KR102058034B1 - 리프트 핀 유닛 및 이를 구비하는 기판 지지 유닛 - Google Patents
리프트 핀 유닛 및 이를 구비하는 기판 지지 유닛 Download PDFInfo
- Publication number
- KR102058034B1 KR102058034B1 KR1020170163556A KR20170163556A KR102058034B1 KR 102058034 B1 KR102058034 B1 KR 102058034B1 KR 1020170163556 A KR1020170163556 A KR 1020170163556A KR 20170163556 A KR20170163556 A KR 20170163556A KR 102058034 B1 KR102058034 B1 KR 102058034B1
- Authority
- KR
- South Korea
- Prior art keywords
- pin
- substrate
- head
- unit
- lift pin
- Prior art date
Links
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170163556A KR102058034B1 (ko) | 2017-11-30 | 2017-11-30 | 리프트 핀 유닛 및 이를 구비하는 기판 지지 유닛 |
TW106145553A TWI649832B (zh) | 2017-11-30 | 2017-12-25 | 舉升銷單元及支撐基板的單元 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020170163556A KR102058034B1 (ko) | 2017-11-30 | 2017-11-30 | 리프트 핀 유닛 및 이를 구비하는 기판 지지 유닛 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20190064188A KR20190064188A (ko) | 2019-06-10 |
KR102058034B1 true KR102058034B1 (ko) | 2019-12-20 |
Family
ID=66213818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170163556A KR102058034B1 (ko) | 2017-11-30 | 2017-11-30 | 리프트 핀 유닛 및 이를 구비하는 기판 지지 유닛 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR102058034B1 (zh) |
TW (1) | TWI649832B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102504269B1 (ko) * | 2021-11-11 | 2023-02-28 | 피에스케이 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 |
US12062525B2 (en) | 2021-11-11 | 2024-08-13 | Psk, Inc. | Support unit, and apparatus for treating substrate with the same |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20220305601A1 (en) * | 2019-06-19 | 2022-09-29 | Lam Research Corporation | Use of vacuum during transfer of substrates |
TW202142733A (zh) * | 2020-01-06 | 2021-11-16 | 荷蘭商Asm Ip私人控股有限公司 | 反應器系統、抬升銷、及處理方法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100666764B1 (ko) | 2001-10-16 | 2007-01-09 | 동경 엘렉트론 주식회사 | 피처리체 승강기구 및 이를 사용한 처리장치 |
JP2007208054A (ja) | 2006-02-02 | 2007-08-16 | Ulvac Japan Ltd | 静電気除去装置及び静電気除去方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4919971B2 (ja) * | 2005-12-28 | 2012-04-18 | シャープ株式会社 | プラズマ処理装置及びプラズマ処理装置を用いて製造された表示パネル用基板 |
US20090314211A1 (en) * | 2008-06-24 | 2009-12-24 | Applied Materials, Inc. | Big foot lift pin |
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2017
- 2017-11-30 KR KR1020170163556A patent/KR102058034B1/ko active IP Right Grant
- 2017-12-25 TW TW106145553A patent/TWI649832B/zh active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100666764B1 (ko) | 2001-10-16 | 2007-01-09 | 동경 엘렉트론 주식회사 | 피처리체 승강기구 및 이를 사용한 처리장치 |
JP2007208054A (ja) | 2006-02-02 | 2007-08-16 | Ulvac Japan Ltd | 静電気除去装置及び静電気除去方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102504269B1 (ko) * | 2021-11-11 | 2023-02-28 | 피에스케이 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 |
WO2023085662A1 (ko) * | 2021-11-11 | 2023-05-19 | 피에스케이 주식회사 | 지지 유닛 및 이를 포함하는 기판 처리 장치 |
US12062525B2 (en) | 2021-11-11 | 2024-08-13 | Psk, Inc. | Support unit, and apparatus for treating substrate with the same |
Also Published As
Publication number | Publication date |
---|---|
KR20190064188A (ko) | 2019-06-10 |
TW201926537A (zh) | 2019-07-01 |
TWI649832B (zh) | 2019-02-01 |
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