KR102513131B1 - 조성물, 막, 광학 필터, 고체 촬상 소자, 적외선 센서, 광학 필터의 제조 방법, 카메라 모듈, 화합물, 및 분산 조성물 - Google Patents

조성물, 막, 광학 필터, 고체 촬상 소자, 적외선 센서, 광학 필터의 제조 방법, 카메라 모듈, 화합물, 및 분산 조성물 Download PDF

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KR102513131B1
KR102513131B1 KR1020207036406A KR20207036406A KR102513131B1 KR 102513131 B1 KR102513131 B1 KR 102513131B1 KR 1020207036406 A KR1020207036406 A KR 1020207036406A KR 20207036406 A KR20207036406 A KR 20207036406A KR 102513131 B1 KR102513131 B1 KR 102513131B1
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KR1020207036406A
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KR20210009375A (ko
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스구루 사메지마
토키히코 마츠무라
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후지필름 가부시키가이샤
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B23/00—Methine or polymethine dyes, e.g. cyanine dyes
    • C09B23/02—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups
    • C09B23/04—Methine or polymethine dyes, e.g. cyanine dyes the polymethine chain containing an odd number of >CH- or >C[alkyl]- groups one >CH- group, e.g. cyanines, isocyanines, pseudocyanines
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B55/00—Azomethine dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00—Other synthetic dyes of known constitution
    • C09B57/04—Isoindoline dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Materials For Photolithography (AREA)
KR1020207036406A 2018-09-18 2019-09-04 조성물, 막, 광학 필터, 고체 촬상 소자, 적외선 센서, 광학 필터의 제조 방법, 카메라 모듈, 화합물, 및 분산 조성물 KR102513131B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018173869 2018-09-18
JPJP-P-2018-173869 2018-09-18
PCT/JP2019/034691 WO2020059484A1 (ja) 2018-09-18 2019-09-04 組成物、膜、光学フィルタ、固体撮像素子、赤外線センサ、光学フィルタの製造方法、カメラモジュール、化合物、及び、分散組成物

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KR20210009375A KR20210009375A (ko) 2021-01-26
KR102513131B1 true KR102513131B1 (ko) 2023-03-23

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JP (1) JP7113907B2 (ja)
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WO (1) WO2020059484A1 (ja)

Families Citing this family (3)

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Publication number Priority date Publication date Assignee Title
KR102388487B1 (ko) * 2019-02-28 2022-04-19 주식회사 엘지화학 화합물, 이를 포함하는 색변환 필름, 백라이트 유닛 및 디스플레이 장치
US11937494B2 (en) * 2019-08-28 2024-03-19 Universal Display Corporation Organic electroluminescent materials and devices
JP7416950B2 (ja) * 2020-07-15 2024-01-17 富士フイルム株式会社 インクセット及び印刷物

Citations (4)

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WO2017203979A1 (ja) 2016-05-27 2017-11-30 富士フイルム株式会社 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、及び硬化膜の製造方法
JP2018025433A (ja) * 2016-08-09 2018-02-15 コニカミノルタ株式会社 コアシェル型蛍光色素含有ナノ粒子およびその製造方法
WO2018088897A1 (en) 2016-11-08 2018-05-17 Tchüpp Gmbh Expansion wool
WO2018155050A1 (ja) * 2017-02-24 2018-08-30 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置

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US7387856B2 (en) 2005-06-20 2008-06-17 Industrial Technology Research Institute Display comprising liquid crystal droplets in a hydrophobic binder
JP5642013B2 (ja) * 2011-04-21 2014-12-17 株式会社Adeka 新規化合物、近赤外線吸収剤及びこれを含有する合成樹脂組成物
CN103571233A (zh) 2012-07-19 2014-02-12 住友化学株式会社 染料用盐
KR101852804B1 (ko) * 2014-05-01 2018-04-27 후지필름 가부시키가이샤 적외선 센서, 근적외선 흡수 조성물, 감광성 수지 조성물, 화합물, 근적외선 흡수 필터 및 촬상 장치
WO2017080357A1 (en) 2015-11-10 2017-05-18 The Hong Kong University Of Science And Technology Detection of glass transition temperatures and visualization of phase-separated morphology
EP3489025A4 (en) * 2016-08-31 2019-10-16 FUJIFILM Corporation CURABLE COMPOSITION, ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATES, AND METHOD FOR MANUFACTURING LITHOGRAPHIC PRINTING PLATE
JP6752664B2 (ja) * 2016-09-20 2020-09-09 富士フイルム株式会社 顔料分散液の製造方法および硬化性組成物の製造方法
JP6770278B2 (ja) * 2017-02-01 2020-10-14 東京都公立大学法人 ジベンゾピロメテンホウ素キレート化合物、近赤外光吸収色素、光電変換素子、近赤外光センサー及び撮像素子

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WO2017203979A1 (ja) 2016-05-27 2017-11-30 富士フイルム株式会社 硬化性組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子、画像表示装置、及び硬化膜の製造方法
JP2018025433A (ja) * 2016-08-09 2018-02-15 コニカミノルタ株式会社 コアシェル型蛍光色素含有ナノ粒子およびその製造方法
WO2018088897A1 (en) 2016-11-08 2018-05-17 Tchüpp Gmbh Expansion wool
WO2018155050A1 (ja) * 2017-02-24 2018-08-30 富士フイルム株式会社 近赤外線カットフィルタ、固体撮像素子、カメラモジュールおよび画像表示装置

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TW202026365A (zh) 2020-07-16
KR20210009375A (ko) 2021-01-26
JPWO2020059484A1 (ja) 2021-08-30
JP7113907B2 (ja) 2022-08-05
WO2020059484A1 (ja) 2020-03-26

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