KR20130127136A - Line type light apparatus - Google Patents
Line type light apparatus Download PDFInfo
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- KR20130127136A KR20130127136A KR1020120050834A KR20120050834A KR20130127136A KR 20130127136 A KR20130127136 A KR 20130127136A KR 1020120050834 A KR1020120050834 A KR 1020120050834A KR 20120050834 A KR20120050834 A KR 20120050834A KR 20130127136 A KR20130127136 A KR 20130127136A
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- light source
- light
- convex
- lenticular
- present
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21S—NON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
- F21S4/00—Lighting devices or systems using a string or strip of light sources
- F21S4/10—Lighting devices or systems using a string or strip of light sources with light sources attached to loose electric cables, e.g. Christmas tree lights
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
- G03B21/602—Lenticular screens
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to a line light source generator including a lenticula.
A device that is most common for the present application is an exposure machine.
In the present invention, the line light source generator 2 includes the light source 4 and the convex lenticula 5 or the light source 4 and the lenticular combination 5.
It is preferable that the light source 4 emits light uniformly over the entire area of the convex cantilever 5 or the lenticular combination 5 having a constant area.
The light source generator of the present invention is characterized in that the light source and the convex lenticula or the light source and the lenticula combination are fixed without relative movement.
According to the present invention, vertical light can be constructed using the function of the central region of the lenticular lens having the property of vertically descending light of a light source.
The luminous source generating apparatus of the present invention may be configured to include a lenticure combination, wherein the lenticure combination is formed by appropriately combining a convex lenticular with at least one or more concave lenticules.
Description
The present invention relates to a line light source generator. The most typical use of the line light source generator of the present invention is in a line light source generator for an exposure machine used to construct a semiconductor circuit or a micro circuit or a fine pattern.
The line light source generator of the present invention is not limited to the exposure machine, but can be utilized in various fields such as a scanning device through the line light source generator.
The line light source generator of the present invention is most efficiently used for an exposure apparatus that enables ultra-precise exposure by allowing the condensing function of the convex lenticula to be used in the exposure apparatus.
Since the line light source generator of the present invention is mainly used for an exposure machine, the line light source generator of the present invention will be described below with reference to the exposure machine.
Another embodiment of the present invention using a lenticular combination enables a finer exposure operation by simultaneously utilizing the condensing function of the convex lenticula and the light splitting function of the concave lenticula.
By using the exposure apparatus to which the line light source generator of the present invention is applied, the photosensitive layer can be exposed accurately and super precisely according to the pattern pattern of the film, and processing can be performed even if the pitch is extremely fine, and the thickness of the photosensitive layer is relatively There is a characteristic that the exposure is vividly clear.
In general, an exposure apparatus refers to a device for transferring a desired pattern onto a photosensitive member by placing a film on which a desired pattern is formed on a substrate coated with a material reacting to light (Photo-resist: PR, photosensitive member) and exposing ultraviolet rays. A wafer, glass, etc. are also defined as a board | substrate in this invention.
Conventionally, an exposure apparatus for fabricating a fine pitch circuit must have a device for producing parallel light, and in the related art, a device for producing such a parallel light has an expensive construction.
However, according to the present invention, it is possible to provide benefits to many industrial fields by providing a luminous source generating device which is manufactured by a simple Lenticular lamp for an expensive parallel light configuration.
The present invention not only can reduce the manufacturing cost by making a low-cost vertical light exposure apparatus through a line light source generator using a lenticula, but also reduce the manufacturing cost of the fine pitch that was previously impossible to manufacture even using an expensive parallel light exposure machine. It is invented to be able to quickly and largely fabricate the circuit.
The present invention adopts a line light source generator using the condensing function and the vertical light function of the convex lenticula, so that even if the thickness of the photosensitive material is several tens of microns, clean exposure is possible. It is possible to provide a lenticular exposure apparatus capable of constructing a clear and clean circuit.
The most remarkable feature of the present invention is that it can perform exposure of an extremely fine circuit, enable light exposure of a large-sized photosensitive layer at the same time, and allow the work to be performed by a scanning operation of a source of light It is possible to work quickly. In addition, in terms of the working environment, it is essential to perform processing in a space free from vibration in the conventional laser processing. However, in the case of the exposure apparatus using the linear light source generating apparatus of the present invention, It is true.
Conventionally, a balanced light exposure machine has been used for the photosensitization of an extremely fine circuit, but the conventional balanced light exposure machine has a complicated equipment structure and requires expensive manufacturing costs.
However, by adopting the line light source generator of the present invention, it is possible to economically produce parallel light using the optical properties of light without using complicated devices or expensive equipment.
The light irradiated in the present invention is a vertical light or parallel light, and when it touches the photosensitive member of the photosensitive part, the light is minimized because light diffusion or scattering action has the advantage that it is possible to precisely expose the extremely fine pattern. .
As the ideal light source device for constructing an extremely fine circuit, the following requirements are required.
First, it should be parallel light to prevent scattering and scattering of light; Second, be a source of light to enable rapid mass and scan operations; Third, the light energy must be condensed by the lens to maintain the intensity of the light of each source. Fourth, when a very fine circuit is to be fabricated, the width of the source must be several tens of nanometers, since it must be much smaller than the microscopic circuit. The fifth source must be present as a bundle of geniuses in order to have a lot of energy; Sixth, the distance between the line light source and the line light source is required to be concentrated in order to be concentrated at a high density of the line light source.
The line light source generator of the present invention satisfies all of the above conditions.
The light formed by the line light source generator of the present invention is applicable to many industrial fields. The most representative application is the exposure machine. The light provided by the line light source generator of the present invention is irradiated onto the film on which the pattern is formed in the exposure machine, and the irradiated light exposes the photosensitive material in the shape of the pattern formed on the film.
The optical circulator generating apparatus in the present invention includes a light source and a convex reticle as basic components. In another embodiment of the present invention, the line light source generator includes a light source and a reticula combination as a basic component.
The linear light source generator of the present invention is configured such that the light source and the convex lenticula or the light source and the lenticula combination are fixed so as not to move relatively.
Of course, the film disposed in the tonic circle generator and the exposure machine can be configured to move relatively.
The present invention intensively utilizes the function of the central region of the convex lenticular lens in which light is vertically transmitted when the light of the light source is irradiated on the convex lenticular.
When the line light source generator of the present invention is applied to an exposure machine, the line light source generator is located above the film on which the pattern is formed. When the sheet material on which the photosensitive material is coated is continuously exposed, it is preferable that the linear light source device of the present invention is constructed so as to be spaced apart from the film by a predetermined distance so that the linear light source device and the film are mutually moved without friction.
In the present invention, since the linear light source generating device can be relatively moved relative to the film in the positional relationship between the linear light source generating device and the film, even if a substrate coated with a photosensitive material of a large area is easily exposed, You can.
Of course, a substrate to which the exposure material is thinly coated is positioned below the film having the pattern formed thereon, and the film and the substrate should be prevented from moving relative to each other during the exposure process.
The present invention uses light condensed in a line shape produced by a convex lenticular.
In the present invention, when used as a lenticure combination, the light splitting function of the concave Lenticular is additionally used. By adding the concave Lenticular, the line width of the line-shaped condensed light formed by the convex lenticule is narrowed further, and the number of the condensed light of the line shape is further increased to enable more precise exposure.
In the present invention, when the lenticule assembly is passed through, the width of the condensed light can reach the condensed light on the line having a line width of several tens to several hundred nanometers.
This fact enables the pitch width of the workpiece to be exposed to be as high as a few microns without errors.
The present invention uses the condensing function of each of the convex lenses constituting the convex lenticula to the exposure apparatus, and uses the vertical light function of the convex lenses of the convex lentilizer to the exposure apparatus. .
By forming light as vertical light in the present invention, it is possible to perform a clear exposure even if the thickness of the photosensitive material is thicker than a few tens of microns, and the interference and scattering of light can be prevented by the vertical light. Therefore, even if the pitch of the circuit is several microns, It is possible.
In addition, when the work is carried out through the exposure device having the linear light source generator of the present invention, the safety of the work can be achieved, and a clear and clear circuit configuration without defects can be realized.
In addition, even if the substrate is coated with a large-area photosensitive material, the entirety of the substrate can be easily and economically exposed at a time through the transfer of the source of light of the present invention.
In the present invention, the linear light source generator is generally manufactured so as to be capable of performing relative movement in the left-right direction or the back-and-forth direction with respect to the patterned film.
Of course, in a special case or in the case where only the exposure of a small substrate is to be discontinuous, there may be a case in which the line light source generator is not constituted by a transfer mechanism for transferring relative to the film.
When such a relative transfer motion is required, first, the line light source generator is transported with the film stopped, and second, the line light source generator is transported with the film in the stopped state. It goes without saying that, in the above description, the film may include a film and an associated support for supporting the film.
As described above, the line light source generator according to the present invention has a focusing function of a lenticular or a lenticular combination which is an essential component thereof. In addition, the present invention is characterized in that a central portion of a typical convex lenticular lens is concentratedly used for generating vertical light.
The linear light source generator of the present invention is characterized in that the light source and the convex lenticura or the light source and lenticula combination are fixed without relative movement. For this purpose, the light source, the lenticurea or the combination of the light source and the lenticure are fixedly set in one fixed plane.
For continuous operation, the toric source generating device may be capable of relative movement relative to the substrate structure comprising the film.
The line light source generator according to the present invention has a light condensing function, which is a physical phenomenon of each convex lenticura lens constituting the convex lenticula, and a light splitting function, which is a physical phenomenon of each concave lenient cura lens constituting the concave lenticula. Will be used.
By manufacturing an exposure apparatus to which a function of a source of light source is applied, even if the thickness of the photosensitive material is several tens of microns or more, processing can be performed even if the width of the pitch is only a few microns.
The extremely fine pitches with small circuit pitches are capable of pure and clear exposure only by vertical light without scattering or diffuse scattering of light. The line light source generator of the present invention enables an exposure machine which is free of defects and can be configured with a clear and clean circuit.
Conventionally, an expensive device is required to produce parallel light, but in the present invention, the function of the conventional expensive device can be extremely easily performed by fully utilizing the physical function of the lenticular lens.
As compared with conventional exposure apparatus technology, it is difficult to expose a large area and requires a long exposure time. In contrast, when the apparatus of the present invention is used, exposure of a large area can be achieved extremely easily and quickly It has a great feature that it can be.
1 is a view showing the structure of a vertical light lenticular exposure apparatus having a line light source generator of the present invention,
2 is a perspective view of a typical convex lenticular,
3 is a view showing a state where light is condensed when light of a light source passes through a general convex lenticule,
4 is a view showing a state in which light is condensed by vertical light generated in a central portion of each lens of a general convex lenticular,
5 is an explanatory view for explaining the configuration of a vertical light convex tentacle,
6 is an explanatory diagram illustrating a vertical light lenticule that implements vertical light through a lens shield to a convex lenticular.
FIG. 7 is an explanatory view for explaining a vertical light lenticule that implements vertical light through a light transmission slitter to a convex lenticular.
8 is a perspective view of a general concave lenticular.
Figures 9a, 9b, 9c are examples of lenticular assemblies.
Hereinafter, various embodiments of the present invention will be described in detail, but the present invention is not limited to the following embodiments unless it departs from the gist thereof.
The present invention relates to a line light source generator.
In the line light source generator of the present invention, the light of the line light source generator is irradiated onto the film on which the pattern is formed, and the irradiated light can be used for an exposure apparatus for exposing the photosensitive material in the shape of the pattern.
The linear light source generator of the present invention includes a light source and a convex reticula or a light source and a lenticular combination, wherein the light source and the convex lenticule or the light source and the lenticular combination are fixed to each other so as not to be movable.
When constructing an exposure machine, the line light source generator and the film can be configured to move relatively.
The present invention utilizes the vertical light provided by the central region of the convex lenticula lens in which the light of the light source to be irradiated falls vertically.
1 is a view showing the structure of a vertical light lenticular exposure apparatus having a line light source generator of the present invention.
The
The above-mentioned optical
It is preferable that the
The present invention is characterized in that the light source, the convex lenticular or the combination of the light source and the lenticular are fixed without relative movement.
In other words, the light source and the convex lenticura or the light source and the lenticurazohabe are fixed and set in one fixed plane.
When the line light source generator is mounted on the exposure machine, the present invention is characterized in that the line light source generator is moved relative to the film of the exposure machine.
Conventionally, there is a technique for an exposure apparatus using a lenticular, but this does not move the lenticular by bringing the film into close contact with each other, and the light source positioned above is moved relative to the lenticular but the present invention is very different from this. have.
There is a remarkable difference in interpreting the physical phenomena of whether the light source is moved or fixed with respect to the lenticulars.
The technique of moving the light source relative to the lenticule is well known to a camera for recording a stereoscopic image by a conventional lenticular.
Convex lenticura has been closely used in the art for recording or reproducing stereoscopic images. As a technique of recording stereoscopic images, there is a stereoscopic image camera that records a plurality of images through respective lenticular lenses constituting the lenticular.
This is a method in which a plurality of images having different wide angles are recorded in one film by moving the lenticule relative to the subject. For convenience, the light source may be viewed as a subject.
The technique of relatively moving the light source relative to the lenticule is based on this stereoscopic imaging technique.
However, in the present invention, the light source is fixed with respect to the lenticular, and the vertical light in the vicinity of the central portion of the convex lenticula is possible without using all the light having different wide angles through the respective lenticular lenses constituting the lenticular. It is characterized by the intensive use of only parts.
In other words, the line light source generator of the present invention is set so that the light source and the lenticular do not move relative to each other, and the present invention is applied to an exposure machine. Is to move relative.
This is a significant difference from the relative movement of the light source relative to the convex lenticura in a state in which the conventional convex lenticula and the film are brought into close contact with each other.
When the light source is moved relative to the convex lenticula, the light condensed by the movement of the light source moves sequentially on the film existing under each lens of the convex lenticula.
This principle is the same as that by the convex lenticura, it is possible to take a three-dimensional image in which a plurality of images are recorded. In this case, even if the light is condensed, the intensity of the light changes depending on the position of the convex lenticular, and it is impossible to obtain an ideal uniform condensed light by this phenomenon.
The line
It is needless to say that the embodiments of the light source generating device transfer means 3 can be configured in various forms.
It is also possible that the slider rod is used to drive the motor as shown in FIG. In the present invention, when the linear light source generating device transfer means 3 is not configured, the linear light source generating device is in a stopped state and the substrate structure located under the linear light source generating device can be moved Of course.
In the exposure machine, the
As a specific embodiment of the
A substrate on which a photosensitive material is coated is detachably placed on the substrate structure, and a film on which the pattern is formed is placed on the substrate to which the photosensitive material is applied.
During the exposure operation in the exposure machine, the substrate structure, the substrate on which the photosensitive material is applied, and the film located on the substrate on which the photosensitive material is applied are preferably operated in a fixed state so that there is no relative movement.
Of course, it is preferable that the film on which the pattern is formed is in close contact with the substrate by means such as vacuum pressure on the substrate on which the photosensitive material is applied.
For convenience of explanation, the plate coated with the photosensitive material uniformly is referred to as a substrate, and a state in which the substrate is flatly spread is also referred to as a flat plate.
In general, when the photosensitive material is to be exposed, the light source generator is placed on the
The substrate to which the photosensitive material is uniformly applied may have various shapes. The photosensitive material may exist in the form of a thinly coated sheet. Of course, the sheet-like substrate may be wound in a roll form. Or a form in which the photosensitive material is thinly coated on a solid substrate which is not deformed.
The light is irradiated through a film having a pattern formed thereon through a light source, and the photosensitive material is exposed according to the shape of the pattern formed on the film by the irradiated light.
The line
The light source generating apparatus of the present invention can roughly classified into two types. Hereinafter, the present invention will be described with reference to the accompanying drawings.
First, it is constituted as one lenticurea called Lenticule which is used in the source of light of the source of light. It is a common lenticule called Lenticule which is used at this time.
Second, the lenticurea used for the source of light of the luminous source is configured as a combination of lenticureas, and a plurality of lenticules used at this time are arranged and used.
In this case, the most common configuration is a convex lenticule at the top, and a concave lenticule is arranged at the bottom of the convex lenticule.
At this time, the number of the concave lenticule is one or more than two, and in order to increase the number of divided light beams on the condensed line, the number of concave lenticulars is increased.
In the description of the present invention, first, a first form of a circular light source generating apparatus will be described, and as a further embodiment of the present invention, a second form circular light generating apparatus will be described later.
When the exposure machine is made using the line light source generator of the present invention, the line light source generator is placed on top of the film on which the pattern is formed.
In order to perform a continuous exposure operation, the linear light source device is positioned at a predetermined distance from the film so that the film can be relatively moved without friction.
Of course, the speed of the work is reduced, but for the purpose of making a device for a more precise work, it is natural that the transfer device is not provided, which also belongs to the scope of the present invention.
In case of performing the exposure work with the source of light of the source of light and the film being stopped, it is needless to say that the distance between the source of light and the film is minimized.
The exposure machine places a flat plate 8 on which the
The flat plate 8 is a substrate for forming a circuit pattern. A photosensitive layer is formed on the flat plate. The photosensitive material is exposed in the shape of the pattern of the film on the upper side of the photosensitive layer.
In order to irradiate light to the photosensitive layer on the top of the flat plate, the line
The
When light is irradiated from the linear
After the exposure operation, the exposed portion of the photosensitive material, that is, the uncured portion is removed with water or a developer to form a circuit pattern on the flat plate 8. [
2 is a perspective view showing a general convex lenticura.
As shown in Fig. 2, the convex portion of the convex portion of the
That is, each of the plurality of convex
Conventionally, a stereoscopic image screen such as a convex tentacle having such a shape has been produced.
3 is a view showing a state in which the light of the light source is focused when passing through the convex lenticula.
Each of the
After the photosensitive layer is closely attached to the lower portion of the convex lenticular, when the light of the light source is irradiated, the condensed light acts on the
That is, when light is irradiated through the convex lenticule, the exposed portion and the non-exposed portion are arranged in the photosensitive layer adhered to the lenticule.
It can be explained as a transparent body in which a plurality of convex lenses having a cylindrical shape in which a plane is formed on one surface of a convex lenticular lens and a convex lens is formed in a longitudinal direction on the other surface are arranged side by side.
There is a unique function of condensing light in the form of a line through the function of each convex lens constituting the convex lenticule called the convex lenticular.
As shown in the figure, when the light of the
The light focused on the
In the photosensitive layer, an exposing
4 is a view for explaining the vertical light generated near the center of each lenticular lens in the convex lenticura.
Through the curved surfaces of the respective lenses of the convex lenticular lens, the light received from the upper portion is condensed in a form corresponding to the curvature and transmitted to the lower portion.
At this time, the light irradiated near the central part of each lens constituting the convex lenticular is almost vertically downward in a state in which the refraction action is extremely fine.
In the curved portion of each lens constituting the convex lenticular, the light is refracted at a certain angle at a certain angle, and then the light is converged by being lowered to the lower portion. The farther away from the center of each lens, the greater the angle of refraction becomes.
In the present invention, the term " convex lenticular " refers to a convex lenticular lens composed of only a region near the central portion of each lens of the convex tentacle.
In the present invention, the light irradiated to the vertical light lenticular is almost vertically downward. In this case, of course, there is no light concentrating action at all.
In the present invention, only the regions near the central portion of each of the convex lenticular lenses called the vertical optical lenticular lens are cut out, and only the convex lenticular lens can be described as a convex lenticular lens.
The vertical light Lens Tucker functions to concentrate the light radiated from the upper portion almost vertically and transmit it to the lower portion.
In the present invention, the central region of each of the convex lenticular lenses does not exactly mean the central portion of the lens but is defined as including a region of the right and left small regions around the center of the lens.
The light received from the
In other words, in the
In the present invention, the light is condensed only in the vertical direction through the region near the central portion of each lens of the convex lenticule, which is defined as vertical light. The vertical light defined in the present invention means almost vertical.
The shape of the convex lenticule used in the linear light source device of the present invention does not mean only the vertical lenticulacular that only collects the area near the center of each lens of the convex lenticular.
The present invention can use various types of boro-tentilicurates. In that case, the efficiency of the optical circulator generating apparatus may decrease according to each mode, and these also belong to the scope of the present invention.
If a photosensitive layer is disposed under the convex portion of the convex lens and the light is irradiated through a linear light source including a vertical optical lenticular, an exposure portion is formed in the
A convex lenticule is defined as a vertical lenticule in the present invention in which the light emitted from the
Also, in the convex lenticule, the area of each lenticule lens of the convex lenticule is defined as the
Therefore, the
5 is an explanatory view for explaining a configuration of an embodiment of the vertical optical lenticular according to the present invention.
The vertical optical lenticular according to the present invention can be configured in various embodiments.
5 is a convex lenticular formed by connecting only the vertical
The vertical light lens of the present invention is characterized in that the light of the light source located at the upper portion is condensed and is transmitted almost vertically to the lower portion.
The vertical light lenticura of the present embodiment may be mechanically produced by forming a small predetermined range of shapes left and right around the center portion of each lenticula lens as a bite, and may be performed by various methods such as laser processing.
As another method, a vertical lenticular lens can be manufactured by making a small amount of lenses, then copying and connecting them.
The pitch of the vertical light lenticule is inevitably smaller than the pitch of a typical convex lenticular. This is because the lenticular lens is constituted only by the region near the central portion of each lens of the common convex lens.
In the present invention, it is preferable that the pitch of the vertical light lenticular is set to a very small pitch with a size of several tens of microns.
6 is an explanatory diagram of a method of implementing a vertical light lenticular by configuring a lens shield in a convex lenticula as another embodiment of the present invention.
In this embodiment, the
That is, opaque shields are formed in regions other than the vertical light region of each lenticular lens, thereby constituting a vertical light lenticular.
If the photosensitive layer is placed under the vertical light cantilever, the irradiated light is formed in the
FIG. 7 is an explanatory diagram illustrating a vertical light lenticura for implementing vertical light through a light transmitting slitting formed under the convex lenticula as another embodiment of the present invention.
At the bottom of the convex lenticular, a light transmitting slit is formed. The light transmitting slit is formed at the lower part of the central portion of each convex
The light transmitting slit may have a long groove or a transparent portion along the longitudinal direction of each lenticular lens.
And the light transmitting slit is supported and formed through the
The light to be irradiated is condensed through each
If the photosensitive layer is placed under the light transmitting slit, the collected condensed light is irradiated to the photosensitive layer 31 coated with the photosensitive material to form the exposed
In another embodiment of the present invention, the lens shield of the Lenticular lens shown in FIG. 6 and the light transmitting slit of the Lenticular lens shown in FIG. 7 are simultaneously formed in a lenticular.
In the present invention, when a convex lenticular lens having only a vertical light region includes at least one lens, it is referred to as a vertical lenticular lens.
In general, many lenses called Lenticular lenses are configured to have the same cross section in the longitudinal direction.
In the present invention, if the number of lenses of the lenticular lens is at least one, it is referred to as lenticular.
Therefore, it is a matter of course that the present invention also encompasses Lenticular lenses in which the number of lenticular lenses is one.
However, the larger the number of the convex lenticular lenses having the vertical light region, the shorter the exposure time becomes.
In addition, in all the embodiments of the present invention, the Fresnel lens can be placed on the upper portion of the lenticular to induce more efficient utilization of light. This also belongs to the embodiment of the present invention.
The concept of the optical circulator generating apparatus of the present invention is so important. The present invention is characterized in that the optical circulator generating device comprises a light source and a convex tentacle, and the light source and the convex tentacle are fixed without being relatively moved.
According to still another embodiment of the present invention, there is provided a linear light source generating apparatus including a light source and a lenticule combination, wherein the light source and the lenticule combination are fixed without being relatively moved. The constitution thereof will be described later.
The light sources in the present invention are various.
It is natural that LEDs and laser light sources as well as all existing types of illuminants are included.
The light source used in the present invention may be constituted by a plurality of point light sources, or may be configured in the form of a linear light source or a surface light source.
It is preferable that the light source is configured to be uniformly irradiated to the entire upper surface of the convex lenticule or to the entire upper surface area of the lenticure combination.
In the present invention, when the light emitted from the light source is irradiated onto the film through the lenticular, the light irradiated on the film appears as a plurality of line-shaped lights. That is, the number of lines corresponding to the number of lenticular lenses constituting the lenticular is irradiated to the film.
In order to uniformly irradiate the light irradiated onto the above-mentioned line over the large-area film, it is necessary to relatively transfer the light source device to the film.
Therefore, the line light source generator of the present invention can be configured to include a transfer means for transporting the line light source generator.
In order to allow the film and the circular light source generating device to move without friction, the film and the circular light source generating device are configured to be spaced apart from each other by a predetermined distance.
The present invention can form a large-area exposed portion through relative movement between the linear light source generating device and the film.
The linear light source generator is located in the upper portion of the film in the case of the exposure machine. Generally, the optical source generator is slightly spaced from the film so that the optical source generator and the film can be moved relative to each other.
However, in the case of fixing the light source device, the substrate structure formed at the lower portion may be moved. The transfer of the present invention is satisfactory if either the source of light source or the substrate structure is movable.
Since the light source device is moved in the left-right direction or the back-and-forth direction, the entire light-sensitive portion can be exposed in a short period of time.
The present invention makes it possible to perform a rapid exposure work on a wide workpiece. The linear light source device of the present invention can be transported in a scanning manner on a film to perform a rapid operation.
Even in the case of a substrate in which a photosensitive material is thinly coated on a sheet and rolled up in a roll shape, it is possible to perform a rapid operation as a scan.
However, in a special case, the above-mentioned light source generating device can be configured to be able to proceed without relative movement with the film.
In the present invention, as a specific embodiment of the conveyance means of the concentrator, it is possible to constitute the rail portion and the driving portion in the concentrator generating device. The driving portion is composed of a driving motor having a driving gear, and a lever having a driving gear engaged with the rail portion may be formed.
As described above, according to the present invention, by using the condensing function of Lenticular, it is possible to perform a clear exposure even if the thickness of the photosensitive material is several tens of microns or more, and it is possible to perform a clear exposure even if the pitch of the circuit is several microns There is no defect and it is possible to construct a clear circuit.
In the present invention, light radiated by vertical light can maximally prevent scattering and reflection of light, so that it is possible to provide an ideal, clean exposure.
Hereinafter, another embodiment of the present invention will be described in which the linear light source generating device is composed of a combination of a light source and a lenticule.
A lenticurea combination is defined as a lenticurea consisting of at least two lenticulars arranged vertically.
The most representative embodiment of the lenticurea combination is formed by laminating at least one concave lenticular on the lower part of the convex lenticular.
By using a combination of a convex lenticular and a concave lenticular, it is possible to produce a concentric circle generating device capable of more precise working.
When a luminous source generating device including a combination of a light source and a lenticule is used, condensed line-shaped light having an extremely minute width in units of nano can be produced.
When a light source is irradiated to a substrate coated with a photosensitive material by using a luminous source generating device including a combination of a light source and a lenticure, an extremely fine line-shaped light can be detected.
It is one of the important means of seeing a stereoscopic image called a bolt lenchy which we commonly know. The lens is made of a transparent material called a convex tentacle, and one surface is constituted by a plane, and the other surface is constituted by a series of lenses each having a columnar shape.
The definition of the concave lenticular used in the present invention is as follows.
Concave lenticura is made of transparent material, one side is composed of flat surface, and the other side is defined as a series of continuous lenses consisting of long bones.
8 is a perspective view of a concave lenticular.
The
When the convex lenticule and the concave lenticule are appropriately arranged and light is irradiated onto the combined lenticule assembly, the light is condensed through the convex lenticule, and the condensed light is divided into a plurality of minute lights through the concave lenticule .
Figure 9 is an embodiment of various types of lenticular assemblies.
FIG. 9A shows a concave lenticule arranged at the lower part of the convex lenticular.
Each of the columnar lenses constituting the
The central portion of the convex portion of the gentle curvature of the convex lenticular is referred to as an acid in the present invention.
Mountain boundaries are formed at the boundary between the neighboring mountains and mountains of the convex lenticule.
Each of the bony lenses constituting the concave
The central portion of the concave portion of the gentle curvature of the concave lenticular is referred to as a bone in the present invention.
In the border of the goal and the goal of the lenticulea, a goal boundary line is formed.
FIG. 9B shows the arrangement of four concave lenticules at the bottom of the convex lenticular.
The most typical form for arranging the concave lenticule is to arrange a plurality of concave lenticulars in the same form under the convex lenticule.
9B shows that the arrangement of the four
Arrange the concave lenticura upside down to produce various effects.
FIG. 9C shows an embodiment in which a concave lenticular is arranged in the lower part of the convex lenticular and a convex lenticular is formed in the lower part of the convex lenticule.
Figures 9a, 9b and 9c illustrate various embodiments of lenticular assemblies. It is a matter of course that the arrangement of the lenticule assembly can be arranged in an extremely wide variety of forms.
A plurality of convex lenticules may be arranged or a plurality of concave lenticulars may be arranged, or at least one convex lenticule and at least one concave lenticule may be arranged to use a lenticurea combination.
The lenticular assembly according to the present invention can arrange the convex lenticular and the concave lenticular in various shapes, and different effects can be produced according to the order and the method of the arrangement.
In arranging such a plurality of lenticulars, the arrangement of the upper lenticule and the lower lenticure greatly affects the function of the exposure system.
The central portion of each lens of the upper lenticulars and the central portion of each lens of the lower lenticulars may be aligned in the vertical direction in order to exert various functions. In some cases, each of the lower lenticulars The central portion of the lens of the upper lenticular lens is spaced apart from the central portion of the respective lenses of the upper lenticular by a necessary distance.
As an embodiment, a case where a convex tentacle is formed on the upper portion and a concave tentacle is formed on the lower side will be described.
When the central portion of each lens of the convex tentacle and the center portion of each lens of the concave lens are slightly spaced apart, the light on the line focused through the convex tentacle is reflected by the lower concave lens, It is divided into light on the line.
It carries out the splitting function of the circle light circle called "Otomoren Tikyu". Considering this action, the arrangement of the lenticule assembly is appropriately designed as necessary.
Hereinafter, a description will be given of how the light condensed in a line shape by the convex lenticule is divided by the concave lenticule.
This embodiment is an explanation of the case where the convex lenticular is placed on the upper side and the concave lenticular is arranged on the lower side.
The light irradiated from the light source is transmitted to the concave lenticule of the lower portion by the condensed line-shaped light of the same number as the number of lines of the lenticurea lenses by the respective lenses of the convex lenticular.
The light on the line focused by the convex lenticular is again split by the respective lenses of the concave lenticule at the bottom.
The light on the same number of converged lines as the number of the lenses of the convex lenticular is divided into the light on the lines much more than the light on the lines converged by the concave lenticule by the concave lenticule located at the bottom.
Shaped light that is condensed by the number of the respective lenses of the convex tentacle and divides the line-shaped light condensed by the convex tentacle, which is concave lenticule arranged at the lower part of the convex tentacle, .
The number of the line-shaped lights converged by the convex tentacle is divided into line-shaped lights increased in number by a number of times through the concave lenticule at the bottom.
At this time, the number of lines converged by the concave lenticular is increased by a factor of several, and the width of the line-shaped light converged at the same time is greatly reduced, thereby enabling finer exposure work.
The effect of this division of light depends on the composition and arrangement of the lenticule combination. The characteristics of the light condensed and split by the lenticular combination are first, the line width becomes thinner, and second, the number of the light in the line shape is significantly increased.
The light thus condensed and divided by the Lenticular structure allows ultrafine exposure.
In the present invention, the source of light produced through the combination of lenticurea can be made into a line-shaped light having a width of several tens of nanometers to several hundreds of nanometers.
The lenticular combination of the present invention provides an advantage that the light to be irradiated can be condensed and divided into an extremely fine line-shaped vertical light.
In the case where the luminous source generating apparatus manufactured by the combination of Lenticure is also required to be continuously operated, the luminous source generating apparatus must be moved relative to the film.
When the light source generating device is fixed, the substrate structure may be moved.
The light source generating device is configured to relatively move with respect to the film structure and the substrate structure under the film, so that the exposure of a large area can be performed promptly.
However, in the case of exposing a narrow area or performing the operation more precisely in the stationary state, the exposure operation is performed while the line light source generating device is fixed to the film and the substrate structure under the film. It is to be configured, which is also part of the present invention.
It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention as defined by the appended claims. It is not.
1: Exposure machine 2: Optical source generator
3: source of light source generating means 4: light source
5: Bolectic Cure, Lenticurea combination
6: Film 7: Photosensitive material
8: Plate 9: Substrate structure
11: Lenticular lens
34: Concerto Lenticulare
Claims (7)
The generator for beneficiation includes a light source and a lenticular assembly, wherein the light source and the lenticular assembly are not moved relative to each other.
The beneficiation generator includes a light source and a convex reticula, and the light source and the convex lenticura are not moved relative to each other.
The line light source generating device includes a light source and a convex lenticura, and the convex lenticura is configured to form a vertical light using only a central region of the convex lenient lens in which the light of the light source is vertically descended. Generator.
The line light source generator includes a light source and a convex lenticula, and the convex lentilizer is configured to form an opaque shield in a region other than the vertical light region in each lens.
The linear light source generator includes a light source and a convex lenticula, and in each lens, a lentilizer in which light transmitting slits are formed along the length of each lenticula lens in a lower portion of the center of the lens. A line light source generator comprising a cura.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120050834A KR20130127136A (en) | 2012-05-14 | 2012-05-14 | Line type light apparatus |
US14/443,396 US10197920B2 (en) | 2011-11-16 | 2012-11-15 | Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device |
EP12850328.1A EP2851751B1 (en) | 2011-11-16 | 2012-11-15 | Stepper having linear light source generating device |
PCT/KR2012/009685 WO2013073873A1 (en) | 2011-11-16 | 2012-11-15 | Linear light source generating device, exposure having linear light source generating device, and lenticular system used for linear light source generating device |
TW101142835A TWI632400B (en) | 2011-11-16 | 2012-11-16 | Line type light exposure apparatus and lenticular assembly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020120050834A KR20130127136A (en) | 2012-05-14 | 2012-05-14 | Line type light apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020190074279A Division KR20190075891A (en) | 2019-06-21 | 2019-06-21 | Line type light apparatus |
Publications (1)
Publication Number | Publication Date |
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KR20130127136A true KR20130127136A (en) | 2013-11-22 |
Family
ID=49854792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020120050834A KR20130127136A (en) | 2011-11-16 | 2012-05-14 | Line type light apparatus |
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KR (1) | KR20130127136A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015080538A2 (en) * | 2013-11-29 | 2015-06-04 | 성낙훈 | Linear light source generating device and exposure device having same |
-
2012
- 2012-05-14 KR KR1020120050834A patent/KR20130127136A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015080538A2 (en) * | 2013-11-29 | 2015-06-04 | 성낙훈 | Linear light source generating device and exposure device having same |
WO2015080538A3 (en) * | 2013-11-29 | 2015-08-13 | 성낙훈 | Linear light source generating device and exposure device having same |
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