex lenticular with the light shielding portion and / or the concave lenticular with the light shielding portion.

In the present invention, a lenticurea system used in a luminous source generating apparatus is claimed. The lenticular system used in the present invention may be composed of only one lenticular or a lenticular laminate. In the case of a lenticular laminate, it may be composed of at least one or more lenticular cements or at least one lenticular cement, or at least one lenticular cortex and at least one concave lenticular. .

The lenticular system used in the present invention may include vibration means. In addition, the lenticular system used in the present invention may include a vertical light lenticular in a part thereof. Vertical light lenticulars include vertical light convex tilia and vertical light tilted lenticulars. A normal lenticular may comprise an opaque shield, include a light transmissive slit, or include a shield to form a vertical lenticular.

In the present invention, the lenticular system needs to maintain flatness. It can be supported by a transparent plate such as a glass plate in order to keep the lenticule in a plane. The Lenticular system is thin, so it can bend well. The most representative embodiment of a transparent plate for maintaining flatness is a glass plate. The transparent plate is positioned to maintain the plane at the top, bottom or top and bottom of the lenticular system.

When the lenticular system is formed as a laminate, the lenticulars are prevented from moving relative to each other. For this purpose, it is preferable to perform bonding all together. Bonding is made on the edge of the lenticule, not on the entire surface of the lenticule. The bonding unit can be configured in various ways. In the most representative embodiment, ultrasonic bonding or U-resin bonding can be used. When forming the bonding portion, it is preferable to process the bonding portion in a vacuum state so that a gap is not formed in the laminated portion of the lenticular and lenticular.

Hereinafter, an exposure apparatus provided with a luminous source generating apparatus used in the present invention using lenticure will be described in further detail.

The exposure machine equipped with the optical circulator for use in the present invention is characterized by using lenticure. Wherein the optical circulator generating apparatus comprises a light source and a lenticular system; The light source and the lenticular system are structured so as to move along the same direction at the same speed as the whole. In the present invention, it is defined that the light source and the lenticure system move in the same direction and at the same speed as the whole, as the accompanying structure.

The accompanying structure means that both the light source and the lenticure system move in the same direction, and both move at the same speed as the whole. The most representative method of the accompanying structure is to mount the light source and the lenticular system in one container. The container is made of a closed or open structure. In this case, the light source and the lenticular system are transported at the same speed, in the same direction as the whole. The transport direction is a direction perpendicular to the longitudinal direction of the lenticular lens.

The oscillating motion of the light source does not affect the speed of the light source at all, but it speeds up the oscillation speed of the light source compared to the moving speed of the light source, and does not have a great influence on the speed of the overall light source. That is, when the light source and the lenticular system are transported for the exposure operation, the light source is designed to be largely unaffected by the rocking motion, and the light source is moved at the same speed as the lenticure system as a whole.

In the luminous source generating apparatus used in the present invention, the lenticure system may be provided with vibrating means to apply fine vibration. Strictly speaking, if you have a vibrating light source or a vibrating lenticule system, you can not assume that each part moves at the same speed. However, for convenience of explanation, it is defined as moving at the same speed as the whole.

In order to explain this smoothly, the term " accompanying structure " is used in the present invention. The most typical embodiment is that the light source and the lenticular system are fixed in the same container and move at the same speed without moving relative to each other in the exposure apparatus provided with the optical circulator used in the present invention. In this case, the light source does not oscillate, and the lenticure system does not vibrate, and moves with one body.

The nature of the light source is important in the present invention. When a light source is made by attaching a number of luminous bodies such as LEDs to a flat plate, strictly speaking, the intensity of the light source can not be said to be uniform with respect to all areas. In the case of an LED light source, there is a gap between the adjacent LEDs. Due to such an interval, the light intensity can not be made uniform for all areas. However, even in this case, efforts are made as much as possible to obtain a uniform distribution of light over all areas. This causes the light source to oscillate in the lateral direction and / or in the longitudinal direction in the same plane as the plane formed by the lenticular system. In order to ensure the uniformity of the light source, the swing motion is repeatedly performed in a short time. The shaking of the light source can be any direction, but must be repetitive movement in a short time.

The intensity of light is very important in the exposure machine. In order to control the intensity of light, a method of adjusting the amount of electricity consumed is a typical method. As an additional method, in order to control the intensity of light, a method of controlling the distance between the light source and the lenticular system in the source of light of the present invention is proposed. Even if the same power is consumed, if the distance between the light source and the Lenticular system is close to that, it is possible to irradiate the stronger light.

In order to adjust the intensity of the light, the light source may be distant or close to the lenticular system so that the distance can be adjusted. When the light source and the lenticular system are mounted in the same container, the lenticular system is positioned at the lowermost end of the container. It is needless to say that strong light intensity can be obtained by moving the light source from the container to the lenticular system and positioning the light source close thereto. It is needless to say that various types of linear transfer devices can be applied to configure a device for adjusting the distance between the light source and the lenticular system.

When the light source and the lenticular system are mounted in the same container, it is also possible to fix the light source and the lenticular system to the container so that the light source and the lenticular system do not move relative to each other. In this case, the intensity of light can be controlled only by the power control used. In this case, there is a case where the oscillation action of the light source or the vibration action of the lenticular system is not performed. Even in such a case, the light source generator can function well. The light source and the lenticular system are configured so that there is no relative movement therebetween, also belonging to one embodiment of the exposure apparatus used in the present invention.

When the light source and the lenticular system are mounted on the same container, the container itself can be moved up and down with respect to the table of the exposure apparatus of the present invention. Such up-and-down movement of the container allows the preparation work for the exposure work to be performed on the table.

In the exposure device of the present invention, it is necessary to remove heat generated by the light source through the cooling means. The cooling air or the cooling water can be forcibly circulated inside the container and cooled. At this time, the mechanical device for making cooling air or cooling water can be located inside or outside of the luminous source generating device or can be arranged under the table of the exposure machine.

In the exposure machine used in the present invention, the pattern film or the photomask is located under the lenticular system. During the exposure operation, the lenticular system is spaced apart from the pattern film or the photomask at regular intervals. These gaps allow for efficient transport with reduced friction when the two move relative to one another. The spacing distance is preferably as short as possible. A substrate on which a photosensitive layer is formed is positioned below the pattern film or the photomask. The substrate is spaced apart from or close to the pattern film or the photomask. It is impossible to exclude side effects such as diffraction and interference of light.

Therefore, it is preferable to make close contact for precise exposure work. However, when the patterned film or the photomask and the photosensitive layer are in close contact with each other, the patterned film or the photomask may contact the photosensitive layer to damage the photosensitive layer. Therefore, there is a need to separate the patterned film or photomask and the photosensitive layer with a gap therebetween. However, it is desirable to reduce the influence of diffraction and interference of light by separating as short a distance as possible in case of separation.

It is necessary to adhere closely for accurate exposure work. When the exposure is performed in close contact with the photosensitive layer, light is directly transmitted to the photosensitive layer, so that side effects such as diffraction and interference of light are greatly reduced. The selection of whether to separate or adhere to each other can be appropriately selected depending on the severity and precision of the exposure work to be performed.

In the lenticular system used in the present invention, it is common to use the convex lenticule as the uppermost layer of the lenticular system, but in some cases, the concave lenticular is positioned. Depending on the required characteristics of each exposure machine, the type and lamination form of lenticure can be varied. In order to constitute the most efficient exposure system, it is preferable to include at least one vertical lenticular lens. In addition, the lenticular system of the present invention may include a lenticurea formed with an opaque shield, a lenticure formed with a transmissive slit, or a lenticure formed with a shield.

Fig. 14 is an explanatory diagram for explaining the exposure apparatus in terms of the upper and lower structures. Fig.

This further explains the structure of the exposure machine used in the present invention. The upper structure includes a pressing roller (74) wrapped by an elastic body (73) and a concentrator generating device (75). In addition, auxiliary rollers 62, 64, 65 may be provided. The pressing roller 74 and the linear light source generating device 75 are interlocked and transported.

The pressing roller is configured at the front portion of the luminous source generating device to perform the operation of bringing the pattern film 63 into close contact with the substrate 70. As a result, the patterning film and the substrate are in close contact with each other, and the exposure operation proceeds with the source of light generated in the source of light. The substructure includes a table (69) for positioning the substrate (70) and a contact means (68) for bringing the substrate into close contact with the table. In the exposure apparatus of this figure, the table and the upper structure are fixed, and the substrate and the pattern film are designed to be transferred during the exposure operation.

On the table 69 of the exposure machine, a substrate 70 on which a thin photosensitive layer 72 is uniformly coated is detachably placed. A pattern film 62 is placed on the substrate. During the exposure operation, the upper structure including the luminous source generating device must be transported relative to the pattern film. In the case where the pattern film moves integrally with the table of the lower structure, the transporting means must be formed in either the upper structure or the lower structure.

Further, cooling means for cooling the heat generated in the light source of the linear light source generating device is formed in either the upper structure or the lower structure. The cooling air or cooling water generated by the cooling means cools the heat generated in the light source of the luminous source generating device. The patterned film is pressed onto the substrate by the pressing roller.

The substrate can be brought into close contact with the table by the contact means. And a tightening means for forming fine holes in the table and closely contacting the substrate with the table with the vacuum pressure of the vacuum pump through the fine holes. So that the upper engine can be moved up and down with respect to the table so as to prepare for the exposure work. In the process for preparing the exposure work, it is necessary to move the upper orifice upward from the table.

In the exposure machine used in the present invention, the pattern film has various forms. In general, a pattern film on a sheet is used in many cases. In another embodiment, the end portion of the patterned film may be formed in an endless loop shape. Such an infinite orbit system is advantageous in a mass production system. In the case of the pattern film in the form of the infinite orbit, the circular light source device is positioned inside the pattern film.

When the pattern film of infinite orbit is not used, the upper structure performs an exposure operation in an initial position, then moves away from the lower structure, and then performs a repetitive exposure operation in such a manner that it returns to the initial position .

A reel structure in which a flexible substrate is wound can be configured at both ends or one end of the table of the exposure machine used in the present invention. In the case where the substrate is a nonconductive substrate, the surface of the substrate 70 is first sputtered with a conductive metal in order to form the conductive layer 71 on the substrate 70. In some cases, the sputtering layer is plated again to increase the thickness of the conductive layer 71.

The source of light of the exposure machine and the pattern film must have a relative transfer during the exposure. The movement of the pattern film can be made to move in connection with the substructure. In this case, if the upper structure is fixed, the lower structure can be relatively moved, and if the lower structure is fixed, the upper structure can be relatively moved. The pattern film 63 on which the pattern is formed may also be constituted by an endless track. The pattern film is configured to be brought into close contact with the substrate by a pressing roller (74). That is, the pattern film is pressed onto the substrate 70 coated with the photosensitive material 72, and the photosensitive layer applied to the pattern film and the substrate is contacted by the pressing roller so that there is no relative sliding therebetween. The substrate and the table can be brought into close contact with each other by the tight contact means.

In the case where the pattern film is in the form of an infinite orbit, the luminous source generating device 75 exists inside the infinite orbit 53. The upper structure is configured to be movable in the vertical direction with respect to the lower structure so that the exposure preparation operation such as replacement of the substrate can be performed. A flexible substrate on which a thin photosensitive layer 72 is uniformly applied is often used as the substrate 70. [ When used as a flexible substrate, it can be wound around a reel on both sides of the table 69 to perform a continuous exposure operation.

If the patterned film is composed of an infinite orbital track, it is possible to perform an infinite continuous operation. The substrate is formed by forming a conductive metal layer 71 on the polyimide film 70 and applying the photosensitive material 72 uniformly over the metal layer. If the pattern film is not infinite orbit, if a certain range of exposure operations is performed, it becomes necessary to move the superstructure back to the initial position. In order to explain this structure, the position at which the exposure operation is started is defined as an initial position. After performing a predetermined range of exposure, the upper structure is moved away from the lower structure to return to the initial position.

Fig. 15 is an explanatory diagram further illustrating Fig. 14; Fig.

The pattern film made of the infinite orbit consists of the transparent film 87 and the non-transparent portion 76. In the infinite orbit, a ray source generating device 86 is located.

The upper structure includes a pressing roller 84 supported by an elastic body 83, at least one or more auxiliary rollers 77, 78, 79, and a concentrator generating device 86. The substructure includes a table and a contact means for bringing the substrate into close contact with the table. The light source and the lenticular system constituting the linear light source generating device are firmly and integrally coupled by the support frame 85. The substrate 80 is uniformly coated with the photosensitive material 81.

FIG. 16 is an explanatory diagram of an embodiment of a tonic circle generating apparatus used in the present invention. FIG.

In this embodiment, the light source 88 and the lenticular system 89 constituting the linear light source generating device 91 are mounted on the container 90. It is needless to say that the light source can be configured to swing inside the container or move up and down.

Inside the container, a swinging structure for oscillating the light source or a vibrating structure for finely vibrating the lenticular system can be formed. Such a structure is well-known general equipment and can be variously configured, so that detailed description is omitted. It goes without saying that various auxiliary equipment such as a cooling device for cooling the heat generated from the light source can be installed inside the container.

In the container, a device capable of moving the light source device in the up and down direction may be configured. In the present invention, the lenticular system is generally located at the bottom of the container. In order to adjust the intensity of the light source, the distance between the light source and the lenticular system can be adjusted within the container.

By adjusting the distance between the light source and the lenticular system, the intensity of light irradiated onto the pattern film or photomask can be controlled.

17 shows another embodiment of the superstructure.

The upper structure includes a pressing roller (97) wrapped with an elastic body, at least one auxiliary roller (100,101,102,103), and a circular light source generating device (98). The pressing roller and the light source generating device move in conjunction with each other and move up and down with respect to the table so as to prepare for the exposure work. Further, the pressing roller and the light source generating device are moved in the left and right direction so that exposure can be performed on a large area. Alternatively, the pressing roller and the light source generating device may be stopped, and the pattern film and the substrate may be moved in the left and right directions to perform the exposure operation with respect to a large area.

In this embodiment, after performing the exposure operation at the initial position, the upper structure may be returned to the initial position apart from the lower structure to cause repetitive operations. A sputtered metal layer is formed on the substrate 93 in order to impart conductivity and a thin plating layer 92 made of a metal such as copper is formed on the sputtered metal layer and then a thin photosensitive layer is formed on the thin plating layer. .

In the exposure machine used in the present invention, a form in which a light source is mounted on a container is common. However, the light source that can be used in the present invention is not limited to a form mounted on a container. For example, light from a light source may be illuminated with respect to the entire exposure table used in the present invention. Or a uniform light source may be illuminated over the entire work space for performing the exposure work. In the present invention, regardless of the form of the light source, if the light of the light source is transmitted to the photosensitive layer only through the lenticular system, all of them belong to the present invention.

In the exposure machine used in the present invention, light is prevented from being transmitted to the photosensitive layer through a portion other than the lenticular system during the exposure operation. This is common to all the light sources in the exposure apparatus of the present invention. As described above, when the light source illuminates the entire area of the table or when the light source illuminates the entire working room, it is needless to say that it is not necessary to move the light source. However, during the exposure operation, the light is not transmitted to the photosensitive layer through a portion other than the lenticure system. It is a matter of course that the lenticular system should have a relative transfer with respect to the pattern film.

The light source configured in the above-described manner is also defined to be included in the concept of the light source constituting the optical circulator generating apparatus used in the present invention. Also in this case, the optical circulator generating apparatus includes a light source and a lenticular system; The light source device is defined as a concept that exposure is performed through relative transfer with a pattern film.

18 is an explanatory diagram of a light source generating device for controlling intensity of light in a container.

The light source and the lenticular system are mounted on the same container 104. The light source mounted inside the container is configured to be able to move up and down inside the container. An LED light source 106 is an example of a light source. LEDs generally comprise a plurality of individual LEDs coupled to a support to form a light source. Needless to say, the LED may be a planar light source. LEDs each composed of a planar light source are referred to as a light source support 105 in the present invention.

In the embodiment of the present invention, the light source support is configured to be movable up and down in the container. A lenticular system 107 is formed at the bottom of the container. The light source support is vertically moved in the container to adjust the intensity of the light irradiated to the lenticular system. The intensity of light can be controlled by controlling the power to be consumed and by controlling the distance between the light source and the lenticure system incidentally. In the exposure machine used in the present invention, the intensity of the light irradiated to the substrate and the relative conveying speed of the optical source generator play a very important role in determining the exposure quality. Therefore, a device that can finely control the intensity of the source of light irradiated to the substrate is very important. Also, it is very important that the apparatus that can finely control the relative conveying speed of the light source generating device is also very important.

19 is an explanatory view for explaining the positional relationship between the linear light source generating device, the pattern film, and the substrate.

In the luminous source generating device used in the present invention, the lenticular system is placed at the bottom of the container. The patterned film or photomask is located at the bottom of the lenticular system. The substrate is placed under the pattern film or the photomask. 19 shows a case where the pattern film or the photomask 108 is brought into close contact with the substrate 109. Fig. When the patterned film or photomask 108 is brought into close contact with the photosensitive layer of the substrate, the diffraction or interference of light is minimized. Thus, the exposure operation can be accurately performed. When the exposure is performed without peeling the protective film formed on the photosensitive layer, there is no damage to the photosensitive layer even if the operation is performed in the close contact state. However, if the protective film is peeled off and worked, the damage of the photosensitive layer must be considered. In this case, it is preferable to expose the pattern film or the photomask with a predetermined distance from the photosensitive layer.

In the lenticular system used in the present invention, the uppermost portion of the lenticular system is referred to as a convex lenticular, and at least one or more concave lenticules are combined in the lower portion of the convex lenticular. In some cases, however, the concave lenticule may be located at the top of the lenticular system and the convex lenticular may be located at the bottom.

The lenticular system used in the optical line source and the optical source used in the present invention can be used in various forms not only in an exposure apparatus but also in a video panel of a general video apparatus. In a conventional imaging device, light is transmitted to the image panel through a backlight and a polarizing filter, and a large amount of light is reduced when passing through the polarizing film. However, when the present light source generating device is used in a video apparatus, the functions of the backlight and the polarizing filter can be substituted. The optical circulator generating apparatus used in the present invention is advantageous in that it is utilized as it is without loss of light provided by the light source. Without loss of light, the life of the battery can be greatly increased.

In order to enable the present invention to be used in a general image panel, a micro vibrating means may be added to the lenticular system. The lenticular system is equipped with a vibration means for generating a fine vibration, thereby eliminating the blank space between the linear light source and the linear light source generated by the linear light source generator. The distance between the source of light and the source of light is only a few microns to tens of microns in size. The blank space due to the interval between the linear light source and the linear light source is solved by the fine vibration of the Lenticular system. That is, the viewer does not feel a blank part by using the illusion phenomenon.

In the present invention, a method for producing a micro-optical source is also used in the present invention. A method of manufacturing a micro-optical source used in the present invention is characterized by producing a fine optical source by passing light emitted from a light source through a lenticular system having a minute pitch. The pitch of the lenticurea used must be fine to make the micro-source. It is also preferred that a lenticular system including a vertical light lenticular is used.

The fine ray source represented by the above expression means that the line width of the ray source is fine, and the line width size ranges from tens of nanometers to tens of microns. As a specific experimental value used in the present invention, a vertical optical convex tilt of 33 microns in pitch was used in order to obtain a line width of 700 nm, and eight concave lenticules were stacked on the bottom of the vertical optical convex tilt. Respectively.

In addition, a lenticure system in which a vertical optical convex tile having a pitch of 30 microns and a concave lenticular was stacked on the bottom of the vertical optical convex tile were used to make a line source having a line width of 3 microns. The exposure of a large area can be rapidly performed by using the above-mentioned source of light having a line width of 3 microns. As a result of the exposure using the exposure apparatus using a line light source having a line width of 3 microns, the substrate having a width of the exposure unit of 10 microns, a width of the unexposed area of 10 microns, and a thickness of the photosensitive layer of 15 microns, .

It goes without saying that, in the lenticular system used in the present invention, even if the pitch of the lenticulars is the same, a more precise exposure can be performed by changing the focal length of the lenticular lens. It is needless to say that the pitch of the lenticular used in the present invention is extremely minute, but the design of the focal length of the lenticular can be variously designed even at the fine pitch.

In the present invention, the term "fine ray source" typically represents a range of the line width of the ray source within a range of from several tens of nanometers to tens of microns. However, it is needless to say that the exposure apparatus used in the present invention and the optical circulator generating apparatus used in the present invention can be applied in any area outside the fine range described above. When the term fine pitch is used in the lenticular system used in the present invention, the fine pitch range typically represents a range of several microns to several tens of microns. However, it is needless to say that the lenticular system used in the present invention can be applied in any area outside the fine range described above. How to fabricate the micro-lenticular used in the present invention is an important factor, but since it is not an object to be used in the present invention, a detailed description thereof will be omitted herein.

The present invention also relates to a method of manufacturing a microcircuit substrate using a line source of fine line width and a microcircuit substrate by the method. Conventionally, a substrate on which a fine circuit is formed is generally manufactured by an exposure operation and an etching operation. Or by exposure and plating operations. Conventionally, a light source for performing an exposure operation on a circuit substrate having a large pitch is mainly made of scattered light. For example, exposure to a PCB substrate with a large line width circuit can be done by working in a scattered light source. Conventionally, exposure work has been performed on a circuit board having a fine pitch in parallel light. In the present invention, it is possible to easily carry out a large-area exposure work by using an exposure machine equipped with a linear light source generator capable of producing a fine line width.

The method for manufacturing a microcircuit substrate used in the present invention is a method for producing a microcircuit substrate, which comprises irradiating a lenticular system for use in the present invention having a fine pitch with light from a light source to generate a linear light source having a fine line width; And the substrate coated with the photosensitive layer is exposed using the generated light source. Thereafter, the microcircuit substrate is manufactured through the development process and the etching process on the exposed substrate. Or a micro circuit substrate is manufactured on the exposed substrate through a developing process and a plating process.

It is general that the substrate is sputtered with copper on a flexible substrate, and copper is plated on the sputtering layer to form a copper plating layer. It is needless to say that the conductive metal may be substituted for the copper. The process of developing and etching the substrate on the exposed substrate is the same as that of the conventional process, so the description thereof is omitted.

A method of fabricating a microcircuit substrate by the plating process will be described in detail below. First, a plating process is carried out on the substrate on which the development work has been completed, without etching. A metal circuit portion is formed in the space portion where the non-visible portion is removed through the developing process through a plating process. After the circuit part is fully grown, the plating operation is stopped. Thereafter, the exposed portion is chemically removed. The conductive metal exposed at the portion where the exposed portion is removed is removed by soft etching. This completes the fabrication of the microcircuit substrate by the plating method. Hereinafter, a method of manufacturing a micro circuit substrate by a plating process will be described in more detail.

First, a thin conductive layer is formed on the non-conductive supporting substrate. As a representative example of the non-conductive support substrate, a polyimide film can be cited. In order to form a thin conductive layer, a metal such as copper is sputtered on the non-conductive support substrate to form an extremely thin conductive layer. When it is desired to increase the thickness of the conductive layer, it is needless to say that the conductive metal such as copper or the like can be thinly plated on the sputtering layer.

Needless to say, in the present invention, a non-flexible supporting substrate may also include a material which is not flexible. In addition, the non-conductive support substrate is preferably a flexible substrate that is wound in a roll form for mass production. The non-conductive support substrate used in the present invention is polyimide film. A photosensitive material is coated on the conductive layer formed on the non-conductive supporting substrate. The photosensitive material is uniformly applied in a thickness of several microns to several tens of microns. In this case, it is preferable to apply the coating after cleaning the thin conductive layer through a plasma process so that the photosensitive material can be coated well.

The pattern material is irradiated with the light of the linear light source having the fine line width generated through the linear light source device used in the present invention. An exposed portion and an unexposed portion are formed on the substrate through the pattern film. When the light of the source of light is irradiated to the photosensitive layer through the pattern film, the light receiving portion is made into the exposure portion, and the portion not receiving the light becomes the non-visible portion. When the unexposed portion is chemically removed, a space portion is formed. A thin conductive layer is exposed at the bottom of the space portion.

In the plating tank, electricity is applied to the exposed conductive layer to perform plating. A conductive fine circuit is formed in the space portion. As the plating progresses, a conductive fine circuit grows in the space portion. When the microcircuit grows at a constant height, plating is stopped. The grown microcircuit may be polished to clean the surface. It is a matter of course that the method of polishing may be performed by grinding the surface through the grinding wheel or may be polished by various other methods.

Then, in order to remove the thin conductive layer present under the exposed portion, the exposed portion is chemically removed. A space portion is formed where the exposed portion is removed. A thin conductive layer is exposed under the space portion. The exposed thin conductive layer is removed by soft etching. When the thin conductive layer is removed, an etching space portion is newly formed. The present invention can be widely used in the processing of fine parts. One type of fine component is a fine metal circuit. The present invention is applied to chip on film and FPCB having extremely fine metal circuits. It is general that the non-supporting substrate is made of a polyimide film. A microcircuit substrate made by the method for manufacturing a microcircuit substrate is also used in the present invention.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the inventive concept as defined by the appended claims. The present invention is not limited to the drawings.

1: Exposure machine 2: Optical source generator
3: source of light source generating means 4: light source
5: Bolectic Cure, Lenticurea combination
6: Film 7: Photosensitive material
8: Plate 9: Substrate structure
11: Lenticular Cylar Lens 34: Concave Lenticular
73: elastic body 74: compression roller
62, 64, 65: auxiliary roller 63: pattern film
68: contact means 69: table
70: substrate 71: conductive layer
72: photosensitive layer 75: luminous source generating device

Claims (17)

A method of fabricating a transparent substrate on which a very fine conductive circuit is formed using a lenticular system,
A photosensitive layer forming step of forming a thin photosensitive layer on a transparent substrate;
The light of the light source is passed through a lenticular system having fine pitch to generate a linear light source having a fine line width and the generated linear light source is irradiated to a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer An exposure process by a lenticular system;
And a space portion forming step of chemically removing the unexposed portion formed by the exposure process by the lenticular system to form a space portion. The method according to claim 1,
A sputtering step of forming a sputtering metal layer on the upper part of the exposure part and the upper part of the space part by sputtering a conductive metal;
Further comprising the step of forming a micro-fine conductive circuit by removing the sputtering metal layer formed on the upper portion of the exposure portion and the exposed portion so that a very fine conductive circuit remains only in the space portion. Way. The method according to claim 1,
A conductive material filling step of filling the space part with a silver paste or a liquid conductive filler to cure the space;
Further comprising a step of forming a very fine conductive circuit by removing the exposed portion so that a very fine conductive circuit remains only in the space portion. The display device according to any one of claims 1 to 3, wherein the transparent substrate comprises a bezel portion and a circuit portion formed inside the bezel portion, wherein the bezel portion and the circuit portion formed inside the bezel portion are simultaneously Wherein the transparent conductive film is formed integrally with the transparent conductive film. 4. A device according to any one of claims 1 to 3, wherein the transparent substrate on which the very fine conductive circuitry is constituted is constituted by a very fine conductive circuit in the same shape and is entirely filled without any void space, Wherein the plurality of circuit groups are electrically insulated from each other. ≪ RTI ID = 0.0 > 21. < / RTI > 3. The method of manufacturing a substrate according to claim 2, wherein plating is further performed only on the bezel portion. The method of manufacturing a substrate according to any one of claims 1 to 3, wherein a plating operation is further performed on a part or the whole of the extremely fine conductive circuit. The method of manufacturing a substrate according to any one of claims 1 to 3, wherein the substrate is transparent glass, optical PET film, transparent polyimide film, or ultraviolet transparent film. The method of manufacturing a substrate according to any one of claims 1 to 3, wherein the substrate is a laminate of materials having different materials on a main material of a transparent glass or a transparent film. 4. The method of any one of claims 1 to 3, wherein the lenticular system comprises a vertical light lenticular. The method of manufacturing a substrate according to any one of claims 1 to 3, wherein the lenticular system has a laminated structure. The method of any one of claims 1 to 3, wherein the lenticular system comprises a convex lenticular. The method of any one of claims 1 to 3, wherein the lenticular system comprises a concave lenticular. The method of any one of claims 1 to 3, wherein the lenticular system is comprised of a concave lenticular and a convex lenticular. A method of manufacturing a transparent substrate having a very fine conductive circuit portion,
A photosensitive layer forming step of forming a thin photosensitive layer on a transparent substrate; An exposure step of irradiating light of a light source onto a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer; A space part forming step of chemically removing the non-exposed part formed by the exposure step to make a space part; A sputtering step of forming a sputtering metal layer on the upper part of the exposure part and the upper part of the space part by sputtering a conductive metal; And forming a very fine conductive circuit by removing the sputtering metal layer formed on the exposed portion and the exposed portion to leave a very fine conductive circuit only in the space portion. Way. A method of manufacturing a transparent substrate having a very fine conductive circuit portion,
A photosensitive layer forming step of forming a thin photosensitive layer on a transparent substrate; An exposure step of irradiating light of a light source onto a photomask or a pattern film to form an exposed portion and an unexposed portion in the photosensitive layer; A space part forming step of chemically removing the non-exposed part formed by the exposure step to make a space part; A conductive material filling step of filling the space part with a silver paste or a liquid conductive filler to cure the space; And a step of forming a very fine conductive circuit by removing the exposed portion to leave a very fine conductive circuit in only the space portion. A transparent substrate comprising a very fine conductive circuit formed by the manufacturing method according to any one of claims 1 to 16.

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