KR20130031481A - Improved stage align device and method, and coating apparatus and printing apparatus having the same - Google Patents
Improved stage align device and method, and coating apparatus and printing apparatus having the same Download PDFInfo
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- KR20130031481A KR20130031481A KR1020110095077A KR20110095077A KR20130031481A KR 20130031481 A KR20130031481 A KR 20130031481A KR 1020110095077 A KR1020110095077 A KR 1020110095077A KR 20110095077 A KR20110095077 A KR 20110095077A KR 20130031481 A KR20130031481 A KR 20130031481A
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- Prior art keywords
- stage
- alignment
- axis
- alignment device
- substrates
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
- B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
- B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/18—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for positioning only
- B23Q3/183—Centering devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q3/00—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
- B23Q3/18—Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine for positioning only
- B23Q3/186—Aligning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Liquid Crystal (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
The present invention discloses an improved stage alignment apparatus and method and a coating apparatus and a printing apparatus having the same.
Stage alignment apparatus according to the present invention comprises one stage on which a plurality of substrates are mounted; One alignment device mounted to a lower portion of the one stage, for controlling alignment in the X, Y, Z, and θ-axis directions of the one stage; And first to fourth devices provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction. It includes a drive member.
In addition, the stage alignment method according to the present invention comprises the steps of: a) mounting a plurality of substrates on one stage; And b) controlling alignment of the one stage in the X-axis, Y-axis, Z-axis, and θ-axis directions using one alignment device mounted below the one stage.
Description
The present invention relates to an improved stage alignment apparatus and method, and a coating apparatus and a printing apparatus having the same.
More specifically, the present invention aligns two or more substrates simultaneously using one stage and one alignment device, thereby reducing the time required for alignment and thus the overall tact time. In addition, since the height difference of the plurality of substrates does not occur, the coating height / printing height is kept the same, thereby improving the coating quality / printing quality, and reducing the overall size of the coating device / printing device and the number of motors used to reduce manufacturing costs. Improved stage alignment apparatus and method which are saved, and a coating apparatus and a printing apparatus having the same.
Generally, in order to manufacture a flat panel display (FPD) such as a plasma display panel (PDP), a liquid crystal display panel (LCD) or an organic light emitting diode (OLED), a single large glass substrate or printed circuit is used. Several identical or different patterns (e.g., electrode circuit patterns, color filters, etc.) such as electrodes or dots on a printed circuit board (PCB) (hereinafter collectively referred to as "substrate") a color filter, a black matrix, or an external electromagnetic interference (EMI) filter, such patterns are for example photoresist (PR) liquid or copper (Cu), silver ( It is formed by a metal paste (hereinafter referred to collectively as " plating liquid ") such as Ag), aluminum (Al), or the like.
In order to fabricate the flat panel display (FPD) described above, the substrate must be positioned on the stage. Thereafter, for example, various processes such as a coating process or a pattern forming process, an exposure process, an etching process, or an adhesive application and bonding process are performed on a substrate located on the stage.
Figure 1a is a view showing a coating apparatus for manufacturing a FPD of the prior art.
More specifically, in the
1B is a view showing a printing apparatus for pattern formation in the prior art.
Referring to FIG. 1B, for example, a printing apparatus for forming a pattern of a gravure offset method using a gravure roll (not shown) and a
More specifically, the
In the above-described
FIG. 1C is a top view and a side view schematically showing a stage alignment apparatus according to the prior art, and FIG. 1D is a side view schematically showing a printing apparatus according to the prior art. Here, although FIG. 1D exemplarily shows a
Hereinafter, the
1C and 1D, in the
More specifically, the first to fourth driving members M1, M2, M3, and M4 are mounted on the
Therefore, when the
Thereafter, when the
For example, among the first to fourth driving members M1, M2, M3, and M4 and the fifth to eighth driving members M5, M6, M7, and M8 used in the above-described prior art, the first to third driving, for example. The members M1, M2 and M3 and the fifth to seventh driving members M5, M6 and M7 are respectively implemented as linear motors, and the fourth driving member M4 and the eighth driving member M8 are rotating motors, respectively. It can be implemented as.
In the above prior art, the use of two
As described above, in the related art, since a printing operation is performed on a
However, the above-described prior art still has the following problems.
1. Since the alignment is made for a plurality of substrates individually, the time required for alignment increases, so that the total process time increases.
2. Since the height (alignment in the Z-axis direction) of the plurality of substrates is adjusted by using the plurality of stages and the plurality of alignment devices, a step may occur between the heights H1 and H2 of the plurality of substrates (FIG. 1D). Reference). In this case, the alignment time is further increased because the
3. Even if the
4. The aligning device must be used for a plurality of stages, increasing the overall size of the coating / printing device and the number of motors used. Thus, the overall manufacturing cost is increased.
Therefore, a new method for solving the above-mentioned problems is required.
The present invention is to solve the problems of the prior art described above, by aligning two or more substrates simultaneously using one stage and one alignment device, the time required for alignment and the entire process accordingly Since the tact time is reduced and the height difference of the plurality of substrates does not occur, the coating height / print height remains the same to improve the coating quality / print quality, the overall size of the coating device / printing device and the motor used An improved stage aligning apparatus and method and a coating apparatus and a printing apparatus having the same are provided to reduce the number of s.
According to a first aspect of the present invention, there is provided a stage alignment apparatus comprising: a stage on which a plurality of substrates are mounted; One alignment device mounted to a lower portion of the one stage, for controlling alignment in the X, Y, Z, and θ-axis directions of the one stage; And first to fourth devices provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction. It characterized in that it comprises a drive member.
According to a second aspect of the present invention, a coating apparatus includes a nozzle apparatus for applying a coating liquid onto a plurality of substrates; One stage on which the plurality of substrates are mounted; A gantry mounted with the nozzle device and reciprocating on the one stage; One alignment device mounted to a lower portion of the one stage and configured to control the alignment of the one stage; A first to fourth drive provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction; absence; And a main frame on which the one alignment device is mounted.
According to a third aspect of the present invention, there is provided a printing apparatus including a printing roll transferring a printing solution corresponding to the printing pattern from a gravure roll having a printing pattern and transferring the printing pattern onto a plurality of substrates; One stage on which the plurality of substrates are mounted; A gantry rotatably supporting a rotating shaft of the printing roll and reciprocating on the one stage; An alignment device mounted below the one stage and configured to control alignment in the X-axis, Y-axis, Z-axis, and θ-axis directions of the one stage; A first to fourth drive provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction; absence; And a main frame on which the one alignment device is mounted.
A stage alignment method according to a fourth aspect of the invention comprises the steps of: a) mounting a plurality of substrates on one stage; And b) controlling alignment of the one stage in the X-axis, Y-axis, Z-axis, and θ-axis directions using one alignment device mounted below the one stage. do.
Using the improved stage alignment apparatus and method of the present invention and the coating and printing apparatus having the same, the following advantages are achieved.
1. Alignment is performed for a plurality of substrates at the same time, thereby reducing the time required for alignment and thus the overall process time.
2. Since the heights of the plurality of substrates are adjusted by using one stage and one alignment device, generation of steps between the heights of the plurality of substrates is prevented. Therefore, there is no need to move the printing roll or nozzle device up and down relative to the substrate, so that the alignment time is further reduced.
3. The coating quality / print quality is improved because the coating height / print height for the plurality of substrates remains the same.
4. Since one alignment device is used, the overall size of the coating device / printing device and the number of motors used are reduced, thereby reducing the overall manufacturing cost.
Further advantages of the present invention can be clearly understood from the following description with reference to the accompanying drawings, in which like or similar reference numerals denote like elements.
Figure 1a is a view showing a coating apparatus for manufacturing a FPD of the prior art.
1B is a view showing a printing apparatus for pattern formation in the prior art.
Figure 1c is a top view and side view schematically showing a stage alignment apparatus according to the prior art.
1D is a side view schematically showing a
2A is a top view and a side view schematically illustrating a stage alignment apparatus according to an embodiment of the present invention.
2B is a side view schematically showing a printing apparatus according to an embodiment of the present invention.
Figure 2c is a side view schematically showing a coating apparatus according to an embodiment of the present invention.
3 is a flowchart illustrating a stage alignment method according to an embodiment of the present invention.
BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described with reference to embodiments and drawings of the present invention.
FIG. 2A is a top view and a side view schematically illustrating a stage alignment device according to an embodiment of the present invention, and FIG. 2B is a side view schematically showing a printing device according to an embodiment of the present invention.
2A and 2B, a
2A and 2B together with FIG. 1B, the
In the
Hereinafter, one
2A and 2B, in the
Here, in the exemplary embodiment of the present invention, two
In addition, only one
More specifically, the first to fourth driving members M1, M2, M3, and M4 are mounted on one
As shown in FIG. 2B, when the
Thereafter, even if the
In addition, in the embodiment of the present invention, since the plurality of
Figure 2c is a side view schematically showing a coating apparatus according to an embodiment of the present invention.
Referring to FIG. 2C together with FIGS. 1A and 2A, a
In the
Hereinafter, one
Here, in the exemplary embodiment of the present invention, two
In addition, only one
More specifically, the first to fourth driving members M1, M2, M3, and M4 are mounted on one
As shown in FIG. 2B, when the
Thereafter, even though the
In addition, in the embodiment of the present invention, since the plurality of
3 is a flowchart illustrating a stage alignment method according to an embodiment of the present invention.
Referring to FIG. 3 together with FIGS. 2A to 2C, a
In the
In addition, the first to third drive members (M1, M2, M3) used in step b) are each implemented as a linear motor, and the fourth drive member (M4) used in step b) is a rotary motor. Is implemented.
Various modifications may be made by those skilled in the art without departing from the spirit and scope of the invention as defined by the following claims. It is not. Accordingly, the scope of the present invention should not be limited by the above-described exemplary embodiments, but should be determined only in accordance with the following claims and their equivalents.
100,200: coating apparatus 101,201: printing apparatus
110, 110a, 110b, 210a, 210b:
122,222: rotating shaft 130: gantry 140,140a, 140b, 240: stage
150, 150a, 150b, 250:
M1, M2, M3, M4, M5, M6, M7, M8: Drive member
Claims (10)
One stage on which a plurality of substrates are mounted;
One alignment device mounted to a lower portion of the one stage, for controlling alignment in the X, Y, Z, and θ-axis directions of the one stage; And
A first to fourth drive provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction; absence
Stage alignment apparatus comprising a.
The first to third driving members are each implemented as a linear motor,
The fourth drive member is implemented by a rotary motor
Stage alignment device.
The first to third driving members drive the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions,
The fourth driving member drives the one alignment device to rotate in the θ-axis direction.
Stage alignment device.
A nozzle device for applying the coating liquid onto the plurality of substrates;
One stage on which the plurality of substrates are mounted;
A gantry mounted with the nozzle device and reciprocating on the one stage;
One alignment device mounted to a lower portion of the one stage and configured to control the alignment of the one stage;
A first to fourth drive provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction; absence; And
A main frame on which the one alignment device is mounted
≪ / RTI >
The first to third driving members are each implemented as a linear motor,
The fourth drive member is implemented by a rotary motor
Coating device.
A printing roll which transfers the printing pattern onto a plurality of substrates by receiving a coating liquid corresponding to the printing pattern from a gravure roll having a printing pattern;
One stage on which the plurality of substrates are mounted;
A gantry rotatably supporting a rotating shaft of the printing roll and reciprocating on the one stage;
An alignment device mounted below the one stage and configured to control alignment in the X-axis, Y-axis, Z-axis, and θ-axis directions of the one stage;
A first to fourth drive provided in the one alignment device and driving the one alignment device to linearly move in the X-axis, Y-axis, and Z-axis directions and to rotate in the θ-axis direction; absence; And
A main frame on which the one alignment device is mounted
Printing apparatus comprising a.
The first to third driving members are each implemented as a linear motor,
The fourth drive member is implemented by a rotary motor
printer.
a) mounting a plurality of substrates on one stage; And
b) controlling alignment in the X, Y, Z, and θ axes of the one stage using one alignment device mounted below the one stage;
Stage alignment method comprising a.
The step b) is to linearly move the one alignment device in the X-axis, the Y-axis and the Z-axis direction by using the first to fourth drive member provided in the one alignment device, A stage alignment method performed by driving to rotate in the θ-axis direction.
The first to third driving members used in the step b) are each implemented as a linear motor,
The fourth drive member used in the step b) is implemented by a rotary motor
Stage alignment method.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020110095077A KR20130031481A (en) | 2011-09-21 | 2011-09-21 | Improved stage align device and method, and coating apparatus and printing apparatus having the same |
Applications Claiming Priority (1)
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KR1020110095077A KR20130031481A (en) | 2011-09-21 | 2011-09-21 | Improved stage align device and method, and coating apparatus and printing apparatus having the same |
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KR20130031481A true KR20130031481A (en) | 2013-03-29 |
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KR1020110095077A KR20130031481A (en) | 2011-09-21 | 2011-09-21 | Improved stage align device and method, and coating apparatus and printing apparatus having the same |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101597352B1 (en) | 2015-04-09 | 2016-02-25 | 서울과학기술대학교 산학협력단 | Stage 4 axis parallel alignment device |
-
2011
- 2011-09-21 KR KR1020110095077A patent/KR20130031481A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101597352B1 (en) | 2015-04-09 | 2016-02-25 | 서울과학기술대학교 산학협력단 | Stage 4 axis parallel alignment device |
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