KR20070109664A - Inspection apparatus of fpd pattern undergoing firing using emissivity of the pattern - Google Patents

Inspection apparatus of fpd pattern undergoing firing using emissivity of the pattern Download PDF

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KR20070109664A
KR20070109664A KR1020060042977A KR20060042977A KR20070109664A KR 20070109664 A KR20070109664 A KR 20070109664A KR 1020060042977 A KR1020060042977 A KR 1020060042977A KR 20060042977 A KR20060042977 A KR 20060042977A KR 20070109664 A KR20070109664 A KR 20070109664A
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emissivity
pattern
firing
fpd
fpd pattern
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KR100876539B1 (en
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허재영
남원식
장성욱
연정륜
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코닉시스템 주식회사
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/42—Measurement or testing during manufacture
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
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    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/22—Electrodes, e.g. special shape, material or configuration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2217/00—Gas-filled discharge tubes
    • H01J2217/38—Cold-cathode tubes
    • H01J2217/49—Display panels, e.g. not making use of alternating current
    • H01J2217/492—Details
    • H01J2217/49207—Electrodes

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Abstract

An apparatus for inspecting a flat panel display pattern firing using emissivity of the pattern is provided to inspect a firing state of the pattern in a non-contact and nondestructive manner during a firing process. A chamber(100) has a heating member for performing a firing process. An emissivity measuring unit measures emissivity of a flat panel display pattern(112) formed on a substrate(110). A comparator compares the measured emissivity with a preset reference value to judge whether the flat panel display pattern is properly fired if the compared result is within a predetermined range. The emissivity measuring unit has a probe(120) irradiating light onto the flat panel display pattern and receiving the light reflected from the flat panel display pattern, and an emissivity calculator(150) calculating the emissivity.

Description

복사율을 이용하는 ＦＰＤ 패턴 소성검사장치{Inspection apparatus of FPD pattern undergoing firing using emissivity of the pattern}Inspection apparatus of FPD pattern undergoing firing using emissivity of the pattern}

도 1은 본 발명에 따른 FPD 패턴 소성검사방법을 설명하기 위한 도면;1 is a view for explaining the FPD pattern plasticity inspection method according to the present invention;

도 2는 소성 진행에 따른 복사율의 변화를 설명하기 위한 그래프;2 is a graph for explaining a change in emissivity according to the progress of firing;

도 3 및 도 4는 본 발명에 따른 FPD 패턴 소성검사장치를 설명하기 위한 도면들;3 and 4 are views for explaining the FPD pattern plastic inspection apparatus according to the present invention;

<도면의 주요부분에 대한 참조번호의 설명><Description of reference numbers for the main parts of the drawings>

100: 급속열처리챔버 110: 기판100: rapid heat treatment chamber 110: substrate

112: FPD 패턴 114: 가열램프112: FPD pattern 114: heating lamp

120: 프로브 130: 제어장치120: probe 130: control device

140: 마이컴 150: 복사율 계산기140: micom 150: emissivity calculator

160: 전원장치160: power supply

본 발명은 FPD 패턴 소성검사장치에 관한 것으로서, 특히 소성공정 중에 소성상태를 인시튜로 판별하는 FPD 패턴 소성검사장치 및 소성방법에 관한 것이다. BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an FPD pattern firing inspection apparatus, and more particularly, to an FPD pattern firing inspection apparatus and a firing method for discriminating a firing state in situ during a firing process.

LCD, PDP 등의 FPD 장치는 유리기판상에 여러가지 패턴을 형성함으로써 이루어진다. 예컨대 전극패턴은 통상적으로 무기접착제, 은, 고분자, 솔벤트 등의 합성물질을 유리기판에 도포한 다음에 열을 가해서 소성을 함으로써 얻는다. 이러한 소성과정이 충분히 이루어지지 않으면 경화가 제대로 이루어지지 않게 되고, 소성과정이 너무 과도하면 전극으로서의 역할을 충분히 할 수 없게 된다. FPD devices such as LCDs and PDPs are formed by forming various patterns on glass substrates. For example, an electrode pattern is usually obtained by applying a synthetic material such as an inorganic adhesive agent, silver, a polymer, a solvent to a glass substrate, and then firing by applying heat. If the firing process is not sufficiently made, the curing is not performed properly, and if the firing process is too excessive, it may not be able to sufficiently serve as an electrode.

종래에는 소성공정이 제대로 되었는가를 판단하기 위해서 육안검사를 하여 전극패턴의 색깔을 살펴보거나 긁기 검사를 하여 전극패턴의 경화정도를 살펴보았다. 그러나 이러한 방법은 많은 시간이 소요되기 때문에 바람직하지 않아 저항측정방법을 이용하기도 하였다. Conventionally, in order to determine whether the firing process is properly performed by visual inspection to examine the color of the electrode pattern or scratch test to examine the degree of curing of the electrode pattern. However, this method is not preferable because it takes a lot of time, the resistance measurement method was used.

저항측정방법은 기판을 몇 개 샘플링한 다음에 상기 전극의 저항을 측정하여 저항값이 소정값 이내이면 소성공정이 제대로 이루어진 것으로 판단하는 것이다. 그러나 이러한 저항측정방법은 프로브를 직접 전극에 접촉시켜야 하므로 파괴적이다. 따라서 모든 기판에 대해서 행할 수가 없어서 몇 개의 샘플을 통해서만 이루어졌다. 그리고 접촉식이기 때문에 소성공정 중에는 행하기가 어려웠다. In the resistance measurement method, a few substrates are sampled, and then the resistance of the electrode is measured to determine that the baking process is properly performed when the resistance value is within a predetermined value. However, this resistance measurement method is destructive since the probe must be directly in contact with the electrode. Therefore, it could not be done for all the substrates and only made up a few samples. And since it was a contact type, it was difficult to carry out during a baking process.

따라서 본 발명이 이루고자 하는 기술적 과제는, 비접촉식이고 비파괴적인 방법으로 신속하게 소성공정이 제대로 이루어졌는지를 판단할 수 있을 뿐만 아니라 나아가 소성공정 중에 인시튜로서 소성상태를 파악할 수 있는 FPD 패턴 소성검사장치 및 소성방법을 제공하는 데 있다. Accordingly, the technical problem to be achieved by the present invention is an FPD pattern plastic inspection apparatus which can not only determine whether the firing process is properly performed quickly by a non-contact and non-destructive method, but also determine the firing state as an in-situ during the firing process; It is to provide a firing method.

상기 기술적 과제를 달성하기 위한 본 발명에 따른 FPD 패턴 소성검사장치는, 기판이 내부에 놓여지며 소성공정이 진행되도록 가열수단을 갖는 챔버; 상기 기판 상에 형성된 FPD 패턴의 복사율을 소성공정이 진행되는 동안에 인시튜로 측정하는 복사율 측정기; 및 상기 복사율 측정기를 통한 복사율 측정치가 미리 입력되어지는 l기준치±오차l의 범위 안에 있으면 상기 FPD 패턴의 소성이 제대로 이루어졌다고 판단하여 상기 가열수단에로의 전원공급을 차단하는 귀환신호를 출력하는 비교판단기; 를 구비하는 것을 특징으로 한다. In accordance with an aspect of the present invention, there is provided a FPD pattern plastic inspection apparatus comprising: a chamber having a heating means such that a substrate is placed therein and a firing process is performed; An emissivity meter for measuring the emissivity of the FPD pattern formed on the substrate in-situ during the firing process; And outputting a feedback signal for blocking the power supply to the heating means by determining that the firing of the FPD pattern is properly performed when the emissivity measurement value through the emissivity measuring instrument is within a range of l reference value ± error l inputted in advance. Judge; Characterized in having a.

상기 복사율 측정기는, 상기 FPD 패턴에 광을 조사하고 이 때 상기 FPD 패턴에서 나오는 광을 입력받는 프로브; 및 상기 프로브에 입력되는 광을 통하여 상기 FPD 패턴의 복사율을 계산하는 복사율 계산기; 포함하여 이루어지는 것을 특징으로 한다. The emissivity meter may include a probe that irradiates light to the FPD pattern and receives light emitted from the FPD pattern at this time; And an emissivity calculator for calculating an emissivity of the FPD pattern through light input to the probe. It is characterized by comprising.

상기 기술적 과제를 달성하기 위한 본 발명에 따른 FPD 패턴 소성방법은, 복사율 기준치를 설정하는 단계; 소성공정 중에 인시튜로 FPD 패턴의 복사율을 측정하는 단계; 및 상기 복사율 측정치가 l상기 기준치±오차l의 범위 안에 있으면 상기 소성공정을 멈추는 단계;를 포함하는 것을 특징으로 한다. FPD pattern firing method according to the present invention for achieving the above technical problem, setting the emissivity reference value; Measuring the emissivity of the FPD pattern in situ during the firing process; And stopping the firing process if the measured emissivity is within the range of the reference value ± error l.

이하에서, 본 발명의 바람직한 실시예를 첨부한 도면들을 참조하여 상세히 설명한다. 아래의 실시예는 본 발명의 내용을 이해하기 위해 제시된 것일 뿐이며 당 분야에서 통상의 지식을 가진 자라면 본 발명의 기술적 사상 내에서 많은 변형이 가능할 것이다. 따라서 본 발명의 권리범위가 이러한 실시예에 한정되는 것으로 해석돼서는 안 된다. Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail. The following examples are only presented to understand the content of the present invention, and those skilled in the art will be capable of many modifications within the technical spirit of the present invention. Therefore, the scope of the present invention should not be construed as limited to these embodiments.

도 1은 본 발명에 따른 FPD 패턴 소성방법을 설명하기 위한 도면이다. 먼저 적절한 방법으로 미리 복사율 기준치를 측정하여 알아둔다(S10). 그런 다음에 소성을 진행하면서 인시튜로 복사율을 측정한다(S20). 이 때의 복사율 측정치가 l기준치±오차l의 범위 안에 있는가의 여부를 판단한다(S30). 복사율 측정치가 l기준치±오차l의 범위 안에 있으면 소성이 제대로 이루어졌다고 판단하여 소성을 멈추고(S40), 복사율 측정치가 l기준치±오차l의 범위 밖에 있으면 소성이 제대로 이루어지지 않은 걸로 판단하여 소성을 계속 진행한다(S45). 1 is a view for explaining the FPD pattern firing method according to the present invention. First, find out by measuring the emissivity reference value in advance by an appropriate method (S10). Then, the emissivity is measured in situ while firing (S20). At this time, it is determined whether the measured emissivity is within the range of l reference value ± error l (S30). If the measured emissivity is within the range of l reference value ± error l, the firing is judged to have been performed properly (S40). Proceed (S45).

도 2는 소성 진행에 따른 복사율의 변화를 설명하기 위한 그래프로서, 유리기판상에 무기접착제, 은, 고분자, 솔벤트 등의 합성물질을 도포한 다음에 열을 가해 소성을 하여 FPD 장치의 전극을 형성시키는 통상적인 과정에서 소성진행시간에 따른 복사율의 변화를 나타낸 것이다. 소성이 진행될수록 솔벤트 등 일부 물질이 증발하여 없어지기 때문에 전극의 물성이 변하게 된다. 복사율은 물질의 고유한 값이므로 이에 따라 전극의 복사율도 도 2에 도시된 바와 같이 변하여 감소하게 된다. 종래의 소성검사방법을 통하여 소성이 제대로 이루어진 시점을 찾아보면 도 2의 경우에는 전극의 복사율이 0.75이 되는 때이다. 그러면 기준치가 0.75이 되는 것이다. 소성시간이 C에서 너무 경과하면 계면반응 내지는 여러 가지 원하지 않는 반응이 생길 수 있으므로 소성시간 C를 지나 너무 오래 소성하는 것은 바람직하지 않다. FIG. 2 is a graph for explaining the change in emissivity according to the progress of sintering. After coating a synthetic material such as an inorganic adhesive agent, silver, a polymer, a solvent, and the like on a glass substrate, calcination is applied to heat to form an electrode of the FPD device. It shows the change of the emissivity according to the firing progress in the usual process. As the sintering proceeds, some materials, such as solvent, evaporate and disappear, thereby changing the physical properties of the electrode. Emissivity is an intrinsic value of the material, so that the emissivity of the electrode is also changed and reduced as shown in FIG. Looking at the time when the firing is properly made through the conventional plastic test method, the emissivity of the electrode is in the case of 0.75. The baseline is then 0.75. If the firing time is too long at C, an interfacial reaction or various unwanted reactions may occur, and it is not preferable to bake too long after the firing time C.

도 3은 본 발명에 따른 FPD 패턴 소성검사장치를 설명하기 위한 도면이다. 도 3을 참조하면, 급속열처리챔버(100) 내에서 FPD 패턴(112)이 형성되어 있는 기판(110)이 가열램프(114)를 통하여 소성되고 있는 동안에 챔버(100)에 설치되는 프로브(120)를 통하여 FPD 패턴(112)에 광을 조사한다. 그러면 FPD 패턴(112)에서는 상기 광의 파장에 대한 복사광이 나오게 되며 이는 다시 프로브(120)에 입력된다. 프로브(120)에 입력되는 광을 통하여 복사율 계산기(150)는 복사율을 계산한다. 프로브(120)에서 FPD 패턴(112)으로 조사되는 광의 파장 및 세기 등은 제어장치(130)로 제어하며 제어장치(130)는 궁극적으로 마이컴(140)의 제어를 받는다. 챔버(100)는 반드시 급속열처리챔버이어야만 하는 것은 아니고 통상적인 로(furnace)이어도 무방하다. 3 is a view for explaining the FPD pattern plastic inspection apparatus according to the present invention. Referring to FIG. 3, the probe 120 installed in the chamber 100 while the substrate 110 on which the FPD pattern 112 is formed in the rapid thermal processing chamber 100 is fired through the heating lamp 114. The FPD pattern 112 is irradiated with light. Then, in the FPD pattern 112, the radiation of the wavelength of the light is emitted, which is input to the probe 120 again. Through the light input to the probe 120, the emissivity calculator 150 calculates the emissivity. The wavelength and the intensity of light emitted from the probe 120 to the FPD pattern 112 are controlled by the controller 130, and the controller 130 is ultimately controlled by the microcomputer 140. The chamber 100 does not necessarily have to be a rapid heat treatment chamber but may be a conventional furnace.

마이컴(140)은 복사율 계산기(150)에서 계산된 복사율 측정치를 도 2에서와 같은 방법으로 알아낸 기준치 0.75와 비교하여 측정치가 기준치와 같으면 소성이 제대로 이루어졌다고 판단하고 측정치와 비교치가 같지 않으면 소성이 제대로 이루어지지 않았다고 판단하는 비교판단부를 포함한다. 바람직하게는 도 4와 같이 기준치의 오차를 고려하여 측정치가 l0.75±오차(X)l의 범위 안에 있으면 FPD 패턴(112)의 소성이 제대로 이루어졌다고 판단하는 것이 좋다. 기준치는 도2에서와 같이 은을 주로 포함하는 전극의 경우에는 0.75일 것이지만 다른 성분을 주로 하는 경우에는 변할 것이다. 은 전극의 경우 오차(X)는 ±0.05 정도면 좋다. The microcomputer 140 compares the emissivity measurement calculated by the emissivity calculator 150 with the reference value 0.75 found in the same manner as in FIG. 2, and determines that the firing is properly performed if the measured value is the same as the reference value, and the firing is not equal to the measured value. It includes a comparison judgment that judges that it did not work properly. Preferably, as shown in FIG. 4, when the measured value is within the range of l0.75 ± error (X) l in consideration of the error of the reference value, it may be determined that the firing of the FPD pattern 112 is performed properly. The reference value will be 0.75 for electrodes mainly containing silver, as in FIG. 2, but will vary for other components. In the case of silver electrodes, the error (X) should be about ± 0.05.

마이컴(140)은 소성이 제대로 이루어졌다고 판단하면 귀환신호를 가열램프(120)에 연결되는 전원장치(160)에 제공하여 전원장치(160)의 전원공급을 차단한다. When the microcomputer 140 determines that the firing is properly performed, the microcomputer 140 provides a feedback signal to the power supply unit 160 connected to the heating lamp 120 to cut off the power supply of the power supply unit 160.

상술한 바와 같이 본 발명에 의하면, 소성의 진행상황을 비접촉식이고 비파괴적으로 알 수 있기 때문에 소성공정 중에 인시튜로 소성상태를 파악하여 소성공정을 제어할 수 있게 된다. As described above, according to the present invention, since the progress of firing can be known in a non-contact and non-destructive manner, the firing process can be controlled by grasping the firing state in situ during the firing process.

Claims (4)

기판이 내부에 놓여지며 소성공정이 진행되도록 가열수단을 갖는 챔버;A chamber in which the substrate is placed and having a heating means for the firing process to proceed; 상기 기판 상에 형성된 FPD 패턴의 복사율을 상기 소성공정이 진행되는 동안에 인시튜로 측정하는 복사율 측정기; 및An emissivity meter for measuring the emissivity of the FPD pattern formed on the substrate in-situ during the firing process; And 상기 복사율 측정기를 통한 복사율 측정치가 미리 입력되어지는 l기준치± 오차l의 범위 안에 있으면 상기 FPD 패턴의 소성이 제대로 이루어졌다고 판단하는 비교판단기;를 구비하는 것을 특징으로 하는 FPD 패턴의 소성검사장치. And a comparison determiner determining that the firing of the FPD pattern is properly performed when the emissivity measurement value of the emissivity measuring instrument is within a range of l reference value ± error l, which is input in advance. 제1항에 있어서, 상기 비교판단기는 상기 복사율 측정기를 통한 복사율 측정치가 l기준치±오차l의 범위 안에 있으면 상기 가열수단에로의 전원공급을 차단하는 귀환신호를 출력하는 것을 특징으로 하는 FPD 패턴의 소성검사장치.The FPD pattern of claim 1, wherein the comparison determiner outputs a feedback signal for interrupting power supply to the heating means when the measured emissivity of the emissivity measurer is within a range of l reference value ± error l. Plasticity inspection device. 제1항에 있어서, 상기 복사율 측정기는, The method of claim 1, wherein the emissivity meter, 상기 FPD 패턴에 광을 조사하고 이 때 상기 FPD 패턴에서 나오는 광을 입력받는 프로브; 및 A probe that irradiates light to the FPD pattern and receives light emitted from the FPD pattern at this time; And 상기 프로브에 입력되는 광을 통하여 상기 FPD 패턴의 복사율을 계산하는 복사율 계산기; 포함하여 이루어지는 것을 특징으로 하는 FPD 패턴의 소성검사장치.An emissivity calculator that calculates an emissivity of the FPD pattern using light input to the probe; Plastic inspection device of the FPD pattern, characterized in that comprises. 복사율 기준치를 설정하는 단계;Setting an emissivity reference value; 소성공정 중에 인시튜로 FPD 패턴의 복사율을 측정하는 단계; 및 Measuring the emissivity of the FPD pattern in situ during the firing process; And 상기 복사율 측정치가 l상기 기준치±오차l의 범위 안에 있으면 상기 소성공정을 멈추는 단계;를 포함하는 것을 특징으로 하는 FPD 패턴의 소성방법. Stopping the firing process if the emissivity measurement value is within the range of the reference value ± error l; and firing the FPD pattern.
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