KR20140058751A - Line type light exposure apparatus and lenticular assembly - Google Patents

Line type light exposure apparatus and lenticular assembly Download PDF

Info

Publication number
KR20140058751A
KR20140058751A KR1020120124419A KR20120124419A KR20140058751A KR 20140058751 A KR20140058751 A KR 20140058751A KR 1020120124419 A KR1020120124419 A KR 1020120124419A KR 20120124419 A KR20120124419 A KR 20120124419A KR 20140058751 A KR20140058751 A KR 20140058751A
Authority
KR
South Korea
Prior art keywords
lenticular
light source
lenticular system
light
convex
Prior art date
Application number
KR1020120124419A
Other languages
Korean (ko)
Inventor
성낙훈
Original Assignee
성낙훈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 성낙훈 filed Critical 성낙훈
Priority to KR1020120124419A priority Critical patent/KR20140058751A/en
Priority to US14/443,396 priority patent/US10197920B2/en
Priority to EP12850328.1A priority patent/EP2851751B1/en
Priority to PCT/KR2012/009685 priority patent/WO2013073873A1/en
Priority to TW101142835A priority patent/TWI632400B/en
Publication of KR20140058751A publication Critical patent/KR20140058751A/en

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The present invention relates to a linear light source generating apparatus, a lenticular system used in the linear light source generating apparatus, and an exposure apparatus including the linear light source generating apparatus. And also relates to a method for producing a fine ray source. By using the characteristic of the luminous source of Lenticular, the luminous source generating apparatus of the present invention is made. In order to produce a more efficient and nano-sized source of light, the lenticular system used in the source of light of the present invention is used.
In addition, the present invention combines such an optical source generator with an exposure machine which can best be used to constitute an exposure machine equipped with a optical source generator. In the present invention, the optical circulator generating apparatus includes a light source and a lenticular system. It is preferable that the light source is irradiated to the lenticular system in a uniform state, and it is preferable to irradiate the entire area of the lenticular system with uniform intensity. Ideally, the light from the light source should go down vertically as it passes through the source of light. For this purpose, a vertical lenticular is used.

Description

A luminous source generating device, an exposure device provided with a luminous source generating device, and a lenticure system used in a luminous source generating device. {LINE TYPE LIGHT EXPOSURE APPARATUS AND LENTICULAR ASSEMBLY}

The present invention relates to a linear light source generating device, a lenticular system used in the linear light source generating device, and an exposure device including the linear light source generating device. The present invention also contemplates a method for producing a microenergy source. The present invention is characterized by using the characteristic of the light source provided by Lenticure.

In order to make the width of the light to be nano-sized in the source of light, the lenticular system of the present invention is used. An area where the most effective application of such an optical source can be considered as an exposure machine. The exposure apparatus provided with the linear light source generating apparatus of the present invention is advantageously used for forming a fine circuit or a fine pattern and has an advantage that a large area can be easily exposed. The optical circulator generating apparatus used in the present invention effectively uses the light converging function and the vertical optical function of the convex lenticular. A lenticular system is used in the present invention.

The lenticular system may be in the form of one convex lenticular and in the form of a lenticular laminate in which a plurality of lenticulars are laminated. The lenticular layered body is formed by appropriately combining convex lenticular or concave lenticular. The Lenticular system can simultaneously use the condensing function of the convex Lenticular and the light splitting function of the concave Lenticular. The concave lenticule's light splitting function makes the linewidth of the source more finer, allowing more delicate exposure.

The use of the exposure device equipped with the linear light source device of the present invention allows exposure of the photosensitive layer accurately and precisely according to the pattern pattern of the pattern film. Even if the pitch is extremely minute, it is possible to expose, and there is a feature that the thickness of the photosensitive layer is clearly thickened or exposed. Further, the exposure apparatus provided with the optical circulator of the present invention is characterized in that accurate exposure is possible even in a somewhat vibrating environment.

Generally, an exposure apparatus refers to a device which places a pattern film on which a desired pattern is formed on a substrate coated with a material (Photo-resist: PR, photosensitive material), and irradiates ultraviolet rays to transfer a desired pattern to the photosensitive material . In the present invention, substrates of various types in which a photosensitive material is coated are defined as substrates.

In order to produce a circuit with a fine pitch, a parallel light exposure system was used. Parallel photo exposures are accompanied by a lot of fabrication costs and have a limited area to be applied. According to the present invention, an expensive exposure apparatus can be used instead of an expensive parallel light exposure apparatus.

The present invention relates to a linear light source generating device, a lenticular system used in the linear light source generating device, and an exposure device including the linear light source generating device. The present invention utilizes the property of the linear light source of Lenticular. The vertical light exposure apparatus provided with the linear light source generator of the present invention can be manufactured at low cost, thereby providing an economical effect. The present invention can quickly fabricate a very fine pitch circuit which can not be manufactured even if an expensive flare exposure apparatus is used. An object of the present invention is to manufacture such an exposure apparatus.

The present invention can expose a thick photosensitive layer to a very fine pitch by using both the condensing function of the convex tentacle and the vertical optical function. The most significant feature when using the present invention is that it is possible to sensitize an extremely fine circuit, expose a large-sized photosensitive layer quickly, and continuously perform an exposure work by a scanning operation of a source of light There are features. From the viewpoint of the working environment, it is essential that the processing by laser is performed in a space free from vibration. However, it is a fact that the exposure apparatus provided with the linear light source generating apparatus of the present invention does not produce a definite defect even if there is slight vibration.

A balanced light exposure apparatus has been used for exposure of very fine circuitry, but the equipment structure is complicated and expensive production cost is required. However, an exposure device equipped with an optical source generates an economical vertical light using only the optical properties of a Lenticular lens, without using a complicated device or expensive equipment. The light of the linear light source of the present invention has properties of a vertical light or a quasi parallel light in the form of a line. This light has the advantage of precisely exposing a very fine pattern because the diffusion of light and the scattering action are minimized even when the light passes through the pattern film. The following conditions are required in order to realize extremely small circuits with a large area.

First, scattering and scattering of light should be prevented;

Second, it should be a light source capable of fast scanning;

Third, the light energy is condensed by the lens;

Fourth, when machining a very fine circuit, it is necessary to provide a linear light source with a much finer line width than a very fine circuit.

Fifth, the light source and the light source should be spaced so that they do not stick together. The optical circulator generating device of the present invention satisfies all the above conditions.

The light provided by the exposure device equipped with the light source device of the present invention is irradiated to the substrate on which the photosensitive layer is formed through the pattern film or through the photomask. The irradiated light exposes the photosensitive layer in the shape of a pattern formed on the pattern film. The light source of the present invention includes a light source and a lenticular system as basic components.

Embodiments of the optical circulator generating apparatus can be configured in various ways.

In the present invention, it is also possible to fix the light source and the lenticular system so that there is no relative movement between them. The vibrating means may be configured in the Lenticular system to vibrate the Lenticular system very finely during the exposure operation. The present invention utilizes the feature of the source of light of Lenticular. In order to manufacture an effective luminous source generating apparatus, the pitch of the lenticular is extremely small in the present invention. In addition, the present invention makes full use of the convex lenticular vertical light function in which light is vertically transmitted. The luminous source generating apparatus using the lenticular according to the present invention must be placed on top of the pattern film or the photomask.

In the case of continuously exposing the flexible substrate in the exposure machine, the optical source generator is installed at a distance from the pattern film or the photomask so as to avoid friction. A substrate on which a light-sensitive material is thinly coated is placed below the pattern film or the photomask. Since the optical source generator and the pattern film or the photomask transfer relative to each other, even a large-area substrate can be easily and economically exposed by a scanning operation. The pattern film or photomask should be such that there is no relative motion with the substrate during the exposure process. The function of narrowing the line width of the light having the line shape condensed by the convex lenticular is called a concave lenticular.

At the same time, the number of lines of condensed light in the form of a concave lenticular is increased to enable more precise exposure. When the lenticular system according to the present invention is operated, the width of the condensed light can be reduced to a line-shaped light having a line width of several tens to several hundreds of nanometers. This fact means that exposure is possible with a numerical value of a few microns. The exposure apparatus of the present invention uses the condensing function of each of the convex lenses constituting the convex lenticular. The exposure device according to the present invention is formed with vertical light, so that it is possible to perform a clear exposure even if the thickness of the photosensitive layer is thicker than several tens of microns. The nature of the vertical light minimizes light interference and scattering, allowing very fine circuitry exposure.

When the exposure operation is performed through the exposure apparatus of the present invention, the safety of the operation is achieved, and a clear and clean circuit configuration free from defects is possible. In addition, even a large-area substrate can be economically exposed entirely at a time in a short time through the transfer motion of the linear light source generator of the present invention. As a relative transfer method of the concentrator generating device for a pattern film or a photomask, there are;

First, in a state where the pattern film is stopped,

Second, when the pattern light source device is stopped and the pattern film is transported,

Third, there is a case where the light source generating device and the pattern film move at the same time.

The optical circulator according to the present invention uses the light converging function for each lens of the convex lenticular and the light dividing function for each lens of the concave lenticular as a core. Lenticular is characterized by the function of condensing the light and the function of dividing the light into a line shape. Also, in the present invention, the function of the vertical light, which is a characteristic of the central portion of the lens, is used intensively. The exposure apparatus provided with the light source generating device can perform the exposure work even if the thickness of the photosensitive material is several tens of microns or more and the pitch is only a few microns. Even with a very fine pitch, the use of the microscopic optical source provided by the lenticular system of the present invention minimizes scattering, diffusion, and dispersion of light, thereby enabling a clear and bright exposure.

An exposing device having parallel light requires an expensive device, but in the present invention, it is possible to make an economical device by taking full advantage of the physical functions of the lenticular lens. The parallel light exposure device is difficult to expose a large area, but the exposure device of the present invention can realize exposure of a large area easily and quickly through the transfer of the light source device. The lenticular system used in the linear light source generator and the linear light source generator of the present invention can be used not only in an exposure apparatus but also in a video apparatus. In the image panel of the conventional image device, light is transmitted through the backlight part and the polarizing filter. At this time, the light is greatly reduced through the polarizing filter.

When the present light source generating device is used in a video apparatus, the polarizing filter can be removed, and there is a great advantage that the loss of light provided by the backlight can be substantially eliminated. If there is no such loss of light, the battery life can be greatly increased. The distance between the source of light and the source of light is only a few microns in size. When the lenticular system is vibrated by the vibration means, the blank portion between the linear light source and the linear light source can be momentarily filled by this vibration. When the present light source generating apparatus is applied to a video panel, a vibration means is added to the lenticular system to utilize the optical illusion caused by the afterimage. Due to the microscopic super-fast oscillation, it does not allow the blank part to be recognized by sight.

1 is a view for explaining an overall concept of an exposure apparatus according to the present invention, which is provided with an optical circulator.
2 is a perspective view for explaining a general convex lenticular.
3 is a view showing a state where light of a light source is condensed in a convex tentacle.
4 is a view showing vertical light generated at the center of each lens of the convex cantilever.
5 is an explanatory view of a convex lenticule made only of the vertical light region 21 of the convex lenticular lens.
6 is an explanatory view for explaining a vertical light lenticular with a lens shield formed on a convex lenticular.
Fig. 7 is an explanatory view for explaining a vertical light lenticular with a light transmission slitter provided in a convex lenticular.
8 is a perspective view of a general concave lenticular.
Figures 9a, 9b and 9c show an embodiment of a lenticular system.
10 is a configuration diagram of a convex lenticular with a shielding portion.
11 is a configuration diagram of a concave lenticular with a shielding portion.
12 and 13 are still another embodiment of a lenticular system having a light shielding portion.
Fig. 14 is an explanatory diagram illustrating the exposure apparatus of the present invention with the upper and lower structures. Fig.
15 shows another embodiment of the upper structure and the lower structure.
Fig. 16 is an explanatory diagram of a light source generating device. Fig.
17 is another embodiment of the superstructure of the exposure machine.
Figs. 18 and 19 are explanatory views for explaining the positional relationship between the linear light source generating device, the pattern film, and the substrate.

The present invention relates to a luminous source generating apparatus using lenticure, a lenticular system used in the luminous source generating apparatus, and an exposure apparatus including the luminous source generating apparatus. Also, in the present invention, a method of manufacturing a linear light source having a fine line width by passing a light emitted from a light source through a lenticular system having a minute pitch will be described, which is also an object of the present invention. Various embodiments of the invention will now be described.

According to the present invention, an apparatus for generating a source of light is manufactured by using characteristics of a source of light using a lenticurea, and an exposure apparatus including a source of light is produced. A lenticular system is constituted in the present invention in order to make an extinction source generated by an optical source using a lenticurea and a nano-sized microscopic optical source. The area of one part which can most effectively utilize the luminous source generating device using the lenticular according to the present invention is the field of the exposure machine. In the present invention, in the luminous source generating apparatus using lenticure, the light source and the lenticule are combined in various forms. The most basic form of source generator is composed of only light source and convex lenticule.

Another form is comprised of a light source and a lenticular system. In most cases, this includes cases involving light sources and lenticular systems. In the present invention, it is preferable that the light source has a uniform light intensity and a uniform distribution. That is, the light of the light source is irradiated to the lenticular system of the present invention in a uniform state, and it is preferable to irradiate the whole area of the lenticular system with uniform intensity. In a preferred embodiment of the present invention, the light source and the lenticular system are fixed to the same frame so that they move together at the same speed in the same direction without relative movement.

In another case, the light source and the lenticular system are mounted in one container, the light source is oscillated in the container, or the lenticular system is vibrated. However, the light source and the lenticular system are mounted in one container So that they move in the same direction at the same overall speed. In the optical circulator generating apparatus of the present invention, when passing through the optical circulator generating apparatus, it is an ideal form that the light of the light source goes down in the vertical direction. For this purpose, the function of the central region of the lenticular lens is mainly used in the present invention. A lenticular system is used in the present invention.

The lenticular system may be in the form of one convex lenticular and in the form of a lenticular laminate in which a plurality of lenticulars are laminated. The lenticular layered body is formed by appropriately combining convex lenticular or concave lenticular. Hereinafter, the contents of the present invention will be described in detail. In the exposure apparatus of the present invention, the light generated by the optical source is irradiated to a pattern film or a photomask on which a pattern is formed, and the light passing through the pattern film or the photomask exposes the photosensitive layer of the substrate. The luminous source generating apparatus used in the present invention includes a light source and a lenticular system. In describing the structure of the exposure apparatus of the present invention, embodiments of the present invention may be described by dividing the concept into an upper structure and a lower structure. In one embodiment of the present invention, the superstructure includes at least one pressing roller supported by an elastic body, at least one auxiliary roller, and a concentrator generating device. The substructure includes a table for positioning the substrate and a contact means for bringing the substrate and the table in close contact with each other. A substrate on which a pattern film or a photomask and a photosensitive layer are formed is placed between the upper structure and the lower structure.

It is needless to say that the transfer device for allowing relative movement between the upper structure and the lower structure and the cooling means for removing heat from the light source can be separately installed. Hereinafter, various embodiments of the exposure apparatus of the present invention will be described in detail, but the present invention is not limited to the following embodiments unless it departs from the gist thereof.

1 is a view for explaining the overall concept of an exposure apparatus provided with a linear light source generating apparatus. The exposure apparatus 1 is constituted by a basic structure composed of a substrate structure 9, a luminous source generating apparatus 2, and other apparatus sections including opening / closing ports. The above-mentioned light source device 2 comprises a light source 4 and a lenticular system 5. It is preferable that the light source 4 is irradiated uniformly with respect to the entire area of the lenticular system having a constant area. As a representative example of a source of light, a light source and a lenticure system are fixed to the same frame and move together in the same direction and at the same speed without relative movement.

In another embodiment, the light source and the lenticular system are mounted in a single container; In the container, the light source performs a rocking motion, and the lenticular system performs a vibration motion; Since the light source and the lenticular system are mounted in one container, they are moved in the same direction at the same speed as the whole. The light source and the lenticure system are mounted in a single light source container is a universal configuration of the light source generating device. It goes without saying that the light source and the convex lenticular are not mounted on a single light source container but can be configured in various types of structures. It is one of the key concepts of the present invention that the light source and the lenticure system move together in the same direction and at the same speed. This is different from the configuration in which the lenticure system is stationary and only the light source located above the lenticure system is moved. A technique for moving a light source relative to a stationary Lenticular system is well known in stereoscopic cameras that record stereoscopic images using Lenticular. It is used in close connection with a technique of recording or reproducing a stereoscopic image called a convex lenticular.

As one field of a technique for recording stereoscopic images, there is a stereoscopic image camera which records a plurality of images through respective convex lenticular lenses constituting the convex lenticule.

This is a method of moving a convex lenticular relative to a subject and recording a plurality of images having different wide angles in one film. A stereoscopic image recording camera is a technique for making a relative movement of a light source with respect to a convex lenticular. When the subject is caused to move relative to the convex tentacle with the convex lenticule kept in close contact with the film, a plurality of images corresponding to the movement of the subject are successively recorded on the film. This principle is a principle in which a plurality of images are recorded in a pitch of one convex lenticular lens so that stereoscopic images can be seen.

In the exposure machine of the present invention, the above-mentioned optical circulator generating device is configured to be relatively movable with respect to the pattern film or the photomask. That is, the film is moved when the linear light source generating device is stopped, and when the pattern film is stopped, the linear light source generating device is moved. Of course, it is also possible that both the linear light source generating device and the pattern film move at the same time. The lenticular system and the pattern film or the photomask of the source of light of the source of light are spaced from each other so that the relative movement is smooth and the friction does not occur. The degree of spacing is preferably maintained at a small spacing in order to achieve as precise exposure work as possible. The above movement is made possible by various types of conveying means 3. It is needless to say that the embodiment of the conveying means of the optical circulator generating apparatus in the exposure apparatus of the present invention can be configured in various forms.

As shown in Fig. 1, it is also possible to feed by driving the motor using the slider rod. In the exposure machine according to the present invention, it is of course possible to move the substrate structure 9 in the lower part of the optical source generating device while the optical source is stopped. In the present invention, the term " substrate structure " generally refers to a structure located underneath an optical source and includes a table, a table transfer device, and a vacuum pressure generator. The substrate on which the photosensitive material is coated in the substrate structure is separately described, and the structures formed in various forms that support the function of supporting the substrate or moving the table are collectively expressed. A substrate 8 on which a photosensitive layer 7 is uniformly applied is placed under the pattern film 6 or the photomask. In the present invention, the pattern film or the photomask is configured not to move relative to the substrate on which the photosensitive layer is formed. Usually, the photosensitive layer applied to the substrate is coated with a transparent protective layer.

In the present invention, the exposure process proceeds with the transparent protective vinyl or the transparent protective vinyl is removed. When the exposure is carried out in the presence of protective vinyl, there is an advantage that the photosensitive layer is protected, and exposure is performed in a state in which the protective vinyl is removed. In order to prevent the pattern film or the photomask from damaging the photosensitive layer, first, the pattern film or the photomask is exposed with a certain distance from the photosensitive layer, or the photosensitive layer is exposed with a protective film.

The most precise exposure is to expose a pattern film or a photomask to the photosensitive layer in a state where the protective vinyl of the photosensitive layer is peeled off. The next precise exposure is to expose the patterned film or the photomask to the photosensitive layer in a state in which the protective layer of the photosensitive layer is covered. The next precise exposure is to expose the pattern film or the photomask to the exposure with the protective layer of the photosensitive layer removed. The next precise exposure is to expose the pattern film or the photomask to the exposure with the protective layer of the photosensitive layer covered. An exposure operation in a state in which protective vinyl is applied is preferable for the purpose of not damaging the photosensitive layer, but it may be adversely affected by light diffraction and interference. The exposure apparatus of the present invention is configured so as to be able to take measures in response to the exposure conditions in the field. When the pattern film 6 is irradiated with light by the linear light source generator 2, the transparent portion of the pattern film transmits light and the opaque portion shields the light. The focused light radiated through the linear light source generating device 2 precisely cures the photosensitive layer of the substrate through the transparent part of the pattern film 6. [

After the exposure operation, if the photoresist material is removed by a chemical method, that is, the uncured portion, that is, the uncured portion, a pattern shape is formed in the flat plate 8 by the exposure portion. The pattern film or photomask prevents relative slippage between the substrate and the substrate on which the photosensitive layer is formed. The substrate on which the photosensitive layer is formed must adhere to the table of the exposure machine so as not to move during the exposure operation. On the substrate structure, a substrate to which a photosensitive material is applied is detachably positioned. An upper portion of the substrate structure is formed with a minute hole, and the substrate coated with the photosensitive material is tightly fixed to the substrate with vacuum pressure through the hole.

A pattern film or a photomask is placed on the substrate. During the exposure operation, it is preferable that the substrate structure, the substrate coated with the photosensitive material, and the pattern film are in an adhered state so that there is no relative movement therebetween. For convenience of explanation, a plate coated with a photosensitive material is referred to as a " substrate ", and a state in which the substrate is unfolded flat is also referred to as a flat plate. On both sides or one side of the table of the exposure machine of the present invention, a roller capable of winding a flexible substrate coated with a photosensitive material can be constituted. In this way, a continuous exposure operation is possible through the photosensitive material sheet wound in a reel. When the photosensitive material is to be exposed through the exposure apparatus of the present invention, the substrate 8 on which the photosensitive material 7 is uniformly applied is placed on the substrate structure 9, and the pattern film 6 is placed on the substrate And the optical brightener is placed on top of the pattern film.

Thereafter, the photosensitive material is exposed using a tonic circle generating device. The substrate to which the photosensitive material is uniformly applied may have various shapes. The photosensitive material may exist in the form of a thinly coated sheet. Of course, the sheet-like substrate may be wound in a roll form for continuous operation. Or a form in which the photosensitive material is thinly coated on a rigid substrate which is not deformed. When the light is irradiated through the pattern film through the linear light source device of the present invention, the photosensitive material is exposed in the shape of the pattern formed on the pattern film. The optical circulator generating device 2 used in the present invention is composed of a light source 4 emitting light and a lenticular system 5 located below the light source. It is needless to say that other components may be added to the optical circulator for use in the present invention in order to add additional functions. Although the present invention has been described with reference to specific embodiments thereof, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, is intended to cover various modifications and equivalent arrangements included within the spirit and scope of the invention. A lenticular system is used in the present invention. The lenticular system may be in the form of one convex lenticular and in the form of a lenticular laminate in which a plurality of lenticulars are laminated. The lenticular layered body is formed by appropriately combining convex lenticular or concave lenticular.

 Since the present invention is roughly divided into two types, the present invention will be described in the form of a luminous source generating apparatus using a lenticure system in two forms. First, the lenticure system is composed of only one lenticurea, which is a common lenticule called lenticule. Second, the lenticure system is used as a lenticure with a plurality of stacked layers. Mostly, a convex lenticular is formed at the uppermost portion, and a concave lenticular is arranged at the bottom of the convex lenticular. The number of concave lenticules can be one or more than two. To increase the number of splits of light on the condensed line, increase the number of concave lenticules. In the description of the present invention, the first embodiment of the present invention will be described, and the second embodiment will be described as a second embodiment of the present invention. In the case of making an exposure apparatus using the optical bright-arc generating apparatus used in the present invention, the optical bright-circle generating apparatus is placed on the top of the pattern film or the photomask. In order to perform a continuous exposure operation, the above-mentioned optical circulator generating device is positioned at a predetermined distance from the pattern film or the photomask to enable relative movement without friction. Of course, it is also within the scope of the present invention to perform exposure in a state in which the concentrator generating apparatus is not conveyed for the purpose of making a device for performing precise work although the continuous operation is not performed and the work speed is decreased. In the case where the patterning film is stopped in the state where the patterning film is stopped by using the compacting light source, the distance between the compacting light source and the patterning film is minimized. .

2 is a perspective view showing a general convex tentacle. As shown in Fig. 2, the convex portion of the convex portion of the convex portion 10 has a shape in which a columnar shape having a convex section is continuously connected. That is, a plurality of convex lenticular lenses 11 called convex lenticular lenses are continuously connected to the side surface. The convex lenticular lens has a long columnar shape. It can be explained as a transparent body in which a plane is formed on one surface of a convex lenticular lens and a convex lens is formed in a cylindrical shape in the longitudinal direction on the other surface. There is a peculiar function of condensing light in a line shape through the function of a convex lens called a convex lenticular lens. Such a shape is often used for a stereoscopic image screen called a convex lens.

3 is a view showing a state where light is condensed when light of a light source passes through a general convex lenticular. Each of the convex lenticular lenses 13 and 14 has a property of condensing the light of the light source 12. After the photosensitive layer is closely attached to the lower part of the convex lens, when the light of the light source is irradiated, the condensed light acts on the photosensitive layer 15, and the condensed light forms the exposure part 16. That is, when light is irradiated through the convex lenticular, the exposed portion and the non-exposed portion are arranged in the photosensitive layer under the convex lenticular. As shown, when the light of the light source 12 is illuminated through the convex lens, the light is condensed by the lenticular lenses 13 and 14 toward the focal point of each convex lenticular lens. By adjusting the focal length of the convex lenticular lens, the light condensed on the photosensitive material 15 can produce various effects. That is, various functions can be pursued by adjusting the distance (a) between the curvature of the convex lens and the photosensitive material. In the photosensitive layer, an exposing portion 16 is formed by the condensed light.

4 is a view showing a state of vertical light generated at the center of each lens of a general convex lenticular. Through the curved surfaces of the respective lenses of the convex lenticular lens, the light received from the upper portion is condensed in a form corresponding to the curvature and is transmitted to the lower portion. At this time, the light irradiated near the central part of each lens constituting the convex lenticular is almost vertically downward without refraction in the downward direction with the refraction effect being extremely fine. In the curved surface portion of each lens constituting the convex lenticular, the light is refracted at a certain angle to the lower portion, and light condensation occurs due to such refracting action. The angle of refraction becomes larger as the surface is deviated from the central portion of each lens of the convex lenticular lens. In the present invention, a lens composed of only the central region of each lens of the convex tentacle is defined as a vertical optical lens. The light irradiated on the vertical light lenticule has a characteristic that it goes down almost vertically. Of course, even in this case, there is a condensing action by the refraction of light, but the refraction action is minimized. In the present invention, for convenience of description, only the regions near the central portion of each of the convex lenticular lenses called the vertical optical lenticular lens are cut out, and only the convex lenticular lens is made of these lenses. The light that is emitted from the upper part of the vertical optical lenticular lens is condensed and is transmitted almost vertically downward.

In the present invention, the central region of each of the convex lenticular lenses does not exactly mean the central portion of the lens but is defined as including a region of the right and left small regions around the center of the lens. The light from the light source 17 located at the upper portion is converged downward in a substantially vertical direction and irradiated in a certain range region 18 of the right and left center of the respective convex lenticular lenses. In other words, each of the lenses of the convex cantilever lens minimizes the refracting action of light in the left and right constant range regions 18 centering on the central portion of the convex lenticular lens. In this region, the irradiated light is focused almost vertically and irradiated. Light that is focused and emitted only in the vertical direction through the region near the center of each lens of the convex lenticular is defined as vertical light in the present invention. The vertical light defined in the present invention means almost vertical. A typical example of the convex lenticular used in the linear light source of the present invention is a vertical lenticular. In the exposure apparatus of the present invention, it is possible to use various types of convex lenticules, but the efficiency is that the vertical lenticure is the most efficient. The present invention can use various types of boro-tentilicurates.

However, in order to obtain a fine ray source, the pitch of the lenticule must be a fine size. In the embodiment, when the pitch of the convex portion is 30 microns, a circuit having a pitch of 20 microns can be easily realized. It was found that the efficiency of the optical source generating apparatus changes depending on the size of the pitch and the focal distance of the lenticular. It can be manufactured in various ways called vertical light lenticular with extremely fine pitch. The shape of each of the left and right small constant ranges of each lenticular lens can be manufactured by bite and mechanically manufactured centering on the center of the lens, and can be performed by various methods such as laser processing. Alternatively, a vertical lenticular lens may be fabricated by making a small amount of photoresist, then plated with photoresist. The pitch of the vertical light lenticule should be smaller than the pitch of a typical convex lenticular. This is because the lenticular lens is constituted only by the region near the central portion of each lens of the common convex lens.

In the present invention, it is preferable that the pitch of the vertical light lenticular is set to a very small pitch with a size of several tens of microns. When a photosensitive layer is disposed under the vertical light-transmissive layer and light is irradiated through a linear light source having a vertical optical lenticular structure, a vertical light exposure portion is formed in the exposure layer 20. The exposure unit at this time is defined as a vertical light exposure unit 19 in the present invention. A convex lenticular that allows the light emitted from the light source 17 to be converged in a substantially vertical direction with respect to the lower surface by a minimum refracting action is defined as a vertical lenticular in the present invention. Also, in the case of the convex lenticule, the area of the lenticular lens, in which the light is condensed and irradiated in a substantially vertical direction with respect to the lower plane due to the minimum refracting action, is defined as the vertical light area 18 of the lenticular. A region 18 in a small range in the left and right direction around the center of each lenticular lens is a vertical light region of the lenticular lens.

5 is an explanatory view for explaining the configuration of a vertical optical lenticular. The vertical optical lenticular according to the present invention can be configured in various embodiments. 5 is a convex lenticular formed by connecting only the vertical light region 21 of each convex lenticular lens. This is the most typical vertical lenticular type. The light of the light source located on the upper side of the vertical optical lenticular according to the present invention is condensed and transmitted to the lower part almost vertically.

 6 is an explanatory view for explaining a vertical light lenticule that implements vertical light through a lens shield to a convex lenticular. In this embodiment, the opaque shielding material 24 is filled in the portions of the respective convex lenticular lenses except for the vertical light region 25 to shield light from passing therethrough. That is, the area other than the vertical light area of each lenticular lens is filled with the opaque shield to constitute the vertical light lenticular. If the photosensitive layer is placed under the vertical light cantilever, the irradiated light is formed in the photosensitive layer 27 through the vertical light region 25 of each lenticular lens.

FIG. 7 is an explanatory view for explaining a vertical light lenticule that implements vertical light by providing a light transmission slitter in a convex lenticular. At the bottom of the convex lenticular, a light transmitting slit is formed. The light transmitting slit is formed at the lower part of the central portion of each convex lenticular lens 29. The light transmitting slit may be formed by forming a long groove along the longitudinal direction of each lenticular lens. When a patterned film is produced, only a portion of the film may be formed as a transparent portion. The light transmitting slit is supported through the slit support (30). The light to be irradiated is condensed through each lens 29 of the convex lenticular and the condensed light is transmitted to the lower part through the light transmitting slit formed in the slit support 30. [

If the photosensitive layer is placed under the light transmitting slit, the collected condensed light is irradiated to the photosensitive layer 31 coated with the photosensitive material to form the exposed portion 33. As another embodiment of the present invention, the lens shield of the lenticular lens shown in Fig. 6 and the light transmitting slit of the lenticular lens shown in Fig. 7 are simultaneously formed in the lenticular. In the present invention, when a convex lenticular lens having only a vertical light region includes at least one lens, it is also referred to as a vertical lenticular lens. Generally, it consists of a number of Lenticure lenses called Lenticular lenses. The lenticular lens is configured to have the same cross section in the longitudinal direction. In the present invention, if the number of lenses of the lenticular lens is at least one, it is referred to as lenticular. It is a matter of course that the present invention also encompasses a lenticular lens having a single lens of Lenticular. However, the larger the number of the convex lenticular lenses in the vertical light region, the shorter the exposure time becomes. In addition, in all the embodiments of the present invention, the Fresnel lens can be placed on the upper portion of the lenticular to induce more efficient utilization of light. This also belongs to the embodiment of the present invention.

In the present invention, the concept of a luminous source generating apparatus using lenticure is very important. The luminous source generating apparatus of the present invention is characterized by using lenticure. The luminous source generating apparatus using the lenticure of the present invention comprises a light source and a lenticular system. The light source and the lenticular system are mounted in the light source container. In this case, in order to equalize the light irradiated by the light source, the light source may be configured to swing in the same plane in the front and rear direction and / or the left and right direction with respect to the Lenticular system. The same plane should be flat with the Lenticular system. In addition, the light source may be configured to control the access distance to the lenticular system in order to adjust the intensity of light. The mechanical configuration for adjusting the distance can be performed by using a scraping method and various other methods. It is needless to say that the lenticular system may be provided with a vibrating means so that fine vibrations can be applied. The lenticular system may be constituted by one convex lenticular or may be laminated with a plurality of lenticulars.

The lenticular system used in the optical circulator according to the present invention includes at least one convex lenticular or at least one concave lenticular. And at least one convex lenticule and at least one concave lenticule. The lenticular system preferably includes at least one vertical lenticular lens. The lenticular system may be configured to include at least one convex lenticular with the opaque shield. The lenticular system may include at least one lenticule having a light transmitting slit formed along the longitudinal direction of the lenticular lens. The lenticular system may include at least one lenticule that forms a light shielding part. The lenticular system may include at least one lenticular lens that forms a lenticule interval portion between the lenticular lens and the neighboring lenticular lens so as to prevent light from entering the lenticular lens.

The light source of the present invention comprises a light source and a lenticular system, and the light source and the lenticure system are fixed without moving relative to each other. Further, in another embodiment of the present invention, the optical circulator generating apparatus includes a light source and a lenticular system, and the light source and the lenticular system may be mounted on the same optical source container. The light sources used in the present invention are various.

It goes without saying that LED light sources and laser light sources as well as all conventional light emitters are included. The light source used in the present invention may be constituted by a plurality of point light sources, or may be configured in the form of a linear light source or a surface light source. It is preferable that the light source is configured to be uniformly irradiated with respect to the entire area of the lenticure system. In the present invention, when the lenticular system is a single convex tentacle, light passing through the lenticular system appears in the form of a line having the same number as the number of lenticular lenses constituting the lenticular system. That is, the number of lines of the linear light source is formed corresponding to the number of lenticular lenses. The light irradiated in a line shape by the lenticular system described above is irradiated onto a pattern film or a photomask.

In the cura system, the size of the lenticular system in the longitudinal direction of the lenticular lens is defined as the length of the linear optical system, and the size of the lenticular system as the direction perpendicular to the longitudinal direction of the lenticular lens is the width define. In the present invention, the linear light source device is transferred in the direction perpendicular to the longitudinal direction of the lenticular lens. In order to perform a large-area exposure work, first, the length of the linear light source generator must be long, and then, the travel distance of the linear light source generator must be long. In the present invention, since the transfer operation is performed in the width direction of the linear light source, even if the width of the linear light source is relatively small, it is possible to expose a large area by increasing the transfer distance as much as possible. In addition, the length of the light source device, that is, the size of the lenticular lens in the longitudinal direction, can be easily made long when the lenticular is manufactured. Therefore, in the present invention, work of a large area can be extremely easily performed. As an example, when a substrate having a width of 1 meter and a length of 200 meters is exposed, the width of the concentrator must be approximately 10 centimeters and the length of the concentrator must be at least 1 meter. In addition, the above-mentioned optical circulator generating apparatus requires a relative transfer of at least 200 meters or more relative to the substrate. Therefore, it is necessary that the optical circulator generating apparatus used in the present invention constitute a transfer means for relatively transferring the optical pulse source generating device to the substrate. At this time, in order to allow the pattern film or the photomask and the tonic circle generator to move without friction, it is preferable that the pattern film and the tonic circle generator are spaced apart from each other by a predetermined distance.

It is possible to form a large-area exposed portion through relative movement between the linear light source device of the present invention and the pattern film or the photomask. The concentrator generating device is placed on top of the pattern film or the photomask. Generally, the tonic circle generating device is configured to be slightly apart from the pattern film, so that the tonic circle generating device and the pattern film can be relatively moved without friction. In the case of fixing the optical circulator generating device without moving it, the substrate structure formed at the bottom may be moved. The transfer of the present invention is satisfactory if either the source of light source or the substrate structure is movable. Since the optical circulator according to the present invention is transported in the left-right direction or the back-and-forth direction, the entire light-sensing unit can be uniformly exposed in a short period of time. INDUSTRIAL APPLICABILITY The present invention makes it possible to perform a rapid exposure work on a workpiece having a large area.

The present invention can transfer the patterned film in a scanning manner to perform a quick operation. In the case of a substrate in which a thin sheet is coated with a photosensitive material and wound in a roll shape, the linear light source device of the present invention can be scanned for rapid exposure. However, in a special case, the light source can be configured so as to be able to perform exposure without relative movement with the pattern film. In the present invention, it is possible to configure various means of the conveying means of the circular light source generating apparatus, and as a specific embodiment, the circular light source generating apparatus can be constituted through the rail portion and the driving portion. The driving unit may include a driving motor having a driving gear, and the rail may include a gear that engages with the driving gear. As described above, the concentrator generating apparatus according to the present invention uses the condensing function of Lenticular.

The condensing function enables clean exposure even if the thickness of the photosensitive material is more than several tens of microns. Even if the pitch of the circuit is several microns, it is possible to make a clear exposure, and there is no defect and a clear circuit configuration is possible. The light of the vertical light produced in the present invention can maximally prevent the scattering action and the reflection action, and it is possible to provide an ideally clean exposure. Hereinafter, another embodiment of the present invention will be described in which a linear light source generator is constituted by a light source and a lenticular system. A lenticular system is used in the present invention. The lenticular system may be in the form of one convex lenticular and in the form of a lenticular laminate in which a plurality of lenticulars are laminated. The lenticular layered body is formed by appropriately combining convex lenticular or concave lenticular. The most representative embodiment of the lenticular system is formed by laminating at least one concave lenticular on the lower part of the convex lenticular.

By using laminated lenticular and lenticule laminates, it is possible to produce a luminous source generating device capable of more precise work. Using a luminous source generator having a lenticure system in which lenticules are stacked, it is possible to produce light in the form of a line having an extremely minute line width in nano units. When a light source is irradiated to a substrate coated with a light-sensitive material using the linear light source generator of the present invention, light of a very fine line width is detected on the substrate. It is one of the important means of seeing a stereoscopic image called a bolt lenchy which we commonly know. The lens is made of a transparent material called a convex lenticular lens. One of the surfaces of the lens is constituted by a plane, and the other surface of the convex lenticular lens is constituted by a series of continuous lenses each having a columnar shape. The definition of the concave lenticular used in the present invention is as follows. It is defined as being made of a transparent material called concave lenticule, one side of which is constituted by a plane, and the other side of which is constituted by a continuous structure in which each lens is constituted by a long oval shape.

8 is a perspective view of a general concave lenticular. A concave lenticular lens 34 is formed at each of the columnar convex lenticular lenses corresponding to each concave lens. When the light is irradiated to a lenticure system in which the convex lenticule and the concave lenticule are appropriately arranged, the light is condensed through the convex lenticule, and the light is divided into a plurality of minute light called the concave lenticule. Figures 9a, 9b and 9c show an embodiment of a lenticular system. FIG. 9A shows a concave lenticule arranged at the lower part of the convex lenticular. Each of the columnar convex lenticular lenses constituting the convex lenticular lens 35 functions as a convex lens and has a protruding portion with a gentle curvature. In the case of the convex lenticular, the central portion of the protruded portion with a gentle curvature is referred to as an acid in the present invention. The concave lenticular layer 36 has a bony recess. Each concave lenticular lens having a bony shape having the concave portion functions as a concave lens.

In the concave lenticular, the central portion of the concave portion with a gentle curvature is referred to as a bone in the present invention. 9B shows an embodiment of the lenticular system in which four concave lenticules 38, 39, 40 and 41 are laminated on the lower part of the convex lenticular. If you arrange the inverted lenticule upside down, you can get a variety of other effects. It is possible to change the performance and efficiency by arranging the concave lenticule at the uppermost position or by changing the shape in which the convex lenticule is arranged at the bottom. FIG. 9C is an embodiment of a lenticular system in which a concave lenticular is arranged at the bottom of the convex lenticular and a convex lenticular is formed at the lower side of the concetrated lenticular. FIGS. 9A, 9B and 9C illustrate various embodiments of the Lenticular system. In the present invention, it is possible to use at least one lenticular system by arranging at least one or more concave lenticulars, or by laminating at least one convex lenticule and at least one concave lenticule. It is needless to say that the lenticular system of the present invention can be constituted alone by the convex lenticular. The lenticular system in the present invention can arrange the convex lenticular and the concave lenticular in various forms, and different effects can be obtained according to the order and the method of the arrangement. In order to stack the plurality of lenticulars, the arrangement of the upper lenticule and the lower lenticule has a great influence on the function of the exposure apparatus, so it is necessary to design them according to each situation. The central portion of each lens of the upper lenticulars and the central portion of each lens of the lower lenticulary are aligned in the vertical direction or spaced apart from each other by a required distance in the left and right direction Arrangements are also made.

As an embodiment, a case where a convex tentacle is formed on the upper portion and a concave tentacle is formed on the lower side will be described.

When the central portion of each lens of the convex tentacle and the center portion of each lens of the concave lens are slightly apart, the light on the condensed line through the convex tenticular is reflected by a plurality of lines Lt; / RTI >

It carries out the splitting function of the circle light circle called "Otomoren Tikyu". Considering this action, the arrangement of the lenticure system is appropriately designed as needed. Hereinafter, a description will be given of how the light condensed in a line shape by the convex lenticule is divided by the concave lenticule. A description will be given of a case where the convex lenticule is disposed on the upper side and the concave lenticule is arranged on the lower side. The light irradiated from the light source is transmitted to the concave lenticule in the lower portion by the same number of line-shaped lights as the number of the lenticurea lenses by the respective lenses of the convex lenticule on the upper side. The light on the line focused by the convex lenticular is again split by the respective lenses of the concave lenticule at the bottom. The number of converged line-shaped lights equal in number to the number of the lenses of the convex lenticular is divided by the concave lenticulars located at the lower portion into the light on the lines much more than the light on the lines condensed by the convex lenticular. Shaped light that is condensed by the number of the respective lenses of the convex tentacle and divides the line-shaped light condensed by the convex tentacle, which is concave lenticule arranged at the lower part of the convex tentacle, . The number of the line-shaped lights converged by the convex tentacle is divided into line-shaped lights increased in number by a number of times through the concave lenticule at the bottom. At this time, due to the concave lenticule, the number of lines is increased several times, and the width of the line-shaped light focused at the same time is greatly reduced. Thus, the reduced light width enables finer exposure. This division of light depends on the configuration and arrangement of the Lenticular system.

The characteristics of the light condensed and divided by the Ticura system are as follows: first, the line width is narrow; and second, the number of line-shaped light is remarkably increased. The light thus condensed and divided by the Lenticular system enables ultrafine exposure. In the present invention, the luminous source produced through the lenticular system enables to make line-shaped light having a width of several tens to several hundreds of nano. The lenticular system of the present invention provides an advantage that the light to be irradiated can be condensed and divided into an extremely minute line shape. In order to perform a continuous exposure operation, the lenticular system of the source of light of the luminous source must be continuously moved relative to the pattern film or the photomask. Through the above-described relative movement, a large area exposure can be continuously performed. However, when it is desired to manufacture an apparatus for finishing work in a narrow area or in a stationary state more precisely, it is preferable that the lenticular system of the above- Can be performed. When the light source generating device is fixed, the substrate structure may be moved. When the substrate structure moves, the substrate on which the photosensitive layer adhered to the substrate structure is formed moves in the same manner. The pattern film or the photomask is brought into close contact with the underlying substrate without slippage. The substrate is placed on top of the substrate structure, and the substrate and substrate structure are also tightly contacted without sliding.

10 is a configuration diagram of a convex lenticular with a shielding portion. In the present invention, it is possible to make a ray source of several tens of nanometers to several hundreds of nanometers through a lenticure system in which a plurality of lenticulars are stacked. In this case, however, it is difficult for neighboring lights passing through the lenticular system to stick together. If the spacing of line-shaped light in the form of neighboring lines is too small, the light on all the lines can be stuck together. In order to prevent these adjacent ray source from sticking to each other, a light shielding portion 47 is formed between the convex lenticular lenses 46 as shown in Fig. A constant gap is formed between the convex lenticular lens and the adjacent convex lenticular lens. In the present invention, a region is formed between the lenticular lens and the adjacent lenticular lens, irrespective of whether the lens is a convex lenticular lens or a concave lenticular lens. In the present invention, an area that prevents the light from entering is defined as a lenticule interval. The lenticular gap portion may include a light shielding portion 47 for preventing light from entering. The light shielding portion may be printed by a printing method, or a patterned film may be formed in which the opaque portion is formed only in the gap portion, and the patterned film may be positioned on the convex portion of the convex portion. In the present invention, this convex tentacle is defined as a convex tenticular 45 having a light shield. Of course, the bottom surface 48 of the convex cantilever with the shielding portion is configured as a flat surface.

 11 is a configuration diagram of a concave lenticular with light-shielding portions. The concave lenticular layer 49 having the light shielding portion 50 corresponds to the convex lenticular with the light shielding portion of Fig. The light shielding portion 50 is positioned between the recessed portion 51 and the recessed portion. Of course, the bottom surface 52 of the concave lenticular with the shielding portion is flat.

Figs. 12 and 13 show still another embodiment of a lenticular system having a light shielding portion. 12 shows a lenticular system having a light shielding part by laminating concave lenticules 54, 55 and 56 having a light shielding part and a convex lenticule 53 having a light shielding part.

13 shows another lenticular system having a light shielding part by laminating convex lenticules (57, 59, 61) having light shielding parts and concave lenticules (58, 60) having light shielding parts. In this case, there is an advantage in that a distance between the extinction source and the extinction source can be considerably separated. When a lenticular system having the above-mentioned light-shielding portion is used, a linear light source having a width of several tens of nanometers can be produced. Due to these advantages, it is possible to realize a circuit line width of a finer pitch. A lenticular system having a light shielding part can be formed by combining a convex lenticular with a light shielding part and a concave lenticular with a light shielding part in various forms. In the present invention, a lenticular system used in a source of light of the present invention is another object of the present invention. The lenticular system of the present invention includes at least one convex lenticular, at least one concave lenticular, or a plurality of lenticures laminated. The lenticular system of the present invention may include vibration means. Typical examples of the lenticular system of the present invention include at least one vertical lenticular lens.

Another embodiment of the lenticular system according to the present invention includes at least one convex lenticular lens constituted by opaque shields or at least one lenticular lens formed with a light transmissive slit along the longitudinal direction of the lenticular lens . Another embodiment of the lenticular system according to the present invention is a lenticular lens system including at least one lenticular lens forming a light shielding part or a lenticurea lens having a lenticule interval part for preventing light from entering between the lenticular lens and its adjacent lenticular lens, As shown in FIG. The lenticular system in the present invention can be supported by a glass plate to maintain flatness. The glass plate may be positioned at the top, bottom, or top and bottom of the lenticular system. In order to prevent the lenticular system from moving with respect to each other, a bonding portion may be formed at the edge of the lenticular system. The bonding portion can be formed by various methods, and as a most representative embodiment, the bonding portion can be bonded by ultrasonic waves or by using an ultraviolet resin. When forming the bonding portion, it is preferable that the bonding portion is processed in a vacuum state in order to prevent a gap from being formed in the lamination portion where the lenticular and lenticular are laminated.

Hereinafter, an exposure apparatus provided with a linear light source generating apparatus using the lenticular according to the present invention will be described. The exposure apparatus equipped with the linear light source generating apparatus of the present invention is characterized by using lenticure. The light source includes a light source and a lenticular system, and the light source and the lenticular system are structured so as to travel at the same speed as the whole. In the present invention, the light source and the lenticular system are collectively referred to as a moving structure moving at the same speed in the same direction. In other words, the light source and the lenticular system move in the same direction, which means that both move at the same speed.

When a light source is made of a number of point light sources such as an LED light source, the intensity of the light source can not be uniformly adjusted everywhere. However, even in such a case, in order to obtain the highest possible uniform light intensity, the intensity of light can be uniformized by oscillating the light source in the horizontal or vertical direction in the same plane. The shaking motion for ensuring the uniformity of the light source is made in a repetitive motion in a short time. The above-described fluctuation of the light source can be moved in an arbitrary direction, but it must be repetitive movement in a short time. When the light source oscillates, the speed of the light source changes due to the fluctuation, but as a whole, the speed of the fluctuating light source and the lenticular system is defined as the overall speed. In this case, for the sake of convenience of description, the present invention is defined as moving at the same speed as the whole. This is also expressed in the present invention by the term cooperating structure. Even if the lenticure system is added with the vibration means to apply the fine vibration, the light source and the lenticure system are expressed as moving at the same speed as the whole, but strictly speaking, the lenticure system can not be regarded as moving at the same speed. However, in this case too, for convenience of explanation, it is defined as moving at the same speed as the whole. In an exposure apparatus equipped with a linear light source generator of the present invention, the light source and the lenticular system are fixed to the same linear light source container and move at the same speed without relative movement at all. In this case, the light source does not fluctuate, and the lenticure system can be moved in the same manner as the one body without vibration.

The intensity of light acts as an important factor in exposure. In order to control the intensity of light, a method of adjusting the amount of electricity consumed is a typical method. As an additional method, a method for adjusting the distance to the light source and the lenticular system may be configured for the adjustment of the amount of light. When the distance between the light source and the lenticular system is close, it is possible to irradiate light as strong as that. In the exposure apparatus of the present invention, it is most convenient to mount the light source and the lenticular system on the light source container. The light source container is a closed or open structure and has a fixed frame. In the most representative embodiment, the light source and the lenticular system are mounted on a single light source container, and the exposure operation is performed while the container is transferred on the same plane in the left-right direction on the table.

Circles and lenticular systems are transported at the same speed, in the same direction. And the transporting direction is a direction perpendicular to the longitudinal direction of the lenticular lens constituting the lenticular. In the present invention, when the light source and the lenticular system are mounted on the light source container, the light source and the lenticular system are transported in the same direction. However, even when the light source and the lenticular system are not mounted on the container, You have to move at the same speed. When the light source and the lenticular system are mounted on the light source container, the container can be moved up and down with respect to the table, thereby facilitating preparation work for the exposure work on the table. In the case where the light source and the lenticular system are mounted on the light source container, the light source is allowed to repeatedly oscillate in the left and right direction and / or the back and forth direction in the container, thereby making it possible to equalize light emitted from the light source. In the case of an LED light source, there is a gap between the adjacent LED light sources. This spacing serves to lower the uniformity of the light. In order to improve the uniformity of light by the spacing portion, the LED light source is subjected to repetitive rocking in the left, right, front, and back directions in the same plane. In the present invention, the definition of the shaking motion defines the same repetitive motion in a short section. Also, when the light source and the lenticular system are mounted on the light source container, the light source may be distant or close to the lenticular system in order to adjust the intensity of the light.

When the light source and the lenticular system are mounted in the same container, the lenticular system is positioned at the lowermost end of the container. Of course, strong light intensity can be obtained if the light source is close to the lenticular system. When the light source and the lenticular system are mounted on the container, it is also possible to fix the light source and the lenticular system to the container so that the light source and the lenticular system do not move relative to each other. In this case, the intensity of the light is made possible by adjusting the external power. In this case, there is a case where the oscillation action of the light source or the vibration action of the lenticular system is not performed. Even in such a case, the light source generator can function well. The light source and the lenticular system constitute an embodiment of the exposure apparatus of the present invention, in which an exposure apparatus configured to have no relative movement therebetween. It is the most representative embodiment of the exposure apparatus of the present invention that the light source and the lenticure system are mounted in the light source container and the light source and the lenticure system are transported in the same direction and at the same speed. Lenticular systems can be vibrated very finely with vibrating means. The concentrator container can be cooled by forcibly circulating cooling air or circulating cooling water.

In the present invention, it is preferable that the lenticular system is moved away from the patterned film having the pattern or the patterned photomask to reduce the friction. The spacing distance is preferably as short as possible. Further, in the exposure machine of the present invention, a pattern film or a photomask is placed under the lenticular system. A substrate on which a photosensitive layer is formed is positioned below the pattern film or the photomask. The substrate may be separated from the pattern film or the photomask by a predetermined distance or may be in close contact with the pattern film or the photomask. Separation is accompanied by side effects such as diffraction and interference of light. The purpose of the separation is to work without friction. It is desirable to separate the shortest possible distance in case of spacing. It is necessary to adhere closely for accurate exposure work. When the exposure is performed in close contact with the photosensitive layer, light is directly transmitted to the photosensitive layer, so that side effects such as diffraction and interference of light are greatly reduced. The criterion for selecting whether to be spaced apart or closely is selected according to the severity and accuracy of the workpiece to be manufactured. Also, the exposure apparatus of the present invention is also required to generate a large amount of heat from the light source. Such heat can be controlled through a cooling means. It is a common practice to forcibly circulate cold air or cooling water from the outside to the inside of the concentrator generating device.

When the lenticular system of the present invention is used, it is common to use a convex lenticule at the top, but in some cases it may be desirable to locate the concave lenticular. It goes without saying that the type and arrangement of the lenticular used may vary depending on the required characteristics of each exposure system. In order to construct the most efficient exposure system, it is preferable to include a vertical light lenticular in the lenticular system. The lenticular system used in the exposure system of the present invention may include a convex lenticular lens constituted by an opaque shield or a light transmissive slit formed along the longitudinal direction of the lenticular lens or a lenticular system including a light shield , Or a lenticure liner with a lenticule spacing that prevents light from entering between the Lenticular lens and its adjacent Lenticular lens.

Fig. 14 is an explanatory diagram illustrating the exposure apparatus of the present invention with the upper and lower structures. Fig. Hereinafter, the exposure apparatus of the present invention will be described with respect to the structural aspects of the upper structure and the lower structure.

The upper structure includes at least one pressing roller supported by an elastic body, at least one auxiliary roller, and a luminous source generating device using a lenticure. The substructure includes a table for positioning the substrate, and a tightening means for tightly adhering the substrate to the table. A substrate on which a thin photosensitive layer is uniformly coated is placed on the table of such an exposure apparatus, and a pattern film or a photomask is placed on the substrate. The upper structure and the lower structure constitute transfer means for the upper structure or the lower structure so as to move relative to each other. Further, a cooling means for cooling the heat generated in the light source of the linear light source generating device is formed in the upper structure. Further, the pattern film or the photomask is pressed onto the substrate by the pressing roller. The substrate is brought into close contact with the table by the contact means. It is necessary that the upper engine is configured to be movable in the vertical direction with respect to the table. This is because it is necessary to move the upper orifice upward from the table in the process for preparing the exposure operation. The tightening means causes vacuum pressure generated by a vacuum pump to be actuated through fine holes formed in the table.

When a patterned film is used, the patterned film may be formed in the form of an exposure device having an infinite orbit to connect the beginning and the end of the patterned film. This method of infinite orbit is advantageous in a mass production system. In the case of the pattern film in the form of the infinite orbit, a circular light source may be provided inside the pattern film. When the pattern film of the infinite orbit is not used, the upper structure performs an exposure operation in an initial position and then performs a repetitive exposure operation in such a manner that it moves away from the lower structure and returns to the initial position There is a number. The table can have a reel structure that winds the flexible substrate at both ends thereof.

FIG. 15 is an explanatory view of another embodiment of the superstructure and the substructure. The upper structure includes at least one pressing roller 54, at least one auxiliary roller 62, 64, 65, and a concentrator generating device 75, which surround the outside with a resilient elastic body 73. The substructure includes a table 69 for positioning the substrate and a contact means 68 for bringing the substrate into close contact with the table. On the table, a substrate 70 having a thin photosensitive layer 72 uniformly applied is placed, and a pattern film or a photomask is placed on the substrate. When the substrate is a nonconductive substrate, a conductive layer is first formed by sputtering the surface of the substrate 70 with a conductive metal in order to form the conductive layer 71 on the substrate 70. In some cases, the sputtering layer is plated again to increase the thickness of the conductive layer 71. The upper structure and the lower structure of the exposure machine are configured to move relative to each other. That is, if the upper structure is fixed, the lower structure can be relatively moved, and if the lower structure is fixed, the upper structure can be relatively moved. The pattern film 63 on which the pattern is formed may also be constituted by an endless track. The patterned film may be adhered to the substrate by a pressing roller (74). That is, the pattern film is pressed on the substrate 70 coated with the photosensitive material 72, and the photosensitive material applied to the pattern film and the substrate is contacted by the pressing roller so that there is no relative sliding therebetween. The substrate and the table are supported by the contact means. The tightening means can use a vacuum pressure generated by a vacuum pumper formed inside the table. It is preferable that the pattern film 63 is in the form of an infinite orbit through which the start portion and the end portion are connected.

When the pattern film is formed in the form of an infinite orbit, the luminous source generating device 75 is present inside the infinite orbit 53. When the pattern film is in the form of an infinite orbit, the upper structure is configured to be vertically spaced relative to the lower structure. That is, the upper structure can be lifted up to enable preparation of operations such as replacement of the substrate. The substrate 70 is preferably made of a flexible substrate having a thin photosensitive layer 72 uniformly coated thereon. At this time, if the flexible substrate can be wound on the reel from both sides of the table 69, continuous exposure can be performed. When the patterned film is formed into an endless track, it is possible to provide a great advantage that a substrate can be wound around a reel to perform a continuous operation. It is preferable that the substrate includes a metal layer 71 on which a conductive metal is sputtered on the polyimide film 70 and the photosensitive layer 72 is uniformly coated on the metal layer. If the pattern film is not made into an infinite orbit, it is necessary to move the upper structure back to the initial position when a certain range of exposure is performed. In order to explain this structure, the position where the upper structure starts to be exposed with the lower structure in close contact with the lower structure is defined as an initial position.

After the exposure operation is performed in a certain range, that is, after the exposure operation is performed to some extent from the initial position, the upper structure must be moved away from the lower structure and returned to the initial position. In this embodiment of the exposure machine, the pattern film constituted by the transparent film 87 and the non-transparent portion 76 is provided in the form of an infinite orbit. The circular light source device 86 is positioned inside the infinite orbit constituted by the pattern film. An embodiment of the present exposure apparatus is composed of an upper structure and a lower structure. The upper structure includes at least one pressing roller 84 supported by the elastic body 83, at least one auxiliary roller 79, 78, 77, and a concentrator generating device 86. The substructure includes a table and a contact means for bringing the substrate into close contact with the table. The light source of the concentrator and the lenticular system are integrally and integrally joined together by the support frame 85.

Fig. 16 is an explanatory diagram of a light source generating device. Fig. In the present embodiment, the light source 88 and the lenticular system 89 constituting the linear light source generating device 91 are mounted on the linear light source container 90. The light source 88 and the lenticular system 89 are fixed to the light source container 90. However, it goes without saying that the light source can be configured to swing or vertically move within the container. In addition, various auxiliary equipment such as a cooling device and a vibration device can be installed inside the container. The light source device can be moved in the vertical direction within the container so that the intensity of the light irradiated to the pattern film or the photomask can be adjusted by adjusting the distance from the lenticular system constituted at the bottom of the container . At this time, it is possible to form a rocking structure or a vibration structure inside the container, which can be variously configured as general equipment, and a detailed description thereof will be omitted. The superstructure and the substructure basically comprise a configuration for relative movement. Further, the upper structure can move in the vertical direction with respect to the lower structure, so that it is possible to perform a preliminary work for preparing the exposure operation.

17 is another embodiment of the superstructure of the exposure machine. The upper structure includes at least one pressing roller (97) supported by an elastic body, at least one auxiliary roller (100,101,102,103), and a concentrator generating device (98). The pressing roller and the linear light source generating device move in the vertical direction to prepare for the exposure work. Further, the pressing roller and the light source generating device can be moved in the left and right directions, so that exposure can be performed on a large area. In this embodiment, the superstructure returns to the initial position after being subjected to a certain operation in a state of being in close contact with the substructure at the initial position, and then separated from the substructure. A metal layer sputtered with a conductive metal is formed on the substrate 93 in order to impart conductivity, a thin plating layer 92 made of metal such as copper is formed on the sputtered metal layer, and a thin The photosensitive layer 104 is constituted.

Figs. 18 and 19 are explanatory views for explaining the positional relationship between the linear light source generating device, the pattern film, and the substrate. A light source support 105 in which the LED light source 106 is coupled is formed in the container 104 and a lenticular system 107 is formed at the bottom of the container. The lenticular system is configured in a lower portion of the container, and a pattern film or a photomask is disposed under the lenticular system. The pattern film or photomask is spaced apart from the lenticular system by a predetermined distance so as to be transported without friction. The light source support can be vertically moved within the container to adjust the light intensity.

Fig. 19 illustrates a case in which the pattern film or the photomask 108 is in close contact with the photosensitive layer. When the patterned film or photomask 108 is brought into close contact with the substrate, the diffraction or interference of light is minimized. Therefore, the exposure operation can be performed precisely. Hereinafter, the lenticular system used in the optical circulator will be described. A lenticular system is used in the present invention. The lenticular system may be in the form of one convex lenticular and in the form of a lenticular laminate in which a plurality of lenticulars are laminated. The lenticular layered body is formed by appropriately combining convex lenticular or concave lenticular. The lenticular system of the present invention may include a vibrating means for vibrating the lenticular system. In the Lenticular system, the light emitted from the light source is first received by the convex lenticule, and at least one or more concave lenticules are combined in the lower portion of the convex lenticule. Of course, it is also possible to receive the light from the light source for the first time. It is preferable that the lenticular system be supported by a glass plate to maintain flatness. The Lenticular system is thin, so it can bend well. In order to prevent such warping, it is possible to maintain a flatness by using a transparent glass plate on the upper or lower portion or the upper and lower portions of the lenticular system. It is preferable to use a glass plate to maintain such a flat surface. The planar surface of the glass plate called lenticular, which is a laminate, can be kept flat. In order to maintain the lenticular system as a single body, it is preferable that a bonding portion is provided at the edge of the lenticular having a plurality of stacked layers. The bonding portion refers to a portion bonded by ultrasound, bonded by ultraviolet resin, or joined in various forms. In forming the bonding portion, it is preferable that the bonding portion is processed in a vacuum state in order to prevent a gap from being formed in the lamination portion where the lenticular and lenticular are stacked. Since several lenticulars are stacked, there may be spaces or gaps between the lenticulars. It is preferable that the space portion or the gap is free from the space portion or the gap because the optical property can be deformed. In order to remove the space, it is preferable that the lenticure system is laminated in a vacuum state when the lenticure system is laminated. That is, it is preferable that a bonding unit for laminating the lenticular system in a vacuum state and sealing the edge portion by using an ultrasonic wave or an ultraviolet resin is preferably provided.

The lenticular system used in the linear light source device and the linear light source device of the present invention can be used in various forms not only in the exposure device but also in the image device. In the conventional imaging device, the light is transmitted to the image panel through the backlight part and the polarizing filter. At this time, the reduction rate of the light through the polarizing film is extremely high. When the present optical circulator generating apparatus is used in a video apparatus, the function of the conventional optical polarizing filter can be replaced by the optical source. The present invention has a great advantage in that it can be utilized as it is without losing the light provided by the backlight. If the light is not lost, it can provide a great advantage that the life of the battery can be greatly increased. The reason why the vibrating means is added to the lenticular system in the present invention is that it is possible to eliminate the vacant portion between the linear light source and the linear light source by vibration. The distance between the source of light and the source of light is only a few microns to tens of microns in size. Such an interval is a minute super-high-speed vibration provided by the vibrating means, and it is possible to prevent the viewer from feeling blank by using the optical illusion phenomenon. In the present invention, the method of making a micro-optical source is also the scope of the present invention.

A method of manufacturing a micro-optical source according to the present invention is characterized in that a fine optical source is manufactured by passing light irradiated from a light source through a lenticular system having a minute pitch. The lenticular system may include vibration means. Of course, it is most preferable that the lenticular system includes a vertical light lenticular. The pitch of the lenticurea used must be microscopic for the production of the microscopic light source. Although the criterion will vary depending on the degree of fineness, as the embodiment of the present invention, the lenticular has a pitch of 30 microns. As a result of exposure using a lenticure system having a pitch of 30 microns, exposure of a workpiece having a width of 10 microns, a width of an unexposed portion of 10 microns, and a photosensitive material of 15 microns was quickly exposed. Needless to say, more precise exposure can be performed by changing the focal length of the lenticular system. It is a matter of course that the pitch of the Lenticular is extremely fine, but it is also possible to design the Lenticular with various focal lengths even at the fine pitch. A key technique in the present invention is how to make such a micro-lenticular. Since the production method of the micro-lenticular is not an object of the present invention, the description thereof will be omitted herein.

It will be understood by those skilled in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims and their equivalents. no.

1: Exposure machine 2: Optical source generator
3: source of light source generating means 4: light source
5: Bolectic Cure, Lenticurea combination
6: Film 7: Photosensitive material
8: Plate 9: Substrate structure
11: Lenticular lens
34: Concerto Lenticulare
73: elastomer
74: Compression roller
62, 64, 65:
63: pattern film
68:
69: Table
70: substrate
71: conductive layer
72: Photosensitive layer
75: Optical source generator

Claims (66)

In an exposure apparatus equipped with a luminous source generating apparatus using lenticure,
Wherein the optical circulator generating apparatus comprises a light source and a lenticular system; Wherein the light source and the lenticular system are structured so as to move at the same speed as the entire system. In an exposure apparatus equipped with a luminous source generating apparatus using lenticure,
Wherein the optical circulator generating apparatus comprises a light source and a lenticular system; Wherein the light source and the lenticular system are transported in a direction perpendicular to the longitudinal direction of the lenticular lens. The method according to claim 1,
Wherein the light source and the lenticular system have no relative movement. The method according to claim 1,
Wherein the light source and the lenticular system are both mounted on a container. The method according to claim 1,
Wherein the light source and the lenticular system are both mounted on a container, and the container is configured to be transported in a front, back, or right and left direction with respect to a table of an exposure machine. The method according to claim 1,
Wherein the light source and the lenticular system are both mounted on a container, and the container is movable in a vertical direction with respect to a table of an exposure machine. 5. The method of claim 4,
Wherein the light source repeatedly oscillates in the left-right direction and / or the back-and-forth direction inside the container. 5. The method of claim 4,
Wherein the light source and the lenticular system are adjustable in distance in order to adjust the intensity of light. 5. The method of claim 4,
Wherein the lenticular system comprises a vibrating means. 5. The method of claim 4,
Wherein the lenticular system is disposed on a bottom portion of the container. 5. The method of claim 4,
Characterized in that the container includes a cooling means. The method according to claim 1,
Wherein the lenticular system is moved in a state of being spaced apart from the pattern film or the photomask by a predetermined distance. The method according to claim 1,
The patterned film or photomask is positioned below the lenticular system; A substrate on which a photosensitive layer is formed is positioned below the pattern film or the photomask; Wherein the pattern film or the photomask is spaced apart from the substrate by a predetermined distance. The method according to claim 1,
The patterned film or photomask is positioned below the lenticular system; A substrate on which a photosensitive layer is formed is positioned below the pattern film or the photomask; Wherein the pattern film or the photomask is in close contact with the substrate. The method according to claim 1,
Wherein the lenticular system comprises at least one convex lenticular. ≪ RTI ID = 0.0 > 18. < / RTI > The method according to claim 1,
Wherein the lenticular system comprises at least one or more concave lenticules. The method according to claim 1,
Wherein the lenticular system comprises at least one convex lenticule and at least one concave lenticular in combination. The method according to claim 1,
Wherein the lenticular system comprises a vertical light lenticular in at least a portion thereof. The method according to claim 1,
Wherein the lenticular system comprises an opaque screening material on at least a portion thereof. The method according to claim 1,
Wherein the lenticular system comprises a light transmitting slit in at least one portion thereof. The method according to claim 1,
Wherein the lenticular system comprises a light shielding part at least in one part. The method according to claim 1,
Wherein the lenticular system comprises at least one lenticular gap portion. ≪ RTI ID = 0.0 > 18. < / RTI > In an exposure apparatus equipped with a luminous source generating apparatus using lenticure,
Wherein the exposure apparatus has an upper structure and a lower structure;
Wherein the upper structure includes at least one pressing roller supported by an elastic body, at least one auxiliary roller, and a concentrator generating device;
Wherein the substructure includes a table and a tightening means for closely adhering the substrate to the table. 24. The method of claim 23,
Wherein the upper structure and the lower structure have a relative movement; A pattern film or a photomask is positioned under the luminous source generating device; Wherein the pattern film or the photomask is pressed onto a substrate coated with a photosensitive material by a pressing roller. 24. The method of claim 23,
Wherein the tightening means uses a vacuum pressure generated by a vacuum pumper. 24. The method of claim 23,
Wherein the pattern film is connected to a start portion and an end portion to form an infinite orbit. 27. The method of claim 26,
Wherein the linear light source device is present in an inner space of a pattern film forming an infinite orbit. 24. The method of claim 23,
Wherein after the exposure operation is performed at the initial position, the upper structure moves away from the lower structure, and then moves back to the initial position. 24. The method of claim 23,
Wherein the table comprises a reel structure that winds a flexible substrate coated with a photosensitive layer. 24. The method of claim 23,
Wherein the linear light source generating device includes a cooling means. A lenticular system for use in an optical source device,
Wherein the lenticular system comprises at least one convex lenticular. ≪ RTI ID = 0.0 > 11. < / RTI > A lenticular system for use in an optical source device,
Wherein the lenticular system comprises at least one concave lenticular. ≪ RTI ID = 0.0 > 11. < / RTI > 33. The method of claim 31 or 32,
Wherein the lenticular system comprises a vibrating means. ≪ RTI ID = 0.0 > 11. < / RTI > A lenticular system for use in an optical source device,
Wherein the lenticular system comprises a plurality of lenticulars laminated. ≪ RTI ID = 0.0 > 11. < / RTI > 35. The method of claim 34,
Wherein the lenticular system includes a lenticular system in which at least one convex lenticular and at least one concave lenticular are combined. 35. The method of claim 34,
Wherein the lenticular system comprises at least one vertical lenticular lens. ≪ RTI ID = 0.0 > 18. < / RTI > 35. The method of claim 34,
Wherein the lenticular system comprises an opaque shield. ≪ RTI ID = 0.0 > 11. < / RTI > 35. The method of claim 34,
Wherein the lenticular system comprises a light transmissive slit formed therein. 35. The method of claim 34,
Wherein the lenticular system includes a light shielding unit. 35. The method of claim 34,
Wherein the lenticular system comprises a lenticule spacing portion. ≪ RTI ID = 0.0 > 11. < / RTI > 35. The method of claim 34,
Wherein the lenticular system is supported by a glass plate to maintain a flatness of the lenticular system. 35. The method of claim 34,
Wherein a bonding part is provided at an edge of the lenticular system. ≪ RTI ID = 0.0 > 11. < / RTI > 43. The method of claim 42,
Wherein the bonding portion is bonded by ultrasonic waves. ≪ RTI ID = 0.0 > 11. < / RTI > 43. The method of claim 42,
Wherein the bonding portion is bonded with a UV-curable resin. 43. The method of claim 42,
Wherein the bonding portion is processed in a vacuum state in order to prevent a gap from being formed in the lenticular layered portion. A luminous source generating apparatus using lenticure,
Wherein the linear light source generator comprises a light source and a lenticular system, and the light source and the lenticular system are mounted in a container. 47. The method of claim 46,
Wherein the light source and the lenticular system are fixed to the container and have no relative motion at all. 47. The method of claim 46,
Wherein the light source is configured to swing back and forth and / or laterally with respect to the lenticular system. 47. The method of claim 46,
Wherein the light source is capable of adjusting an access distance to the lenticular system for adjusting a light amount. 47. The method of claim 46,
Wherein the lenticular system includes a vibrating means. 47. The method of claim 46,
Wherein the lenticular system comprises at least one convex tentacle. 47. The method of claim 46,
Wherein the lenticular system includes at least one concave lenticular. 47. The method of claim 46,
Wherein the lenticular system comprises a plurality of lenticulars laminated. 47. The method of claim 46,
Wherein the lenticular system comprises a single convex lenticular. 47. The method of claim 46,
Wherein the lenticular system includes a lenticular system in which at least one convex lenticular and at least one concave lenticule are combined. 47. The method of claim 46,
Wherein the lenticular system comprises at least one vertical lenticular lens. 47. The method of claim 46,
Wherein the lenticular system includes at least one convex lenticular formed of a opaque shield. 47. The method of claim 46,
Wherein the lenticular system comprises a light transmitting slit. 47. The method of claim 46,
Wherein the lenticular system includes a light shielding part. 47. The method of claim 46,
Wherein the lenticular system comprises a lenticule spacing portion. In a method for producing a fine linear light source using lenticure,
And a luminous source having a fine line width is manufactured by passing a lenticure system having a fine pitch. 64. The method of claim 60,
Wherein the lenticular system comprises a vibrating means for vibrating the lenticular. 64. The method of claim 60,
Wherein the lenticular system comprises at least one or more of borotynticurea. 64. The method of claim 60,
Wherein the lenticular system comprises at least one or more concave lenticules. 64. The method of claim 60,
Wherein the lenticular system comprises at least one combination of at least one convex lenticule and at least one concave lenticular. 64. The method of claim 60,
Wherein the lenticular system comprises a vertical light lenticular.
KR1020120124419A 2011-11-16 2012-11-05 Line type light exposure apparatus and lenticular assembly KR20140058751A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020120124419A KR20140058751A (en) 2012-11-05 2012-11-05 Line type light exposure apparatus and lenticular assembly
US14/443,396 US10197920B2 (en) 2011-11-16 2012-11-15 Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
EP12850328.1A EP2851751B1 (en) 2011-11-16 2012-11-15 Stepper having linear light source generating device
PCT/KR2012/009685 WO2013073873A1 (en) 2011-11-16 2012-11-15 Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device
TW101142835A TWI632400B (en) 2011-11-16 2012-11-16 Line type light exposure apparatus and lenticular assembly

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020120124419A KR20140058751A (en) 2012-11-05 2012-11-05 Line type light exposure apparatus and lenticular assembly

Publications (1)

Publication Number Publication Date
KR20140058751A true KR20140058751A (en) 2014-05-15

Family

ID=50888837

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020120124419A KR20140058751A (en) 2011-11-16 2012-11-05 Line type light exposure apparatus and lenticular assembly

Country Status (1)

Country Link
KR (1) KR20140058751A (en)

Similar Documents

Publication Publication Date Title
US9550326B2 (en) Stereolithography machine with improved optical unit
US20150355553A1 (en) Production of a volume object by lithography, having improved spatial resolution
CN105216320B (en) Dual-optical-path projection exposure 3D printing device and method
JP2012519875A (en) Irradiation system for stereolithography equipment
KR20160101941A (en) Linear light source generating device and exposure device having same
CN110524874B (en) Photocuring 3D printing device and printing method thereof
EP2851751B1 (en) Stepper having linear light source generating device
CN107783206A (en) Double-layer microlens array optical element
JP2009266901A (en) Transfer apparatus, method for manufacturing wafer-like optical device, electronic element wafer module, sensor wafer module, electronic element module, sensor module and electronic information instrument
TWI600527B (en) Stereolithography machine with improved optical unit
KR20140058751A (en) Line type light exposure apparatus and lenticular assembly
KR20140038147A (en) Line type light exposure apparatus
KR20140094131A (en) The method of manufacturing substrate having ultra-fine conductive circuit by silver paste filling and its substrate.
US20110080566A1 (en) Method for replicating production of 3d parallax barrier
TWI632400B (en) Line type light exposure apparatus and lenticular assembly
KR20140065506A (en) Line type light exposure apparatus and lenticular assembly
KR20140062291A (en) Line type light exposure apparatus and lenticular assembly
KR20140094315A (en) The method of manufacturing polyimide substrate having ultra-fine conductive circuit by silver paste filling and its substrate.
JP6037199B2 (en) Exposure apparatus and exposure method
US20180149879A1 (en) Display body including partially-provided optical element array
KR20190075891A (en) Line type light apparatus
KR101432885B1 (en) Lenticular exposure apparatus
KR20140051532A (en) Line type light exposure apparatus and lenticular assembly
KR20140093496A (en) Ttransparent substrate having a ultra-fine conductive circuit using Lenticular system and a method of manufacturing a transparent substrate by him.
KR20140010822A (en) Line type light apparatus

Legal Events

Date Code Title Description
N231 Notification of change of applicant
A201 Request for examination
E902 Notification of reason for refusal
WITB Written withdrawal of application