KR20110130151A - A black photosensitive resin composition, color filter and liquid crystal display device having the same - Google Patents
A black photosensitive resin composition, color filter and liquid crystal display device having the same Download PDFInfo
- Publication number
- KR20110130151A KR20110130151A KR1020100049650A KR20100049650A KR20110130151A KR 20110130151 A KR20110130151 A KR 20110130151A KR 1020100049650 A KR1020100049650 A KR 1020100049650A KR 20100049650 A KR20100049650 A KR 20100049650A KR 20110130151 A KR20110130151 A KR 20110130151A
- Authority
- KR
- South Korea
- Prior art keywords
- black
- resin composition
- photosensitive resin
- mass
- acrylate
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 54
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 20
- 150000001875 compounds Chemical class 0.000 claims abstract description 36
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000002904 solvent Substances 0.000 claims abstract description 30
- 239000002041 carbon nanotube Substances 0.000 claims abstract description 27
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract description 27
- 229920005989 resin Polymers 0.000 claims abstract description 25
- 239000011347 resin Substances 0.000 claims abstract description 25
- 239000000049 pigment Substances 0.000 claims abstract description 24
- 239000006229 carbon black Substances 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 17
- 238000004040 coloring Methods 0.000 claims abstract description 16
- 230000003287 optical effect Effects 0.000 claims abstract description 8
- 239000011159 matrix material Substances 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 22
- 239000007787 solid Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 8
- 239000003999 initiator Substances 0.000 claims description 7
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 230000003449 preventive effect Effects 0.000 abstract 1
- -1 polyoxyethylene Polymers 0.000 description 61
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 33
- 239000006185 dispersion Substances 0.000 description 28
- 229920001577 copolymer Polymers 0.000 description 17
- 239000000178 monomer Substances 0.000 description 17
- 238000002360 preparation method Methods 0.000 description 16
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- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 13
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 12
- 239000002270 dispersing agent Substances 0.000 description 12
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 11
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 10
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 10
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 9
- 239000011324 bead Substances 0.000 description 8
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- 239000010408 film Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 229920000647 polyepoxide Polymers 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
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- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
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- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
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- 230000000052 comparative effect Effects 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 4
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- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 3
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Natural products CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
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- FYGHSUNMUKGBRK-UHFFFAOYSA-N 1,2,3-trimethylbenzene Chemical compound CC1=CC=CC(C)=C1C FYGHSUNMUKGBRK-UHFFFAOYSA-N 0.000 description 2
- UAJRSHJHFRVGMG-UHFFFAOYSA-N 1-ethenyl-4-methoxybenzene Chemical compound COC1=CC=C(C=C)C=C1 UAJRSHJHFRVGMG-UHFFFAOYSA-N 0.000 description 2
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 2
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 2
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- IEOSVNHEBOONLN-UHFFFAOYSA-N 2-(3-methyloxetan-3-yl)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCC1(C)COC1 IEOSVNHEBOONLN-UHFFFAOYSA-N 0.000 description 2
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- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 2
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- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/28—Interference filters
- G02B5/281—Interference filters designed for the infrared light
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
Description
본 발명은 흑색 감광성 수지 조성물, 컬러 필터 및 이를 구비한 액정 표시 장치에 관한 것이다.
The present invention relates to a black photosensitive resin composition, a color filter, and a liquid crystal display device having the same.
컬러 필터는 촬상(撮像) 소자, 액정 표시 장치(LCD) 등에 널리 이용되는 것으로, 그 응용 범위가 급속히 확대되고 있다. 컬러 액정 표시 장치나 촬상 소자 등에 사용되는 컬러 필터는 통상 블랙 매트릭스가 패턴 형상으로 형성된 기판상에 적색, 녹색 및 청색의 각 색에 상당하는 착색 재료를 함유하는 착색 감광성 수지 조성물을 사용하여 각 색에 해당되는 화소를 형성함으로써 제조되고 있다. Color filters are widely used in imaging devices, liquid crystal displays (LCDs), and the like, and their application ranges are rapidly expanding. The color filter used for a color liquid crystal display device, an image pick-up element, etc. is normally used for each color using the coloring photosensitive resin composition containing the coloring material corresponding to each color of red, green, and blue on the board | substrate with which the black matrix was formed in pattern shape. It is manufactured by forming the corresponding pixel.
특히 액정 표시 장치 중에서 횡전계 모드 박막트랜지스터 액정 표시 장치는 화소전극과 상대전극을 어레이 기판에 모두 배치시켜서 수평 방향의 강한 전계로 액정 분자들의 배열을 제어하며, 여기서 블랙 매트릭스는 컬러필터 기판과의 전계 왜곡이 방지되도록 하는 역할을 수행하기도 한다. Particularly, among the liquid crystal display devices, the transverse electric field mode thin film transistor liquid crystal display device arranges both the pixel electrode and the counter electrode on the array substrate and controls the arrangement of the liquid crystal molecules with a strong electric field in the horizontal direction, where the black matrix is an electric field with the color filter substrate. It also serves to prevent distortion.
여기서 패턴 형상으로 형성되는 블랙 매트릭스는 통상 카본 블랙을 포함하는 흑색 감광성 수지 조성물로 형성하게 된다. 그러나, 기존의 흑색 감광성 수지 조성물을 사용하여 형성되는 블랙매트릭스를 형성할 경우 표시영역 외곽에서 어레이 기판의 게이트 팬-아 웃(gate Fan-Out)부와 컬러필터 기판의 수지 블랙매트릭스간에 원치 않는 전계가 발생되어 빛샘 현상이 발생되는 문제가 있다. 그에 따라 흑색 감광성 수지 조성물로 빛샘을 방지하기 위하여 저저항의 블랙매트릭스를 형성할 수 있는 것이 요구되고 있다. 특히 기존의 흑색 감광성 수지 조성물의 경우 카본 블랙만을 포함함에 따라 550nm 부근에서의 광학밀도(Optical density: OD)는 우수하나, 700nm 이상에서의 OD가 현저히 떨어져 OD 값 3.0 미만에서 나타나는 붉은색의 빛샘 현상이 발생되는 문제가 있다.
Here, the black matrix formed in a pattern shape is usually formed of a black photosensitive resin composition containing carbon black. However, when forming a black matrix formed using the existing black photosensitive resin composition, an unwanted electric field is formed between the gate fan-out portion of the array substrate and the resin black matrix of the color filter substrate outside the display area. There is a problem that the light leakage phenomenon occurs. Accordingly, in order to prevent light leakage with the black photosensitive resin composition, it is required to be able to form a low resistance black matrix. In particular, in the case of the conventional black photosensitive resin composition, the optical density (OD) is excellent at around 550 nm because only carbon black is included, but the red light leakage phenomenon appears at an OD value of less than 3.0 due to a significant decrease in OD at 700 nm or more. There is a problem that arises.
본 발명은 빛샘 현상 방지를 위하여 저저항의 블랙매트릭스를 형성할 수 있을 뿐만 아니라 높은 OD값을 갖는 흑색 감광성 수지 조성물을 제공하는데 그 목적이 있다. An object of the present invention is to provide a black photosensitive resin composition having a high OD value as well as forming a low resistance black matrix to prevent light leakage.
또한 본 발명은 상기 흑색 감광성 수지 조성물을 이용하여 형성된 저저항 및 높은 OD값을 갖는 블랙 매트릭스를 포함하는 컬러 필터를 제공하는데 다른 목적이 있다.Another object of the present invention is to provide a color filter including a black matrix having a low resistance and a high OD value formed using the black photosensitive resin composition.
또한 본 발명은 상기 컬러 필터를 구비한 액정 표시 장치를 제공하는데 또 다른 목적이 있다.
Another object of the present invention is to provide a liquid crystal display device having the color filter.
상기의 목적을 달성하기 위한 본 발명은 흑색 안료를 포함하는 착색 재료(A), 알칼리 가용성 수지(B), 광중합성 화합물(C), 광중합 개시제(D), 카본나노튜브(E) 및 용제(F)를 포함하여 이루어는 것을 특징으로 하는 흑색 감광성 수지 조성물을 제공한다. The present invention for achieving the above object is a coloring material containing a black pigment (A), alkali-soluble resin (B), photopolymerizable compound (C), photopolymerization initiator (D), carbon nanotube (E) and a solvent ( It provides the black photosensitive resin composition characterized by including the F).
본 발명의 다른 목적을 달성하기 위하여 본 발명은 기판 상부에 본 발명에 따른 흑색 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광 및 현상하여 형성되는 블랙 매트릭스를 포함하는 것을 특징으로 하는 컬러 필터를 제공한다.In order to achieve the other object of the present invention, the present invention provides a color filter comprising a black matrix formed by applying the black photosensitive resin composition according to the present invention on a substrate and exposed and developed in a predetermined pattern. .
본 발명의 또 다른 목적을 달성하기 위하여 본 발명은 상기 컬러 필터를 구비한 것을 특징으로 하는 액정 표시 장치를 제공한다.
In order to achieve the another object of the present invention, the present invention provides a liquid crystal display device comprising the above-mentioned color filter.
본 발명에 따른 흑색 감광성 수지 조성물은 저저항 및 4.0 이상의 높은 OD값을 가짐에 따라 빛샘 현상을 효과적으로 방지할 수 있다. 따라서 상기한 본 발명에 따른 흑색 감광성 수지 조성물을 칼러필터의 블랙매트릭스 형성에 사용시 빛샘을 효과적으로 방지할 수 있다.
The black photosensitive resin composition according to the present invention can effectively prevent light leakage as it has a low resistance and a high OD value of 4.0 or more. Therefore, when the black photosensitive resin composition according to the present invention is used for forming the black matrix of the color filter, light leakage can be effectively prevented.
이하, 본 발명을 상세하게 설명한다.
EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.
본 발명에 따른 흑색 감광성 수지 조성물은 흑색 안료를 포함하는 착색 재료(A), 알칼리 가용성 수지(B), 광중합성 화합물(C), 광중합 개시제(D), 카본나노튜브(E) 및 용제(F)를 포함하여 이루어진다. 또한 특별히 제한되지는 않으나, 상기 흑색 감광성 수지 조성물은 선택적으로 첨가제(F)를 더 포함할 수 있다.
The black photosensitive resin composition according to the present invention comprises a coloring material (A), an alkali-soluble resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), a carbon nanotube (E) and a solvent (F) containing a black pigment. ) In addition, although not particularly limited, the black photosensitive resin composition may optionally further include an additive (F).
이하, 본 발명의 흑색 감광성 수지 조성물에 포함되는 각 성분에 대하여 보다 상세하게 설명한다. Hereinafter, each component contained in the black photosensitive resin composition of this invention is demonstrated in detail.
착색 재료(A)Coloring material (A)
상기 착색 재료는 흑색 안료를 포함한다. The coloring material comprises a black pigment.
상기 흑색 안료는 구체적으로 아닐린 블랙, 아닐린 블랙, 퍼릴렌 블랙, 티탄 블랙 및 카본블랙으로 이루어진 군으로부터 선택되는 적어도 하나를 포함할 수 있다. The black pigment may specifically include at least one selected from the group consisting of aniline black, aniline black, perylene black, titanium black, and carbon black.
바람직하게 상기 흑색 안료는 카본 블랙일 수 있으며, 상기 카본 블랙은 차광성이 있는 것이라면 특별히 제한 없이 공지된 카본 블랙을 사용할 수 있다. Preferably, the black pigment may be carbon black, and the carbon black may be a known carbon black without particular limitation as long as it is light-shielding.
상기 카본 블랙은 구체적으로 채널 블랙(channel black), 퍼니스 블랙(furnace black), 서멀 블랙(thermal black), 램프 블랙(lamp black) 등을 예시할 수 있다. 이들은 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다. The carbon black may specifically include a channel black, a furnace black, a thermal black, a lamp black, and the like. These can be used individually or in combination of 2 or more, respectively.
상기 카본 블랙은 수지가 피복된 것일 수도 있다. 상기 수지가 피복된 카본 블랙은 수지가 피복되어 있지 않은 카본 블랙에 비해 도전성이 낮기 때문에 블랙 매트릭스 또는 블랙 컬럼 스페이서 형성 시에 우수한 전기 절연성을 부여 할 수 있다. The carbon black may be coated with a resin. Since the carbon black coated with the resin has lower conductivity than the carbon black coated with the resin, it is possible to provide excellent electrical insulation when forming the black matrix or the black column spacer.
상기 착색 재료는 필요에 따라서 선택적으로 색보정제를 더 포함할 수 있다. 상기 색보정제로는 안트라퀴논계 안료 또는 페릴렌계 안료 등의 축합다환 안료, 프탈로시아닌 안료 또는 아조안료 등의 유기안료를 사용할 수 있다.The coloring material may optionally further include a color correction agent. As the color correction agent, organic pigments such as condensed polycyclic pigments such as anthraquinone pigments or perylene pigments, phthalocyanine pigments or azo pigments may be used.
상기 착색 재료는 흑색 감광성 수지 조성물 중의 고형분 함량에 대하여 질량 분율로 20 내지 70질량%, 바람직하게는 30 내지 65질량%로 포함될 수 있다. 상기 착색 재료가 상기 기준으로 20 내지 70질량% 포함되는 경우에는 박막을 형성하여도 평균 4.0이상의 높은 OD 값을 얻을 수 있으며, 현상시 잔사가 발생하기 어려움으로 바람직하다. 본 발명에서 흑색 감광성 수지 조성물 중의 고형분 함량이란 용제를 제외한 나머지 성분의 총 함량을 의미한다.
The coloring material may be contained in a mass fraction of 20 to 70% by mass, preferably 30 to 65% by mass relative to the solids content in the black photosensitive resin composition. When the coloring material is included in 20 to 70% by mass based on the above reference, even if a thin film is formed, a high OD value of 4.0 or more can be obtained on average, and it is preferable because residues hardly occur during development. In the present invention, the solid content in the black photosensitive resin composition means the total content of the remaining components except for the solvent.
상기 착색 재료로 포함되는 흑색 안료는 그 입경이 균일한 것을 사용하는 것이 바람직하다. 흑색 안료의 입경을 균일하게 하는 방법으로서는, 안료 분산제를 함유시켜 분산 처리를 행하는 방법 등을 들 수 있으며, 이 방법에 따르면 안료가 용액 중에 균일하게 분산된 상태의 안료 분산액을 얻을 수 있다. As for the black pigment contained in the said coloring material, it is preferable to use the thing with the uniform particle size. As a method of making the particle size of a black pigment uniform, the method of containing a pigment dispersing agent and performing a dispersion process is mentioned, According to this method, the pigment dispersion liquid of the state in which the pigment was disperse | distributed uniformly in the solution can be obtained.
상기 안료 분산제로서는, 예를 들면 양이온계, 음이온계, 비이온계, 양성계, 폴리에스테르계, 폴리아민계, 폴리아크릴계 등의 계면 활성제 등을 들 수 있으며, 이들은 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다. Examples of the pigment dispersant include surfactants such as cationic, anionic, nonionic, amphoteric, polyester, polyamine, and polyacryl, and the like, each of which may be used alone or in combination of two or more. Can be used.
상기의 계면 활성제로서는 구체적으로 폴리옥시에틸렌알킬에테르류, 폴리옥시에틸렌알킬페닐에테르류, 폴리에틸렌글리콜디에스테르류, 소르비탄지방산에스테르류, 지방산변성폴리에스테르류, 3급아민변성폴리우레탄류, 폴리에틸렌이민류 등을 들 수 있으며, 이외에 상품명으로 KP(신에쯔 가가꾸 고교㈜ 제조), 폴리플로우(POLYFLOW)(교에이샤 가가꾸㈜ 제조), 에프톱(EFTOP)(토켐 프로덕츠사 제조), 메가팩(MEGAFAC)(다이닛본 잉크 가가꾸 고교㈜ 제조), 플로라드(Flourad)(스미또모 쓰리엠㈜ 제조), 아사히가드(Asahi guard), 서플론(Surflon)(이상, 아사히 글라스㈜ 제조), 솔스퍼스(SOLSPERSE)(Lubrisol사 제조), EFKA(EFKA 케미칼스사 제조), PB 821(아지노모또㈜ 제조), Disperbyk-series(BYK-chemi사 제조) 등을 들 수 있다.Specific examples of the surfactant include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, polyethylene glycol diesters, sorbitan fatty acid esters, fatty acid modified polyesters, tertiary amine modified polyurethanes, and polyethyleneimines. And KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), EFTOP (manufactured by Tochem Products), and Mega. MEGAFAC (made by Dainippon Ink & Chemicals Co., Ltd.), Florad (made by Sumitomo 3M Co., Ltd.), Asahi guard, Suflon (above, manufactured by Asahi Glass Co., Ltd.), Sol SOLPERSE (made by Lubrisol), EFKA (made by EFKA Chemicals), PB 821 (made by Ajinomoto Co., Ltd.), Disperbyk-series (made by BYK-chemi), etc. are mentioned.
상기 안료 분산제는 착색재료 1질량부에 대하여 통상 1질량부 이하로 사용되며, 바람직하게는 0.05 내지 0.5질량부로 사용될 수 있다. 상기 안료 분산제가 상기의 기준으로 0.05 내지 0.5질량부 범위내로 사용될 경우 균일한 입경의 안료를 얻을 수 있기 때문에 바람직하다.
The pigment dispersant is usually used in an amount of 1 parts by mass or less with respect to 1 part by mass of the coloring material, preferably from 0.05 to 0.5 parts by mass. When the said pigment dispersant is used in 0.05-0.5 mass part on the said reference | standard, since a pigment of uniform particle size can be obtained, it is preferable.
알칼리 가용성 수지(B)Alkali-soluble resin (B)
상기 알칼리 가용성 수지는 본 발명의 용제에 용해될 수 있고 광 또는 열의 작용에 대한 반응성을 가지며, 상기 착색 재료에 대한 결착 수지의 기능을 하고 알칼리성 현상액에 용해 가능한 수지라면 제한 없이 사용할 수 있다. The alkali-soluble resin can be used without limitation as long as it can be dissolved in the solvent of the present invention, has a reactivity to the action of light or heat, functions as a binder resin for the coloring material, and can be dissolved in an alkaline developer.
바람직하게 상기 알칼리 가용성 수지는 아크릴계 공중합체를 포함할 수 있다. 상기 아크릴계 공중합체는 구체적으로 카르복실기 함유 단량체 및 상기 단량체와 공중합 가능한 다른 단량체와의 공중합체를 예시할 수 있다. Preferably the alkali-soluble resin may comprise an acrylic copolymer. The acrylic copolymer may specifically exemplify a copolymer of a carboxyl group-containing monomer and another monomer copolymerizable with the monomer.
상기 카르복실기 함유 단량체는 구체적으로 불포화 모노카르복실산, 불포화 디카르복실산 또는 불포화 다가 카르복실산와 같이 분자 중에 1개 이상의 카르복실기를 갖는 불포화 카르복실산을 예시할 수 있다. The carboxyl group-containing monomer may specifically exemplify an unsaturated carboxylic acid having one or more carboxyl groups in the molecule, such as unsaturated monocarboxylic acid, unsaturated dicarboxylic acid or unsaturated polyvalent carboxylic acid.
상기 불포화 모노카르복실산으로서는, 예를 들면 아크릴산, 메타아크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. As said unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
상기 불포화 디카르복실산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. As said unsaturated dicarboxylic acid, a maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
상기 불포화 다가 카르복실산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
상기 불포화 다가 카르복실산은 그의 모노(2-메타크릴로일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산모노(2-아크릴로일옥시에틸), 숙신산모노(2-메타크릴로일옥시에틸), 프탈산모노(2-아크릴로일옥시에틸), 프탈산모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. 또한, 상기 불포화 다가 카르복실산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤모노아크릴레이트, ω-카르복시폴리카프로락톤모노메타크릴레이트 등을 들 수 있다. The unsaturated polyhydric carboxylic acid may be a mono (2-methacryloyloxyalkyl) ester thereof, for example, mono succinate (2-acryloyloxyethyl), mono succinate (2-methacryloyloxyethyl) And mono phthalate (2-acryloyloxyethyl) and mono phthalate (2-methacryloyloxyethyl). In addition, the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, for example, ω-carboxypolycaprolactone monoacrylate, ω-carboxypolycaprolactone monomethacrylate, or the like. Can be mentioned.
상기 카르복실기 함유 단량체들은 각각 단독으로 또는 둘 이상을 혼합하여 사용할 수 있다.
The carboxyl group-containing monomers may be used alone or in combination of two or more.
상기 카르복실기 함유 단량체와 공중합 가능한 다른 단량체는 구체적으로 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에닐메타크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복실산 에스테르류; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복실산 아미노알킬에스테르류; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복실산 글리시딜에스테르류; 3-메틸-3-아크릴옥시메틸옥세탄, 3-메틸-3-메타크릴옥시메틸옥세탄, 3-에틸-3-아크릴옥시메틸옥세탄, 3-에틸-3-메타크릴옥시메틸옥세탄, 3-메틸-3-아크릴옥시에틸옥세탄, 3-메틸-3-메타크릴옥시에틸옥세탄, 3-메틸-3-아크릴옥시에틸옥세탄, 3-메틸-3-메타크릴옥시에틸옥세탄 등의 불포화 옥세탄카르복실레이트 화합물; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복실산 비닐에스테르류; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르류; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, N-페닐말레이미드. N-시클로헥실말레이미드 등의 불포화 이미드류; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류 등을 예시할 수 있다. 이들 단량체는 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다. Other monomers copolymerizable with the carboxyl group-containing monomer are specifically styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene , p-methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl Aromatic vinyl compounds such as glycidyl ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxy Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl Relate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nylacrylate, dicyclopentadienyl methacrylate, 2-hydroxy-3-phenoxy Acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, unsaturated carboxylic acid esters such as glycerol monoacrylate, glycerol monomethacrylate; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxyl such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate and 3-dimethylaminopropyl methacrylate Acid aminoalkyl esters; Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate; 3-methyl-3-acryloxymethyloxetane, 3-methyl-3-methacryloxymethyloxetane, 3-ethyl-3-acryloxymethyloxetane, 3-ethyl-3-methacryloxymethyloxetane, 3-methyl-3-acryloxyethyl oxetane, 3-methyl-3-methacryloxyethyl oxetane, 3-methyl-3-acryloxyethyl oxetane, 3-methyl-3- methacryloxyethyl oxetane, etc. Unsaturated oxetanecarboxylate compounds; Carboxylic acid vinyl esters such as vinyl acetate, vinyl propionate, vinyl butyrate and vinyl benzoate; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Maleimide, N-phenylmaleimide. Unsaturated imides such as N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; Polystyrene, polymethyl acrylate, polymethyl methacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, having a monoacryloyl group or a monomethacryloyl group at the terminal of the polymer molecular chain of polysiloxane Giant monomers etc. can be illustrated. These monomers can be used individually or in combination of 2 or more, respectively.
상기 아크릴계 공중합체로서는, 예를 들면 (메타)아크릴산/메틸(메타)아크릴레이트 공중합체, (메타)아크릴산/벤질(메타)아크릴레이트 공중합체, (메타)아크릴산/2-히드록시에틸(메타)아크릴레이트/벤질(메타)아크릴레이트 공중합체, (메타)아크릴산/메틸(메타)아크릴레이트/폴리스틸렌 거대 단량체 공중합체, (메타)아크릴산/메틸(메타)아크릴레이트/폴리메틸(메타)아크릴레이트 거대 단량체 공중합체, (메타)아크릴산/벤질(메타)아크릴레이트/폴리스틸렌 거대 단량체 공중합체, (메타)아크릴산/벤질(메타)아크릴레이트/폴리메틸(메타)아크릴레이트 거대 단량체 공중합체, (메타)아크릴산/2-히드록시에틸(메타)아크릴레이트/벤질(메타)아크릴레이트/폴리스티렌 거대 단량체 공중합체, (메타)아크릴산/2-히드록시에틸(메타)아크릴레이트/벤질(메타)아크릴레이트/폴리메틸(메타)아크릴레이트 거대 단량체 공중합체, (메타)아크릴산/스티렌/벤질(메타)아크릴레이트/N-페닐말레이미드 공중합체, (메타)아크릴산/숙신산 모노(2-아크릴로일옥시)/스티렌/벤질(메타)아크릴레이트/N-페닐말레이미드 공중합체, (메타)아크릴산/숙신산 모노(2-아크릴로일옥시에틸)/스티렌/알릴(메타)아크릴레이트/N-페닐말레이미드 공중합체, (메타)아크릴산/벤질(메타)아크릴레이트/N-페닐말레이미드/스티렌/글리세롤모노(메타)아크릴레이트 공중합체 등을 들 수 있다. 여기서 (메타)아크릴레이트는 아크릴레이트 또는 메타크릴레이트를 의미한다.
As said acrylic copolymer, a (meth) acrylic acid / methyl (meth) acrylate copolymer, a (meth) acrylic acid / benzyl (meth) acrylate copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth), for example Acrylate / benzyl (meth) acrylate copolymer, (meth) acrylic acid / methyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / methyl (meth) acrylate / polymethyl (meth) acrylate macro Monomer copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / benzyl (meth) acrylate / polymethyl (meth) acrylate macromonomer copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate / polystyrene macromonomer copolymer, (meth) acrylic acid / 2-hydroxyethyl (meth) acrylate / benzyl (meth) acrylate Yate / polymethyl (meth) acrylate macromonomer copolymer, (meth) acrylic acid / styrene / benzyl (meth) acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / succinic acid mono (2-acryloyloxy ) / Styrene / benzyl (meth) acrylate / N-phenylmaleimide copolymer, (meth) acrylic acid / succinic acid mono (2-acryloyloxyethyl) / styrene / allyl (meth) acrylate / N-phenylmaleimide A copolymer, (meth) acrylic acid / benzyl (meth) acrylate / N-phenylmaleimide / styrene / glycerol mono (meth) acrylate copolymer, etc. are mentioned. Here (meth) acrylate means acrylate or methacrylate.
상기 알칼리 가용성 수지의 폴리스티렌 환산 중량평균분자량은 통상 5,000 내지 50,000이고, 바람직하게는 8,000 내지 40,000이며, 보다 바람직하게는 10,000 내지 35,000이고, 가장 바람직하게는 10,000 내지 30,000이다. 알칼리 가용성 수지의 분자량이 5,000 내지 50,000인 경우에는 도막 경도가 향상되고, 잔막률도 높으며, 미노광부의 현상액에 대한 용해성이 양호하기 때문에 바람직하다.The polystyrene reduced weight average molecular weight of the alkali-soluble resin is usually 5,000 to 50,000, preferably 8,000 to 40,000, more preferably 10,000 to 35,000, and most preferably 10,000 to 30,000. When the molecular weight of alkali-soluble resin is 5,000-50,000, since coating film hardness improves, a residual film rate is also high and the solubility to the developing solution of an unexposed part is favorable, it is preferable.
상기 알칼리 가용성 수지의 산가는 통상 50 내지 150(KOH ㎎/g)이고, 바람직하게는 60 내지 140이며, 보다 바람직하게는 80 내지 135이고, 가장 바람직하게는 80 내지 130이다. 산가가 50 내지 150인 경우에는 현상액에 대한 용해성이 향상되어 미노광부가 쉽게 용해되고, 고감도화되어 현상시 노광부의 패턴이 남아 잔막률이 향상되기 때문에 바람직하다. 여기서 산가란, 아크릴계 중합체 1g을 중화하는데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값이며, 통상적으로 수산화칼륨 수용액을 사용하여 적정함으로써 구할 수 있다. The acid value of the said alkali-soluble resin is 50-150 (KOHmg / g) normally, Preferably it is 60-140, More preferably, it is 80-135, Most preferably, it is 80-130. When the acid value is 50 to 150, the solubility in the developing solution is improved, so that the unexposed portion is easily dissolved, the sensitivity is increased, and the pattern of the exposed portion at the time of development remains, so that the residual film ratio is improved. The acid value is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer, and can be determined by titration using an aqueous potassium hydroxide solution.
상기 알칼리 가용성 수지는 본 발명의 흑색 감광성 수지 조성물 중의 고형분 함량에 대하여 질량 분율로 10 내지 40질량%로 포함될 수 있으며, 12내지 38질량%로 포함되는 것이 더욱 바람직하다. 상기 알칼리 가용성 수지가 상기의 기준으로 10 내지 40질량% 포함되는 경우에는 패턴의 형성이 가능하고, 잔막률이 향상되므로 바람직하다.
The alkali-soluble resin may be included in a mass fraction of 10 to 40% by mass relative to the solids content in the black photosensitive resin composition of the present invention, more preferably 12 to 38% by mass. When 10-40 mass% of said alkali-soluble resin is contained on the said reference | standard, since formation of a pattern is possible and a residual film ratio improves, it is preferable.
광중합성 화합물(C)Photopolymerizable Compound (C)
상기 광중합성 화합물(C)은 광 및 후술하는 광중합 개시제의 작용으로 중합할 수 있는 화합물로서 제한이 없으며, 바람직하게 상기 광중합성 화합물(C)은 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체 등을 들 수 있으며, 이들은 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다. The photopolymerizable compound (C) is not limited as a compound capable of polymerizing under the action of light and a photopolymerization initiator described below. Preferably, the photopolymerizable compound (C) is a monofunctional monomer, a bifunctional monomer, or another polyfunctional monomer. These can be mentioned, These can be used individually or in combination of 2 or more, respectively.
상기 단관능 단량체의 구체적인 예로는 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다. Specific examples of the monofunctional monomers include nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate and N-vinylpyrroly Money, etc.
상기 2관능 단량체의 구체적인 예로는 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다. Specific examples of the bifunctional monomers include 1,6-hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, triethylene glycol di (meth) acrylate, Bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, etc. are mentioned.
그 밖의 다관능 단량체의 구체적인 예로는 트리메틸올프로판트리(메타)아크릴레이트, 에톡실레이티드트리메틸올프로판트리(메타)아크릴레이트, 프로폭실레이티드트리메틸올프로판트리(메타)아크릴레이트, 펜타에리트리톨트리(메타)아크릴레이트, 펜타에리트리톨테트라(메타)아크릴레이트, 디펜타에리트리톨펜타(메타)아크릴레이트, 에톡실레이티드디펜타에리트리톨헥사(메타)아크릴레이트, 프로폭실레이티드디펜타에리트리톨헥사(메타)아크릴레이트, 디펜타에리트리톨헥사(메타)아크릴레이트 등을 들 수 있다. Specific examples of other polyfunctional monomers include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylolpropane tri (meth) acrylate, propoxylated trimethylolpropane tri (meth) acrylate, pentaerythritol Tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (meth) acrylate, propoxylated dipentaeryte Lithol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc. are mentioned.
이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다.
Of these, bifunctional or higher polyfunctional monomers are preferably used.
상기 광중합성 화합물은 흑색 감광성 수지 조성물 중의 고형분 함량에 대하여 질량 분율로 3 내지 40질량%로 포함되는 것이 바람직하고, 특히 5 내지 30질량% 포함되는 것이 더욱 바람직하다. 상기 광중합성 화합물이 상기의 기준으로 1 내지 40질량% 포함되는 경우 노광부의 강도 및 평활성이 양호하게 되기 때문에 바람직하다.
It is preferable that the said photopolymerizable compound is contained in 3-40 mass% by mass fraction with respect to solid content in a black photosensitive resin composition, and it is more preferable that 5-30 mass% is contained especially. When 1-40 mass% of said photopolymerizable compounds are contained on the said reference | standard, since the intensity | strength and smoothness of an exposure part become favorable, it is preferable.
광중합 개시제(D)Photopolymerization Initiator (D)
상기 광중합 개시제는 제한되지 않으며, 바람직하게는 트리아진계 화합물, 아세토페논계 화합물, 비이미다졸계 화합물 및 옥심 화합물로 이루어지는 군으로부터 선택되는 적어도 하나를 사용할 수 있다. The photopolymerization initiator is not limited, and preferably at least one selected from the group consisting of a triazine compound, an acetophenone compound, a biimidazole compound, and an oxime compound may be used.
상기 트리아진계 화합물로서는, 예를 들면 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다.
As said triazine type compound, it is 2, 4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1, 3, 5- triazine, 2, 4-bis (trichloromethyl)-, for example. 6- (4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4- Bis (trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2 -Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-tri Azine, 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloro Methyl) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine and the like.
상기 아세토페논계 화합물로서는, 예를 들면 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온의 올리고머 등을 들 수 있다.
As said acetophenone type compound, diethoxy acetophenone, 2-hydroxy-2-methyl-1- phenyl propane- 1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2- Hydroxyethoxy) phenyl] -2-methylpropane-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one , 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane- 1-one oligomer etc. are mentioned.
또한 상기 아세토페논계 화합물은 하기 화학식 1로 표시되는 화합물일 수 있다. In addition, the acetophenone-based compound may be a compound represented by the following formula (1).
<화학식 1><Formula 1>
상기 화학식 1에서 R1 내지 R4는 각각 독립적으로 수소 원자, 할로겐 원자, 수산기, 탄소수 1 내지 12의 알킬기에 의해 치환될 수도 있는 페닐기, 탄소수 1 내지 12의 알킬기에 의해 치환될 수도 있는 벤질기 또는 탄소수 1 내지 12의 알킬기에 의해 치환될 수도 있는 나프틸기를 나타낸다. In Formula 1, R 1 to R 4 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a phenyl group which may be substituted by an alkyl group having 1 to 12 carbon atoms, a benzyl group which may be substituted by an alkyl group having 1 to 12 carbon atoms, or The naphthyl group which may be substituted by the C1-C12 alkyl group is shown.
상기 화학식 1로 표시되는 화합물의 구체적인 예로는 2-메틸-2-아미노(4-모르폴리노페닐)에탄-1-온, 2-에틸-2-아미노(4-모르폴리노페닐)에탄-1-온, 2-프로필-2-아미노(4-모르폴리노페닐)에탄-1-온, 2-부틸-2-아미노(4-모르폴리노페닐)에탄-1-온, 2-메틸-2-아미노(4-모르폴리노페닐)프로판-1-온, 2-메틸-2-아미노(4-모르폴리노페닐)부탄-1-온, 2-에틸-2-아미노(4-모르폴리노페닐)프로판-1-온, 2-에틸-2-아미노(4-모르폴리노페닐)부탄-1-온, 2-메틸-2-메틸아미노(4-모르폴리노페닐)프로판-1-온, 2-메틸-2-디메틸아미노(4-모르폴리노페닐)프로판-1-온, 2-메틸-2-디에틸아미노(4-모르폴리노페닐)프로판-1-온 등을 들 수 있다.
Specific examples of the compound represented by Formula 1 include 2-methyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-ethyl-2-amino (4-morpholinophenyl) ethane-1 -One, 2-propyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-butyl-2-amino (4-morpholinophenyl) ethan-1-one, 2-methyl-2 -Amino (4-morpholinophenyl) propane-1-one, 2-methyl-2-amino (4-morpholinophenyl) butan-1-one, 2-ethyl-2-amino (4-morpholino Phenyl) propane-1-one, 2-ethyl-2-amino (4-morpholinophenyl) butan-1-one, 2-methyl-2-methylamino (4-morpholinophenyl) propan-1-one , 2-methyl-2-dimethylamino (4-morpholinophenyl) propan-1-one, 2-methyl-2-diethylamino (4-morpholinophenyl) propan-1-one, etc. may be mentioned. .
상기 비이미다졸 화합물로서는, 예를 들면 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있다. 이들 중에서 2,2'비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸이 바람직하게 사용될 수 있다.
As said biimidazole compound, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'- tetraphenyl biimidazole, 2,2'-bis (2,3-, for example) Dichlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimi Dazole, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, and a phenyl group at the 4,4', 5,5 'position is carbo The imidazole compound substituted with the alkoxy group etc. are mentioned. Among them, 2,2'bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4', 5,5'-tetraphenylbiimidazole can be preferably used.
상기의 옥심 화합물로서는, 예를 들면 하기의 화학식 2 내지 4로 표시되는 화합물 등을 들 수 있다. As said oxime compound, the compound etc. which are represented by following General formula (2)-4 are mentioned, for example.
<화학식 2> <Formula 2>
<화학식 3> <Formula 3>
<화학식 4> <Formula 4>
또한, 상술한 광중합 개시제 이외에 본 발명의 효과를 손상하지 않는 정도이면 이 분야에서 통상 사용되고 있는 그 밖의 광중합 개시제 등을 추가로 병용할 수도 있다. 그 밖의 광중합 개시제로서는, 예를 들면 벤조인계 화합물, 벤조페논계 화합물, 티오크산톤계 화합물, 안트라센계 화합물, 다관능티올화합물 등을 들 수 있다. 이들은 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다. Moreover, in addition to the photoinitiator mentioned above, the other photoinitiator etc. which are normally used in this field can also be used together if it is a grade which does not impair the effect of this invention. As another photoinitiator, a benzoin compound, a benzophenone type compound, a thioxanthone type compound, an anthracene type compound, a polyfunctional thiol compound, etc. are mentioned, for example. These can be used individually or in combination of 2 types or more, respectively.
상기 벤조인계 화합물로서는, 예를 들면, 벤조인, 벤조인메틸에테르, 벤조인에틸에테르, 벤조인이소프로필에테르, 벤조인이소부틸에테르 등을 들 수 있다. As said benzoin type compound, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, etc. are mentioned, for example.
상기 벤조페논계 화합물로서는, 예를 들면 벤조페논, 0-벤조일벤조산메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등을 들 수 있다. As said benzophenone type compound, for example, benzophenone, methyl 0- benzoyl benzoate, 4-phenyl benzophenone, 4-benzoyl-4'- methyl diphenyl sulfide, 3, 3 ', 4, 4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, etc. are mentioned.
상기 티오크산톤계 화합물로서는, 예를 들면 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등을 들 수 있다. As said thioxanthone type compound, 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. Can be mentioned.
상기 안트라센계 화합물로서는, 예를 들면 9,10-디메톡시안트라센, 2-에틸-9,10-디메톡시안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디에톡시안트라센 등을 들 수 있다. Examples of the anthracene-based compound include 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-diethoxyanthracene, and the like. Can be mentioned.
상기 다관능티올화합물로서는, 예를 들면, 트리스-(3-머캅토프로피온일옥시)-에틸-이소시아눌레이트, 트리메틸올프로판트리스-3-머캅토프로피오네이트, 펜타에리트리톨테트라키스-3-머캅토프로피오네이트, 디펜타에리트리톨테트라키스-3-머캅토프로피오네이트 등을 들 수 있다. Examples of the polyfunctional thiol compound include tris- (3-mercaptopropionyloxy) -ethyl-isocyanurate, trimethylolpropanetris-3-mercaptopropionate, and pentaerythritol tetrakis-3. Mercaptopropionate, dipentaerythritol tetrakis-3-mercaptopropionate, and the like.
그 밖에 2,4,6-트리메틸벤조일디페닐포스핀옥시드, 10-부틸-2-클로로아크리돈, 2-에틸안트라퀴논, 벤질, 9,10-페난트렌퀴논, 캄포퀴논, 페닐클리옥실산 메틸, 티타노센 화합물 등을 그 밖의 광중합 개시제로서 들 수 있다.
Other 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 10-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, phenylclioxylic acid Methyl, a titanocene compound, etc. are mentioned as another photoinitiator.
상기 광중합 개시제는 광중합 개시 보조제(D-1)를 조합하여 사용할 수도 있다. 상기 광중합 개시제에 광중합 개시 보조제를 병용하면, 이들을 함유하는 흑색 감광성 수지 조성물은 더욱 고감도가 되어 이를 사용하여 블랙 매트릭스를 형성할 때 생산성이 향상되므로 바람직하다. The photoinitiator may be used in combination with a photopolymerization initiation aid (D-1). When a photopolymerization start adjuvant is used together with the said photoinitiator, the black photosensitive resin composition containing these is more sensitive, and since productivity is improved when using this, and forming a black matrix, it is preferable.
상기 광중합 개시 보조제(D-1)로서는 아민 화합물 및 카르복실산 화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있다. As the photopolymerization initiation assistant (D-1), one or more compounds selected from the group consisting of amine compounds and carboxylic acid compounds can be preferably used.
상기 광중합 개시 보조제 중 아민 화합물의 구체적인 예로서는 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민 등의 지방족 아민 화합물, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 4-디메틸아미노벤조산2-에틸헥실, 벤조산2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭: 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논 등의 방향족 아민 화합물을 들 수 있다. 상기 아민 화합물로서는 방향족 아민 화합물이 바람직하게 사용된다. Specific examples of the amine compound in the photopolymerization start adjuvant include aliphatic amine compounds such as triethanolamine, methyldiethanolamine and triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (commonly known as Michler's ketone), 4,4'- Aromatic amine compounds, such as bis (diethylamino) benzophenone, are mentioned. As the amine compound, an aromatic amine compound is preferably used.
상기 광중합 개시 보조제 중 카르복실산 화합물의 구체예로서는 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신, 나프톡시아세트산 등의 방향족 헤테로아세트산류를 들 수 있다.
Specific examples of the carboxylic acid compound in the photopolymerization start adjuvant include phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid and chlorophenyl And aromatic heteroacetic acids such as thioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine and naphthoxyacetic acid.
상기 광중합 개시제의 함량은 흑색 감광성 수지 조성물 중의 고형분에 대하여 질량 분율로 0.1 내지 20질량%, 바람직하게는 0.5 내지 10질량%의 범위이다. 상기 광중합 개시제의 함량이 상기의 기준으로 상기의 범위에 있으면 흑색 감광성 수지 조성물이 고감도화되어 노광시간이 단축되므로 생산성이 향상되며 높은 감도를 가져 이 조성물을 사용하여 형성한 노광부의 강도나, 이 노광부의 표면에서의 평활성이 양호하게 되기 때문에 바람직하다.The content of the photoinitiator is in the range of 0.1 to 20% by mass, preferably 0.5 to 10% by mass, based on the mass fraction of the solids in the black photosensitive resin composition. When the content of the photopolymerization initiator is in the above range on the basis of the above criteria, the black photosensitive resin composition becomes highly sensitive and the exposure time is shortened, so that the productivity is improved and the intensity of the exposed portion formed using the composition with high sensitivity or the exposure It is preferable because smoothness at the negative surface becomes good.
상기 광중합 개시 보조제 함량은 흑색 감광성 수지 조성물 중의 고형분에 대하여 질량 분율로 0.01 내지 10질량%, 바람직하게는 0.01 내지 5질량%의 범위이다. 상기 광중합 개시 보조제의 사용량이 상기의 범위에 있으면 흑색 감광성 수지 조성물의 감도가 더 높아지고, 이 조성물을 사용하여 형성되는 컬러필터의 생산성이 향상되기 때문에 바람직하다.
The photopolymerization initiation aid content is in the range of 0.01 to 10% by mass, preferably 0.01 to 5% by mass, based on the mass fraction with respect to the solid content in the black photosensitive resin composition. When the usage-amount of the said photoinitiator is in the said range, since the sensitivity of a black photosensitive resin composition becomes high and the productivity of the color filter formed using this composition improves, it is preferable.
카본나노튜브(E)Carbon Nanotubes (E)
상기 카본나노튜브는 흑색 감광성 수지 조성물의 저항을 낮추어 주어 빛샘 현상을 효과적으로 방지할 수 있도록 하기 위하여 사용된다. The carbon nanotubes are used to lower the resistance of the black photosensitive resin composition to effectively prevent light leakage.
상기 카본나노튜브는 일반적으로 사용되는 단일벽(single wall), 이중벽(duble wall), 다중 (multi wall)의 구조 및 다발형 구조로 이루어진 군으로부터 선택되는 적어도 하나를 사용할 수 있다. The carbon nanotubes may be at least one selected from the group consisting of a single wall, a double wall, a multi-wall structure, and a bundle-type structure which are generally used.
상기 카본나노튜브는 직경이 1 내지 100 나노미터, 길이가 1 내지 500 마이크로미터인 것을 사용하는 것이 바람직하다. 상기 카본나노튜브의 직경과 길이가 상기의 범위를 벗어나는 경우 분산성이나 투명성이 좋지 않다는 단점이 있다. The carbon nanotubes preferably have a diameter of 1 to 100 nanometers and a length of 1 to 500 micrometers. If the diameter and length of the carbon nanotubes are outside the above range, there is a disadvantage in that dispersibility or transparency is not good.
또한, 상기 카본나노튜브는 분산용매에 분산되어 있는 것이 바람직하게 사용될 수 있다. 상기 분산용매는 아세톤, 메틸에틸케톤, 메틸알콜, 에틸알콜, 이소프로필알콜, 부틸알콜, 에틸렌글라이콜, 폴리에틸렌글라이콜, 테트라하이드로푸란, 디메틸포름아미드, 디메틸아세트아마이드, N-메틸-2-피롤리돈, 헥산, 사이클로헥사논, 톨루엔, 클로로포름, 증류수, 디클로로벤젠, 디메틸벤젠, 트리메틸벤젠, 피리딘, 메틸나프탈렌, 니트로메탄, 아크릴로니트릴, 옥타데실아민, 아닐린, 디메틸설폭사이드로 이루어진 군으로부터 선택된 1종 이상 사용하는 것이 바람직하다.In addition, the carbon nanotubes are preferably dispersed in a dispersion solvent. The dispersion solvent is acetone, methyl ethyl ketone, methyl alcohol, ethyl alcohol, isopropyl alcohol, butyl alcohol, ethylene glycol, polyethylene glycol, tetrahydrofuran, dimethylformamide, dimethylacetamide, N-methyl-2 -Group consisting of pyrrolidone, hexane, cyclohexanone, toluene, chloroform, distilled water, dichlorobenzene, dimethylbenzene, trimethylbenzene, pyridine, methylnaphthalene, nitromethane, acrylonitrile, octadecylamine, aniline, dimethyl sulfoxide It is preferable to use one or more selected from.
상기 카본나노튜브를 분산용매에 균일하게 분산시키기 위하여 초음파 분산법이나 볼밀링법을 사용할 수 있다. 상기 초음파 분산법은 카본나노튜브의 용량 및 용매의 량에 따라 진동수 20kHz 내지 50kHz 범위의 파워(power) 50 내지 700W인 초음파기에서 1시간 내지 60시간 동안 적용하여 용매에 카본나노튜브가 균일하게 분산될 수 있도록 한다.Ultrasonic dispersion or ball milling may be used to uniformly disperse the carbon nanotubes in the dispersion solvent. The ultrasonic dispersion method is uniformly dispersed in a solvent by applying for 1 hour to 60 hours in an ultrasonic wave having a power of 50 to 700W in the frequency range of 20kHz to 50kHz according to the capacity of the carbon nanotubes and the amount of the solvent. To help.
상기 카본나노튜브를 용매에 분산시 분산안정제를 첨가 할 수 있다. 상기 분산안정제는 트리톤 엑스백(Triton X-100), 폴리에틸렌옥사이드, 폴리에틸렌옥사이드-폴리프로필렌옥사이드 공중합체, 폴리비닐피롤, 폴리비닐알코올, 가넥스(Ganax), 전분, 단당류(monosaccharide), 다당류(polysaccharide), 도데실벤젠술폰산 나트륨(dodecyl benzene sulfate), 도데실벤젠설폰산나트륨 (sodium dodecyl benzene sulfonate, NaDDBS), 도데실설폰산나트륨(sodium dodecylsulfonate, SDS), 4-비닐벤조산 세실트리메틸암모늄 (cetyltrimethylammounium 4-vinylbenzoate), 파이렌계 유도체(pyrene derivatives), 검 아라빅(Gum Arabic, GA), 나피온(nafion)에서 선택되는 적어도 하나를 사용하는 것이 바람직하다.When the carbon nanotubes are dispersed in a solvent, a dispersion stabilizer may be added. The dispersion stabilizer is Triton X-100, polyethylene oxide, polyethylene oxide-polypropylene oxide copolymer, polyvinylpyrrole, polyvinyl alcohol, Gannex, starch, monosaccharide, polysaccharide. ), Sodium dodecyl benzene sulfate, sodium dodecyl benzene sulfonate (NaDDBS), sodium dodecylsulfonate (SDS), 4-vinyl benzoic acid cesyltrimethylammounium 4- It is preferable to use at least one selected from vinylbenzoate, pyrene derivatives, gum Arabic, GA, and nafion.
상기 카본나노튜브는 분산성 및 표면안정화를 위해 산처리된 것을 사용할 수 있다. 상기 산으로는 질산(HNO3), 염산(HCl), 인산(H3PO4), 불화붕소산(HBF4), 불산(HF), 황산(H2SO4) 및 디노닐나프탈렌술폴산으로 이루어진 군으로부터 선택된 하나 이상 또는 그 수용액을 사용할 수 있다. 상기 산 수용액인 경우, 산 수용액의 농도는 5~99중량%인 것이 바람직하다. 상기 산처리는 0.1분 내지 120분인 것이 바람직하다.
The carbon nanotubes may be acid treated for dispersibility and surface stabilization. Examples of the acid include nitric acid (HNO 3 ), hydrochloric acid (HCl), phosphoric acid (H 3 PO 4 ), boric fluoride (HBF 4 ), hydrofluoric acid (HF), sulfuric acid (H 2 SO 4 ), and dinonylnaphthalenesulfonic acid. At least one selected from the group consisting of or an aqueous solution thereof may be used. In the case of the said acid aqueous solution, it is preferable that the density | concentration of an acid aqueous solution is 5-99 weight%. The acid treatment is preferably 0.1 minutes to 120 minutes.
상기 카본나노튜브는 흑색 감광성 수지 조성물 중의 고형분 함량에 대하여 질량 분율로 10 내지 50질량%, 바람직하게는 20내지 45질량%로 포함될 수 있다. 상기 카본나노튜브가 상기 기준으로 10 내지 50질량% 포함되는 경우에는 저저항의 블랙매트릭스의 형성이 가능하여 빛샘을 효과적으로 방지할 수 있어 바람직하다.
The carbon nanotubes may be included in a mass fraction of 10 to 50% by mass, preferably 20 to 45% by mass, based on the solids content in the black photosensitive resin composition. When the carbon nanotubes are contained in 10 to 50% by mass based on the above standard, it is possible to form a low-resistance black matrix, which can effectively prevent light leakage.
용제(F)Solvent (F)
상기 용제는 특별히 제한되지 않으며, 당해 분야에서 통상적으로 사용되고 있는 각종 유기 용제를 사용할 수 있다.The solvent is not particularly limited, and various organic solvents commonly used in the art may be used.
상기 용제의 구체적인 예로는, 에틸렌글리콜모노메틸에테르, 에틸렌글리콜모노에틸 에테르, 에틸렌글리콜모노프로필에테르, 에틸렌글리콜모노부틸에테르 등의 에틸렌글리콜모노알킬에테르류, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜디에틸에테르, 디에틸렌글리콜디프로필에테르, 디에틸렌글리콜디부틸에테르 등의 디에틸렌글리콜디알킬에테르류, 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜알킬에테르아세테이트류, 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 프로필렌글리콜모노프로필에테르아세테이트 등의 알킬렌글리콜알킬에테르아세테이트류, 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알콕시알킬아세테이트류, 벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류, 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤류, 에탄올, 프로판올, 부탄올, 헥사놀, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류, 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등의 에스테르류, γ-부티롤락톤 등의 환상 에스테르류 등을 들 수 있다. Specific examples of the solvent include ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, and diethylene glycol diethyl. Diethylene glycol dialkyl ethers such as ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether, ethylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and propylene glycol monomethyl ether Alkylene glycol alkyl ether acetates, such as acetate, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate, alkoxy alkyl acetates, such as methoxy butyl acetate, and methoxy pentyl acetate, benzene, toluene, xylene, mesitylene, etc. Of Ketones such as aromatic hydrocarbons, methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin, 3- Ester, such as ethyl ethoxy propionate and 3-methoxy methyl propionate, and cyclic ester, such as (gamma) -butyrolactone, etc. are mentioned.
상기 용제는 도포성, 건조성면에서 상기 예시한 용제 중에서 비점이 100℃ 내지 200℃인 유기 용제가 바람직하게 사용될 수 있고, 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산에틸이나 3-메톡시프로피온산메틸 등의 에스테르류가 보다 바람직하게 사용될 수 있으며, 특히 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 시클로헥사논, 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등이 더욱 바람직하게 사용될 수 있다.The solvent may preferably be an organic solvent having a boiling point of 100 ° C. to 200 ° C. among the solvents exemplified above in terms of applicability and dryness, and may be alkylene glycol alkyl ether acetates, ketones, ethyl 3-ethoxypropionate or 3- Ester, such as methyl methoxy propionate, can be used more preferably, Especially propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 3-ethoxy propionate, 3-methoxy propionate, etc. are mentioned. More preferably.
이들 용제는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.
These solvents can be used individually or in mixture of 2 or more types, respectively.
상기 용제는 이를 포함하는 흑색 감광성 수지 조성물 전체량에 대하여 질량 분율로 60 내지 90질량%, 바람직하게는 70 내지 88 질량% 포함된다. 상기 용제의 함량이 상기의 기준으로 60 내지 90질량%의 범위이면 도포성이 양호해지기 때문에 바람직하다.
The solvent is contained in a mass fraction of 60 to 90 mass%, preferably 70 to 88 mass% with respect to the total amount of the black photosensitive resin composition including the same. Since the applicability | paintability becomes favorable when content of the said solvent is the range of 60-90 mass% on the said reference | standard, it is preferable.
첨가제(G)Additive (G)
상기 첨가제는 필요에 따라 본 발명의 효과를 저해하지 않는 범위 내에서 선택적으로 첨가될 수 있는 것으로서, 구체적으로 충진제, 다른 고분자 화합물, 경화제, 밀착 촉진제, 산화 방지제, 자외선 흡수제, 응집 방지제 등을 예시할 수 있다. The additive may be optionally added within the range that does not impair the effects of the present invention, if necessary, and specifically, fillers, other polymer compounds, curing agents, adhesion promoters, antioxidants, ultraviolet absorbers, anti-agglomerating agents, etc. Can be.
상기 충진제는 구체적으로 유리, 실리카, 알루미나 등을 들 수 있다. Specific examples of the filler include glass, silica, alumina, and the like.
상기 다른 고분자 화합물은 구체적으로 에폭시 수지, 말레이미드 수지 등의 경화성 수지, 폴리비닐알코올, 폴리아크릴산, 폴리에틸렌글리콜모노알킬에테르, 폴리플루오로알킬아크릴레이트, 폴리에스테르, 폴리우레탄 등의 열가소성 수지 등을 들 수 있다. Specific examples of the other polymer compound include curable resins such as epoxy resins and maleimide resins, thermoplastic resins such as polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ethers, polyfluoroalkyl acrylates, polyesters, polyurethanes, and the like. Can be.
상기 경화제는 심부 경화 및 기계적 강도를 높이기 위해 사용될 수 있으며, 상기 경화제로는 구체적으로 에폭시 화합물, 다관능 이소시아네이트 화합물, 멜라민 화합물, 옥세탄 화합물 등을 들 수 있다. The curing agent may be used to increase the core hardening and mechanical strength, and the curing agent may specifically include an epoxy compound, a polyfunctional isocyanate compound, a melamine compound, an oxetane compound, and the like.
상기 경화제에서 에폭시 화합물의 구체적인 예로서는, 비스페놀 A계 에폭시 수지, 수소화 비스페놀 A계 에폭시 수지, 비스페놀 F계 에폭시 수지, 수소화 비스페놀 F계 에폭시 수지, 노블락형 에폭시 수지, 기타 방향족계 에폭시 수지, 지환족계 에폭시 수지, 글리시딜에스테르계 수지, 글리시딜아민계 수지, 또는 이러한 에폭시 수지의 브롬화 유도체, 에폭시 수지 및 그 브롬화 유도체 이외의 지방족, 지환족 또는 방향족 에폭시 화합물, 부타디엔 (공)중합체 에폭시화물, 이소프렌 (공)중합체 에폭시화물, 글리시딜(메타)아크릴레이트 (공)중합체, 트리글리시딜이소시아눌레이트 등을 들 수 있다. Specific examples of the epoxy compound in the curing agent include a bisphenol A epoxy resin, a hydrogenated bisphenol A epoxy resin, a bisphenol F epoxy resin, a hydrogenated bisphenol F epoxy resin, a noblock type epoxy resin, other aromatic epoxy resins, and an alicyclic epoxy resin. , Aliphatic, cycloaliphatic or aromatic epoxy compounds other than glycidyl ester resins, glycidylamine resins, or brominated derivatives of these epoxy resins, epoxy resins and brominated derivatives thereof, butadiene (co) polymer epoxides, isoprene ( Co) polymer epoxide, glycidyl (meth) acrylate (co) polymer, triglycidyl isocyanurate, and the like.
상기 경화제에서 옥세탄 화합물의 구체적인 예로서는 카르보네이트비스옥세탄, 크실렌비스옥세탄, 아디페이트비스옥세탄, 테레프탈레이트비스옥세탄, 시클로헥산디카르복실산비스옥세탄 등을 들 수 있다.Specific examples of the oxetane compound in the curing agent include carbonate bis oxetane, xylene bis oxetane, adipate bis oxetane, terephthalate bis oxetane, cyclohexane dicarboxylic acid bis oxetane and the like.
상기 경화제는 경화제와 함께 에폭시 화합물의 에폭시기, 옥세탄 화합물의 옥세탄 골격을 개환 중합하게 할 수 있는 경화 보조 화합물을 병용할 수 있다. 상기 경화 보조 화합물로서는 예를 들면, 다가 카르본산류, 다가 카르본산 무수물류, 산 발생제 등을 들 수 있다. 상기 카르본산 무수물류는 에폭시 수지 경화제로서 시판되는 것을 이용할 수 있다. 시판되는 상기 에폭시 수지 경화제로서는 예를 들면, 상품명(아데카하도나 EH-700)(아데카공업㈜ 제조), 상품명(리카싯도 HH)(신일본이화㈜ 제조), 상품명(MH-700)(신일본이화㈜ 제조) 등을 들 수 있다. The said hardening | curing agent can use together the hardening auxiliary compound which can make ring-opening-polymerize the epoxy group of an epoxy compound, and the oxetane skeleton of an oxetane compound with a hardening | curing agent. As said hardening auxiliary compound, polyhydric carboxylic acid, polyhydric carboxylic anhydride, an acid generator, etc. are mentioned, for example. As said carboxylic anhydride, what is marketed can be used as an epoxy resin hardening | curing agent. As said commercially available epoxy resin hardening | curing agent, a brand name (Adekahadona EH-700) (made by Adeka Industrial Co., Ltd.), a brand name (Rikaditdo HH) (made by Nippon Ewha Co., Ltd.), a brand name (MH-700) are mentioned, for example. (Manufactured by Nippon Ewha Co., Ltd.).
상기에서 예시한 경화제 및 경화 보조 화합물은 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다.The curing agent and curing auxiliary compound exemplified above may be used alone or in combination of two or more.
상기 밀착 촉진제는 구체적으로 비닐트리메톡시실란, 비닐트리에톡시실란, 비닐트리스(2-메톡시에톡시)실란, N-(2-아미노에틸)-3-아미노프로필메틸디메톡시실란, N-(2-아미노에틸)-3-아미노프로필트리메톡시실란, 3-아미노프로필트리에톡시실란, 3-글리시독시프로필트리메톡시실란, 3-글리시독시프로필메틸디메톡시실란, 2-(3,4-에폭시시클로헥실)에틸트리메톡시실란, 3-클로로프로필메틸디메톡시실란, 3-클로로프로필트리메톡시실란, 3-메타크릴옥시프로필트리메톡시실란, 3-머캅토프로필트리메톡시실란, 3-이소시아네이트프로필트리메톡시실란, 3-이소시아네이트프로필트리에톡시실란 등을 들 수 있다. 상기 밀착 촉진제는 각각 단독으로 또는 2종 이상 조합하여 사용할 수 있다. Specifically, the adhesion promoter may include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- ( 3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimeth And oxysilane, 3-isocyanatepropyltrimethoxysilane, and 3-isocyanatepropyltriethoxysilane. The adhesion promoters may be used alone or in combination of two or more thereof.
상기 산화 방지제는 구체적으로 2,2'-티오비스(4-메틸-6-t-부틸페놀), 2,6-디-t-부틸-4-메틸페놀 등 힌더드페놀계를 들 수 있다. Specific examples of the antioxidant include hindered phenols such as 2,2'-thiobis (4-methyl-6-t-butylphenol) and 2,6-di-t-butyl-4-methylphenol.
상기 자외선 흡수제는 구체적으로 2-(3-tert-부틸-2-히드록시-5-메틸페닐)-5-클로로벤조티리아졸, 알콕시벤조페논 등을 들 수 있다. Specific examples of the ultraviolet absorber include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzothiazole, alkoxybenzophenone and the like.
상기 응집 방지제는 구체적으로 폴리아크릴산 나트륨 등을 들 수 있다.
Specific examples of the aggregation inhibitor include sodium polyacrylate.
본 발명의 흑색 감광성 수지 조성물은, 예를 들면 이하와 같은 방법에 의해 제조할 수 있다. The black photosensitive resin composition of this invention can be manufactured by the following method, for example.
착색 재료(A)와 카본나노튜브(E)를 미리 용제(F)와 혼합하여 비드 밀 등을 이용하여 분산시킨다. 이때, 필요에 따라 안료 분산제가 사용되고, 또한 알칼리 가용성 수지(B)의 일부 또는 전부가 배합되는 경우도 있다. 얻어진 분산체(이하, '밀베이스'라고 하는 경우도 있음)에 알칼리 가용성 수지(B)의 나머지, 광중합성 화합물(C), 광중합 개시제(D)와, 필요에 따라 첨가제(G)를 첨가한 후, 필요에 따라 추가의 용제를 소정의 농도가 되도록 더 첨가하면 목적하는 흑색 감광성 수지 조성물을 얻을 수 있다.
The coloring material (A) and carbon nanotube (E) are previously mixed with the solvent (F) and dispersed using a bead mill or the like. At this time, a pigment dispersant is used as needed, and some or all of alkali-soluble resin (B) may be mix | blended. The remainder of alkali-soluble resin (B), the photopolymerizable compound (C), the photoinitiator (D), and the additive (G) were added as needed to the obtained dispersion (henceforth a "mill base"). After that, if necessary, an additional solvent is further added so as to have a predetermined concentration, whereby the desired black photosensitive resin composition can be obtained.
이하에서는 본 발명에 따른 컬러 필터를 설명한다.Hereinafter, a color filter according to the present invention will be described.
본 발명에 따른 컬러 필터는 기판 상부에 전술한 본 발명에 따른 흑색 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광 및 현상하여 얻어지는 블랙 매트릭스를 포함한다. The color filter which concerns on this invention contains the black matrix obtained by apply | coating the black photosensitive resin composition which concerns on this invention mentioned above on a board | substrate, and exposing and developing in a predetermined pattern.
보다 구체적으로 본 발명에 따른 흑색 감광성 수지 조성물을 이용하여 블랙 매트릭스의 패턴을 형성하는 방법은, 전술한 흑색 감광성 수지 조성물을 기판상에 도포하는 단계, 상기 흑색 감광성 수지 조성물의 일부 영역을 선택적으로 노광하는 단계 및 상기 흑색 감광성 수지 조성물의 노광 영역 또는 비노광 영역을 제거하는 현상 단계를 포함하여 이루어진다.More specifically, the method of forming a pattern of a black matrix using the black photosensitive resin composition according to the present invention comprises the steps of applying the above-described black photosensitive resin composition on a substrate, selectively exposing a portion of the black photosensitive resin composition And a developing step of removing the exposed area or the non-exposed area of the black photosensitive resin composition.
상기 도포단계는 본 발명의 흑색 감광성 조성물을 기판 위에 도포하여 예비 건조함으로써 용제 등의 휘발 성분을 제거하여 평활한 도막을 얻는 것이다. 이 때의 도막의 두께는 대개 0.5 내지 5㎛ 정도이다. In the coating step, the black photosensitive composition of the present invention is applied onto a substrate and preliminarily dried to remove volatile components such as a solvent to obtain a smooth coating film. The thickness of the coating film at this time is about 0.5-5 micrometers normally.
상기 기판은 유리판, 실리콘 웨이퍼 및 폴리에테르설폰(polyethersulfone, PES), 폴리카보네이트(polycarbonate, PC) 등의 플라스틱 기재의 판 등일 수 있으며, 그 종류가 특별히 제한되는 것은 아니다.The substrate may be a glass plate, a silicon wafer, a plate of a plastic substrate such as polyethersulfone (PES), polycarbonate (PC), or the like, and the type thereof is not particularly limited.
상기 노광단계는 상기에서 얻어진 도막에 목적하는 패턴을 얻기 위해 마스크를 통해 특정 영역에 자외선을 조사하는 것이다. 이때, 노광부 전체에 균일하게 평행 광선이 조사되고, 마스크와 기판이 정확히 위치가 맞도록 마스크 얼라이너나 스테퍼 등의 장치를 사용하는 것이 바람직하다. The exposing step is to irradiate ultraviolet rays to a specific region through a mask to obtain a desired pattern on the coating film obtained above. At this time, it is preferable to use apparatuses, such as a mask aligner and a stepper, so that a parallel light beam may be irradiated uniformly to the whole exposure part, and a mask and a board | substrate will be correctly aligned.
상기 현상 단계는 상기에서 경화가 종료된 도막을 현상액인 알칼리 수용액에 접촉시켜 비노광 영역을 용해시키고 현상함으로써 목적하는 패턴을 제조하는 것이다. 현상 후, 필요에 따라 150 내지 230℃에서 10 내지 60분 정도의 후 건조를 실시할 수 있다. The developing step is to prepare a desired pattern by contacting the coating film after the curing is completed with an aqueous alkali solution which is a developing solution to dissolve and develop the non-exposed areas. After image development, it can carry out after about 10 to 60 minutes of drying at 150-230 degreeC as needed.
상기 현상 단계에서 사용하는 현상액은 통상 알칼리성 화합물과 계면 활성제를 포함하는 수용액이다. The developing solution used in the developing step is usually an aqueous solution containing an alkaline compound and a surfactant.
상기 현상액 중의 알칼리성 화합물은 무기 및 유기 알칼리성 화합물 중 어느 것이어도 좋다. 상기 무기 알칼리성 화합물의 구체적인 예로서는 수산화나트륨, 수산화칼륨, 인산수소이나트륨, 인산이수소나트륨, 인산수소이암모늄, 인산이수소암모늄, 인산이수소칼륨, 규산나트륨, 규산칼륨, 탄산나트륨, 탄산칼륨, 탄산수소나트륨, 탄산수소칼륨, 붕산나트륨, 붕산칼륨, 암모니아 등을 들 수 있다. 또한, 상기 유기 알칼리성 화합물의 구체적인 예로서는 테트라메틸암모늄히드록시드, 2-히드록시에틸트리메틸암모늄히드록시드, 모노메틸아민, 디메틸아민, 트리메틸아민, 모노에틸아민, 디에틸아민, 트리에틸아민, 모노이소프로필아민, 디이소프로필아민, 에탄올아민 등을 들 수 있다. 이들 무기 및 유기 알칼리성 화합물은 각각 단독으로 또는 둘 이상을 조합하여 사용할 수 있다. The alkaline compound in the developer may be any of inorganic and organic alkaline compounds. Specific examples of the inorganic alkaline compounds include sodium hydroxide, potassium hydroxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, diammonium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium silicate, potassium silicate, sodium carbonate, potassium carbonate, sodium hydrogen carbonate And potassium hydrogen carbonate, sodium borate, potassium borate, ammonia and the like. In addition, specific examples of the organic alkaline compound include tetramethylammonium hydroxide, 2-hydroxyethyltrimethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, mono Isopropylamine, diisopropylamine, ethanolamine, etc. are mentioned. These inorganic and organic alkaline compounds can be used individually or in combination of 2 or more, respectively.
상기 현상액 중의 알칼리성 화합물의 바람직한 농도는 0.01 내지 10질량%의 범위이고, 보다 바람직하게는 0.03 내지 5질량%이다. The concentration of the alkaline compound in the developer is in the range of 0.01 to 10% by mass, more preferably 0.03 to 5% by mass.
상기 현상액 중의 계면 활성제는 비 이온계 계면 활성제, 음 이온계 계면 활성제 또는 양 이온계 계면 활성제 중 모두 사용할 수 있다. 상기 비 이온계 계면 활성제의 구체적인 예로서는 폴리옥시에틸렌알킬에테르, 폴리옥시에틸렌아릴에테르, 폴리옥시에틸렌알킬아릴에테르, 그 밖의 폴리옥시에틸렌 유도체, 옥시에틸렌/옥시프로필렌 블록 공중합체, 소르비탄지방산에스테르, 폴리옥시에틸렌소르비탄지방산에스테르, 폴리옥시에틸렌소르비탄지방산에스테르, 글리세린지방산에스테르, 폴리옥시에틸렌지방산에스테르, 폴리옥시에틸렌알킬아민 등을 들 수 있다. 상기 음이온계 계면 활성제의 구체예로서는 라우릴알코올황산에스테르나트륨이나 올레일알코올황산에스테르나트륨 등의 고급알코올황산에스테르염류, 라우릴황산나트륨이나 라우릴황산암모늄 등의 알킬황산염류, 도데실벤젠술폰산나트륨이나 도데실나프탈렌술폰산나트륨 등의 알킬아릴술폰산염류 등을 들 수 있다. 상기 양 이온계 계면 활성제의 구체예로서는 스테아릴아민염산염이나 라우릴트리메틸암모늄클로라이드 등의 아민염 또는 4급 암모늄염 등을 들 수 있다. 상기 계면 활성제는 각각 단독으로 또는 2종 이상을 조합하여 사용할 수 있다. Surfactant in the developer may be used both non-ionic surfactant, anionic surfactant or cationic surfactant. Specific examples of the nonionic surfactant include polyoxyethylene alkyl ether, polyoxyethylene aryl ether, polyoxyethylene alkyl aryl ether, other polyoxyethylene derivatives, oxyethylene / oxypropylene block copolymers, sorbitan fatty acid esters, and poly Oxyethylene sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, glycerin fatty acid ester, polyoxyethylene fatty acid ester, polyoxyethylene alkylamine and the like. Specific examples of the anionic surfactants include higher alcohol sulfate ester salts such as sodium lauryl alcohol sulfate and sodium oleyl alcohol sulfate, alkyl sulfates such as sodium lauryl sulfate and ammonium lauryl sulfate, sodium dodecylbenzene sulfonate and dode Alkyl aryl sulfonates, such as sodium cinnaphthalene sulfonate, etc. are mentioned. Specific examples of the cationic surfactant include amine salts such as stearylamine hydrochloride and lauryl trimethylammonium chloride, or quaternary ammonium salts. The said surfactant can be used individually or in combination of 2 types or more, respectively.
상기 현상액 중의 계면 활성제의 함량은, 통상 알칼리 현상액 100질량부에 대하여 0.01 내지 10질량부, 바람직하게는 0.05 내지 8질량부, 보다 바람직하게는 0.1 내지 5질량부이다.
The content of the surfactant in the developer is usually 0.01 to 10 parts by mass, preferably 0.05 to 8 parts by mass, and more preferably 0.1 to 5 parts by mass with respect to 100 parts by mass of the alkaline developer.
상기한 과정을 거치면 기판 상에 소정의 패턴 형상을 갖는 블랙 매트릭스가 얻어진다. 상기 블랙 매트릭스를 제외한 컬러 필터의 구성 및 그 제조방법은 본 기술분야에서 잘 알려져 있으므로 그에 의하고 자세한 설명은 생략한다.
Through the above process, a black matrix having a predetermined pattern shape is obtained on the substrate. The configuration of the color filter except the black matrix and a method of manufacturing the same are well known in the art, and detailed description thereof will be omitted.
상기한 바와 같이 하여 제조되는 본 발명에 따른 컬러 필터의 블랙 매트릭스는 400nm에서 750nm까지의 광학 밀도(Optical density 이하 OD)가 평균 4.0 이상의 높은 OD 값을 나타낸다. 또한 본 발명에 따른 컬러 필터의 블랙매트릭스는 1.0×1012 Ω/cm2 이하의 저저항을 나타낸다. 따라서 본 발명에 따른 컬러 필터의 블랙 매트릭스는 빛샘 현상이 방지되게 된다.
The black matrix of the color filter according to the present invention prepared as described above exhibits a high OD value of an average density of 4.0 or less from 400 nm to 750 nm. In addition, the black matrix of the color filter according to the present invention exhibits a low resistance of 1.0 × 10 12 mA / cm 2 or less. Therefore, the black matrix of the color filter according to the present invention is to prevent light leakage phenomenon.
본 발명은 전술한 컬러 필터를 구비한 액정 표시 장치도 권리에 포함하고 있다. This invention also includes the liquid crystal display device provided with the color filter mentioned above in a right.
본 발명의 액정 표시 장치는 전술한 컬러 필터를 구비한 것을 제외하고는 본 기술분야에서 알려진 구성을 포함한다. 즉, 본 발명의 컬러 필터를 적용할 수 있는 액정 표시 장치는 모두 본 발명에 포함된다. 일례로, 박막트랜지스터(TFT소자), 화소전극 및 배향층을 구비한 대향 전극 기판을 소정의 간격으로 마주 향하게 하고, 이 간극부에 액정 재료를 주입하여 액정층으로 한 투과형의 액정 표시 장치를 들 수 있다. 또한, 컬러 필터의 기판과 착색층 사이에 반사층을 설치한 반사형의 액정 표시 장치도 있다. 또 다른 일례로, 컬러 필터의 투명 전극 위에 합쳐진 TFT(박막 트랜지스터: Thin Film Transistor) 기판 및, TFT 기판이 컬러 필터와 중첩하는 위치에 고정된 백라이트를 포함한 액정 표시 장치를 들 수 있다. 이러한 액정 표시 장치의 구성은 당해분야에 널리 알려져 있으므로 이에 대한 상세한 설명은 생략하기로 한다.
The liquid crystal display of the present invention includes a configuration known in the art, except that the above-described color filter is provided. That is, all of the liquid crystal display devices to which the color filter of the present invention can be applied are included in the present invention. For example, a transmissive liquid crystal display device in which a counter electrode substrate including a thin film transistor (TFT element), a pixel electrode, and an alignment layer is faced at predetermined intervals, and a liquid crystal material is injected into the gap to form a liquid crystal layer. Can be. There is also a reflective liquid crystal display device in which a reflective layer is provided between the substrate of the color filter and the colored layer. As another example, a liquid crystal display device including a TFT (Thin Film Transistor) substrate joined on a transparent electrode of a color filter, and a backlight fixed at a position where the TFT substrate overlaps the color filter. Since the configuration of such a liquid crystal display is well known in the art, a detailed description thereof will be omitted.
이하, 본 발명을 하기 실시예에 기초하여 더욱 상세하게 설명하지만, 하기에 개시되는 본 발명의 실시예는 본 발명의 이해를 돕기 위한 것으로서 본 발명의 범위가 이들 실시예에 한정되지 않는다.
Hereinafter, the present invention will be described in more detail based on the following examples, but the embodiments of the present invention disclosed below are provided to assist the understanding of the present invention, and the scope of the present invention is not limited to these examples.
분산체(M)의 제조Preparation of Dispersion (M)
<제조예 1><Manufacture example 1>
카본블랙 20.0질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 5질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M1)를 제조하였다.20.0 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 5 parts by mass of carbon nanotubes (multi world nanotubes), and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. A dispersion (M1) was prepared by mixing and dispersing with a bead mill for 12 hours.
<제조예 2><Manufacture example 2>
카본블랙 17.0질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 8질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M2)를 제조하였다.17.0 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 8 parts by mass of carbon nanotubes (multi world nanotubes), and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. A dispersion (M2) was prepared by mixing and dispersing with a bead mill for 12 hours.
<제조예 3><Manufacture example 3>
카본블랙 14.0질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 11질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69 질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M3)를 제조하였다.14.0 parts by mass of carbon black, 6 parts by mass of Azispa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 11 parts by mass of carbon nanotubes (multi-world nanotubes), and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. A dispersion (M3) was prepared by mixing and dispersing with a bead mill for 12 hours.
<제조예 4>≪ Preparation Example 4 &
카본블랙 11.0질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 14질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M4)를 제조하였다.11.0 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 14 parts by mass of carbon nanotubes (multi-world nanotubes), and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. The dispersion (M4) was prepared by mixing and dispersing with a bead mill for 12 hours.
<제조예 5>Production Example 5
카본블랙 25.0질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M5)를 제조하였다.25.0 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent were mixed and dispersed for 12 hours using a bead mill. (M5) was prepared.
<제조예 6><Manufacture example 6>
카본블랙 23.5질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 1.5질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M6)를 제조하였다.23.5 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 1.5 parts by mass of carbon nanotubes (multi-world nanotubes) and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. The dispersion (M6) was prepared by mixing and dispersing with a bead mill for 12 hours.
<제조예 7><Manufacture example 7>
카본블랙 7질량부, 분산제로서 아지스파 PB821(아지노모또 파인테크노 가부시끼가이샤 제조) 6질량부, 카본나노튜브(멀티월드 나노튜브) 18질량부 및 용매로서 프로필렌글리콜모노메틸에테르아세테이트 69질량부를 비드밀에 의해 12 시간 동안 혼합·분산하여 분산체(M7)를 제조하였다
7 parts by mass of carbon black, 6 parts by mass of azipa PB821 (manufactured by Ajino Moto Fine Techno Co., Ltd.) as a dispersant, 18 parts by mass of carbon nanotubes (multi-world nanotubes) and 69 parts by mass of propylene glycol monomethyl ether acetate as a solvent. A dispersion (M7) was prepared by mixing and dispersing with a bead mill for 12 hours.
알칼리 가용성 수지(B)의 합성Synthesis of Alkali-Soluble Resin (B)
<합성예 1>Synthesis Example 1
교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 1000ml플라스크에 프로필렌글리콜모노메틸에테르아세테이트 400질량부, 아조비스이소부티로나이트릴(AIBN) 7질량부, 3-(2-(아크릴로일옥시)에톡시-3-옥소프로파노익엑시드 45질량부, N-페닐말레이미드 58질량부, 스티렌 20질량부, 메타아크릴산 40질량부, 1,7,7-트리메틸바이싸이클로[2.2.1]헵탄-2-일메타아크릴레이트 20질량부를 투입하고 질소 치환하였다. 그 후 교반하며 반응액의 온도를 100℃로 상승시키고 상승 후 7시간 반응하였다. 이렇게 합성된 알칼리 가용성 수지의 최종 고형분은 31.0%, 고형분 산가는 123㎎KOH/g 이며 GPC로 측정한 중량 평균 분자량은 12,000 이었다.
400 parts by mass of propylene glycol monomethyl ether acetate, 7 parts by mass of azobisisobutyronitrile (AIBN), 3- (2- (acrylic) in a 1000 ml flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen introduction tube. Royloxy) ethoxy-3-oxopropanoic acid 45 mass parts, N-phenylmaleimide 58 mass parts, styrene 20 mass parts, methacrylic acid 40 mass parts, 1,7,7- trimethyl bicyclo [2.2. 1] 20 parts by mass of heptane-2-ylmethacrylate was added thereto, followed by nitrogen substitution, followed by stirring, raising the temperature of the reaction solution to 100 ° C. and reacting for 7 hours after the rise. 31.0%, solid acid value was 123 mgKOH / g, and the weight average molecular weight measured by GPC was 12,000.
흑색 감광성 수지 조성물의 제조Preparation of Black Photosensitive Resin Composition
<실시예 1>≪ Example 1 >
상기 제조예 1의 분산체(M1) 50질량부, 상기 합성예 1에서 제조한 알칼리 가용성 수지 9.5질량부, 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본가야꾸 제조) 1.98질량부, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온(Irgacure 369; Ciba Specialty Chemical 사 제조) 0.21질량부, 4,4'-비스(디에틸아미노)벤조페논(EAB-F; 호도가야 카가쿠㈜제조) 0.1질량부, 에타논-1-[9-에틸-6-(2-메틸-4테트라히드로피라닐옥시벤조일)-9H-카바졸-3-일]-1-(O-아세틸옥심)(Irgacure OXE02; Ciba Specialty Chemical사 제조) 0.8질량부, 프로필렌글리콜모노메틸에테르아세테이트 37.41질량부를 혼합하여 흑색 감광성 수지 조성물을 제조하였다.50 parts by mass of the dispersion (M1) of Preparation Example 1, 9.5 parts by mass of alkali-soluble resin prepared in Synthesis Example 1, 1.98 parts by mass of dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku), 2- Benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one (Irgacure 369; manufactured by Ciba Specialty Chemical) 0.21 parts by mass, 4,4'-bis (diethylamino) benzophenone ( EAB-F; manufactured by Hodogaya Kagaku Co., Ltd.) 0.1 parts by mass, ethanone-1- [9-ethyl-6- (2-methyl-4tetrahydropyranyloxybenzoyl) -9H-carbazol-3-yl] 0.8 mass parts of -1- (O-acetyl oxime) (Irgacure OXE02; the product made by Ciba Specialty Chemical Co., Ltd.), and 37.41 mass parts of propylene glycol monomethyl ether acetate were mixed, and the black photosensitive resin composition was produced.
<실시예 2><Example 2>
제조예 1에서 제조한 분산체(M1)를 제조예 2에서 제조한 분산체(M2)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다. A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M2) prepared in Preparation Example 2.
<실시예 3><Example 3>
제조예 1에서 제조한 분산체(M1)를 제조예 3에서 제조한 분산체(M3)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다. A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M3) prepared in Preparation Example 3.
<실시예 4><Example 4>
제조예 1에서 제조한 분산체(M1)를 제조예 4에서 제조한 분산체(M4)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다. A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M4) prepared in Preparation Example 4.
<실시예 5>Example 5
제조예 1에서 제조한 분산체(M1)를 제조예 6에서 제조한 분산체(M6)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다. A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M6) prepared in Preparation Example 6.
<실시예 6><Example 6>
제조예 1에서 제조한 분산체(M1)를 제조예 7에서 제조한 분산체(M6)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다.
A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M6) prepared in Preparation Example 7.
<비교예 1>Comparative Example 1
제조예 1에서 제조한 분산체(M1)를 제조예 5에서 제조한 분산체(M5)로 변경한 것 이외는 상기 실시예 1과 동일하게 실시하여 흑색 감광성 수지 조성물을 제조하였다.
A black photosensitive resin composition was prepared in the same manner as in Example 1 except that the dispersion (M1) prepared in Preparation Example 1 was changed to the dispersion (M5) prepared in Preparation Example 5.
<실험예 1>Experimental Example 1
상기 실시예 1 내지 6와 비교예 1 에서 제조된 흑색 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100℃의 온도에서 2분간 유지하여 박막을 형성시켰다. 이어서 상기 박막 위에 투과율을 1 내지 100%의 범위에서 계단상으로 변화시키는 패턴과 1㎛ 내지 50㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 50㎛로 하여 자외선을 조사하였다. 이때, 자외선 광원은 g, h, i 선을 모두 함유하는 1KW의 고압 수은등을 사용하여 50mJ/ ㎠의 조도로 조사하였으며, 특별한 광학 필터는 사용하지 않았다. 상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 2분 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 230℃의 가열 오븐에서 20분간 가열하여 블랙매트릭스 패턴을 형성하였다. 제조된 블랙매트릭스의 두께는 1.0㎛이었다. The black photosensitive resin composition prepared in Examples 1 to 6 and Comparative Example 1 was applied onto a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 2 minutes to form a thin film. Subsequently, a test photomask having a pattern for changing the transmittance stepwise in a range of 1 to 100% and a line / space pattern of 1 μm to 50 μm was placed on the thin film and the distance from the test photomask was 50 μm. Was investigated. At this time, the ultraviolet light source was irradiated with an illuminance of 50mJ / cm 2 using a 1KW high-pressure mercury lamp containing all g, h, and i lines, and no special optical filter was used. The thin film irradiated with ultraviolet rays was developed by soaking in a KOH aqueous solution developing solution of pH 10.5 for 2 minutes. The thin glass plate coated with the thin film was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 230 ° C. for 20 minutes to form a black matrix pattern. The thickness of the prepared black matrix was 1.0 μm.
상기 기판 상에 형성된 블랙매트릭스 패턴에 대하여 아래와 같이 면저항 및 광학밀도를 측정하고 그 결과를 하기 표 1에 나타내었다. The sheet resistance and optical density of the black matrix pattern formed on the substrate were measured as follows, and the results are shown in Table 1 below.
<면저항><Surface resistance>
상기 기판 상에 형성된 블랙매트릭스 패턴에 대하여 면저항 측정기(MCP-HT450, 미쓰비시社)로 면저항을 측정하였다. The sheet resistance of the black matrix pattern formed on the substrate was measured with a sheet resistance meter (MCP-HT450, Mitsubishi Corporation).
<광학밀도 측정><Optical density measurement>
상기 기판 상에 형성된 블랙매트릭스 패턴에 대하여 OSP-200(올림푸스사 제)을 이용하여, 400nm내지 750nm파장에서의 광학 밀도를 측정하고 그 평균값을 나타내었다.For the black matrix pattern formed on the substrate, the optical density at 400 nm to 750 nm wavelength was measured using OSP-200 (manufactured by Olympus) and the average value thereof was shown.
상기 표 1에서 보는 바와 같이 본 발명에 따라 CNT를 포함하는 실시예의 경우 비교예에 비하여 광학밀도 특성이 양호하면서도 면저항 값이 현저하게 낮은 것을 확인 할 수 있다. 이와 같이 면저항 값이 낮은 경우 블랙매트릭스 외곽의 원치 않는 전계형성을 막아줄 수 있기 때문에 빛샘이 방지될 수 있음을 알 수 있다. 다만, 카본나노튜브의 함량이 본 발명의 바람직한 범위내에 포함되지 않는 실시예 5와 6의 경우에는 그 함량이 본 발명의 바람직한 범위내에 포함되는 실시예 1 내지 4에 비하여 면저항 특성이 좋지 않은 것을 확인 할 수 있다.As shown in Table 1, in the case of the embodiment including the CNT according to the present invention, it can be confirmed that the sheet resistance value is remarkably low while the optical density characteristic is good as compared with the comparative example. As such, when the sheet resistance value is low, light leakage can be prevented because it can prevent unwanted electric field formation outside the black matrix. However, in the case of Examples 5 and 6 in which the content of carbon nanotubes is not included in the preferred range of the present invention, it is confirmed that the sheet resistance characteristics are not as good as those in Examples 1 to 4 in which the content is included in the preferred range of the present invention. can do.
Claims (9)
A black material comprising a coloring material (A) containing a black pigment, an alkali-soluble resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), carbon nanotubes (E), and a solvent (F). Photosensitive resin composition.
The method according to claim 1, wherein the carbon nanotube (E) is characterized in that it comprises at least one selected from the group consisting of a single wall (double wall), a double wall (multi-wall), a multi-wall structure and a bundle structure. Black photosensitive resin composition.
The black photosensitive resin composition according to claim 1, wherein the carbon nanotube (E) is contained in a mass fraction of 10 to 50% by mass based on the solids content in the black photosensitive resin composition.
The black photosensitive resin composition according to claim 1, wherein the coloring material is contained in a mass fraction of 20 to 70% by mass based on the solids content in the black photosensitive resin composition.
A black filter obtained by applying the black photosensitive resin composition of any one of Claims 1-5 on a board | substrate, and exposing and developing in a predetermined pattern.
The color filter of claim 6, wherein the black matrix exhibits a low resistance of 1.0 × 10 12 μs / cm 2 or less.
The color filter of claim 6, wherein the black matrix has an average optical density (OD below 400) of 400 nm to 750 nm.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20140148377A (en) * | 2012-03-26 | 2014-12-31 | 도레이 카부시키가이샤 | Photosensitive black resin composition and resin black matrix substrate |
WO2021036387A1 (en) * | 2019-08-30 | 2021-03-04 | 福州高意光学有限公司 | Optical filter applied in wide angle |
CN113105771A (en) * | 2020-01-09 | 2021-07-13 | 三星显示有限公司 | Composition for black matrix and display device |
-
2010
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20140148377A (en) * | 2012-03-26 | 2014-12-31 | 도레이 카부시키가이샤 | Photosensitive black resin composition and resin black matrix substrate |
WO2021036387A1 (en) * | 2019-08-30 | 2021-03-04 | 福州高意光学有限公司 | Optical filter applied in wide angle |
CN113105771A (en) * | 2020-01-09 | 2021-07-13 | 三星显示有限公司 | Composition for black matrix and display device |
US11703728B2 (en) | 2020-01-09 | 2023-07-18 | Samsung Display Co., Ltd. | Black matrix composition and display device comprising the same |
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