KR102270594B1 - 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터 - Google Patents

컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터 Download PDF

Info

Publication number
KR102270594B1
KR102270594B1 KR1020197018537A KR20197018537A KR102270594B1 KR 102270594 B1 KR102270594 B1 KR 102270594B1 KR 1020197018537 A KR1020197018537 A KR 1020197018537A KR 20197018537 A KR20197018537 A KR 20197018537A KR 102270594 B1 KR102270594 B1 KR 102270594B1
Authority
KR
South Korea
Prior art keywords
group
mol
meth
resin composition
compound
Prior art date
Application number
KR1020197018537A
Other languages
English (en)
Korean (ko)
Other versions
KR20190086753A (ko
Inventor
히로키 구라모토
야스아키 가와구치
다케히로 기노시타
마사요시 야나기
츠카사 하라
에리 나가이
Original Assignee
쇼와 덴코 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 쇼와 덴코 가부시키가이샤 filed Critical 쇼와 덴코 가부시키가이샤
Publication of KR20190086753A publication Critical patent/KR20190086753A/ko
Application granted granted Critical
Publication of KR102270594B1 publication Critical patent/KR102270594B1/ko

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
KR1020197018537A 2016-12-14 2017-10-25 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터 KR102270594B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016242058 2016-12-14
JPJP-P-2016-242058 2016-12-14
PCT/JP2017/038495 WO2018110097A1 (ja) 2016-12-14 2017-10-25 カラーフィルター用樹脂組成物、その製造方法及びカラーフィルター

Publications (2)

Publication Number Publication Date
KR20190086753A KR20190086753A (ko) 2019-07-23
KR102270594B1 true KR102270594B1 (ko) 2021-06-28

Family

ID=62558735

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020197018537A KR102270594B1 (ko) 2016-12-14 2017-10-25 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터

Country Status (5)

Country Link
JP (1) JP6890613B2 (zh)
KR (1) KR102270594B1 (zh)
CN (1) CN110073253B (zh)
TW (1) TWI653248B (zh)
WO (1) WO2018110097A1 (zh)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7474106B2 (ja) 2019-05-08 2024-04-24 住友化学株式会社 着色硬化性樹脂組成物
JP7392719B2 (ja) * 2019-06-25 2023-12-06 株式会社レゾナック 感光性樹脂組成物、樹脂硬化膜及び画像表示素子
JP2021014568A (ja) * 2019-07-10 2021-02-12 住友化学株式会社 着色剤を含有する組成物
CN112694557B (zh) * 2019-10-23 2022-05-10 常州强力先端电子材料有限公司 光固化树脂、光固化树脂组合物及黑色矩阵材料
JPWO2022085389A1 (zh) * 2020-10-19 2022-04-28

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000047016A (ja) 1998-07-27 2000-02-18 Toppan Printing Co Ltd カラーフィルター及びその製造方法
JP2010085723A (ja) * 2008-09-30 2010-04-15 Fujifilm Corp 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
US20150315376A1 (en) 2014-04-30 2015-11-05 Chi Mei Corporation Photosensitive resin composition for color filter and application thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003330184A (ja) 2002-05-13 2003-11-19 Fuji Photo Film Co Ltd 着色感光性樹脂組成物及びカラーフィルター
JP2004198717A (ja) * 2002-12-18 2004-07-15 Showa Denko Kk カラーフィルターブラックマトリックスレジスト組成物及びその組成物に用いるカーボンブラック分散液組成物
TWI458648B (zh) * 2006-04-07 2014-11-01 Mitsubishi Paper Mills Ltd A method for manufacturing a photographic mask for printing a resin, and a screen printing mask for resin
EP2567995B1 (en) * 2006-12-26 2014-02-19 Asahi Kasei E-materials Corporation Resin composition for printing plate
JP4855299B2 (ja) * 2007-02-27 2012-01-18 富士フイルム株式会社 着色感光性組成物、カラーフィルター及びその製造方法
JP5109903B2 (ja) * 2007-10-19 2012-12-26 Ｊｓｒ株式会社 着色層形成用感放射線性組成物、カラーフィルタ及び液晶表示素子
JP5371313B2 (ja) * 2008-07-28 2013-12-18 富士フイルム株式会社 カラーフィルタ用着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示素子
KR101368539B1 (ko) * 2009-06-26 2014-02-27 코오롱인더스트리 주식회사 감광성 수지 조성물
KR101859710B1 (ko) * 2010-06-08 2018-05-21 토요잉크Sc홀딩스주식회사 칼라 필터용 착색 조성물 및 칼라 필터
JP5495991B2 (ja) * 2010-07-12 2014-05-21 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜及びその製造方法、カラーフィルタ、並びに、表示装置
JP5919698B2 (ja) * 2010-11-08 2016-05-18 Jsr株式会社 カラーフィルタ用着色組成物、カラーフィルタ及び表示素子
WO2012141000A1 (ja) 2011-04-11 2012-10-18 昭和電工株式会社 共重合体、その共重合体を含む樹脂組成物及び感光性樹脂組成物、並びにカラーフィルター
JP5966268B2 (ja) 2011-07-22 2016-08-10 Jsr株式会社 アレイ基板、液晶表示素子およびアレイ基板の製造方法
KR102004436B1 (ko) * 2011-11-30 2019-07-26 토요잉크Sc홀딩스주식회사 컬러 필터용 착색 조성물, 및 컬러 필터
JP2014164021A (ja) 2013-02-22 2014-09-08 Toyo Ink Sc Holdings Co Ltd 感光性着色組成物およびカラーフィルタ
TWI535742B (zh) * 2014-05-28 2016-06-01 Chi Mei Corp Photosensitive resin composition for color filter and its application
KR20160113796A (ko) * 2015-03-23 2016-10-04 동우 화인켐 주식회사 감광성 수지 조성물, 이를 포함하는 컬러 필터 및 화상표시장치
JP6511898B2 (ja) * 2015-03-24 2019-05-15 東洋インキＳｃホールディングス株式会社 固体撮像素子用感光性着色組成物、固体撮像素子用カラーフィルタ、及び固体撮像素子

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000047016A (ja) 1998-07-27 2000-02-18 Toppan Printing Co Ltd カラーフィルター及びその製造方法
JP2010085723A (ja) * 2008-09-30 2010-04-15 Fujifilm Corp 着色硬化性組成物、カラーフィルタ、及びカラーフィルタの製造方法
US20150315376A1 (en) 2014-04-30 2015-11-05 Chi Mei Corporation Photosensitive resin composition for color filter and application thereof

Also Published As

Publication number Publication date
CN110073253A (zh) 2019-07-30
CN110073253B (zh) 2021-10-29
JPWO2018110097A1 (ja) 2019-10-24
JP6890613B2 (ja) 2021-06-18
KR20190086753A (ko) 2019-07-23
TW201829489A (zh) 2018-08-16
WO2018110097A1 (ja) 2018-06-21
TWI653248B (zh) 2019-03-11

Similar Documents

Publication Publication Date Title
KR102270594B1 (ko) 컬러 필터용 수지 조성물, 그 제조 방법 및 컬러 필터
KR102121255B1 (ko) (메타)아크릴레이트계 폴리머, 상기 폴리머를 포함하는 조성물 및 그 용도
JP5588503B2 (ja) 付加共重合体、感光性樹脂組成物及びカラーフィルター
KR102626467B1 (ko) 감광성 수지 조성물 및 그 제조 방법
JP6255006B2 (ja) ブロックイソシアナト基含有ポリマー、該ポリマーを含む組成物及びその用途
JP7364020B2 (ja) 感光性樹脂組成物
KR102146622B1 (ko) 블랙 칼럼 스페이서 형성용 감광성 수지 조성물, 블랙 칼럼 스페이서 및 화상 표시 장치
KR102475680B1 (ko) 컬러 필터용 감광성 수지 조성물, 컬러 필터, 화상 표시 소자 및 컬러 필터의 제조 방법
KR101918433B1 (ko) 수지 조성물, 컬러 필터, 그 제조 방법 및 화상 표시 소자
WO2016203905A1 (ja) カラーフィルター用着色組成物、カラーフィルターおよび画像表示素子
CN116529670A (zh) 感光性树脂组合物及感光性树脂组合物的制造方法
JP2019031627A (ja) アルカリ可溶性樹脂、それを含むカラーフィルター用感光性樹脂組成物及びカラーフィルター
WO2022085389A1 (ja) 感光性樹脂組成物及びカラーフィルター
JP2019031626A (ja) アルカリ可溶性樹脂の製造方法
WO2023119900A1 (ja) 感光性樹脂組成物およびカラーフィルター
JP2023060757A (ja) 樹脂組成物、感光性樹脂組成物、樹脂硬化膜、カラーフィルターおよび画像表示素子

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant